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31. 发明申请

US20060288565A1 WRITE POLE FABRICATION FOR PERPENDICULAR RECORDING 失效
标题翻译：写字符制造用于完整记录
公开(公告)号：US20060288565A1
公开(公告)日：2006-12-28
申请号：US11469132
申请日：2006-08-31
申请人： Quang Le , Edward Lee , Jui-Lung Li , Aron Pentek , Nian-Xiang Sun
发明人： Quang Le , Edward Lee , Jui-Lung Li , Aron Pentek , Nian-Xiang Sun
IPC分类号： G11B5/127
CPC分类号： G11B5/1278 , G11B5/112 , Y10T29/49021 , Y10T29/49032 , Y10T29/49041 , Y10T29/49043 , Y10T29/49044 , Y10T29/49046 , Y10T29/49048 , Y10T29/49052 , Y10T29/49067
摘要： Methods for forming write heads. One method includes forming a mask layer above a pole tip layer; forming a layer of resist above the mask layer; patterning the resist; removing portions of the mask layer not covered by the patterned resist; shaping a pole tip from the pole tip layer; depositing a layer of dielectric material above the pole tip and flux shaping layer, wherein the layer of dielectric material extends about adjacent to the mask layer; depositing a stop layer over the dielectric material, the stop layer abutting the mask layer; and polishing for forming a substantially planar upper surface comprising the mask layer and stop layer. Another method includes depositing a layer of dielectric material at least adjacent the pole tip, wherein the layer of dielectric material extends about adjacent to the mask layer. A further method includes forming dishing in the pole tip.
摘要翻译：形成写头的方法一种方法包括在极尖层上形成掩模层; 在掩模层之上形成抗蚀剂层; 图案化抗蚀剂; 去除未被图案化抗蚀剂覆盖的掩模层的部分; 从极尖层成形极尖; 在极尖和熔剂成形层上沉积介电材料层，其中介电材料层围绕掩模层延伸; 在电介质材料上沉积停止层，停止层邻接掩模层; 以及用于形成包括掩模层和停止层的基本平坦的上表面的抛光。另一种方法包括沉积至少邻近极尖的介电材料层，其中电介质材料层围绕掩模层延伸。另一种方法包括在极尖中形成凹陷。

32. 发明申请

US20060109588A1 Method of making a perpendicular recording magnetic head pole tip with an etchable adhesion CMP stop layer 审中-公开
公开(公告)号：US20060109588A1
公开(公告)日：2006-05-25
申请号：US11325133
申请日：2006-01-03
申请人： Quang Le , Jui-lung Li , Jeffrey Lille , Son Nguyen
发明人： Quang Le , Jui-lung Li , Jeffrey Lille , Son Nguyen
IPC分类号： G11B5/147
CPC分类号： G11B5/1278 , G11B5/3106 , Y10T29/49041 , Y10T29/49046 , Y10T29/49048 , Y10T29/49052
摘要： The method of making a magnetic head assembly includes forming a second pole piece layer that is recessed from a head surface, forming a reactive ion etchable (RIEable) pole tip forming layer on the second pole piece layer, forming an adhesion/stop layer of tantalum (Ta) on the pole tip forming layer, forming a photoresist mask on the adhesion/stop layer with an opening for patterning the adhesion/stop layer and the pole tip forming layer with another opening, reactive ion etching (RIE) through the opening to form the other opening, forming the second pole piece pole tip in the other opening with a top which is above a top of the adhesion/stop layer and chemical mechanical polishing (CMP) the top of the second pole piece pole tip until the CMP contacts the adhesion/stop layer. The invention also includes the magnetic head made by such a process.

33. 发明申请

US20050219747A1 Trailing edge taper design and method for making a perpendicular write head with shielding 有权
标题翻译：后缘锥形设计和垂直写头的屏蔽方法
公开(公告)号：US20050219747A1
公开(公告)日：2005-10-06
申请号：US10815286
申请日：2004-03-31
申请人： Yimin Hsu , Quang Le , Jui-Lung Li , Ian McFadyen , James Nix , Neil Robertson , Mason Williams
发明人： Yimin Hsu , Quang Le , Jui-Lung Li , Ian McFadyen , James Nix , Neil Robertson , Mason Williams
IPC分类号： G11B5/127 , G11B5/147 , G11B5/187 , G11B5/31
CPC分类号： G11B5/3146 , G11B5/1278 , G11B5/1872 , G11B5/3116
摘要： A magnetic write head for us in perpendicular magnetic recording tapered trailing shield design for improved write flux, and field gradient performance.
摘要翻译：一种用于我们的磁性写头，用于垂直磁记录锥形后屏蔽设计，用于改善写通量和场梯度性能。

