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31. 发明申请

US20070257205A1 APPARATUS AND METHOD FOR TREATING A SUBSTRATE WITH UV RADIATION USING PRIMARY AND SECONDARY REFLECTORS 有权
标题翻译：用初级和次级反射器处理具有紫外线辐射的基板的装置和方法
公开(公告)号：US20070257205A1
公开(公告)日：2007-11-08
申请号：US11686878
申请日：2007-03-15
申请人： Juan Rocha-Alvarez , Thomas Nowak , Dale Du Bois , Sanjeev Baluja , Scott Hendrickson , Dustin Ho , Andrzei Kaszuba , Tom Cho
发明人： Juan Rocha-Alvarez , Thomas Nowak , Dale Du Bois , Sanjeev Baluja , Scott Hendrickson , Dustin Ho , Andrzei Kaszuba , Tom Cho
IPC分类号： B01J19/08
CPC分类号： B05D3/067
摘要： Embodiments of the invention relate generally to an ultraviolet (UV) cure chamber for curing a dielectric material disposed on a substrate and to methods of curing dielectric materials using UV radiation. A substrate processing tool according to one embodiment comprises a body defining a substrate processing region; a substrate support adapted to support a substrate within the substrate processing region; an ultraviolet radiation lamp spaced apart from the substrate support, the lamp configured to transmit ultraviolet radiation to a substrate positioned on the substrate support; and a motor operatively coupled to rotate at least one of the ultraviolet radiation lamp or substrate support at least 180 degrees relative to each other. The substrate processing tool may further comprise one or more reflectors adapted to generate a flood pattern of ultraviolet radiation over the substrate that has complementary high and low intensity areas which combine to generate a substantially uniform irradiance pattern if rotated. Other embodiments are also disclosed.
摘要翻译：本发明的实施方案一般涉及用于固化设置在基底上的介电材料的紫外（UV）固化室和使用UV辐射固化电介质材料的方法。根据一个实施例的基板处理工具包括限定基板处理区域的主体; 衬底支撑件，适于支撑衬底处理区域内的衬底; 与衬底支撑件间隔开的紫外线辐射灯，所述灯被配置为将紫外线辐射透射到位于所述衬底支撑件上的衬底; 以及可操作地耦合以使所述紫外线辐射灯或衬底支撑体中的至少一个相对于彼此旋转至少180度的电动机。衬底处理工具还可以包括一个或多个反射器，其适于在衬底上产生具有互补的高和低强度区域的紫外线辐射的泛化图案，其结合以在旋转时产生基本上均匀的辐照度图案。还公开了其他实施例。

32. 发明申请

US20070228289A1 APPARATUS AND METHOD FOR EXPOSING A SUBSTRATE TO UV RADIATION WHILE MONITORING DETERIORATION OF THE UV SOURCE AND REFLECTORS 有权
标题翻译：用于在紫外线源和反射器的监测下，将基底暴露于紫外线辐射的装置和方法
公开(公告)号：US20070228289A1
公开(公告)日：2007-10-04
申请号：US11686897
申请日：2007-03-15
申请人： Andrzei Kaszuba , Juan Rocha-Alvarez , Thomas Nowak , Sanjeev Baluja , Ndanka Mukuti
发明人： Andrzei Kaszuba , Juan Rocha-Alvarez , Thomas Nowak , Sanjeev Baluja , Ndanka Mukuti
IPC分类号： G21G5/00
CPC分类号： B05D3/067 , B29C71/04 , B29C2035/0827 , F26B3/28 , H01L21/67115
摘要： Embodiments of the invention relate generally to an ultraviolet (UV) cure chamber for curing a dielectric material disposed on a substrate and to methods of curing dielectric materials using UV radiation. A substrate processing tool according to one embodiment comprises a body defining a substrate processing region; a substrate support adapted to support a substrate within the substrate processing region; an ultraviolet radiation lamp spaced apart from the substrate support, the lamp configured to transmit ultraviolet radiation to a substrate positioned on the substrate support; and a motor operatively coupled to rotate at least one of the ultraviolet radiation lamp or substrate support at least 180 degrees relative to each other. The substrate processing tool may further comprise one or more reflectors adapted to generate a flood pattern of ultraviolet radiation over the substrate that has complementary high and low intensity areas which combine to generate a substantially uniform irradiance pattern if rotated. Other embodiments are also disclosed.
摘要翻译：本发明的实施方案一般涉及用于固化设置在基底上的介电材料的紫外（UV）固化室和使用UV辐射固化电介质材料的方法。根据一个实施例的基板处理工具包括限定基板处理区域的主体; 衬底支撑件，适于支撑衬底处理区域内的衬底; 与衬底支撑件间隔开的紫外线辐射灯，所述灯被配置为将紫外线辐射透射到位于所述衬底支撑件上的衬底; 以及可操作地耦合以使所述紫外线辐射灯或衬底支撑体中的至少一个相对于彼此旋转至少180度的电动机。衬底处理工具还可以包括一个或多个反射器，其适于在衬底上产生具有互补的高和低强度区域的紫外线辐射的泛化图案，其结合以在旋转时产生基本上均匀的辐照度图案。还公开了其他实施例。

