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31. 发明申请

WO2012052334A1 LOAD LOCK CHAMBER, SUBSTRATE PROCESSING SYSTEM AND METHOD FOR VENTING 审中-公开
标题翻译：负载锁仓，底板加工系统及其施工方法
公开(公告)号：WO2012052334A1
公开(公告)日：2012-04-26
申请号：PCT/EP2011/067819
申请日：2011-10-12
申请人： APPLIED MATERIALS, INC. , GEBELE, Thomas , LEIPNITZ, Thomas , BUSCHBECK, Wolfgang , BANGERT, Stefan , LINDENBERG, Ralph
发明人： GEBELE, Thomas , LEIPNITZ, Thomas , BUSCHBECK, Wolfgang , BANGERT, Stefan
IPC分类号： H01L21/67
CPC分类号： H01L21/67201 , Y10T137/0379
摘要： A lock chamber for a substrate processing system is provided which includes at least a first conduit adapted to provide an inner portion of the lock chamber in fluid communication with atmospheric pressure or overpressure. Additionally, the lock chamber includes at least a first control valve for controlling a flow rate of the fluid communication of the inner portion of the chamber with the atmospheric pressure or the overpressure, wherein the control valve is adapted to continuously control the flow rate. Furthermore, an according method, a computer program and a computer readable medium adapted for performing the method is provided.
摘要翻译：提供了一种用于基板处理系统的锁定室，其包括至少第一导管，其适于提供与大气压力或超压力流体连通的锁定室的内部。此外，锁定室至少包括第一控制阀，用于控制室内部与大气压或超压力的流体连通的流量，其中控制阀适于连续地控制流量。此外，提供了一种适用于执行该方法的依据方法，计算机程序和计算机可读介质。

32. 发明申请

WO2011056403A2 SHADOW MASK ALIGNMENT AND MANAGEMENT SYSTEM 审中-公开
标题翻译： SHADOW面罩对齐与管理系统
公开(公告)号：WO2011056403A2
公开(公告)日：2011-05-12
申请号：PCT/US2010/053067
申请日：2010-10-18
申请人： APPLIED MATERIALS, INC. , KWAK, Byung-Sung, Leo , BANGERT, Stefan , HOFMANN, Ralf , KOENIG, Michael
发明人： KWAK, Byung-Sung, Leo , BANGERT, Stefan , HOFMANN, Ralf , KOENIG, Michael
IPC分类号： H01M10/04 , H01M10/0562 , H01M6/18 , H01G9/025
CPC分类号： H01M6/40 , C23C14/042 , H01M4/02 , H01M4/13 , H01M4/139 , H01M4/5825 , H01M4/621 , H01M4/623 , H01M4/663 , H01M2004/028 , Y02E60/122 , Y10T29/49002 , Y10T29/5313
摘要： A magnetic handling assembly for thin-film processing of a substrate, a system and method for assembling and disassembling a shadow mask to cover a top of a workpiece for exposure to a processing condition. The assembly may include a magnetic handling carrier and a shadow mask disposed over, and magnetically coupled to, the magnetic handling carrier to cover a top of a workpiece that is to be disposed between the shadow mask and the magnetic handling carrier when exposed to a processing condition. A system includes a first chamber with a first support to hold the shadow mask, a second support to hold a handling carrier, and an alignment system to align the shadow mask a workpiece to be disposed between the carrier and shadow mask. The first and second supports are moveable relative to each other.
摘要翻译：用于基板薄膜处理的磁性处理组件，用于组装和拆卸荫罩以覆盖工件顶部以暴露于加工状态的系统和方法。组件可以包括磁性处理载体和荫罩，其设置在磁性处理载体上并且磁耦合到磁性处理载体以覆盖待暴露于加工过程中待设置在荫罩和磁性处理载体之间的工件的顶部条件。系统包括具有用于保持荫罩的第一支撑件的第一室，用于保持处理托架的第二支撑件以及将荫罩对准待设置在承载器和荫罩之间的工件的对准系统。第一和第二支撑件可相对于彼此移动。

