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31. 发明授权

US07476490B2 Method for producing a marker on a substrate, lithographic apparatus and device manufacturing method 失效
标题翻译：在基板上制造标记的方法，光刻设备和器件制造方法
公开(公告)号：US07476490B2
公开(公告)日：2009-01-13
申请号：US10875605
申请日：2004-06-25
申请人： Maurits Van Der Schaar , Jacobus Burghoorn , Richard Johannes Franciscus Van Haren , Everhardus Cornelis Mos , Rene Monshouwer
发明人： Maurits Van Der Schaar , Jacobus Burghoorn , Richard Johannes Franciscus Van Haren , Everhardus Cornelis Mos , Rene Monshouwer
IPC分类号： G03C9/00
CPC分类号： G03F7/105 , G03F7/168 , G03F9/708 , G03F9/7084
摘要： A method of producing a marker on a substrate includes projecting a patterned beam on a layer of resist disposed on a substrate in a lithographic apparatus to create a latent marker; and locally heating the substrate at the marker location in the lithographic apparatus to transform the latent marker into a detectable marker.
摘要翻译：在衬底上产生标记的方法包括将图案化的光束投影到设置在光刻设备中的衬底的抗蚀剂层上以产生潜在标记; 并且在光刻设备中的标记位置处局部加热衬底，以将潜在标记转变成可检测标记。

32. 发明授权

US09632430B2 Lithographic system, lithographic method and device manufacturing method 有权
公开(公告)号：US09632430B2
公开(公告)日：2017-04-25
申请号：US13120495
申请日：2009-09-17
申请人： Everhardus Cornelis Mos , Maurits Van Der Schaar , Scott Anderson Middlebrooks
发明人： Everhardus Cornelis Mos , Maurits Van Der Schaar , Scott Anderson Middlebrooks
IPC分类号： G03B27/52 , G03F7/20
CPC分类号： G03F7/70625 , G03F7/70525
摘要： A lithographic system includes a lithographic apparatus and a scatterometer. In an embodiment, the lithographic apparatus includes an illumination optical system arranged to illuminate a pattern and a projection optical system arranged to project an image of the pattern on to a substrate. In an embodiment, the scatterometer includes a measurement system arranged to direct a beam of radiation onto a target pattern on said substrate and to obtain an image of a pupil plane representative of radiation scattered from the target pattern. A computational arrangement represents the pupil plane by moment functions calculated from a pair of orthogonal basis function and correlates the moment function to lithographic feature parameters to build a lithographic system identification. A control arrangement uses the system identification to control subsequent lithographic processes performed by the lithographic apparatus.

33. 发明申请

US20110299050A1 Lithographic System, Lithographic Method And Device Manufacturing Method 有权
标题翻译：平版印刷系统，平版印刷方法和器件制造方法
公开(公告)号：US20110299050A1
公开(公告)日：2011-12-08
申请号：US13120495
申请日：2009-09-17
申请人： Everhardus Cornelis Mos , Maurits Van Der Schaar , Scott Anderson Middlebrooks
发明人： Everhardus Cornelis Mos , Maurits Van Der Schaar , Scott Anderson Middlebrooks
IPC分类号： G03B27/54
CPC分类号： G03F7/70625 , G03F7/70525
摘要： A lithographic system includes a lithographic apparatus and a scatterometer. In an embodiment, the lithographic apparatus includes an illumination optical system arranged to illuminate a pattern and a projection optical system arranged to project an image of the pattern on to a substrate. In an embodiment, the scatterometer includes a measurement system arranged to direct a beam of radiation onto a target pattern on said substrate and to obtain an image of a pupil plane representative of radiation scattered from the target pattern. A computational arrangement represents the pupil plane by moment functions calculated from a pair of orthogonal basis function and correlates the moment function to lithographic feature parameters to build a lithographic system identification. A control arrangement uses the system identification to control subsequent lithographic processes performed by the lithographic apparatus.
摘要翻译：光刻系统包括光刻设备和散射仪。在一个实施例中，光刻设备包括布置成照亮图案的照明光学系统和布置成将图案的图像投影到基板上的投影光学系统。在一个实施例中，散射仪包括测量系统，其布置成将辐射束引导到所述基板上的目标图案上，并且获得代表从目标图案散射的辐射的光瞳平面的图像。计算装置表示由一对正交基函数计算的瞳面平面，并将力矩函数与光刻特征参数相关联以构建光刻系统识别。控制装置使用系统识别来控制由光刻设备执行的后续光刻处理。