33. 发明申请

US20070228618A1 APPARATUS AND METHOD FOR EXPOSING A SUBSTRATE TO UV RADIATION USING A REFLECTOR HAVING BOTH ELLIPTICAL AND PARABOLIC REFLECTIVE SECTIONS 有权
标题翻译：使用具有两个ELLIPTICAL和PARABOLIC反射部分的反射器将基板暴露于紫外线辐射的装置和方法
公开(公告)号：US20070228618A1
公开(公告)日：2007-10-04
申请号：US11686901
申请日：2007-03-15
申请人： Andrzei Kaszuba , Juan Rocha-Alvarez , Thomas Nowak , Sanjeev Baluja , Ashish Shah , Inna Shmurun
发明人： Andrzei Kaszuba , Juan Rocha-Alvarez , Thomas Nowak , Sanjeev Baluja , Ashish Shah , Inna Shmurun
IPC分类号： B29C35/08
CPC分类号： B05D3/067 , B29C71/04 , B29C2035/0827 , F26B3/28 , H01L21/67115
摘要： Embodiments of the invention relate generally to an ultraviolet (UV) cure chamber for curing a dielectric material disposed on a substrate and to methods of curing dielectric materials using UV radiation. A substrate processing tool according to one embodiment comprises a body defining a substrate processing region; a substrate support adapted to support a substrate within the substrate processing region; an ultraviolet radiation lamp spaced apart from the substrate support, the lamp configured to transmit ultraviolet radiation to a substrate positioned on the substrate support; and a motor operatively coupled to rotate at least one of the ultraviolet radiation lamp or substrate support at least 180 degrees relative to each other. The substrate processing tool may further comprise one or more reflectors adapted to generate a flood pattern of ultraviolet radiation over the substrate that has complementary high and low intensity areas which combine to generate a substantially uniform irradiance pattern if rotated. Other embodiments are also disclosed.
摘要翻译：本发明的实施方案一般涉及用于固化设置在基底上的介电材料的紫外（UV）固化室和使用UV辐射固化电介质材料的方法。根据一个实施例的基板处理工具包括限定基板处理区域的主体; 衬底支撑件，适于支撑衬底处理区域内的衬底; 与衬底支撑件间隔开的紫外线辐射灯，所述灯被配置为将紫外线辐射透射到位于所述衬底支撑件上的衬底; 以及可操作地耦合以使所述紫外线辐射灯或衬底支撑体中的至少一个相对于彼此旋转至少180度的电动机。衬底处理工具还可以包括一个或多个反射器，其适于在衬底上产生具有互补的高和低强度区域的紫外线辐射的泛化图案，其结合以在旋转时产生基本上均匀的辐照度图案。还公开了其他实施例。

