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31. 发明申请

WO2011006802A1 TARGET BACKING TUBE, CYLINDRICAL TARGET, AND CYLINDRICAL TARGET ASSEMBLY 审中-公开
标题翻译：目标支管，圆柱目标和圆柱目标组件
公开(公告)号：WO2011006802A1
公开(公告)日：2011-01-20
申请号：PCT/EP2010/059660
申请日：2010-07-06
申请人： APPLIED MATERIALS, INC. , SCHNAPPENBERGER, Frank , WEBER, Roland , KREMPEL-HESSE, Joerg , HELLMICH, Anke
发明人： SCHNAPPENBERGER, Frank , WEBER, Roland , KREMPEL-HESSE, Joerg , HELLMICH, Anke
IPC分类号： H01J37/34
CPC分类号： H01J37/3405 , H01J37/3435
摘要： A target backing tube is described. The target backing tube is for a rotatable target and includes a tube adapted for one or more non-bonded target cylinders to be disposed around the tube, the tube having an exterior surface adapted to face the at least one target cylinder and at least three or more protrusion receiving positions; and protrusions mounted on the exterior surface of the tube at each of the protrusion receiving positions for centering the target cylinders.
摘要翻译：描述了目标背衬管。目标背衬管用于可旋转的靶，并且包括适于一个或多个未粘合的目标圆柱体的管以围绕管布置，所述管具有适于面对至少一个目标圆柱体的外表面和至少三个或更多突出接收位置; 以及在用于使目标气缸对中的每个突起接收位置处安装在管的外表面上的突起。

32. 发明申请

WO2011006799A1 SPUTTERING SYSTEM, ROTATABLE CYLINDRICAL TARGET ASSEMBLY, BACKING TUBE, TARGET ELEMENT AND COOLING SHIELD 审中-公开
标题翻译：喷射系统，可旋转圆柱形目标组件，背管，目标元件和冷却屏蔽
公开(公告)号：WO2011006799A1
公开(公告)日：2011-01-20
申请号：PCT/EP2010/059656
申请日：2010-07-06
申请人： APPLIED MATERIALS, INC. , SCHNAPPENBERGER, Frank , WEBER, Roland , KREMPEL-HESSE, Joerg , HELLMICH, Anke
发明人： SCHNAPPENBERGER, Frank , WEBER, Roland , KREMPEL-HESSE, Joerg , HELLMICH, Anke
IPC分类号： H01J37/34
CPC分类号： H01J37/342 , H01J37/3405 , H01J37/3435 , H01J37/3497
摘要： The application concerns a target backing tube for a rotatable cylindrical target assembly (120) comprising : a tube (122a) for at least one target element (126a) to be disposed there around, wherein the tube has an exterior surface adapted to face the at least one target element, wherein a portion of the exterior surface of the tube has a mean emissivity of 0.7 to 1, wherein the portion is at least 50% of the exterior surface of the tube. Further, the application concerns a cooling shield for a sputtering system comprising a rotatable target, the cooling shield has an interior surface adapted to face a target element of a sputtering system and an exterior surface; wherein a portion of the interior surface of the cooling shield has a mean emissivity of 0.7 to 1, wherein the portion is at least 50% of the interior surface of the cooling shield. Additionally, the application concerns a target element for a rotatable cylindrical target assembly of a sputtering system, wherein the target element an interior surface adapted to face a target backing tube onto which the target cylinder is adapted to be disposed and exterior surface, wherein a portion of the interior surface of the target element has a emissivity of 0.7 to 1, wherein the portion is at least 50% of the interior surface of the target element.
摘要翻译：该应用涉及用于可旋转圆柱形目标组件（120）的目标背衬管，包括：用于至少一个目标元件（126a）的管（122a），其布置在其周围，其中管具有适于面向至少一个目标元件，其中所述管的外表面的一部分的平均发射率为0.7至1，其中所述部分是所述管的外表面的至少50％。此外，该应用涉及包括可旋转靶的溅射系统的冷却屏蔽，冷却屏具有适于面对溅射系统的目标元件和外表面的内表面; 其中所述冷却罩的内表面的一部分的平均发射率为0.7-1，其中所述部分是所述冷却屏蔽的内表面的至少50％。另外，该应用涉及一种用于溅射系统的可旋转圆柱形目标组件的目标元件，其中目标元件适于面向目标背衬管的内表面，目标圆柱体适于放置在其上并且外表面，其中一部分目标元件的内表面的发射率为0.7比1，其中该部分是目标元件的内表面的至少50％。

