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31. 发明专利

JPS61237416A ROTATING HOLDER OF SUBSTRATE OF MOLECULAR BEAM EPITAXY DEVICE 失效
公开(公告)号：JPS61237416A
公开(公告)日：1986-10-22
申请号：JP7830685
申请日：1985-04-15
申请人： HITACHI LTD
发明人： FUJIOKA KAZUMASA , OKUNO SUMIO , MIZUMOTO MUNEO , KANBARA HIDEAKI , UEDA SHINJIRO , KURODA TAKARO , YAMAGUCHI SUMIO , TAMURA NAOYUKI
IPC分类号： H01L21/203
摘要： PURPOSE:To curb the rise in temperature of a bearing element and to reduce the heat loss of a heater heating a substrate, by providing an element serving as a lead wire for electrifying the heater and a support for supporting the heater. CONSTITUTION:The heat from a heater 7 or a heater base 6, either of which is at a high temperature, is transmitted to a terminal plate 15 through an ele ment 8 serving as a lead wire and a support for the heater, and further it is transmitted to a bearing 10 through a holding plate 14 and a fixed shaft 4. Since the element 8 serving as a lead wire and a support for the heater has a large length, it renders a large heat resistance, and consequently the tempera ture is lowered sufficiently in the terminal plate 15. Since the element 8 has a sufficiently large diameter, in addition, the heat in the element 8 can be neglected substantially, and thus the fixed shaft 4 is not heated from inside. Therefore little heat is transmitted to the bearing 10, the temperature of the bearing 10 is kept at a remarkably low level, the reliability thereof is improved, and thus the lifetime of a holder is prolonged.

32. 发明专利

JPS60245236A SEMICONDUCTOR MANUFACTURING APPARATUS 失效
公开(公告)号：JPS60245236A
公开(公告)日：1985-12-05
申请号：JP10050284
申请日：1984-05-21
申请人： HITACHI LTD
发明人： MIZUMOTO MUNEO , OKUNO SUMIO , FUJIOKA KAZUMASA , TAKAHASHI KUNIHIRO , YAMAGUCHI SUMIO , KURODA TAKAO , TAMURA NAOYUKI , TACHIBANA MITSUHIRO
IPC分类号： H01L21/20 , C30B25/02 , H01L21/50
摘要： PURPOSE:To transfer substrates of various patterns by independently and automatically carrying out the substrate transfer operation and substrate receiving and sending operation. CONSTITUTION:A molecular beam epitaxy apparatus comprises automatic control apparatuses 21, 22 which control sending and receiving of substrate within an introducing chamber to a transfer chamber, automatic control apparatuses 23, 24 which control sending and receiving of substrate within transfer chamber to an analyzing chamber, automatic control apparatuses 25, 26 which control sending and receiving of substrate within a transfer chamber to a growth chamber, automatic control apparatuses 27, 28 which control sending and receiving of substrate within a sending chamber to a transfer chamber and an automatic control apparatus 29 which controls the transfer mechanism of truck within the transfer chamber. The substrates of various patterns can be transferred by individually and automatically executing the substrate transfer operation and substrate sending and receiving operation.

33. 发明专利

JPS60226134A SEMICONDUCTOR MANUFACTURE APPARATUS 失效
公开(公告)号：JPS60226134A
公开(公告)日：1985-11-11
申请号：JP8173684
申请日：1984-04-25
申请人： HITACHI LTD
发明人： MIZUMOTO MUNEO , OKUNO SUMIO , FUJIOKA KAZUYA , TAKAHASHI KUNIHIRO , YAMAGUCHI SUMIO , KURODA TAKAROU , TAMURA NAOYUKI , TACHIBANA MITSUHIRO
IPC分类号： H01L21/67 , H01L21/00 , H01L21/203 , H01L21/677 , H01L21/68
摘要： PURPOSE:To improve reliability through accurate detection of transfer or reception of substrates by detecting direction of operations of substrate transfer and reception mechanism at the outside of apparatus and discriminating the substrate receiving and transfer operations with such detection signal. CONSTITUTION:A molecular epitaxy apparatus comprises a detector 13 which detects a direction (vertical direction) of movement of a member 11 of substrate transfer and reception mechanism at the outside of apparatus, a detector 14 which detects a direction (forward or backward direction) of movement of manipulator 10 at the outside of apparatus and a discriminating circuit 15 which discriminates the substrate transfer and reception operation by inputting a detection signals sent from the detectors 13, 14. When the substrate transfer or reception mechanism executes the substrate reception operation, directions in movement of manipular 10 and member 11 are detected by the detectors 13, 14. When the detection signal is input to the discrimination circuit 15, the discrimination circuit 15 issues a signal which indicates that the substrate reception is being carried out. When the substrate reception or transfer mechanism executes the substrate transfer operation, the discrimination circuit 15 issues a signal which indicates that the substrate transfer operation is being carried out.