33. 发明申请

WO2015086049A1 EVAPORATION SOURCE FOR ORGANIC MATERIAL, APPARATUS HAVING AN EVAPORATION SOURCE FOR ORGANIC MATERIAL, SYSTEM HAVING AN EVAPORATION DEPOSITION APPARATUS WITH AN EVAPORATION SOURCE FOR ORGANIC MATERIALS, AND METHOD FOR OPERATING AN EVAPORATION SOURCE FOR ORGANIC MATERIAL 审中-公开
标题翻译：有机材料的蒸发源，有机材料蒸发源的装置，有机材料蒸发源的蒸发沉积装置的系统，以及有机材料的蒸发源操作方法
公开(公告)号：WO2015086049A1
公开(公告)日：2015-06-18
申请号：PCT/EP2013/076120
申请日：2013-12-10
申请人： APPLIED MATERIALS, INC. , BANGERT, Stefan , SCHÜßLER, Uwe , DIEGUEZ-CAMPO, Jose Manuel , HAAS, Dieter
发明人： BANGERT, Stefan , SCHÜßLER, Uwe , DIEGUEZ-CAMPO, Jose Manuel , HAAS, Dieter
IPC分类号： C23C14/04 , C23C14/12 , C23C14/56 , C23C14/24 , B05D3/04 , B05D1/02 , B05D1/00 , H01L51/00 , H01L51/56 , C23C16/44
CPC分类号： C23C14/243 , C23C14/042 , C23C14/12 , C23C14/246 , C23C14/50 , C23C14/56 , C23C14/562 , C23C14/564 , C23C14/566 , H01L51/001 , H01L51/0011 , H01L51/56
摘要： An evaporation source for organic material is described. The evaporation source includes an evaporation crucible, wherein the evaporation crucible is configured to evaporate the organic material; a distribution pipe with one or more outlets, wherein the distribution pipe is in fluid communication with the evaporation crucible and wherein the distribution pipe is rotatable around an axis during evaporation; and a support for the distribution pipe, wherein the support is connectable to a first drive or includes the first drive, wherein the first drive is configured for a translational movement of the support and the distribution pipe.
摘要翻译：描述了有机材料的蒸发源。蒸发源包括蒸发坩埚，其中蒸发坩埚构造成蒸发有机材料; 具有一个或多个出口的分配管，其中所述分配管与所述蒸发坩埚流体连通，并且其中所述分配管可以在蒸发期间围绕轴线旋转; 以及对所述分配管的支撑件，其中所述支撑件可连接到第一驱动器或包括所述第一驱动器，其中所述第一驱动器构造成用于所述支撑件和所述分配管的平移运动。

34. 发明申请

WO2011037868A2 METHODS OF AND FACTORIES FOR THIN-FILM BATTERY MANUFACTURING 审中-公开
标题翻译：薄膜电池制造方法与工艺
公开(公告)号：WO2011037868A2
公开(公告)日：2011-03-31
申请号：PCT/US2010/049536
申请日：2010-09-20
申请人： APPLIED MATERIALS, INC. , KWAK, Byung-Sung , BANGERT, Stefan , HAAS, Dieter , NALAMASU, Omkaram
发明人： KWAK, Byung-Sung , BANGERT, Stefan , HAAS, Dieter , NALAMASU, Omkaram
IPC分类号： H01M10/04 , H01M10/0525
CPC分类号： H01M10/0404 , H01M4/621 , H01M6/40 , H01M10/052 , H01M10/0585 , Y02E60/122 , Y02P70/54 , Y10T29/52
摘要： Methods of and factories for thin-film battery manufacturing are described. A method includes operations for fabricating a thin-film battery. A factory includes one or more tool sets for fabricating a thin-film battery.
摘要翻译：描述了薄膜电池制造的方法和工厂。一种方法包括制造薄膜电池的操作。工厂包括用于制造薄膜电池的一个或多个工具组。

