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    • 34. 发明申请
    • MICROMECHANICAL SYSTEM
    • 微生物系统
    • US20070125961A1
    • 2007-06-07
    • US11560830
    • 2006-11-16
    • Michel Despont
    • Michel Despont
    • G21G5/00
    • G01Q70/16G01Q70/02
    • A micromechanical system including a micromechanical structure and a shadow mask device. The micromechanical structure and the shadow mask device are produced from a single wafer. The micromechanical structure includes a covering surface to be acted upon in a covering area. The covering surface is produced in the course of covering surface processing steps. The shadow mask device is provided for shading part of the micromechanical structure from a deposition or treatment beam. It has at least one geometry, which affects a shading area in respect to the covering surface and which is produced in the course of geometry processing steps. The covering surface and geometry processing steps are applied from one side of the wafer.
    • 一种包括微机械结构和荫罩装置的微机械系统。 微机械结构和荫罩装置由单个晶片制成。 微机械结构包括要覆盖在覆盖区域中的覆盖表面。 在覆盖表面处理步骤的过程中产生覆盖表面。 阴影掩模装置用于从沉积或处理光束遮蔽微机械结构的一部分。 它具有至少一个几何形状,其影响相对于覆盖表面的遮蔽区域并且在几何处理步骤的过程中产生。 覆盖表面和几何形状处理步骤从晶片的一侧施加。