34. 发明授权

US08296930B2 Method for manufacturing a magnetoresistive sensor having a flat shield 有权
标题翻译：具有平面屏蔽的磁阻传感器的制造方法
公开(公告)号：US08296930B2
公开(公告)日：2012-10-30
申请号：US12645323
申请日：2009-12-22
申请人： Shin Funada , Quang Le , Thomas L. Leong , Jui-Lung Li , Chang-Man Park , Ning Shi , Hicham M. Sougrati
发明人： Shin Funada , Quang Le , Thomas L. Leong , Jui-Lung Li , Chang-Man Park , Ning Shi , Hicham M. Sougrati
IPC分类号： G11B5/127 , H04R31/00
CPC分类号： G11B5/3163 , G11B5/112 , G11B5/3912 , G11B5/398 , Y10T29/49032 , Y10T29/49041 , Y10T29/49043 , Y10T29/49044 , Y10T29/49046 , Y10T29/49048 , Y10T29/49052 , Y10T29/49067
摘要： A method for manufacturing a magnetoresistive sensor that results in the sensor having a very flat top magnetic shield. The process involves depositing a plurality of sensor layers and then depositing a thin high density carbon CMP stop layer over the sensor layers and forming a mask over the CMP stop layer. An ion milling is performed to define the sensor. Then a thin insulating layer and magnetic hard bias layer are deposited. A chemical mechanical polishing is performed to remove the mask and a reactive ion etching is performed to remove the remaining carbon CMP stop layer. Because the CMP stop layer is very dense and hard, it can be made very thin. This means that when it is removed by reactive ion etching, there is very little notching over the sensor, thereby allowing the upper shield to be very thin.
摘要翻译：一种用于制造磁阻传感器的方法，其导致传感器具有非常平坦的顶部磁屏蔽。该过程包括沉积多个传感器层，然后在传感器层上沉积薄的高密度碳CMP停止层，并在CMP停止层上形成掩模。执行离子铣削来定义传感器。然后沉积薄的绝缘层和磁性硬偏置层。进行化学机械抛光以除去掩模，并执行反应离子蚀刻以除去剩余的碳CMP停止层。因为CMP停止层非常致密且硬，所以可以使其非常薄。这意味着当通过反应离子蚀刻去除时，在传感器上几乎没有凹口，从而允许上部屏蔽（沉积在其上）非常薄。

35. 发明申请

US20120127616A1 TMR READER WITHOUT DLC CAPPING STRUCTURE 有权
标题翻译： TMR读取器，无DLC封装结构
公开(公告)号：US20120127616A1
公开(公告)日：2012-05-24
申请号：US12954508
申请日：2010-11-24
申请人： HONGLIN ZHU , Liubo Hong , Hicham M. Sougrati , Quang Le , Jui-Lung Li , Chando Park
发明人： HONGLIN ZHU , Liubo Hong , Hicham M. Sougrati , Quang Le , Jui-Lung Li , Chando Park
IPC分类号： G11B5/33 , B44C1/22 , B05D5/12
CPC分类号： G11B5/3163 , G01R33/098 , G11B5/3909 , G11B5/3929 , G11B5/3932
摘要： Embodiments herein generally relate to TMR readers and methods for their manufacture. The embodiments discussed herein disclose TMR readers that utilize a structure that avoids use of the DLC layer over the sensor structure and over the hard bias layer. The capping structure over the sensor structure functions as both a protective layer for the sensor structure and a CMP stop layer. The hard bias capping structure functions as both a protective structure for the hard bias layer and as a CMP stop layer. The capping structures that are free of DLC reduce the formation of notches in the second shield layer so that second shield layer is substantially flat.
摘要翻译：本文的实施方案通常涉及TMR读取器及其制造方法。本文讨论的实施例公开了使用避免在传感器结构上以及硬偏压层上使用DLC层的结构的TMR读取器。传感器结构上的封盖结构用作传感器结构的保护层和CMP停止层。硬偏置封盖结构既用作硬偏置层的保护结构又用作CMP停止层。没有DLC的封盖结构减少了第二屏蔽层中的凹口的形成，使得第二屏蔽层基本上是平的。