35. 发明申请

WO2009109464A1 COATING APPARATUS WITH ROTATION MODULE 审中-公开
标题翻译：涂装装置与旋转模块
公开(公告)号：WO2009109464A1
公开(公告)日：2009-09-11
申请号：PCT/EP2009/051898
申请日：2009-02-18
申请人： APPLIED MATERIALS INC. , BANGERT, Stefan , KOENIG, Michael , SCHUESSLER, Uwe , GERTMANN, Reiner
发明人： BANGERT, Stefan , KOENIG, Michael , SCHUESSLER, Uwe , GERTMANN, Reiner
IPC分类号： C23C14/04 , C23C14/56 , C23C16/04 , C23C16/54 , H01L21/68 , H01L21/00
CPC分类号： C23C14/568 , C23C14/042 , C23C16/042 , C23C16/54 , H01L21/67173 , H01L21/682
摘要： The present invention refers to a method for coating a substrate, a coating apparatus for carrying out the method and a handling module for coating apparatuses. The handling module comprises a moveable support (13) for a substrate to be coated the support being movable between at least two positions. Further, a mask arranging device (415) for at least one of attaching and detaching a mask to the substrate, and a mask alignment device (415) for aligning the mask with respect to the substrate are provided for, wherein the mask alignment device (415) is attached to the movable support (13) so as to be movable together with the support. Alternatively, the handling module comprises a vacuum chamber, a moveable support (13) for a substrate to be coated, the support being arranged in the vacuum chamber and being rotatable between at least two positions, wherein a mask arranging device (415) for at least one of attaching and detaching a mask to the substrate is arranged within the vacuum chamber of the handling module.
摘要翻译：本发明涉及一种基材的涂布方法，实施该方法的涂布装置和涂布装置的处理模块。处理模块包括用于待涂覆的基底的可移动支撑件（13），所述支撑件可在至少两个位置之间移动。此外，提供了一种用于将掩模附着和分离至基板的掩模布置装置（415）和用于使掩模相对于基板对准的掩模对准装置（415），其中，掩模对准装置 415）附接到可动支撑件（13），以便与支撑件一起移动。替代地，处理模块包括真空室，用于待涂覆的基底的可移动支撑件（13），所述支撑件布置在真空室中并且可在至少两个位置之间旋转，其中，在处理模块的真空室内布置有至少一个将掩模附着和分离到基板上。

36. 发明申请

WO2022084712A1 SUPPLY ARRANGEMENT, VACUUM PROCESSING SYSTEM AND METHOD OF SUPPLYING A MOVING DEVICE IN A VACUUM PROCESSING SYSTEM 审中-公开
公开(公告)号：WO2022084712A1
公开(公告)日：2022-04-28
申请号：PCT/IB2020/059813
申请日：2020-10-19
申请人： APPLIED MATERIALS, INC. , SPATZ, Norbert , BANGERT, Stefan , KREBS, Matthias
发明人： SPATZ, Norbert , BANGERT, Stefan , KREBS, Matthias
IPC分类号： C23C14/56 , C23C14/24 , H01L51/56 , H01L21/677 , H01L51/00
摘要： A supply arrangement (100) for supplying a movable device (10) in a vacuum processing system is described. The supply arrangement (100) includes a jointed-arm feedthrough system (105) for providing supply lines to the movable device (10). Additionally, the supply arrangement (100) includes a force compensation unit (140) for compensating a moment (M) around a first rotation axis (R1) of a first joint (131) provided at a first end (101) of the jointed-arm feedthrough system (105). The moment (M) is caused by gravitational force of the jointed-arm feedthrough system (105). Further, a vacuum processing system and a method of supplying a movable device in a vacuum processing system are described.

37. 发明申请

WO2022002349A1 NOZZLE ASSEMBLY, EVAPORATION SOURCE, DEPOSITION SYSTEM AND METHOD FOR DEPOSITING AN EVAPORATED MATERIAL ONTO A SUBSTRATE 审中-公开
公开(公告)号：WO2022002349A1
公开(公告)日：2022-01-06
申请号：PCT/EP2020/068257
申请日：2020-06-29
申请人： APPLIED MATERIALS, INC. , LOPP, Andreas , BANGERT, Stefan
发明人： LOPP, Andreas , BANGERT, Stefan
IPC分类号： C23C14/24 , C23C14/16 , C23C14/56 , H01M4/04 , H01M4/38 , C23C14/243 , C23C14/562 , C23C14/564 , C23C14/568 , H01M4/0423 , H01M4/1395 , H01M4/382
摘要： A nozzle assembly for guiding an evaporated material to a substrate is described. The nozzles assembly includes a plurality of nozzles, one or more nozzles of the plurality of nozzles include: a first nozzle section having a first end and a second end, the first nozzle section comprising a vapor outlet at the second end, and an orifice at or adjacent to the vapor outlet having an orifice diameter.

