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    • 40. 发明申请
    • SPUTTER COATING APPARATUS INCLUDING ION BEAM SOURCE(S), AND CORRESPONDING METHOD
    • 包括离子束源的溅射涂层装置和相应的方法
    • WO03095695A2
    • 2003-11-20
    • PCT/US0314066
    • 2003-05-06
    • GUARDIAN INDUSTRIES
    • THOMSEN SCOTT VWALTON HUGH A
    • C03C17/00C03C17/36C23C14/56C23C16/26C23C
    • C03C17/3618C03C17/002C03C17/36C03C17/3634C03C17/3644C03C17/366C03C2217/78C23C14/562C23C16/26
    • A coating apparatus deposits a first coating (single or multi-layered) onto a first side of a substrate (e.g., glass substrate) passing through the apparatus, and a second coating (single or multi-layered) onto the other or second side of the substrate. In certain example embodiments, the first coating may be deposited via sputtering while the second coating is deposited via ion beam deposition. In such a manner, it is possible to coat both sides of the substrate in a single apparatus in an efficient manner. In other embodiments, the coating apparatus may sputter a coating onto a first side of the substrate and ion beam mill at leaste one surface of the substrate as the substrate passes through the coating apparatus. In other embodiments of this invention, a dual mode chamber may be provided that is adapted to receive a removable ion beam module on one side of a substrate and a removable sputtering module on the other side of the substrate. The different removable modules may or may not be used simultaneously in different embodiments of this invention.
    • 涂覆设备将第一涂层(单层或多层)沉积到穿过设备的基底(例如玻璃基底)的第一侧上,并将第二涂层(单层或多层)沉积到 底物。 在某些示例性实施例中,可以通过溅射沉积第一涂层,同时通过离子束沉积沉积第二涂层。 以这种方式,可以以有效的方式在单个装置中涂覆基板的两侧。 在其它实施例中,当基底穿过涂覆装置时,涂覆装置可以将涂层溅射到衬底的第一侧上,并且在衬底的至少一个表面上进行离子束研磨。 在本发明的其它实施例中,可以提供双模腔室,其适于在衬底的一侧上接收可去除的离子束模块和在衬底的另一侧上的可移除的溅射模块。 在本发明的不同实施例中,不同的可移除模块可以同时使用也可以不使用。