34. 发明授权

US07969577B2 Inspection apparatus, an apparatus for projecting an image and a method of measuring a property of a substrate 有权
标题翻译：检查装置，投影图像的装置和测量基板的特性的方法
公开(公告)号：US07969577B2
公开(公告)日：2011-06-28
申请号：US11520790
申请日：2006-09-14
申请人： Roy Werkman , Everhardus Cornelis Mos , Maurits Van Der Schaar
发明人： Roy Werkman , Everhardus Cornelis Mos , Maurits Van Der Schaar
IPC分类号： G01N21/55
CPC分类号： G03F7/70633
摘要： When using a scatterometer different portions of a target area may be at different focal depths. When the whole area is measured this results in part of it being out of focus. To compensate for this an array of lenses is placed in the back focal plane of the high numerical aperture lens.
摘要翻译：当使用散射仪时，目标区域的不同部分可能处于不同的焦点深度。当测量整个区域时，会导致部分失去焦点。为了补偿这一点，将一组透镜放置在高数值孔径透镜的后焦平面中。

35. 发明授权

US07683351B2 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US07683351B2
公开(公告)日：2010-03-23
申请号：US11607098
申请日：2006-12-01
申请人： Everhardus Cornelis Mos , Maurits Van Der Schaar , Hubertus Johannes Gertrudus Simons
发明人： Everhardus Cornelis Mos , Maurits Van Der Schaar , Hubertus Johannes Gertrudus Simons
IPC分类号： G03F7/20
CPC分类号： G03F7/70725 , G03F7/70258 , G03F7/70358 , G03F7/70458 , G03F7/70525 , G03F7/70633 , G03F7/70783
摘要： A lithographic apparatus includes an illumination system configured to condition a radiation beam, a support for a patterning device, a substrate table for a substrate, a projection system, and a control system. The patterning device is capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam. The projection system is configured to project the patterned radiation beam as an image onto a target portion of the substrate along a scan path. The scan path is defined by a trajectory in a scanning direction of an exposure field of the lithographic apparatus. The control system is coupled to the support, the substrate table and the projection system for controlling an action of the support, the substrate table and the projection system, respectively. The control system is configured to correct a local distortion of the image in a region along the scan path by a temporal adjustment of the image in that region.
摘要翻译：光刻设备包括配置成调节辐射束的照明系统，图案形成装置的支撑件，用于衬底的衬底台，投影系统和控制系统。图案形成装置能够在其横截面中赋予辐射束图案以形成图案化的辐射束。投影系统被配置为沿着扫描路径将图案化的辐射束作为图像投影到基板的目标部分上。扫描路径由光刻设备的曝光场的扫描方向上的轨迹限定。控制系统耦合到支撑件，基板台和投影系统，用于分别控制支撑件，基板台和投影系统的作用。控制系统被配置为通过在该区域中的图像的时间调整来校正沿着扫描路径的区域中的图像的局部失真。

36. 发明申请

US20080174753A1 Method of measurement, an inspection apparatus and a lithographic apparatus 有权
标题翻译：测量方法，检查装置和光刻设备
公开(公告)号：US20080174753A1
公开(公告)日：2008-07-24
申请号：US11656004
申请日：2007-01-22
申请人： Everhardus Cornelis Mos , Maurits Van Der Schaar
发明人： Everhardus Cornelis Mos , Maurits Van Der Schaar
IPC分类号： G03B27/42 , G01N21/55
CPC分类号： H01L21/0274 , G01N21/4738 , G03F7/70633 , H01L23/544 , H01L2924/0002 , H01L2924/00
摘要： Radiation is projected onto a plurality of targets on a substrate. By assuming that the overlay error derivable from asymmetry varies smoothly across the substrate, the number of targets measured can be reduced. This may result in a smaller area of the scribe lane being used by targets for each layer of the substrate.
摘要翻译：辐射被投影到基板上的多个靶上。通过假设由不对称性导出的重叠误差在衬底上平滑地变化，可以减少所测量的目标数量。这可能导致划线的较小区域被基板每层的目标使用。

37. 发明申请

US20080068609A1 Inspection apparatus, an apparatus for projecting an image and a method of measuring a property of a substrate 有权
标题翻译：检查装置，投影图像的装置和测量基板的特性的方法
公开(公告)号：US20080068609A1
公开(公告)日：2008-03-20
申请号：US11520790
申请日：2006-09-14
申请人： Roy Werkman , Everhardus Cornelis Mos , Maurits Van Der Schaar
发明人： Roy Werkman , Everhardus Cornelis Mos , Maurits Van Der Schaar
IPC分类号： G01B11/00
CPC分类号： G03F7/70633
摘要： When using a scatterometer different portions of a target area may be at different focal depths. When the whole area is measured this results in part of it being out of focus. To compensate for this an array of lenses is placed in the back focal plane of the high numerical aperture lens.
摘要翻译：当使用散射仪时，目标区域的不同部分可能处于不同的焦点深度。当测量整个区域时，会导致部分失去焦点。为了补偿这一点，将一组透镜放置在高数值孔径透镜的后焦平面中。

