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31. 发明专利

JP2008258606A Method of measuring asymmetry in scatterometer, method of measuring overlay error in substrate and metrology apparatus 有权
标题翻译：在散射计中测量不对称的方法，测量基板和计量装置中的覆盖误差的方法
公开(公告)号：JP2008258606A
公开(公告)日：2008-10-23
申请号：JP2008072792
申请日：2008-03-21
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： DEN BOEF ARIE JEFFREY , VAN DER MAST KAREL DIEDERICK , SCHAAR MAURITS VAN DER
IPC分类号： H01L21/66 , G01M11/00 , G01N21/00 , G01N21/47 , G01N23/02 , G01N23/203 , G03F7/20 , H01L21/027
CPC分类号： G01N21/4785 , G03F7/70516 , G03F7/70616 , G03F7/70633
摘要： PROBLEM TO BE SOLVED: To provide a method and apparatus for compensating or reducing errors caused when searching TIS and/or the center of a pupil plane without any large increase in throughput time.
SOLUTION: In a method of measuring asymmetry in a scatterometer, a target portion is illuminated twice, first with 0° of substrate rotation and secondly with 180°of substrate rotation. One of those images is rotated and then that rotated image is subtracted from the other image. In this way, the asymmetry of the scatterometer can be corrected.
COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：提供一种用于补偿或减少在搜索TIS和/或瞳孔平面的中心而引起的错误而不会大大增加吞吐时间的方法和装置。解决方案：在测量散射仪中的不对称性的方法中，目标部分被照射两次，首先以0°的基板旋转，其次是180°的基板旋转。其中一个图像被旋转，然后从另一个图像中减去旋转的图像。以这种方式，可以校正散射仪的不对称性。版权所有（C）2009，JPO＆INPIT

32. 发明专利

JP2008166755A Method of measurement, inspection apparatus, and lithographic apparatus 有权
标题翻译：测量方法，检查装置和平面设备
公开(公告)号：JP2008166755A
公开(公告)日：2008-07-17
申请号：JP2007320546
申请日：2007-12-12
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： SCHAAR MAURITS VAN DER , DEN BOEF ARIE JEFFREY , MOS EVERHARDUS CORNELIS
IPC分类号： H01L21/66 , G03F9/00 , H01L21/027
CPC分类号： G03F7/70633 , H01L22/12
摘要： PROBLEM TO BE SOLVED: To provide an improved method for detecting an overlay error.
SOLUTION: A first layer of a substrate includes a plurality of diffraction gratings each having the periodicity of P. A second layer of the substrate includes a plurality of diffraction gratings that overlap a first set of diffraction gratings and having the periodicity of NP (here, N is two or greater integer). The first set of diffraction gratings have a bias +d and a second set of diffraction gratings have a bias -d. Radiation beams are projected to the diffraction gratings and an angular resolution spectrum of the reflected radiation is detected. Next, an overlay error is calculated using the angular resolution spectrum of the reflected radiation.
COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：提供一种用于检测重叠误差的改进方法。解决方案：衬底的第一层包括多个周期为P的衍射光栅。衬底的第二层包括与第一组衍射光栅重叠并具有NP的周期性的多个衍射光栅（这里，N为2以上的整数）。第一组衍射光栅具有偏压+ d，第二组衍射光栅具有偏压-d。辐射光束投影到衍射光栅，并检测反射辐射的角度分辨率光谱。接下来，使用反射辐射的角度分辨率光谱来计算重叠误差。版权所有（C）2008，JPO＆INPIT

33. 发明专利

JP2008042200A Method and equipment for characterizing angle-resolved spectral lithography 有权
标题翻译：用于表征角度分辨率光谱的方法和设备
公开(公告)号：JP2008042200A
公开(公告)日：2008-02-21
申请号：JP2007200475
申请日：2007-08-01
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： MOS EVERHARDUS CORNELIS , DEN BOEF ARIE JEFFREY , SCHAAR MAURITS VAN DER , KEIJ STEFAN CAROLUS J A
IPC分类号： H01L21/027
CPC分类号： G03B27/42 , G01N21/4788 , G01N21/95607 , G03F7/70516 , G03F7/70616 , G03F7/70633
摘要： PROBLEM TO BE SOLVED: To provide a compound alignment overlay target given on the substrate so as to enable the measurement of the alignment of a substrate to surroundings and the measurement of the relative alignment of a series of layers on the substrate.
SOLUTION: The target is provided with an array of a structure at substantially equal intervals except a part of a structure which is an offset with the same size to a first direction and a second part of a structure which is an offset with the same size to the opposite direction. The target on the substrate can be used for the measurement of the alignment, and the same target, which is given to the second layer superimposed on the first layer, can be used for the measurement of the overlay.
COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：提供在基板上给出的复合对准覆盖目标，以便能够测量基板与周围环境的对准以及基板上的一系列层的相对取向的测量。解决方案：除了作为与第一方向具有相同尺寸的偏移的结构的一部分和与第一方向偏移的结构的第二部分之外，目标具有基本相等的间隔的结构的阵列，相同大小相反的方向。基板上的目标可以用于对准的测量，并且给予叠加在第一层上的第二层的相同目标可用于覆盖层的测量。版权所有（C）2008，JPO＆INPIT

