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31. 发明专利

JPS62283252A SOLID LUBRICATING BALL SCREW 失效
公开(公告)号：JPS62283252A
公开(公告)日：1987-12-09
申请号：JP12350086
申请日：1986-05-30
申请人： TOSHIBA CORP
发明人： NISHIOKA TAKESHI
IPC分类号： F16C33/66 , F16H25/22 , F16H25/24
摘要： PURPOSE:To prolong the service life of a ball screw by allowing a portion of the solid lubricating agent to adhere onto the ball surface by the friction between a lubricating member and the ball and preventing the exhaustion of the solid lubricating agent from the frictional surface. CONSTITUTION:As a screw shaft 1 revolves, a ball 4 circulates on the rolling surface between the screw shaft 1 and a nut 2 and in a return tube 3. During this time, a part of the PTFE group composite material containing molybdenum disulfide is allowed to adhere onto the surface of the ball 4 by the friction between the return tube 3 and the ball 4. The return tube 3 itself is made of the PTFE group composite material containing molybdenum disulfide. Therefore, the time up to the end of generation of adhesion of molybdenum disulfide and PTFE onto the ball 4 is made sufficiently long, and the service life of the ball screw can be prolonged markedly.

32. 发明专利

JPS62283251A SOLID LUBRICATING BALL SCREW 失效
公开(公告)号：JPS62283251A
公开(公告)日：1987-12-09
申请号：JP12349986
申请日：1986-05-30
申请人： TOSHIBA CORP
发明人： NISHIOKA TAKESHI
IPC分类号： F16C33/66 , F16H25/22 , F16H25/24
摘要： PURPOSE:To prolong the service life of ball screws by allowing a portion of the solid lubricating agent of the ball to adhere onto other balls and the rolling surface and eliminating the exhaustion of the solid lubricating agent. CONSTITUTION:As a screw shaft 1 revolves, a ball 41 and a ball 42 circulate on the rolling surface between the screw shaft 1 and a nut 2, and further circulate in a return tube 3. During this time, molybdenum disulfide is allowed to adhere onto the rolling surface of the screw shaft 1 and the nut 2 and the surface of the steel ball 41 from the ball 42 made of the copper group sintered alloy containing molybdenum disulfide, by the collision of the ball 41 and the ball 42 which are arranged alternately and the friction between the ball 42 and the rolling surface. Therefore, the time up to the end of generation of adhesion of molybdenum disulfide onto the surface of the screw shaft 1, etc. is made sufficiently long, and the service life of the ball screw can be prolonged markedly.

33. 发明专利

JPH04118841A ROTARY ANODE X-RAY TUBE AND MANUFACTURE THEREOF 失效
公开(公告)号：JPH04118841A
公开(公告)日：1992-04-20
申请号：JP32520990
申请日：1990-11-29
申请人： TOSHIBA CORP
发明人： MARUMO HITOSHI , NISHIOKA TAKESHI , ISHIZUKA MASARU , SASAKI TOMIYA
IPC分类号： B22F3/16 , H01J9/14 , H01J35/10 , H01J35/16
摘要： PURPOSE:To prevent decrease in the lubricating performance with only a small rise in temperature of the bearing portion following increase in output of the X rays, by manufacturing a connection shaft made of sintered material through performance of the process steps including a rotary grinding step. CONSTITUTION:The connection shaft directly receives heat from an anode target, so that it increases in temperature. Therefore, it is made of sintered material containing molybdenum and tungsten, as main components, which have high resistance to high temperature. And the connection shaft 4 is formed into a tubular configuration through performance of, for example, rotary grinding operation. When carrying out the rotary grinding operation, a tubular member 20 having a wall thickness of several millimeters is first fitted over a mold 21 and is rotated integrally therewith. Then, a rotating member such as a roll 22 is pressed against the outer peripheral wall surface of the tubular member 20 in a state wherein it is contacted therewith. Then, the wall surface of the tubular member 20 is ground by this roll 22 along the axis of the tube to extend the tubular wall while this wall is made thin, thereby forming a hollow connection shaft 4 of a specified wall thickness. Since the crystal grains of the sintered material are finely granulated and so the connection shaft has a very high strength, reduction in cross-sectional area thereof and increase in heat resistance are possible to make it possible to suppress rise in temperature of the bearing portion to a very small value.