33. 发明申请

WO2023064062A1 LASER PROCESSING OF LITHIUM BATTERY WEB 审中-公开
公开(公告)号：WO2023064062A1
公开(公告)日：2023-04-20
申请号：PCT/US2022/043855
申请日：2022-09-16
申请人： APPLIED MATERIALS, INC.
发明人： LEI, Wei-Sheng , GOPALAKRISHNAN NAIR, Girish, Kumar , ZHAO, Kent, Qiujing , STOCK, Daniel , STOLLEY, Tobias , DEPPISCH, Thomas , DELMAS, Jean , LEDFORD, Kenneth, S. , HERLE, Subramanya, P. , VACHHANI, Kiran , CHIDAMBARAM, Mahendran , TRASSL, Roland , MORRISON, Neil , SCHNAPPENBERGER, Frank , CUNNINGHAM, Kevin, Laughton , BANGERT, Stefan , CUSHING, James , SIVARAMAKRISHNAN, Visweswaren
IPC分类号： H01M10/058 , H01M10/052 , B23K26/36 , B23K26/352
摘要： Methods and apparatuses for processing lithium batteries with a laser source having a wide process window, high efficiency, and low cost are provided. The laser source is adapted to achieve high average power and a high frequency of picosecond pulses. The laser source can produce a line¬ shaped beam either in a fixed position or in scanning mode. The system can be operated in a dry room or vacuum environment. The system can include a debris removal mechanism, for example, inert gas flow, to the processing site to remove debris produced during the patterning process.

34. 发明公开

EP3710615A1 METHOD OF COOLING A DEPOSITION SOURCE, CHAMBER FOR COOLING A DEPOSITION SOURCE AND DEPOSITION SYSTEM 审中-公开
公开(公告)号：EP3710615A1
公开(公告)日：2020-09-23
申请号：EP17798227.9
申请日：2017-11-16
申请人： Applied Materials, Inc.
发明人： ARMSTRONG, Claire , SCHNAPPENBERGER, Frank , DEPPISCH, Thomas
IPC分类号： C23C14/24 , C23C14/54

35. 发明授权

EP3050073B1 METHOD FOR CONTROLLING A GAS SUPPLY TO A PROCESS CHAMBER, CONTROLLER FOR CONTROLLING A GAS SUPPLY TO A PROCESS CHAMBER, AND APPARATUS THEREOF 有权
公开(公告)号：EP3050073B1
公开(公告)日：2019-11-06
申请号：EP13766958.6
申请日：2013-09-24
申请人： Applied Materials, Inc.
发明人： SCHNAPPENBERGER, Frank , HELLMICH, Anke , KOCH, Thomas , DEPPISCH, Thomas
IPC分类号： H01J37/32 , C23C16/455

36. 发明授权

EP2826057B1 MINI ROTATABLE SPUTTER DEVICES FOR SPUTTER DEPOSITION 有权
标题翻译：微型可旋转溅射装置用于溅射沉积
公开(公告)号：EP2826057B1
公开(公告)日：2018-01-24
申请号：EP12709309.4
申请日：2012-03-12
申请人： Applied Materials, Inc.
发明人： DEPPISCH, Thomas , SCHNAPPENBERGER, Frank , LOPP, Andreas , FLOCK, Annemarie , GÖRISCH, Götz
IPC分类号： H01J37/34 , H01J37/32
CPC分类号： H01J37/3414 , C23C14/35 , H01J37/3277 , H01J37/3405 , H01J37/3417 , H01J37/342
摘要： A deposition apparatus and a method for depositing deposition material on a web is described. The deposition apparatus includes a first sputter device support defining a first axis for a first rotatable sputter device, a second sputter device support defining a second axis for a second rotatable sputter device, and a coating window. The first sputter device support and the second sputter device support are adapted for supporting the first rotatable sputter device and the second rotatable sputter device to provide at least a component of the deposition material to be deposited on the web over a coating drum. Further, the distance between the first axis and the second axis is smaller than 200 mm.