34. 发明专利

JP2008042177A Method and apparatus for angular-resolved spectroscopic lithography characterization 有权
标题翻译：用于角度分辨光谱光刻特征的方法和装置
公开(公告)号：JP2008042177A
公开(公告)日：2008-02-21
申请号：JP2007158121
申请日：2007-06-15
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： KIERS ANTOINE GASTON MARIE , DEN BOEF ARIE JEFFREY , KEIJ STEFAN CAROLUS J A
IPC分类号： H01L21/027 , G01B11/00 , G01N21/21 , G01N21/956 , G03F7/20
CPC分类号： G01N21/21 , G01N21/956 , G03F7/70616 , G03F7/7085
摘要： PROBLEM TO BE SOLVED: To reduce the time taken for measurement of both p- and s-polarized beams. SOLUTION: Simultaneous measurement of two orthogonally polarized beams after subjection to diffraction from a substrate W to determine the characteristics of the substrate W. Linearly polarized light sources P, S having their radiation polarized in orthogonal directions are passed via two non-polarizing beam splitters, with one being rotated by 90°, with respect to the other. The combined beam is then diffracted at the substrate and then passed back through a non-polarizing beam splitter, and passed through a phase shifter and a Wollaston prism and then measured by a CCD camera. Thus, the phase and the intensities for various phase steps of the two polarized beams can be measured, and then the polarization state of the beams can be determined. If the phase shifter is changed to zero (i.e. there is no phase shift), the diffraction grating of the substrate has its parameters measured with TE and TM polarized light, simultaneously as with the same detector system. COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：减少测量p和s偏振光束所需的时间。解决方案：在从基板W投影到衍射之后同时测量两个正交偏振光束，以确定基板W的特性。具有在正交方向上偏振的其辐射的线偏振光源P，S通过两个非偏振分束器，一个相对于另一个旋转90°。然后将组合的光束在衬底处衍射，然后通过非偏振分束器传回，并通过移相器和Wollaston棱镜，然后通过CCD照相机测量。因此，可以测量两个偏振光束的各相位阶段的相位和强度，然后可以确定光束的偏振状态。如果移相器被改变为零（即没有相移），则基板的衍射光栅具有与TE和TM偏振光一起测量的参数，同样地，与相同的检测器系统一样。版权所有（C）2008，JPO＆INPIT

35. 发明专利

JP2008022015A Order-combining prism 有权
标题翻译：订单组合
公开(公告)号：JP2008022015A
公开(公告)日：2008-01-31
申请号：JP2007185484
申请日：2007-07-17
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： DEN BOEF ARIE JEFFREY , HOOGERLAND MAARTEN , GAJDECZKO BOGUSLAW
IPC分类号： G01B9/02 , H01L21/027 , G01B11/00 , G03F7/20 , G03F9/00
CPC分类号： G03F9/7088 , G03B27/32 , G03F9/7049 , G03F9/7076 , Y10T428/24802
摘要： PROBLEM TO BE SOLVED: To provide an alignment system improved and capable of capturing an alignment position by using a single alignment mark and/or adjusting asymmetric alignment marks. SOLUTION: In the alignment system, a self-reference interferometer to form two superposed relatively rotating images of alignment markers is used. A detector detects the intensity on a pupil surface where Fourier transformations of the images are made to interfere. A position information is obtained from a phase difference between diffraction orders of the two images indicated as intensity variations in the interfered orders. The asymmetry is also measurable by measuring intensities at two positions on either one side of the diffraction orders. COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：提供一种改进的并且能够通过使用单个对准标记捕获对准位置和/或调整不对称对准标记的对准系统。解决方案：在对准系统中，使用自参考干涉仪来形成对准标记物的两个重叠的相对旋转的图像。检测器检测在图像的傅里叶变换被干扰的瞳孔表面上的强度。从两个图像的衍射级之间的相位差获得的位置信息表示为受干扰顺序的强度变化。通过测量衍射级的两侧的两个位置处的强度，也可以测量不对称性。版权所有（C）2008，JPO＆INPIT