38. 发明申请

WO2019238245A1 COOLING SYSTEM FOR COOLING A DEPOSITION AREA, ARRANGEMENT FOR MATERIAL DEPOSITION IN DEPOSITION AREA, AND METHOD OF DEPOSITION ON A SUBSTRATE IN A DEPOSITION AREA 审中-公开
公开(公告)号：WO2019238245A1
公开(公告)日：2019-12-19
申请号：PCT/EP2018/065977
申请日：2018-06-15
申请人： APPLIED MATERIALS, INC. , BANGERT, Stefan
发明人： BANGERT, Stefan
IPC分类号： C23C14/54
摘要： A cooling system provided in a vacuum chamber for cooling a deposition area comprising an active cooling device comprising a first surface and second surface; the first surface is arranged between the second surface and the deposition area and a heat exchanger configured to actively cool the first surface by transferring a heat away from the first surface. An arrangement for material deposition on a substrate, comprising a deposition source for material deposition on a substrate in a deposition area; a cooling system having a first active cooling device with an actively cooled first surface and a heat exchanger configured to transfer a heat away from the first surface; whereby the actively cooled first surface is configured to transfer a cooling load away from the deposition area; and a cooling arrangement having a second active cooling device configured to reduce heat radiation from the deposition source.

39. 发明申请

WO2019228611A1 METHODS OF HANDLING MASKS IN A VACUUM SYSTEM, AND VACUUM SYSTEM 审中-公开
公开(公告)号：WO2019228611A1
公开(公告)日：2019-12-05
申请号：PCT/EP2018/064056
申请日：2018-05-29
申请人： APPLIED MATERIALS, INC. , ZANG, Sebastian Gunther , BANGERT, Stefan , KURITA, Shinichi , HENRICH, Jürgen , SAUER, Andreas
发明人： ZANG, Sebastian Gunther , BANGERT, Stefan , KURITA, Shinichi , HENRICH, Jürgen , SAUER, Andreas
IPC分类号： C23C14/04 , C23C14/56 , H01L21/677
摘要： A method of handling masks in a vacuum system is described. The method includes (a) transporting a mask carrier (10) carrying a first mask (11) in a non-horizontal orientation (V) along a transport path in the vacuum system, (b) changing the orientation of the mask carrier (10) carrying the first mask (11) from the non-horizontal orientation (V) to an essentially horizontal orientation (H), and (c) unloading the first mask (11) from the mask carrier (10) arranged in the essentially horizontal orientation (H) in the vacuum system. According to a further aspect, a vacuum system including a mask handling module for handling masks is described. (FIG. 1C)

40. 发明申请

WO2019206414A1 VACUUM PROCESSING SYSTEM AND METHOD OF OPERATING A VACUUM PROCESSING SYSTEM 审中-公开
公开(公告)号：WO2019206414A1
公开(公告)日：2019-10-31
申请号：PCT/EP2018/060741
申请日：2018-04-26
申请人： APPLIED MATERIALS, INC. , BANGERT, Stefan , BUSCHBECK, Wolfgang , BERGER, Thomas
发明人： BANGERT, Stefan , BUSCHBECK, Wolfgang , BERGER, Thomas
IPC分类号： H01L21/67 , H01L21/677
摘要： A vacuum processing system for routing a carrier with a substrate is described. The system includes a first vacuum processing chamber for processing the substrate on the carrier; a vacuum buffer chamber providing a processing time delay for the substrate; a second vacuum processing chamber for masked deposition of a material layer on the substrate; and one or more transfer chambers for routing the carrier from the first vacuum chamber to the vacuum buffer chamber and for routing the carrier from the vacuum buffer chamber to the second vacuum chamber.

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