34. 发明申请

US20060249175A1 High efficiency UV curing system 审中-公开
标题翻译：高效UV固化系统
公开(公告)号：US20060249175A1
公开(公告)日：2006-11-09
申请号：US11230975
申请日：2005-09-20
申请人： Thomas Nowak , Juan Rocha-Alvarez , Andrzej Kaszuba , Scott Hendrickson , Dustin Ho , Sanjeev Baluja , Tom Cho , Josephine Chang , Hichem M'Saad
发明人： Thomas Nowak , Juan Rocha-Alvarez , Andrzej Kaszuba , Scott Hendrickson , Dustin Ho , Sanjeev Baluja , Tom Cho , Josephine Chang , Hichem M'Saad
IPC分类号： B08B3/12 , B08B7/00 , B08B9/00 , H01L21/306
CPC分类号： B08B7/0035 , C23C16/4405
摘要： An ultraviolet (UV) cure chamber enables curing a dielectric material disposed on a substrate and in situ cleaning thereof. A tandem process chamber provides two separate and adjacent process regions defined by a body covered with a lid having windows aligned respectively above each process region. One or more UV bulbs per process region that are covered by housings coupled to the lid emit UV light directed through the windows onto substrates located within the process regions. The UV bulbs can be an array of light emitting diodes or bulbs utilizing a source such as microwave or radio frequency. The UV light can be pulsed during a cure process. Using oxygen radical/ozone generated remotely and/or in-situ accomplishes cleaning of the chamber. Use of lamp arrays, relative motion of the substrate and lamp head, and real-time modification of lamp reflector shape and/or position can enhance uniformity of substrate illumination.
摘要翻译：紫外线（UV）固化室可固化设置在基底上的电介质材料并进行原位清洁。串联处理室提供由覆盖有盖的主体限定的两个单独的和相邻的过程区域，所述盖子具有分别位于每个处理区域上方的窗口。每个处理区域的一个或多个UV灯泡被耦合到盖的壳体覆盖，将通过窗口的UV光发射到位于处理区域内的衬底上。 UV灯泡可以是利用诸如微波或射频的源的发光二极管或灯泡阵列。紫外光可以在固化过程中被脉冲。使用远程生成的氧自由基/臭氧和/或原位实现清洁室。灯阵列的使用，基板和灯头的相对运动以及灯反射器形状和/或位置的实时修改可以增强基板照明的均匀性。

35. 发明申请

US20060251827A1 TANDEM UV CHAMBER FOR CURING DIELECTRIC MATERIALS 审中-公开
标题翻译：用于固化电介质的TANDEM紫外线灯
公开(公告)号：US20060251827A1
公开(公告)日：2006-11-09
申请号：US11124908
申请日：2005-05-09
申请人： Thomas Nowak , Juan Rocha-Alvarez , Andrzej Kaszuba , Scott Hendrickson , Dustin Ho , Sanjeev Baluja , Tom Cho , Josephine Chang , Hichem M'Saad
发明人： Thomas Nowak , Juan Rocha-Alvarez , Andrzej Kaszuba , Scott Hendrickson , Dustin Ho , Sanjeev Baluja , Tom Cho , Josephine Chang , Hichem M'Saad
IPC分类号： B05D3/06 , B05B5/00
CPC分类号： B05D3/067 , B05D3/0209 , B05D3/0493 , H01L21/31058
摘要： An ultraviolet (UV) cure chamber enables curing a dielectric material disposed on a substrate and in situ cleaning thereof. A tandem process chamber provides two separate and adjacent process regions defined by a body covered with a lid having windows aligned respectively above each process region. One or more UV bulbs per process region that are covered by housings coupled to the lid emit UV light directed through the windows onto substrates located within the process regions. The UV bulbs can be an array of light emitting diodes or bulbs utilizing a source such as microwave or radio frequency. The UV light can be pulsed during a cure process. Using oxygen radical/ozone generated remotely and/or in-situ accomplishes cleaning of the chamber. Use of lamp arrays, relative motion of the substrate and lamp head, and real-time modification of lamp reflector shape and/or position can enhance uniformity of substrate illumination.
摘要翻译：紫外线（UV）固化室可固化设置在基底上的电介质材料并进行原位清洁。串联处理室提供由覆盖有盖的主体限定的两个单独的和相邻的过程区域，所述盖子具有分别位于每个处理区域上方的窗口。每个处理区域的一个或多个UV灯泡被耦合到盖的壳体覆盖，将通过窗口的UV光发射到位于处理区域内的衬底上。 UV灯泡可以是利用诸如微波或射频的源的发光二极管或灯泡阵列。紫外光可以在固化过程中被脉冲。使用远程生成的氧自由基/臭氧和/或原位实现清洁室。灯阵列的使用，基板和灯头的相对运动以及灯反射器形状和/或位置的实时修改可以增强基板照明的均匀性。

