专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

31. 发明授权

US08747587B2 Multi-layered material and a method for making the same 有权
标题翻译：多层材料及其制造方法
公开(公告)号：US08747587B2
公开(公告)日：2014-06-10
申请号：US13080916
申请日：2011-04-06
申请人： Chung-Chih Feng , Yung-Yu Fu , Kun-Lin Chiang , Jung-Ching Chang , Chih-Chenh Lin , Chun-Wei Wu , Pei-Huo Huang , I-Peng Yao
发明人： Chung-Chih Feng , Yung-Yu Fu , Kun-Lin Chiang , Jung-Ching Chang , Chih-Chenh Lin , Chun-Wei Wu , Pei-Huo Huang , I-Peng Yao
IPC分类号： B32B5/18 , B32B5/24
CPC分类号： B32B5/32 , B32B5/022 , B32B5/024 , B32B5/18 , B32B5/245 , B32B7/06 , B32B7/12 , B32B27/065 , B32B27/10 , B32B27/12 , B32B27/40 , B32B29/00 , B32B37/12 , B32B38/164 , B32B2038/0084 , B32B2255/12 , B32B2255/26 , B32B2266/0221 , B32B2266/0228 , B32B2266/0235 , B32B2266/025 , B32B2266/0278 , B32B2266/0292 , B32B2305/022 , B32B2305/18 , B32B2305/20 , B32B2553/00 , C08J9/365 , Y10T428/249953 , Y10T428/249981 , Y10T442/3341 , Y10T442/649
摘要： A multi-layered material and a method for making the same are provided. The multi-layered material includes a first foamed layer, a substrate, a second foamed layer, and a surface layer. The first foamed layer has a plurality of first cells. The substrate is a fabric. The second foamed layer has a plurality of second cells. The foaming method of the second foamed layer is different from that of the first foamed layer. The size of the second cells is different from that of the first cells. The variation in size of the second cells is different from that of the first cells. The surface layer is disposed on the second foamed layer. Thus, when the multi-layered material is used as a surface cover of a ball, it can provide excellent resilience and control, and improve manufacturing efficiency.
摘要翻译：提供多层材料及其制造方法。多层材料包括第一发泡层，基底，第二发泡层和表面层。第一泡沫层具有多个第一泡孔。基材是织物。第二泡沫层具有多个第二泡孔。第二泡沫层的发泡方法与第一发泡层的发泡方法不同。第二细胞的大小不同于第一细胞的大小。第二细胞的大小变化与第一细胞的大小不同。表面层设置在第二发泡层上。因此，当使用多层材料作为球的表面覆盖层时，其可以提供优异的弹性和控制，并且提高制造效率。

32. 发明授权

US08491359B2 Polishing pad, use thereof and method for making the same 有权
标题翻译：抛光垫及其制造方法
公开(公告)号：US08491359B2
公开(公告)日：2013-07-23
申请号：US12862098
申请日：2010-08-24
申请人： Chung-Chih Feng , I-Peng Yao , Yung-Chang Hung , Lyang-Gung Wang , Wen-Chieh Wu
发明人： Chung-Chih Feng , I-Peng Yao , Yung-Chang Hung , Lyang-Gung Wang , Wen-Chieh Wu
IPC分类号： B32B5/32 , B24B37/22
CPC分类号： B24B37/22 , B24D18/00 , Y10T428/24983 , Y10T428/249981
摘要： The present invention relates to a polishing pad that comprises a polishing sheet for polishing a substrate, a buffer sheet comprising a plurality of holes, and adhesive for adhering the buffer sheet to the polishing sheet; wherein the adhesive is formed by polymerizing macromolecules with fluidity. A method of polishing a substrate comprising using the polishing pad and a method for manufacturing the polishing pad described above are also provided.
摘要翻译：抛光垫技术领域本发明涉及一种抛光垫，其包括用于研磨基板的抛光片，包括多个孔的缓冲片和用于将缓冲片粘附到抛光片的粘合剂; 其中所述粘合剂通过聚合具有流动性的大分子形成。还提供了一种抛光包括使用抛光垫的基板的方法和用于制造上述抛光垫的方法。