34. 发明专利

JPH0294343A X-RAY TUBE WITH ROTARY ANODE 失效
公开(公告)号：JPH0294343A
公开(公告)日：1990-04-05
申请号：JP24440788
申请日：1988-09-30
申请人： TOSHIBA CORP
发明人： NISHIOKA TAKESHI , MARUMO HITOSHI , SHIKAUCHI TSUTOMU
IPC分类号： H01J35/10
摘要： PURPOSE:To prevent a bearing from temp. rise and vibration when X-rays are generated, by fixing a rotor under a rotary shaft, and securing its stationary part to a vacuum vessel in the neighborhood of the bearing arranged on the anode target side. CONSTITUTION:A cylindrical rotor 14 is fixed to the lower part of a rotary shaft 12, while a stator is arranged at the periphery of a vacuum vessel 10 situated outside of it, and a drive motor is composed of this rotor 14 and stator. The rotary shaft 12 is rotatably supported by the stationary part through two ball bearings 15a, 15b. A disc-shaped coupling part 16a is formed in the upper part of the stationary part 16, which is secured to the vacuum vessel 10 through this coupling part 16a. Thereby temp. rise of the bearing can be suppressed even though an anode target 13 and inside the vacuum vessel 10 have become at high temp., and generation of vibrations be also suppressed.

35. 发明专利

JP2001077060A MANUFACTURE OF SEMICONDUCTOR DEVICE 失效
公开(公告)号：JP2001077060A
公开(公告)日：2001-03-23
申请号：JP25456599
申请日：1999-09-08
申请人： TOSHIBA CORP
发明人： MIYASHITA NAOTO , NISHIOKA TAKESHI
IPC分类号： H01L21/304 , B24B37/04 , C09G1/02 , H01L21/321
摘要： PROBLEM TO BE SOLVED: To provide the manufacturing method of a semiconductor device, which can suppress 'dishings' while suppressing an increase in 'scratchings'. SOLUTION: A slurry 20 containing a solvent (inorganic alkaline aqueous solution), abrasive particles (a colloidal silica) mixed into this solvent and an additive (hydroxycellulose) of a variable viscosity is fed to a polishing pad 13 to dip the surface layer part of the pad 13 into the slurry 20. Then a viscosity moderator (pure water) 30 is fed to the pad 13 and with the slurry 20 made to gel, the surface layer part of the pad 13 is rigidified. After this, the surface to be polished of a wafer 12 is polished chemically and mechanically with the gelled slurry 20 and the rigidified surface layer part of the pad 13.

36. 发明专利

JPH11251276A POLISHING METHOD 失效
公开(公告)号：JPH11251276A
公开(公告)日：1999-09-17
申请号：JP5331998
申请日：1998-03-05
申请人： TOSHIBA CORP
发明人： NISHIOKA TAKESHI , SEKINE KUNIO , YOSHII YASUO , TATEYAMA YOSHIKUNI
IPC分类号： H01L21/3205 , H01L21/304
摘要： PROBLEM TO BE SOLVED: To provide a polishing method and a polishing apparatus which dispenses with extending polishing time of a polished film and for using a special abrasive liquid suitable for a material forming the polished film, while reducing the polishing amount of a recess in the polished film. SOLUTION: A silicon oxide film 3 is formed as an insulation film on a circular silicon substrate 4, and an A1 interconnection 2 is formed on the oxide film 3 through lithography or etching. A silicon oxide film 1, which is a polished film, is then formed by plasma CVD. A circular polishing cloth 9 is positioned opposite to the silicon oxide film 1. Polishing liquid 8 containing polishing particles is supplied between the silicon oxide film 1 and the polishing cloth 9, and desired polishing can be performed in that convex portions are polished and recesses are not polished in the silicon oxide film 1 by maintaining P

37. 发明专利

JPH11126765A METHOD FOR SIMULATING POLISHING, RECORDING MEDIA FOR RECORDING THE SAME METHOD AND METHOD FOR POLISHING 失效
公开(公告)号：JPH11126765A
公开(公告)日：1999-05-11
申请号：JP28935097
申请日：1997-10-22
申请人： TOSHIBA CORP
发明人： NISHIOKA TAKESHI , OTANI HIROSHI , MATSUNOU TADASHI , SEKINE KUNIO
IPC分类号： B24B49/00 , G06F17/00 , G06F19/00 , H01L21/00 , H01L21/304
摘要： PROBLEM TO BE SOLVED: To enable to accurately match the form of a part to be polished by polishing simulation with a form to be actually measured within a desired polishing range. SOLUTION: A method for simulating polishing has a first step for dividing a material 1 to be polished or an abrasive cloth 2 into multiple parts according to elastic modulus, setting the elastic modulus of the divided parts including the contact part between the abrasive cloth 2 and the material 1 to be polished smaller than that of the parts adjacent to the divided parts including the contact part, and calculating the pressure at the contact part; and a second step for calculating a polishing amount at the contact part according to the pressure calculated in the first step, and setting the form of the material 1 to be polished. The form of the material 1 to be polished according to the method for simulating polishing is matched to the measured form with accuracy within a desired polishing range and the reliability can be improved.