38. 发明授权

US06732004B2 Computer program for determining a corrected position of a measured alignment mark, device manufacturing method, and device manufactured thereby 有权
标题翻译：用于确定测量的对准标记的校正位置的计算机程序，装置制造方法以及由此制造的装置
公开(公告)号：US06732004B2
公开(公告)日：2004-05-04
申请号：US10079826
申请日：2002-02-22
申请人： Everhardus Cornelis Mos , Maurits Van Der Schaar
发明人： Everhardus Cornelis Mos , Maurits Van Der Schaar
IPC分类号： G06F1900
CPC分类号： G03F9/7092 , G03F9/708 , G03F9/7084
摘要： A computer program for determining a corrected position of an alignment mark on a substrate to be exposed in a lithographic projection apparatus, said computer program comprising program code means for, when executed on a computer system, instructing the computer system to perform the steps of: controlling a measuring tool to measure the position of at least one alignment mark on said substrate overlaid with an Al layer; calculating a corrected position of the alignment mark on the basis of the measured position of the alignment mark and a model of a process apparatus involved in deposition of the Al layer. Preferably, positions of a plurality of alignment marks on a substrate are measured and used to find parameters of the model.
摘要翻译：一种计算机程序，用于确定要在光刻投影设备中曝光的基板上的对准标记的校正位置，所述计算机程序包括程序代码装置，用于当在计算机系统上执行时指示计算机系统执行以下步骤：控制测量工具以测量覆盖有Al层的所述衬底上的至少一个对准标记的位置; 基于对准标记的测量位置和涉及沉积Al层的处理装置的模型来计算对准标记的校正位置。优选地，测量基板上的多个对准标记的位置并用于找到模型的参数。

39. 发明授权

US08706442B2 Alignment system, lithographic system and method 有权
标题翻译：对准系统，光刻系统和方法
公开(公告)号：US08706442B2
公开(公告)日：2014-04-22
申请号：US13000443
申请日：2009-07-03
申请人： Everhardus Cornelis Mos , Henricus Johannes Lambertus Megens , Maurits Van Der Schaar , Hubertus Johannes Gertrudus Simons , Scott Anderson Middlebrooks
发明人： Everhardus Cornelis Mos , Henricus Johannes Lambertus Megens , Maurits Van Der Schaar , Hubertus Johannes Gertrudus Simons , Scott Anderson Middlebrooks
IPC分类号： G06F15/00 , G03B27/54
CPC分类号： G03F9/7003 , G03F7/705 , G03F7/70633
摘要： A lithographic system includes a lithographic apparatus comprising a projection system which projects a patterned radiation beam onto a target portion of a substrate and an alignment system which measures the position of a feature of the pattern on the substrate at a number of locations over the substrate. A controller compares the measured positions with points on a grid of values and extrapolates values for intermediate positions on the substrate based on values of corresponding intermediate points on the grid, so as to provide an indication of the intermediate positions on the substrate and their displacements relative to the grid. The grid is based on at least one orthogonal basis function, the measurement on the substrate being performed at positions corresponding to the root values of the at least one orthogonal basis function.
摘要翻译：光刻系统包括光刻设备，其包括投影系统，该投影系统将图案化的辐射束投影到基板的目标部分上;以及对准系统，该对准系统在衬底上的多个位置处测量衬底上的图案的特征的位置。控制器将测量位置与值网格上的点进行比较，并基于栅格上对应的中间点的值来外推基板上的中间位置的值，以便提供基板上的中间位置及其相对位移的指示到电网。网格基于至少一个正交基函数，基板上的测量在对应于至少一个正交基函数的根值的位置处执行。

40. 发明授权

US08264664B2 Method for producing a marker on a substrate, lithographic apparatus and device manufacturing method 失效
标题翻译：在基板上制造标记物的方法，光刻设备和器件制造方法
公开(公告)号：US08264664B2
公开(公告)日：2012-09-11
申请号：US12269390
申请日：2008-11-12
申请人： Maurits Van Der Schaar , Jacobus Burghoorn , Richard Johannes Franciscus Van Haren , Everhardus Cornelis Mos , Rene Monshouwer
发明人： Maurits Van Der Schaar , Jacobus Burghoorn , Richard Johannes Franciscus Van Haren , Everhardus Cornelis Mos , Rene Monshouwer
IPC分类号： G03B27/52 , G03B27/42
CPC分类号： G03F7/105 , G03F7/168 , G03F9/708 , G03F9/7084
摘要： A method of producing a marker on a substrate includes projecting a patterned beam on a layer of resist disposed on a substrate in a lithographic apparatus to create a latent marker; and locally heating the substrate at the marker location in the lithographic apparatus to transform the latent marker into a detectable marker.
摘要翻译：在衬底上产生标记的方法包括将图案化的光束投影到设置在光刻设备中的衬底的抗蚀剂层上以产生潜在标记; 并且在光刻设备中的标记位置处局部加热衬底，以将潜在标记转变成可检测标记。

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