33. 发明授权

US07972396B2 Method of producing polishing pad 有权
标题翻译：抛光垫的生产方法
公开(公告)号：US07972396B2
公开(公告)日：2011-07-05
申请号：US11859928
申请日：2007-09-24
申请人： Chung-Chih Feng , I-Peng Yao , Yung-Chang Hung
发明人： Chung-Chih Feng , I-Peng Yao , Yung-Chang Hung
IPC分类号： B24D3/34
CPC分类号： B24D13/147 , B24B37/30 , B24D11/001
摘要： The present invention relates to a method of producing a polishing pad, comprising steps of: (a) providing a base material comprising a plurality of fibers; said base material having a surface for polishing a substrate, wherein the fibers comprise a core and a cladding surrounding the core, and the cladding comprises a hydrophobic polymer; (b) impregnating the surface of the base material with an elastomer solution; (c) coagulating the elastomer impregnated in the surface of the base material to mold the elastomer and to form a plurality of first continuous pores between the elastomer, and between the elastomer and the fibers; (d) planarizing the surface of the base material; (e) impregnating the surface of the base material and elastomer obtained in the step (d) with a condition polymer solution; and (e) curing the condition polymer impregnated in the surface of the base material and elastomer and partially filling the condition polymer into the first continuous pores to form a plurality of second continuous pores.
摘要翻译：本发明涉及一种制造抛光垫的方法，包括以下步骤：（a）提供包含多根纤维的基材; 所述基材具有用于抛光基底的表面，其中所述纤维包括芯和围绕所述芯的包层，并且所述包层包含疏水性聚合物; （b）用弹性体溶液浸渍基材的表面; （c）凝固浸渍在基材表面的弹性体以模制弹性体并在弹性体之间以及弹性体和纤维之间形成多个第一连续孔; （d）使基材的表面平坦化; （e）用条件聚合物溶液浸渍在步骤（d）中获得的基材和弹性体的表面; 和（e）固化浸渍在基材表面和弹性体表面的状态聚合物，并将状态聚合物部分地填充到第一连续孔中以形成多个第二连续孔。

34. 发明申请

US20110070814A1 Method for Manufacturing Polishing Pad and Polishing Pad 有权
标题翻译：抛光垫和抛光垫的制造方法
公开(公告)号：US20110070814A1
公开(公告)日：2011-03-24
申请号：US12887363
申请日：2010-09-21
申请人： Chung-Chih Feng , I-Peng Yao , Yung-Chang Hung , Lyang-Gung Wang
发明人： Chung-Chih Feng , I-Peng Yao , Yung-Chang Hung , Lyang-Gung Wang
IPC分类号： B24D3/28 , B24D11/00
CPC分类号： B24B37/24
摘要： The present invention relates to a method for manufacturing a polishing pad. The method of the invention includes the steps of forming a polishing layer from a polyurethane solution has a solid content more than about 90 wt % and drying the polyurethane solution at a temperature from about 130° C. to about 170° C. The invention also provides a polishing pad manufactured by the method mentioned above. The defect of scraping the surface of the substrate to be polished due to polishing particles remaining is avoided when applying the polishing pad according to the invention, and the flatness of the substrate to be polished is raised and the defective rate is eliminated also.
摘要翻译：本发明涉及一种抛光垫的制造方法。本发明的方法包括从聚氨酯溶液形成抛光层的步骤，其固体含量大于约90重量％，并在约130℃至约170℃的温度下干燥聚氨酯溶液。本发明还提供通过上述方法制造的抛光垫。当应用根据本发明的抛光垫时，避免了由于抛光颗粒残留而刮擦待抛光的基板的表面的缺陷，并且抛光的基板的平坦度提高并且不良率也被消除。