34. 发明专利

JPS60154611A MOLECULAR BEAM EPITAXY APPARATUS 失效
公开(公告)号：JPS60154611A
公开(公告)日：1985-08-14
申请号：JP1007484
申请日：1984-01-25
申请人： HITACHI LTD
发明人： KONDOU YOSHIMASA , SATOU KAZUO , YAMAGUCHI SUMIO , MATSUMURA YASUHIDE , KANETOMO MASABUMI , TAKAHASHI TOSHIO , MIZUMOTO MUNEO
IPC分类号： H01L21/203
摘要： PURPOSE:To improve movement and stop accuracy of truck and easily realize maintenance and repair of transfer mechanism by providing a driver of transfer mechanism at the one end or both ends of substrate transfer chamber. CONSTITUTION:A transfer chamber is composed of a transfer chamber 18 and a drive chamber 19. Both ends of rail 11 extend up to the drive chamber 19 and are provided with a sprocket 15 for driving the chain or metal belt 13. The tension sprocket 20 is pushed by a spring 21 in order to give adequate tension to the belt 13 and preventing deflection of it. The truck 12 and belt are coupled in rigid, stop accuracy of truck 12 driven by rotation of sprocket 15 is remarkably improved and automatic send and receive of substrate can be realized easily. Since the sprocket 15 and tension mechanism are exposed by removing the drive chamber 19, it is no longer necessary to deassemble the transfer path in the maintenance and working efficiency of apparatus can be improved distinctively.

35. 发明专利

JPS60117614A MOLECULAR BEAM EPITAXY DEVICE 失效
公开(公告)号：JPS60117614A
公开(公告)日：1985-06-25
申请号：JP22414383
申请日：1983-11-30
申请人： HITACHI LTD
发明人： MIZUMOTO MUNEO , OKUNO SUMIO , FUJIOKA KAZUMASA , TAKAHASHI KUNIHIRO , SATOU KAZUO , YAMAGUCHI SUMIO , KURODA TAKAROU , TAMURA NAOYUKI
IPC分类号： H01L21/203
摘要： PURPOSE:To detect the presence of a substrate on a transporter positively, and to facilitate the remote control of the transporter by providing a sensing means detecting the presence of the substrate on the transporter in a molecular beam epitaxy device in which the transporter on which the substrate is loaded is mounted movably in a carrying chamber for carrying the substrate to each treating chamber. CONSTITUTION:Conductive base plates 9A1, 9A2 buried to a transporter 8 made of a non-conductive material with a guide roller 13 rolling along a rail 7 made of a non-conductive material installed into a carrying chamber 5 are mounted to the transporter 8 in order to load a conductive substrate 15 after crystal growth. When the substrate 15 is loaded on the base plates 9A1, 9A2, currents flow and a conduction sensor 29 is operated because sliding contacts 21a, 21b are each brought into pressure-contact with buried plates 22, 24 for conduction through springs 20a, 20b by the load of the substrate. When the substrate 15 is removed from the base plates 9A1, 9A2, while the conduction sensor 29 is returned to an original state because currents stops by operation reverse to the one mentioned above. Accordingly, the presence of the substrate 15 on the base plates 9A1, 9A2 can be discriminated positively.

36. 发明专利

JPS6017069A STRAIGHT WIRE INTRODUCING DEVICE 失效
公开(公告)号：JPS6017069A
公开(公告)日：1985-01-28
申请号：JP12325183
申请日：1983-07-08
申请人： HITACHI LTD
发明人： KANETOMO MASABUMI , SATOU KAZUO , YAMAGUCHI SUMIO , MATSUMURA YASUHIDE , KATOU SHIGEO
IPC分类号： C23C14/56 , H01L21/203 , C23C14/22
摘要： PURPOSE:To enable use of a straight wire introducing device in an ultrahigh vacuum by placing a magnet or ferromagnetic material sealed hermetically with a member consisting of a low gas releasing material on the vacuum side and forming a magnetic circuit between the same and the member on the atm. side. CONSTITUTION:A low gas releasing material sealed internally and hermetically with a magnet 52, for example, a vessel formed of a stainless steel, is disposed in a vacuum partition wall 51 of a straight wire introducing device. The vessel is constituted of two kinds of stainless steels, i.e., a ferromagnetic and nonmagnetic stainless steels. Yokes 53 formed of the magnetic stainless steel are attached to both ends in an axial direction and pipes 54 formed of the nonmagnetic stainless steel are attached circumferentially to the inside and outside circumferences. These members are respectively joined by welding to constitute a hermetic vessel which confines the gas released from the magnet 52 in the vessel. A magnetic circuit is formed by the above-mentioned constitution and the magnetic coupling in the atmospheric air and in a vacuum is created through a vacuum partition wall 51.

