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    • 37. 发明授权
    • Method of separating semiconductor dies
    • 分离半导体管芯的方法
    • US07829440B2
    • 2010-11-09
    • US11835289
    • 2007-08-07
    • Jiunn-Yi ChuChao-Chen ChengChen-Fu ChuTrung Tri Doan
    • Jiunn-Yi ChuChao-Chen ChengChen-Fu ChuTrung Tri Doan
    • H01L21/301
    • H01L21/78H01L33/0079H01L33/0095
    • A method for the separation of multiple dies during semiconductor fabrication is described. On an upper surface of a semiconductor wafer containing multiple dies, a seed metal layer may be used to grow hard metal layers above it for handling. Metal may be plated above these metal layers everywhere except where a block of stop electroplating (EP) material exists. The stop EP material may be obliterated, and a barrier layer may be formed above the entire remaining structure. The substrate may be removed, and the individual dies may have any desired bonding pads and/or patterned circuitry added to the semiconductor surface. The remerged hard metal after laser cutting and heating should be strong enough for handling. Tape may be added to the wafer, and a breaker may be used to break the dies apart. The resulting structure may be flipped over, and the tape may be expanded to separate the individual dies.
    • 描述了在半导体制造期间分离多个管芯的方法。 在包含多个管芯的半导体晶片的上表面上,种子金属层可以用于在其上方生长硬金属层用于处理。 除了存在一块停止电镀(EP)材料之外,金属可以被覆盖在这些金属层之上。 停止EP材料可能被擦除,并且阻挡层可以形成在整个剩余结构之上。 可以去除衬底,并且各个管芯可以具有添加到半导体表面的任何期望的接合焊盘和/或图案化电路。 激光切割加热后的重金属硬度应足够强大。 可以将胶带加入到晶片中,并且可以使用断路器将模具分开。 可以将所得到的结构翻转,并且可以将带扩展以分离各个管芯。