35. 发明申请

US20110045744A1 Polishing Pad, Use Thereof and Method for Making the Same 有权
标题翻译：抛光垫，使用方法和制作方法
公开(公告)号：US20110045744A1
公开(公告)日：2011-02-24
申请号：US12862098
申请日：2010-08-24
申请人： Chung-Chih Feng , I-Peng Yao , Yung-Chang Hung , Lyang-Gung Wang , Wen-Chieh Wu
发明人： Chung-Chih Feng , I-Peng Yao , Yung-Chang Hung , Lyang-Gung Wang , Wen-Chieh Wu
IPC分类号： B24D11/00 , B24B1/00
CPC分类号： B24B37/22 , B24D18/00 , Y10T428/24983 , Y10T428/249981
摘要： The present invention relates to a polishing pad that comprises a polishing sheet for polishing a substrate, a buffer sheet comprising a plurality of holes, and adhesive for adhering the buffer sheet to the polishing sheet; wherein the adhesive is formed by polymerizing macromolecules with fluidity. A method of polishing a substrate comprising using the polishing pad and a method for manufacturing the polishing pad described above are also provided.
摘要翻译：抛光垫技术领域本发明涉及一种抛光垫，其包括用于研磨基板的抛光片，包括多个孔的缓冲片和用于将缓冲片粘附到抛光片的粘合剂; 其中所述粘合剂通过聚合具有流动性的大分子形成。还提供了一种抛光包括使用抛光垫的基板的方法和用于制造上述抛光垫的方法。

36. 发明申请

US20090258578A1 POLISHING PAD AND METHOD FOR MAKING THE SAME 审中-公开
标题翻译：抛光垫及其制造方法
公开(公告)号：US20090258578A1
公开(公告)日：2009-10-15
申请号：US12208520
申请日：2008-09-11
申请人： Chung-Chih Feng , Chun-Ta Wang , Yung-Chang Hung , I-Peng Yao
发明人： Chung-Chih Feng , Chun-Ta Wang , Yung-Chang Hung , I-Peng Yao
IPC分类号： B24D11/00
CPC分类号： B24B37/24 , B24B37/22 , B24D18/00
摘要： The present invention relates to a polishing pad and method for making the same. In the invention, a liquid-state polymer material is directly formed on the surface of a base material, and then the liquid-state polymer material is solidified to form a flat grinding layer. Whereby, the polishing pad has high unity and flatness. The grinding layer has attenuated structures and a plurality of holes, thus increasing the storage ability of polishing particles distributed in a polishing liquid. In addition, the polishing pad has high compression ratio, so the polishing pad can compactly contact a polishing workpiece, and will not scratch the surface of the polishing workpiece scratched. Therefore, the polishing effect and quality will be improved.
摘要翻译：抛光垫及其制造方法技术领域本发明涉及抛光垫及其制造方法。在本发明中，在基材的表面上直接形成液态聚合物材料，然后使液态聚合物材料固化，形成平坦的研磨层。因此，抛光垫具有高的一体性和平坦度。研磨层具有衰减结构和多个孔，从而增加了分布在抛光液中的抛光颗粒的储存能力。此外，抛光垫具有高压缩比，因此抛光垫可以紧密接触抛光工件，并且不会刮擦抛光工件的表面划伤。因此，抛光效果和质量将得到提高。

37. 发明申请

US20080171493A1 Polishing pad and method of producing the same 审中-公开
标题翻译：抛光垫及其制造方法
公开(公告)号：US20080171493A1
公开(公告)日：2008-07-17
申请号：US11652595
申请日：2007-01-12
申请人： Chung-Chih Feng , I-Peng Yao , Chen-Hsiang Chao , Yung-Chang Hung
发明人： Chung-Chih Feng , I-Peng Yao , Chen-Hsiang Chao , Yung-Chang Hung
IPC分类号： D06C3/00 , D04H13/00 , B24B1/00
CPC分类号： B24B37/20 , B24D3/22 , B24D11/02 , Y10T442/608
摘要： The present invention mainly relates to a polishing pad and method of producing the same. The polishing pad comprises a base material having a surface for polishing a substrate, wherein the surface comprises a non-woven fabric and an elastomer. The non-woven fabric is made of a long fiber and the elastomer is embedded into the fabric.
摘要翻译：本发明主要涉及一种抛光垫及其制造方法。抛光垫包括具有用于抛光基底的表面的基材，其中该表面包括无纺织物和弹性体。无纺布由长纤维制成，弹性体嵌入织物中。