38. 发明专利

JPH0997772A POLISHING PAD, POLISHING DEVICE AND METHOD 失效
公开(公告)号：JPH0997772A
公开(公告)日：1997-04-08
申请号：JP33296
申请日：1996-01-05
申请人： TOSHIBA CORP
发明人： SASAKI YASUTAKA , NAKADA RENPEI , KANEKO HISAFUMI , NISHIOKA TAKESHI , NAKANO YUTAKA , TATEYAMA YOSHIKUNI , HAYASAKA NOBUO
IPC分类号： B24B37/20 , B24B37/22 , B24B37/24 , B24D13/14 , C08J5/14 , H01L21/304 , B24B37/00
摘要： PROBLEM TO BE SOLVED: To provide a polishing device which is capable of making a semiconductor wafer constant in pressure distribution throughout its polishing surface and enhancing in-plane uniformity of polishing speed. SOLUTION: A polishing device is used for carrying out CMP, wherein the device is equipped with a polishing pad 93 for polishing a semiconductor wafer 92, an air mat 94 composed of fine bags which are hermetically filled with air and regularly arranged to support the polishing pad 93 two-dimensionally, a pressing mechanism which presses the polishing pad 9 against the wafer 92 through the intermediary of the air mat 94, and a sliding mechanism which slides the polishing pad 93 and the wafer 92.

39. 发明专利

JPH034100A LUBRICATION MECHANISM 失效
公开(公告)号：JPH034100A
公开(公告)日：1991-01-10
申请号：JP13746389
申请日：1989-06-01
申请人： TOSHIBA CORP
发明人： SHIKAUCHI TSUTOMU , MARUMO HITOSHI , NISHIOKA TAKESHI
IPC分类号： F16N17/06
摘要： PURPOSE:To improve reliability and a life in a vacuum and in a high temperature vacuum by providing constitution of the first member consisting of ceramics, second member consisting of high speed tool steel and a lubricant applied to or coating at least one of the friction parts in both the first and second members. CONSTITUTION:As ceramics of the first member 1, Si3N4SiC, ZrO2, Al2O3, etc. are used, as high speed tool steel of the second member 2, SKH4, tungsten system SKH2, SKH3, SKH5, SKH10, etc. or molybdenum system SKH9, SKH52 to SKH57, etc. are used, as a lubricant, sulfide and selenide of MoS2, WS2, AgS, NbSe2, WSe2, etc. are used as a solid lubricant, and gold, silver, lead, aluminum, etc. are used as a soft metal, while in the atmosphere, lubricating oil is used. By these combinations, a tendency of improving a number of times of accumulative friction to a film break is seen, and a life is particularly im proved in a vacuum especially in a high temperature vacuum.

40. 发明专利

JPH01120481A SOLID STATE LUBRICATION GEAR 失效
公开(公告)号：JPH01120481A
公开(公告)日：1989-05-12
申请号：JP27838887
申请日：1987-11-05
申请人： TOSHIBA CORP
发明人： NISHIOKA TAKESHI
IPC分类号： F16H55/06 , F16H55/17
摘要： PURPOSE:To obtain a solid state lubrication gear having a long service life without increasing cost or degrading transmission efficiency by specifying the gearing rate of a pair of gears applied with solid state lubricant onto at least one tooth flank. CONSTITUTION:A drive side gear 1 and a driven side gear 2 are engaged and the pair of gears start engagement at point 6 and end engagement at point 7. Solid state lubricant. films 31, 32 are applied onto the tooth flanks of the gears 1, 2. Tip radii 51, 52 of the gears are made small and gearing rate is set between 1-1.2. Consequently, starting and ending positions 6, 7 of engagement come close to pitch circles 41, 42 thus lowering relative slip speed, and lengthening abrasion time of solid state lubrication film 3.

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