36. 发明专利

JP2008021972A Metrology tool, system having lithography apparatus and the metrology tool, and method of determining parameter of substrate 有权
标题翻译：计量工具，具有雕刻设备和计量工具的系统以及确定衬底参数的方法
公开(公告)号：JP2008021972A
公开(公告)日：2008-01-31
申请号：JP2007137324
申请日：2007-05-24
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： PLUG REINDER TEUN , DEN BOEF ARIE JEFFREY , VAN DER MAST KAREL DIEDERICK
IPC分类号： H01L21/027 , G03F7/20 , H01L21/68
CPC分类号： G03F7/70758 , G03F7/70766
摘要： PROBLEM TO BE SOLVED: To provide a high-speed metrology tool for measuring the parameter of a substrate patterned in a lithography apparatus. SOLUTION: The metrology tool includes a base frame, a substrate table 10 configured to hold a substrate 9, at least one sensor 7 configured to measure the parameter of the substrate 9, a displacement system for displacing one of the substrate table 10 and the sensor 7 from the other at least in a first direction, a first balance mass, and a first bearing for movably supporting the first balance mass such that the first balance mass substantially freely moves in the opposite direction from the first direction to compensate for a displacement of one of the substrate table 10 and the sensor 7 in the first direction. COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：提供用于测量在光刻设备中图案化的衬底的参数的高速计量工具。解决方案：测量工具包括基架，被配置为保持基板9的基板台10，配置成测量基板9的参数的至少一个传感器7，用于移动基板台10之一的位移系统至少在第一方向上的传感器7，第一平衡质量块和用于可移动地支撑第一平衡质量块的第一轴承，使得第一平衡块基本上沿与第一方向相反的方向自由移动，以补偿基板台10和传感器7之一沿第一方向的位移。版权所有（C）2008，JPO＆INPIT

37. 发明专利

JP2007010666A Measuring instrument, lithography unit, process apparatus, measuring method, and device manufacturing method 有权
标题翻译：测量仪器，光刻单元，工艺设备，测量方法和器件制造方法
公开(公告)号：JP2007010666A
公开(公告)日：2007-01-18
申请号：JP2006178938
申请日：2006-06-29
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： PELLEMANS HENRICUS PETRUS MARI , DEN BOEF ARIE JEFFREY , CORBEIJ WILHELMUS M , VAN DER LAAN HANS
IPC分类号： G01B11/00 , H01L21/027
CPC分类号： G03F7/70616
摘要： PROBLEM TO BE SOLVED: To provide a measuring instrument improved in sensitivity and/or an operation speed.
SOLUTION: This measuring instrument for measuring a parameter of fine structure on a substrate is provided with a supercontinuum light source constituted to generate a measurement beam, an optical system constituted to emit the measurement beam onto the substrate, and a sensor for detecting radiation reflected and/or diffracted by the structure.
COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：提供灵敏度和/或操作速度提高的测量仪器。解决方案：用于测量基板上的精细结构参数的测量仪器设置有用于产生测量光束的超连续光源，构成为将测量光束发射到基板上的光学系统，以及用于检测的传感器由结构反射和/或衍射的辐射。版权所有（C）2007，JPO＆INPIT

38. 发明专利

JP2006170996A Inspection device, sample, and inspection method 有权
标题翻译：检验设备，样品和检验方法
公开(公告)号：JP2006170996A
公开(公告)日：2006-06-29
申请号：JP2005359045
申请日：2005-12-13
申请人： Asml Netherlands Bv , エイエスエムエルネザランドズベスローテンフエンノートシャップ
发明人： VAN DER WERF JAN EVERT , DEN BOEF ARIE JEFFREY , PRESURA CRISTIAN N
IPC分类号： G01N21/21 , G01N21/00 , G01N21/27 , G01N21/88 , G01N21/956 , H01L21/66
CPC分类号： G01N21/211 , G01N21/956 , G01N2021/213
摘要： PROBLEM TO BE SOLVED: To provide an improved inspection device for inspecting a sample.
SOLUTION: This inspection device has a radiation system constituted to provide a radiation beam, a beam splitter constituted to generate, from the radiation beam, the first illumination beam and the second illumination beam transmitted respectively toward a flat reference part of the sample and a pattern formation-finished part of the sample, and a beam detector constituted to detect a detection beam including recoupling of radiations scattered from the flat reference part and the pattern formation-finished part.
COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：提供用于检查样品的改进的检查装置。解决方案：该检查装置具有构造成提供辐射束的辐射系统，分束器，其被构造成从辐射束产生分别朝向样品的平坦参考部分传输的第一照明光束和第二照射光束以及光束检测器，其构成为检测包括从平坦基准部分散射的辐射和图案形成完成部分的重新耦合的检测光束。版权所有（C）2006，JPO＆NCIPI