38. 发明申请

US20080064310A1 Polishing pad having hollow fibers and the method for making the same 审中-公开
标题翻译：具有中空纤维的抛光垫及其制造方法
公开(公告)号：US20080064310A1
公开(公告)日：2008-03-13
申请号：US11517255
申请日：2006-09-08
申请人： Chung-Chih Feng , I-Peng Yao , Chao-Yuan Tsai
发明人： Chung-Chih Feng , I-Peng Yao , Chao-Yuan Tsai
IPC分类号： B24D11/00
CPC分类号： B24B37/24 , B24D11/02
摘要： The invention relates to a polishing pad having hollow fibers and a method for making the same. The polishing pad comprises a body and a plurality of hollow fibers. The body has a polishing surface. The hollow fibers are located within the body and have an opening on the polishing surface, wherein the hollow area of the section of each hollow fiber is larger than the sectional area of polishing particles in a polishing slurry. Therefore, the polishing slurry and polishing particles achieve a thorough circulation on the polishing pad via the hollow fibers.
摘要翻译：本发明涉及一种具有中空纤维的抛光垫及其制造方法。抛光垫包括主体和多个中空纤维。身体有一个抛光表面。中空纤维位于主体内并且在抛光表面上具有开口，其中每个中空纤维的截面的中空区域大于抛光浆料中抛光颗粒的截面面积。因此，抛光浆料和抛光颗粒通过中空纤维在抛光垫上实现彻底的循环。

39. 发明申请

US20080003935A1 Polishing pad having surface texture 审中-公开
标题翻译：具有表面纹理的抛光垫
公开(公告)号：US20080003935A1
公开(公告)日：2008-01-03
申请号：US11478605
申请日：2006-07-03
申请人： Chung-Chih Feng , I-Peng Yao , Chen-Hsiang Chao , Kun-Cheng Sung
发明人： Chung-Chih Feng , I-Peng Yao , Chen-Hsiang Chao , Kun-Cheng Sung
IPC分类号： B24D11/00
CPC分类号： B24B37/26
摘要： The present invention relates to a polishing pad having a surface texture. The surface texture is disposed on the polishing surface of the polishing pad. The surface texture comprises at least one first groove, at least one second groove, and a plurality of holes. The second groove extends from a central portion of the polishing pad to the edge of the polishing pad, and the first groove(s) is intersected with the second groove(s) to form a plurality of intersection points. The holes are disposed at the intersection points, and the depth of the holes is larger than that of the first groove. Thus, the second groove(s) enables impurities suspended in the polishing slurry to be quickly removed from the polishing pad, and the holes can store the polishing slurry to delay the polishing particles in the polishing slurry from departing from the polishing pad.
摘要翻译：本发明涉及具有表面纹理的抛光垫。表面纹理设置在抛光垫的抛光表面上。表面纹理包括至少一个第一凹槽，至少一个第二凹槽和多个孔。第二凹槽从抛光垫的中心部分延伸到抛光垫的边缘，并且第一凹槽与第二凹槽相交以形成多个交点。孔设置在交点处，孔的深度大于第一槽的深度。因此，第二凹槽使得悬浮在抛光浆料中的杂质能够快速地从抛光垫移除，并且孔可以存储抛光浆料以延迟抛光浆料中的抛光颗粒从抛光垫离开。

40. 发明申请

US20080003927A1 Sheet for mounting polishing workpiece and method for making the same 审中-公开
公开(公告)号：US20080003927A1
公开(公告)日：2008-01-03
申请号：US11797714
申请日：2007-05-07
申请人： Chung-Chih Feng , I-Peng Yao , Chen-Hsiang Chao
发明人： Chung-Chih Feng , I-Peng Yao , Chen-Hsiang Chao
IPC分类号： B24B1/00
CPC分类号： B24B37/30 , B24B41/068
摘要： The present invention relates to a sheet for mounting a polishing workpiece. The sheet comprises a substrate, a surface layer and a slightly rough layer. The substrate has a surface. The surface layer is located on the surface of the substrate, with no hole structure existing in the interior thereof, and has a surface. The slightly rough layer is located on the surface of the surface layer to carry and mount the polishing workpiece, with no hole structure existing in the interior thereof. Accordingly, when the polishing workpiece contacts the slightly rough layer, the air therebetween is easily vented out via the slightly rough layer, without the phenomenon of air wrapping, which increases the adsorption force between the polishing workpiece and the sheet.

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式