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31. 发明授权

US5900699A Plasma generator with a shield interposing the antenna 失效
标题翻译：等离子发生器，屏蔽插入天线
公开(公告)号：US5900699A
公开(公告)日：1999-05-04
申请号：US876902
申请日：1997-06-16
申请人： Seiji Samukawa , Tsutomu Tsukada , Yukito Nakagawa , Kibatsu Shinohara , Hiroyuki Ueyama
发明人： Seiji Samukawa , Tsutomu Tsukada , Yukito Nakagawa , Kibatsu Shinohara , Hiroyuki Ueyama
IPC分类号： H05H1/46 , C23C16/50 , C23F4/00 , H01L21/00 , H01L21/205 , H01L21/302 , H01L21/3065 , H05B37/00
CPC分类号： H01L21/67069
摘要： The plasma generator includes a plasma generation chamber which is pumped and into which plasma generation gas is introduced. An antenna provided outside the plasma generation chamber, a RF source supplying a RF power with the antenna to excite the antenna. A part or whole of the plasma generation chamber is made of dielectric. The antenna radiates the RF through the dielectric and includes an antenna element which longitudinal direction is vertical to the direction for the plasma. The plasma generation chamber has a side wall intersecting the longitudinal direction of the antenna element at both sides. A part or whole of a plasma generation chamber is made of dielectric having relative permittivity .epsilon..sub.S. The antenna radiates a RF through the dielectric and is comprised of multiple antenna elements which longitudinal directions are on a plane vertical to the direction for the plasma. A shield is provided at the opposite side of the electric interposing the antenna, and, the electric distance between the antenna and the shield is shorter than the length made from adding 1/.epsilon..sub.S times of the thickness of the dielectric with the distance between the dielectric and the antenna. A surface treatment apparatus using the plasma generator, includes a substrate holder for placing a substrate to be treated in parallel with the longitudinal direction of the antenna elements in the plasma generation chamber.
摘要翻译：等离子体发生器包括等离子体产生室，其被泵送并被引入等离子体产生气体。设置在等离子体产生室外部的天线，RF天线提供RF功率以激发天线。等离子体生成室的一部分或全部由电介质构成。天线通过电介质辐射RF，并且包括纵向方向垂直于等离子体的方向的天线元件。等离子体产生室具有与两侧的天线元件的纵向方向相交的侧壁。等离子体产生室的一部分或全部由具有相对介电常数εS的电介质制成。天线通过电介质辐射RF，并且由多个天线元件组成，纵向方向在垂直于等离子体的方向的平面上。在插入天线的电气的相对侧设置有屏蔽，并且天线和屏蔽之间的电距离短于由电介质的厚度的1 / epsilon S倍增加的长度电介质和天线。使用等离子体发生器的表面处理装置包括用于将待处理基板与等离子体发生室中的天线元件的纵向平行放置的基板保持器。

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