37. 发明专利

JPS606373A MANIPULATOR 失效
公开(公告)号：JPS606373A
公开(公告)日：1985-01-14
申请号：JP11092783
申请日：1983-06-22
申请人： HITACHI LTD
发明人： KANETOMO MASABUMI , SATOU KAZUO , YAMAGUCHI SUMIO , KONDOU YOSHIMASA , TAKAHASHI TOSHIO
IPC分类号： H01F7/02 , B25J9/10 , B25J21/00

38. 发明专利

JPS58211683A Faraday cup 失效
标题翻译： FARADAY杯
公开(公告)号：JPS58211683A
公开(公告)日：1983-12-09
申请号：JP9485682
申请日：1982-06-04
申请人： Hitachi Ltd
发明人： YAMAGUCHI SUMIO , HABU TOORU , UENO TAKUMI , ISHIHARA HEIGO , AKAGI MOTOO
IPC分类号： H01J37/244 , G01T1/29 , H01J49/06
CPC分类号： G01T1/29
摘要： PURPOSE:To accurately detect the quantity of all beams in the central position and within a prescribed radius, by constituting the titled device by a part detecting the distribution of beams in the direction X, a part detecting the distribution of beams in the direction Y, and a cup detecting the quantity of the beams. CONSTITUTION:The device is constituted by a cup 1 for detecting the quantity of ion beams and a leading rod 2 for leading the detected quantity to a meter 3. The leading rod 2 comprises parts (a) and (b) for detecting the center of the beams, which are formed by bending the rod in the middle. The part (a) is a part for detecting the central position in the direction Y of the beams, and by moving the Faraday cup 1 in the direction Y, the position whereat the meter 3 indicates a maximum value is found. The part (b) is a part for detecting the central position in the direction X of the beams, and the position whereat a maximum value in the direction X is indicated is found in the same way as the above. The cup 1 is moved to the central position of the beams thus found, so as to detect a prescribed quantity of the ion beams.
摘要翻译：目的：为了准确检测中心位置和规定半径范围内的所有光束的数量，通过利用检测光束在方向X上的分布的部分构成标题设备，检测光束在Y方向上的分布的部分，以及检测梁的数量的杯子。构成：该装置由用于检测离子束量的杯1和用于将检测量引导到仪表3的前导杆2构成。引导杆2包括用于检测离子束的中心的部分（a）和（b）梁是通过在中间弯曲杆而形成的。部分（a）是用于检测梁的方向Y的中心位置的部分，并且通过沿着方向Y移动法拉第杯1，发现仪表3指示最大值的位置。部分（b）是以与上述相同的方式找到用于检测梁的方向X上的中心位置的部分，以及指示方向X上的最大值的位置。将杯1移动到如此找到的梁的中心位置，以便检测规定量的离子束。

39. 发明专利

JPS58192319A Mechanism for prevention of wafer break 失效
标题翻译：防止破裂的机制
公开(公告)号：JPS58192319A
公开(公告)日：1983-11-09
申请号：JP7527182
申请日：1982-05-07
申请人： Hitachi Ltd
发明人： HABU TOORU , TOKIKUCHI KATSUMI , YAMAGUCHI SUMIO
IPC分类号： H01L21/683 , H01L21/02
CPC分类号： H01L21/02
摘要： PURPOSE:To absorb shocks of water drop and prevent breaks, by providing metallic arms installed with springs in a drop carrier gate. CONSTITUTION:The wafer 1 drops in the guide 5, and is received by a pair of the arms 8 having spring property and detected by a sensor 11. A rotary solenoid 10 operates by the signal of the sensor 11, then the arms 8 extend to space over the wafer diameter and accordingly the wafer drops again. Thereat, the arms 8 move in contact with the end surface of the wafer, while the wafer doe not preform unnecessary movements in the guide 5. By this constitution, breakings or very small breaks of the wafer hardly generate.
摘要翻译：目的：为了吸收水滴的冲击并防止断裂，通过在落料架门中提供安装有弹簧的金属臂。构成：晶片1在引导件5中下落，并被具有弹簧特性的一对臂8接收并由传感器11检测。旋转螺线管10通过传感器11的信号进行操作，然后臂8延伸到晶片直径上的空间，因此晶片再次下降。在这种情况下，臂8与晶片的端面相接触，同时晶片不会在导向件5中产生不必要的运动。由此，晶片的断裂或非常小的断裂几乎不产生。

40. 发明专利

JPS5351385A LOCATING METHOD 失效
公开(公告)号：JPS5351385A
公开(公告)日：1978-05-10
申请号：JP12606076
申请日：1976-10-22
申请人： HITACHI LTD
发明人： KASHIOKA SEIJI , KAMEYAMA MASAYOSHI , YAMAGUCHI SUMIO , HORII MASAHIRO
IPC分类号： B41J7/34 , G05B19/18 , G05B19/404 , G05D3/00 , G05D3/12
摘要： PURPOSE:To correct the position of an object through the process comprising detecting the actual position of operation result by means of a detector, comparing it with correct operation position and eliminating thus-obtained deviation of transfer distance.

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