37. 发明公开

EP3050073A1 METHOD FOR CONTROLLING A GAS SUPPLY AND CONTROLLER 有权
标题翻译：一种用于控制燃气供给和控制
公开(公告)号：EP3050073A1
公开(公告)日：2016-08-03
申请号：EP13766958.6
申请日：2013-09-24
申请人： Applied Materials, Inc.
发明人： SCHNAPPENBERGER, Frank , HELLMICH, Anke , KOCH, Thomas , DEPPISCH, Thomas
IPC分类号： H01J37/32 , C23C16/455
CPC分类号： C23C14/0042 , C23C14/544 , H01J37/32449 , H01J37/32981 , H01J37/3299
摘要： A method for controlling a gas supply to a process chamber is provided. The method includes: measuring a gas parameter by each of two or more sensors provided in the process chamber; determining a combined gas parameter from the measured gas parameters; and controlling the gas supply to the process chamber based on the determined combined gas parameter.

38. 发明公开

EP2826057A1 MINI ROTATABLE SPUTTER DEVICES FOR SPUTTER DEPOSITION 有权
标题翻译：微型可旋转溅射装置用于溅射沉积
公开(公告)号：EP2826057A1
公开(公告)日：2015-01-21
申请号：EP12709309.4
申请日：2012-03-12
申请人： Applied Materials, Inc.
发明人： DEPPISCH, Thomas , SCHNAPPENBERGER, Frank , LOPP, Andreas , FLOCK, Annemarie , GÖRISCH, Götz
IPC分类号： H01J37/34 , H01J37/32
CPC分类号： H01J37/3414 , C23C14/35 , H01J37/3277 , H01J37/3405 , H01J37/3417 , H01J37/342
摘要： A deposition apparatus and a method for depositing deposition material on a web is described. The deposition apparatus includes a first sputter device support defining a first axis for a first rotatable sputter device, a second sputter device support defining a second axis for a second rotatable sputter device, and a coating window. The first sputter device support and the second sputter device support are adapted for supporting the first rotatable sputter device and the second rotatable sputter device to provide at least a component of the deposition material to be deposited on the web over a coating drum. Further, the distance between the first axis and the second axis is smaller than 200 mm.
摘要翻译：描述了用于在网上沉积沉积材料的沉积设备和方法。沉积设备包括限定用于第一可旋转溅射装置的第一轴线的第一溅射装置支撑件，限定用于第二可旋转溅射装置的第二轴线的第二溅射装置支撑件以及涂覆窗口。第一溅射装置支撑件和第二溅射装置支撑件适于支撑第一可旋转溅射装置和第二可旋转溅射装置，以便在涂布鼓上提供要沉积在网上的沉积材料的至少一个部件。此外，第一轴线和第二轴线之间的距离小于大约200mm。

40. 发明公开

EP4334227A1 ROLLER FOR TRANSPORTING A FLEXIBLE SUBSTRATE, VACUUM PROCESSING APPARATUS, AND METHODS THEREFOR 审中-实审
公开(公告)号：EP4334227A1
公开(公告)日：2024-03-13
申请号：EP22799280.7
申请日：2022-04-18
申请人： Applied Materials, Inc.
发明人： DEPPISCH, Thomas , BANGERT, Stefan , ARMSTRONG, Claire , SCHNAPPENBERGER, Frank
IPC分类号： B65H20/14 , C23C14/56 , C23C14/24

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