39. 发明专利

JP2006140500A Marker structure to control positioning each layer of multi-layer substrate and its method 有权
标题翻译：控制多层基板各层定位的标记结构及其方法
公开(公告)号：JP2006140500A
公开(公告)日：2006-06-01
申请号：JP2005327563
申请日：2005-11-11
申请人： Asml Netherlands Bv , エイエスエムエルネザランドズベスローテンフエンノートシャップ
发明人： VAN HAREN RICHARD JOHANNES FRA , DEN BOEF ARIE JEFFREY , BURGHOORN JACOBUS , VAN DER SCHAAR MAURITS , RIJPERS BARTOLOMEUS P
IPC分类号： H01L21/027 , G03F9/00
CPC分类号： H01L23/544 , G03F7/70633 , G03F9/7049 , G03F9/7065 , G03F9/7076 , G03F9/7092 , H01L2223/54453 , H01L2924/0002 , H01L2924/00
摘要： PROBLEM TO BE SOLVED: To provide a marker structure to be used by a lithography system which is equipped with a first radiant source to produce a radiation having a first wavelength and a positioning system which includes a second radiant source to produce a radiation having a second wavelength. SOLUTION: The second wavelength is larger than the first wavelength. The marker structure is equipped with the first layer and the second layer. The second layer directly or indirectly exists on the first layer. The first layer has a first periodic structure, and the second layer has a second periodic structure. At least the other periodic structure has a plurality of features having a size smaller than 400 nm at least in one direction. The combination of the first periodic structure and the second periodic structure forms a diffraction structure which is composed to be illuminated by a radiation having the second wavelength. COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：提供一种由光刻系统使用的标记结构，其被配备有第一辐射源以产生具有第一波长的辐射和定位系统，该定位系统包括第二辐射源以产生辐射具有第二波长。
解决方案：第二波长大于第一波长。标记结构配备有第一层和第二层。第二层直接或间接存在于第一层上。第一层具有第一周期性结构，第二层具有第二周期性结构。至少另一个周期性结构具有至少在一个方向上具有小于400nm的尺寸的多个特征。第一周期结构和第二周期结构的组合形成衍射结构，该衍射结构被具有第二波长的辐射照射。版权所有（C）2006，JPO＆NCIPI

40. 发明专利

JP2005268237A Lithography apparatus, device manufacturing method, and device manufactured thereby 有权
标题翻译：平面设备，设备制造方法及其制造方法
公开(公告)号：JP2005268237A
公开(公告)日：2005-09-29
申请号：JP2003196130
申请日：2003-06-09
申请人： Asml Netherlands Bv , エイエスエムエルネザランドズベスローテンフエンノートシャップ
发明人： DEN BOEF ARIE JEFFREY , HOOGERLAND MAARTEN , GAJDECZKO BOGUSLAW
IPC分类号： G01B9/02 , G01B11/00 , G03F9/00 , H01L21/027
CPC分类号： G03F9/7088 , G03B27/32 , G03F9/7049 , G03F9/7076 , Y10T428/24802
摘要： PROBLEM TO BE SOLVED: To provide an improved alignment system capturing an alignment position using a single alignment mark and/or adjusting an asymmetrical alignment mark. SOLUTION: In the alignment system, a self reference interferometer is used for forming two overlapping and relatively rotated images of an alignment mark. A detector detects light intensity at a pupil plane where Fourier transformation of the image interferes. The image exhibited as intensity changes at orders of the interference. Position information is obtained from a phase difference between diffraction orders of the two images. Asymmetry can also be measured by measuring intensities at two positions on either side of a diffraction order. COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：提供使用单个对准标记捕获对准位置和/或调整不对称对准标记的改进的对准系统。解决方案：在对准系统中，使用自参考干涉仪来形成对准标记的两个重叠且相对旋转的图像。检测器检测在图像干涉的傅立叶变换的光瞳面处的光强度。随着干扰的次序，强度变化的图像呈现出来。从两幅图像的衍射级之间的相位差获得位置信息。也可以通过测量衍射级的任一侧上两个位置处的强度来测量不对称性。版权所有（C）2005，JPO＆NCIPI

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