36. 发明申请

US20060249078A1 HIGH EFFICIENCY UV CURING SYSTEM 有权
标题翻译：高效UV固化系统
公开(公告)号：US20060249078A1
公开(公告)日：2006-11-09
申请号：US11424368
申请日：2006-06-15
申请人： Thomas Nowak , Juan Rocha-Alvarez , Andrzej Kaszuba , Scott Hendrickson , Dustin Ho , Sanjeev Baluja , Tom Cho , Josephine Chang , Hichem M'Saad
发明人： Thomas Nowak , Juan Rocha-Alvarez , Andrzej Kaszuba , Scott Hendrickson , Dustin Ho , Sanjeev Baluja , Tom Cho , Josephine Chang , Hichem M'Saad
IPC分类号： B05D3/06 , B01J3/04 , C23C16/00
CPC分类号： B05D3/067 , B05D3/0209 , B05D3/0493 , H01L21/31058
摘要： An ultraviolet (UV) cure chamber enables curing a dielectric material disposed on a substrate and in situ cleaning thereof. A tandem process chamber provides two separate and adjacent process regions defined by a body covered with a lid having windows aligned respectively above each process region. One or more UV bulbs per process region that are covered by housings coupled to the lid emit UV light directed through the windows onto substrates located within the process regions. The UV bulbs can be an array of light emitting diodes or bulbs utilizing a source such as microwave or radio frequency. The UV light can be pulsed during a cure process. Using oxygen radical/ozone generated remotely and/or in-situ accomplishes cleaning of the chamber. Use of lamp arrays, relative motion of the substrate and lamp head, and real-time modification of lamp reflector shape and/or position can enhance uniformity of substrate illumination.
摘要翻译：紫外线（UV）固化室可固化设置在基底上的电介质材料并进行原位清洁。串联处理室提供由覆盖有盖的主体限定的两个单独的和相邻的过程区域，所述盖子具有分别位于每个处理区域上方的窗口。每个处理区域的一个或多个UV灯泡被耦合到盖的壳体覆盖，将通过窗口的UV光发射到位于处理区域内的衬底上。 UV灯泡可以是利用诸如微波或射频的源的发光二极管或灯泡阵列。紫外光可以在固化过程中被脉冲。使用远程生成的氧自由基/臭氧和/或原位实现清洁室。灯阵列的使用，基板和灯头的相对运动以及灯反射器形状和/或位置的实时修改可以增强基板照明的均匀性。

37. 发明申请

US20130177706A1 METHOD FOR SEASONING UV CHAMBER OPTICAL COMPONENTS TO AVOID DEGRADATION 审中-公开
标题翻译：用于分解紫外线光学元件以避免降解的方法
公开(公告)号：US20130177706A1
公开(公告)日：2013-07-11
申请号：US13719047
申请日：2012-12-18
申请人： Sanjeev Baluja , Alexandros T. Demos , Bo Xie , Juan Carlos Rocha-Alvarez
发明人： Sanjeev Baluja , Alexandros T. Demos , Bo Xie , Juan Carlos Rocha-Alvarez
IPC分类号： B05D3/06
CPC分类号： B05D3/066 , C23C16/4404 , C23C16/4405
摘要： Methods for depositing a carbon-based seasoning layer on exposed surfaces of the optical components within a UV processing chamber are disclosed. In one embodiment, the method includes flowing a carbon-containing precursor radially inwardly across exposed surfaces of optical components within the thermal processing chamber from a circumference of the optical components, exposing the carbon-containing precursor to a thermal radiation emitted from a heating source to form a carbon-based seasoning layer on the exposed surfaces of the optical components, exposing the carbon-based seasoning layer to ozone, wherein the ozone is introduced into the processing chamber by flowing the ozone radially inwardly across exposed surfaces of optical components from the circumference of the optical components, heating the optical components to a temperature of about 400° C. or above while flowing the ozone to remove the carbon-based seasoning layer from exposed surfaces of the optical components.
摘要翻译：公开了在UV处理室内的光学部件的暴露表面上沉积碳基调味剂层的方法。在一个实施例中，该方法包括使含碳前驱体从光学部件的圆周径向向内流过热处理室内的光学部件的暴露表面，将含碳前体暴露于从加热源发射的热辐射至在光学部件的暴露表面上形成碳基调味剂层，将碳基调味剂层暴露于臭氧，其中臭氧通过径向向内流过来自圆周的光学部件的暴露表面而将臭氧引入处理室的光学部件，将光学部件加热至约400℃以上的温度，同时使臭氧流动，以从光学部件的露出表面除去碳基调味剂层。

