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    • 32. 发明授权
    • Logic block control architectures for programmable logic devices
    • 用于可编程逻辑器件的逻辑块控制架构
    • US07397276B1
    • 2008-07-08
    • US11446351
    • 2006-06-02
    • Om P. AgrawalXiaojie HeSajitha WijesuriyaBarry BrittonMing H. DingJun Zhao
    • Om P. AgrawalXiaojie HeSajitha WijesuriyaBarry BrittonMing H. DingJun Zhao
    • H03K19/177
    • H03K19/17736H03K19/17728
    • Systems and methods are disclosed herein to provide logic block slice architectures and programmable logic block architectures along with control logic architectures in accordance with embodiments of the present invention. For example, in accordance with an embodiment of the present invention, a programmable logic device includes a plurality of programmable logic blocks and a plurality of logic block slices within each of the programmable logic blocks, with each of the logic block slices having at least a first and a second slice each having at least a first lookup table. At least one of the programmable logic blocks includes at least a first logic block slice, a second logic block slice, and a third logic block slice, with the first logic block slice being a logic block slice type different from the second logic block slice, and the third logic block slice being a logic block slice type different from the first and second logic block slices. Control logic provides at a programmable logic block level bundled and/or unbundled control signals at a logic block slice level for at least two of the logic block slices.
    • 本文公开了系统和方法,以根据本发明的实施例提供逻辑块片段架构和可编程逻辑块架构以及控制逻辑架构。 例如,根据本发明的实施例,可编程逻辑器件包括多个可编程逻辑块和每个可编程逻辑块内的多个逻辑块片,每个逻辑块片段具有至少一个 第一片和第二片,每片具有至少第一查找表。 至少一个可编程逻辑块至少包括第一逻辑块片段,第二逻辑块片段和第三逻辑块片段,其中第一逻辑块片段是不同于第二逻辑块片段的逻辑块片段类型, 并且第三逻辑块片是不同于第一和第二逻辑块片段的逻辑块片段类型。 逻辑块片段中的至少两个逻辑块片级的控制逻辑在逻辑块片级提供捆绑和/或非捆绑控制信号的可编程逻辑块级。
    • 37. 发明申请
    • Novel fan blade of a ceiling fan
    • 吊扇的新风扇叶片
    • US20070122286A1
    • 2007-05-31
    • US11517509
    • 2006-09-08
    • Chun LeungJun Zhao
    • Chun LeungJun Zhao
    • F04D29/34
    • F04D29/384F04D25/088
    • The present invention relates to novel fan blade of a ceiling fan, wherein whole or partial perimeter of the blades was designed to project outwardly, for example, the cross section of the outwardly perimeter of the fan blade can be presented in a shape of circular arc, oval, taper with circular arc, obliquity with circular arc, truncated taper, truncated oblique or taper with circular arc in which two sides of the projecting base have a raised bench. A comparison test showed that, the rotational speed and air volume of the novel fan blade according to the present invention is 15-24% and 5-10% greater than those of the traditional fan blades respectively, therefore resulting in saving of materials and energy.
    • 本发明涉及吊扇的新型风扇叶片,其中叶片的全部或部分周边被设计成向外突出,例如,风扇叶片的外周的横截面可以呈圆弧形 椭圆形,圆弧形圆锥形,圆弧倾斜,截锥形,圆弧形斜截锥形或锥形,突出底座的两侧具有升高的台架。 比较试验表明,根据本发明的新型风扇叶片的转速和风量分别比传统风扇叶片大15-24%和5-10%,从而节省材料和能量 。
    • 40. 发明授权
    • Electron beam treatment apparatus
    • 电子束处理装置
    • US07049606B2
    • 2006-05-23
    • US10698726
    • 2003-10-30
    • Alexandros T. DemosHari K. PonnekantiJun ZhaoHelen R. Armer
    • Alexandros T. DemosHari K. PonnekantiJun ZhaoHelen R. Armer
    • H01J37/30
    • H01J37/317H01J3/025H01J37/077
    • One embodiment of the present invention is an electron beam treatment apparatus that includes: (a) a chamber; (b) a cathode having a surface of relatively large area that is exposed to an inside of the chamber; (c) an anode having holes therein that is disposed inside the chamber and spaced apart from the cathode by a working distance; (d) a wafer holder disposed inside the chamber facing the anode; (e) a source of negative voltage whole output is applied to the cathode to provide a cathode voltage; (f) a source of voltage whose output is applied to the anode; (g) a gas inlet adapted to admit gas into the chamber at an introduction rate; and (h) a pump adapted to exhaust gas from the chamber at an exhaust rate, the introduction rate and the exhaust rate providing a gas pressure in the chamber; wherein values of cathode voltage, gas pressure, and the working distance are such that there is no arcing between the cathode and anode and the working distance is greater than an electron mean free path.
    • 本发明的一个实施例是一种电子束处理装置,包括:(a)室; (b)具有暴露于所述室内部的相对较大面积表面的阴极; (c)其中具有孔的阳极,其设置在室内并与阴极间隔开工作距离; (d)设置在面向阳极的腔室内的晶片保持器; (e)将负电压全输出源施加到阴极以提供阴极电压; (f)其输出端施加到阳极的电压源; (g)气体入口,其适于以引入速率将气体引入所述腔室; 以及(h)适于以排气速度从所述室排出气体的泵,所述引入速率和排气速率在所述室中提供气体压力; 其中阴极电压,气体压力和工作距离的值使得阴极和阳极之间没有电弧,并且工作距离大于电子平均自由程。