36. 发明授权

US07572499B2 Contact magnetic transfer template 失效
标题翻译：接触磁性传递模板
公开(公告)号：US07572499B2
公开(公告)日：2009-08-11
申请号：US11044777
申请日：2005-01-26
申请人： Zvonimir Z. Bandic , A. David Erpelding , Jordan Asher Katine , Quang Le , Kim Y. Lee , Jui-Lung Li , Michael J. Rooks
发明人： Zvonimir Z. Bandic , A. David Erpelding , Jordan Asher Katine , Quang Le , Kim Y. Lee , Jui-Lung Li , Michael J. Rooks
IPC分类号： G11B5/64 , G11B5/66 , G11B5/65 , G11B5/86
CPC分类号： G11B5/865 , G11B5/855 , Y10T428/24612
摘要： A contact magnetic transfer (CMT) master template has a flexible plastic film with a planarized top or upper surface containing magnetic islands separated from one another by nonmagnetic regions. The flexible plastic film is secured at its perimeter to a silicon annulus that provides rigid support at the perimeter of the film. The plastic film is preferably polyimide that has recesses filled with the magnetic material that form the pattern of magnetic islands. The upper surfaces of the islands and the upper surfaces of the nonmagnetic regions form a continuous planar surface. The nonmagnetic regions are formed of chemical-mechanical-polishing (CMP) stop layer material that remains after a CMP process has planarized the upper surface of the plastic film.
摘要翻译：接触磁传递（CMT）主模板具有柔性塑料膜，其具有包含通过非磁性区域彼此分离的磁岛的平坦化顶部或上部表面。柔性塑料膜在其周边固定在硅环上，该硅环在膜的周边提供刚性支撑。塑料膜优选为具有填充有形成磁岛图案的磁性材料的凹部的聚酰亚胺。岛的上表面和非磁性区的上表面形成连续的平坦表面。非磁性区域由化学机械抛光（CMP）阻挡层材料形成，其在CMP工艺已经使塑料膜的上表面平坦化之后残留。

37. 发明授权

US07160477B2 Method for making a contact magnetic transfer template 失效
标题翻译：制造接触磁传输模板的方法
公开(公告)号：US07160477B2
公开(公告)日：2007-01-09
申请号：US11044288
申请日：2005-01-26
申请人： Zvonimir Z. Bandic , A. David Erpelding , Jordan Asher Katine , Quang Le , Kim Y. Lee , Jui-Lung Li , Michael J. Rooks
发明人： Zvonimir Z. Bandic , A. David Erpelding , Jordan Asher Katine , Quang Le , Kim Y. Lee , Jui-Lung Li , Michael J. Rooks
IPC分类号： B44C1/22
CPC分类号： G11B5/865 , B82Y10/00 , C23F3/04 , C23F4/00 , G11B5/72 , G11B5/743 , G11B5/82 , G11B5/855 , Y10T29/4903 , Y10T29/49032
摘要： A contact magnetic transfer (CMT) master template is made by first adhering a plastic film to a first surface of a silicon wafer. A resist pattern is then formed on the polyimide film and the polyimide is reactive-ion-etched through the resist to form recesses. The resist is removed and a chemical-mechanical-polishing (CMP) stop layer is deposited over the non-recessed regions of the polyimide, and optionally into the bottoms of the recesses. A layer of magnetic material is then deposited over the polyimide film to fill the recesses. A CMP process is then performed to remove magnetic material above the recesses and above the non-recessed regions and continued until the CMP stop layer is reached. The resulting upper surface of the polyimide film is then a continuous planar film of magnetic islands and regions of CMP stop layer material that function as the nonmagnetic regions of the template.
摘要翻译：通过首先将塑料膜粘附到硅晶片的第一表面上来制造接触磁传递（CMT）主模板。然后在聚酰亚胺膜上形成抗蚀剂图案，并通过抗蚀剂反应离子蚀刻聚酰亚胺以形成凹陷。去除抗蚀剂，并在化学机械抛光（CMP）停止层上沉积在聚酰亚胺的非凹陷区域上，并且任选地沉积到凹部的底部中。然后将一层磁性材料沉积在聚酰亚胺膜上以填充凹部。然后执行CMP处理以除去凹部上方的磁性材料并且在非凹陷区域上方并继续直到达到CMP停止层。所得到的聚酰亚胺膜的上表面是磁性岛的连续平面膜和作为模板的非磁性区域的CMP停止层材料的区域。

38. 发明授权

US08778198B2 Method for manufacturing a magnetoresistive sensor using simultaneously formed hard bias and electrical lapping guide 有权
标题翻译：使用同时形成的硬偏置和电研磨导向器制造磁阻传感器的方法
公开(公告)号：US08778198B2
公开(公告)日：2014-07-15
申请号：US13172739
申请日：2011-06-29
申请人： Quang Le , Shin Funada , Jui-Lung Li
发明人： Quang Le , Shin Funada , Jui-Lung Li
IPC分类号： B44C1/22
CPC分类号： G03F7/20 , B82Y10/00 , G11B5/3169 , G11B5/3909 , G11B2005/3996
摘要： A method for manufacturing a magnetic sensor using an electrical lapping guide deposited and patterned simultaneously with a hard bias structure of the sensor material. The method includes depositing a sensor material, and patterning and ion milling the sensor material to define a track width of the sensor. A magnetic, hard bias material is then deposited and a second patterning and ion milling process is performed to simultaneously define the back edge of an electrical lapping guide and a back edge of the sensor.
摘要翻译：一种用传感器材料的硬偏置结构沉积和图案化的电研磨导向器制造磁传感器的方法。该方法包括沉积传感器材料，以及图案化和离子铣削传感器材料以限定传感器的轨道宽度。然后沉积磁性，硬偏置材料，并且执行第二图案化和离子铣削工艺以同时限定电研磨引导件的后边缘和传感器的后边缘。