38. 发明授权

US08664061B2 Pulse method of oxidizing sidewall dielectrics for high capacitance applications 失效
标题翻译：用于高电容应用的氧化侧壁电介质的脉冲方法
公开(公告)号：US08664061B2
公开(公告)日：2014-03-04
申请号：US13011946
申请日：2011-01-24
申请人： Bo Xie , Alexandros T. Demos , Juan Carlos Rocha-Alvarez , Sanjeev Baluja
发明人： Bo Xie , Alexandros T. Demos , Juan Carlos Rocha-Alvarez , Sanjeev Baluja
IPC分类号： H01L21/28 , H01L21/8242
CPC分类号： H01L28/40 , H01L21/3105 , H01L28/90
摘要： The present invention provides systems, methods and apparatus for manufacturing a memory cell. The invention includes forming a feature having sidewalls in a first dielectric material; forming a first conductive material on the sidewalls of the feature; depositing a layer of a second dielectric material on the conductive material; and exposing the second dielectric material to oxidizing species and ultraviolet light to oxidize the second dielectric material. Numerous additional aspects are disclosed.
摘要翻译：本发明提供用于制造存储单元的系统，方法和装置。本发明包括在第一介电材料中形成具有侧壁的特征; 在所述特征的侧壁上形成第一导电材料; 在导电材料上沉积第二介电材料层; 以及将所述第二电介质材料暴露于氧化物质和紫外光以氧化所述第二电介质材料。公开了许多附加方面。

39. 发明授权

US08455849B2 Method and apparatus for modulating wafer treatment profile in UV chamber 有权
标题翻译：用于调节UV室中晶片处理轮廓的方法和装置
公开(公告)号：US08455849B2
公开(公告)日：2013-06-04
申请号：US13301558
申请日：2011-11-21
申请人： Sanjeev Baluja , Juan Carlos Rocha-Alvarez , Alexandros T. Demos
发明人： Sanjeev Baluja , Juan Carlos Rocha-Alvarez , Alexandros T. Demos
IPC分类号： G01N21/23 , G02B13/14 , G02B21/16 , C23C16/48
CPC分类号： G02B5/22 , G02B5/208 , H01L21/67115
摘要： A method and apparatus for providing a uniform UV radiation irradiance profile across a surface of a substrate is provided. In one embodiment, a substrate processing tool includes a processing chamber defining a processing region, a substrate support for supporting a substrate within the processing region, an ultraviolet (UV) radiation source spaced apart from the substrate support and configured to transmit ultraviolet radiation toward the substrate positioned on the substrate support, and a light transmissive window positioned between the UV radiation source and the substrate support, the light transmissive window having an optical film layer coated thereon. In one example, the optical film layer has a non-uniform thickness profile in a radial direction, wherein a thickness of the optical film layer at the peripheral area of the light transmissive window is relatively thicker than at the center region of the optical film layer.
摘要翻译：提供了一种用于在衬底的表面上提供均匀的UV辐射辐照度分布的方法和装置。在一个实施例中，衬底处理工具包括限定处理区域的处理室，用于支撑处理区域内的衬底的衬底支撑件，与衬底支撑件间隔开并且被配置成向衬底支撑件发射紫外线辐射的紫外线（UV）辐射源位于基板支撑件上的基板和位于UV辐射源和基板支撑件之间的透光窗口，透光窗口具有涂覆在其上的光学膜层。在一个示例中，光学膜层在径向上具有不均匀的厚度分布，其中在透光窗的周边区域处的光学膜层的厚度比在光学膜层的中心区域处的厚度更厚。

40. 发明申请

US20120187534A1 PULSE METHOD OF OXIDIZING SIDEWALL DIELECTRICS FOR HIGH CAPACITANCE APPLICATIONS 失效
标题翻译：用于高电容应用的氧化电介质的脉冲方法
公开(公告)号：US20120187534A1
公开(公告)日：2012-07-26
申请号：US13011946
申请日：2011-01-24
申请人： Bo Xie , Alexandros T. Demos , Juan Carlos Rocha-Alvarez , Sanjeev Baluja
发明人： Bo Xie , Alexandros T. Demos , Juan Carlos Rocha-Alvarez , Sanjeev Baluja
IPC分类号： H01L29/02 , H01L21/28
CPC分类号： H01L28/40 , H01L21/3105 , H01L28/90
摘要： The present invention provides systems, methods and apparatus for manufacturing a memory cell. The invention includes forming a feature having sidewalls in a first dielectric material; forming a first conductive material on the sidewalls of the feature; depositing a layer of a second dielectric material on the conductive material; and exposing the second dielectric material to oxidizing species and ultraviolet light to oxidize the second dielectric material. Numerous additional aspects are disclosed.
摘要翻译：本发明提供用于制造存储单元的系统，方法和装置。本发明包括在第一介电材料中形成具有侧壁的特征; 在所述特征的侧壁上形成第一导电材料; 在导电材料上沉积第二介电材料层; 以及将所述第二电介质材料暴露于氧化物质和紫外光以氧化所述第二电介质材料。公开了许多附加方面。

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