39. 发明申请

US20100024201A1 METHOD FOR FABRICATING NARROW MAGNETIC READ WIDTH TMR/CPP SENSORS 有权
标题翻译：用于制造NARROW MAGNETIC READ WIDTH TMR / CPP SENSORS的方法
公开(公告)号：US20100024201A1
公开(公告)日：2010-02-04
申请号：US12184054
申请日：2008-07-31
申请人： Quang Le , Jui-Lung Li
发明人： Quang Le , Jui-Lung Li
IPC分类号： H04R31/00
CPC分类号： G11B5/3909 , B82Y10/00 , B82Y25/00 , G01R33/093 , G01R33/098 , G11B5/3163 , G11B5/3932 , G11B2005/3996 , Y10T29/49043 , Y10T29/49044 , Y10T29/49046 , Y10T29/49048 , Y10T29/49052
摘要： A method for manufacturing a manufacturing a magnetoresistive sensor that allows the sensor to be constructed with a very narrow and well controlled track width. The method includes depositing a layer of diamond like carbon over a series of sensor layers. A first mask is then formed to define a sensor, and an ion milling is performed to remove sensor material not protected by the first mask. Then, a second mask is formed, and a hard bias layer is deposited to the thickness of the sensor layers. The second mask is then lifted off and a CMP is performed to remove the first mask structure. Because the all areas other than the area directly over the sensor are substantially planar (due to the removal of the second mask and the low level of the hard bias material) a quick, gentle CMP can be used to remove the first mask layer even if the first mask is small, such as for definition of a very narrow track-width sensor.
摘要翻译：一种用于制造磁阻传感器的方法，该传感器允许传感器被构造成具有非常窄且良好控制的轨道宽度。该方法包括在一系列传感器层上沉积一层类似金刚石的碳。然后形成第一掩模以限定传感器，并且执行离子铣削以去除未被第一掩模保护的传感器材料。然后，形成第二掩模，并且在传感器层的厚度上沉积硬偏置层。然后将第二掩模剥离并执行CMP以除去第一掩模结构。由于直接在传感器上方的区域以外的所有区域基本上是平面的（由于第二掩模的移除和硬偏置材料的低水平），可以使用快速柔和的CMP来去除第一掩模层，即使第一个掩模很小，例如用于定义非常窄的轨道宽度传感器。

40. 发明授权

US07398592B2 Manufacturable CMP assisted liftoff process to fabricate write pole for perpendicular recording heads 失效
标题翻译：可制造的CMP辅助脱模工艺，用于制造垂直记录头的写入极
公开(公告)号：US07398592B2
公开(公告)日：2008-07-15
申请号：US11093962
申请日：2005-03-29
申请人： Quang Le , Jui-Lung Li
发明人： Quang Le , Jui-Lung Li
IPC分类号： G11B5/127 , H04R31/00
CPC分类号： G11B33/0438 , Y10T29/49041 , Y10T29/49043 , Y10T29/49044 , Y10T29/49046 , Y10T29/49048 , Y10T29/49052
摘要： This invention describes a manufacturable method, including a CMP liftoff process, for removing masking materials after ion milling for fabricating the write pole of a magnetic head. Significant parameters for the CMP assisted liftoff process include the thickness of the remaining mask materials after the write pole ion milling for effective CMP assisted liftoff, the thickness of the dielectric fill material deposited to protect the write pole during the CMP liftoff step, and the type of CMP slurry, polishing pad and the polishing conditions that are required to yield satisfactory results.
摘要翻译：本发明描述了一种可制造的方法，包括CMP去除工艺，用于在用于制造磁头的写磁极的离子铣削之后去除掩模材料。用于CMP辅助剥离工艺的重要参数包括用于有效CMP辅助剥离的写入极离子铣削之后的剩余掩模材料的厚度，在CMP去除步骤期间沉积以保护写入极的介电填充材料的厚度和类型的CMP浆料，抛光垫以及产生令人满意的结果所需的抛光条件。

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