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    • 37. 发明公开
    • 반도체 소자와 전자기 노이즈 억제체
    • 电磁噪声抑制器,使用其的半导体器件及其制造方法
    • KR1020010095323A
    • 2001-11-03
    • KR1020010017977
    • 2001-04-04
    • 가부시키가이샤 토킨
    • 요시다,시게요시오노,히로시아와쿠라,요시오네모토,미치오야마나카,에이지야마구치,마사히로시마다,유타카
    • H01L21/00
    • H01L23/552H01L23/66H01L2223/6627H01L2224/274H01L2924/01019H01L2924/19032H01L2924/3011
    • PURPOSE: An electromagnetic noise suppressor, a semiconductor device using the same, and a method of manufacturing the same are provided to be capable of efficiently absorbing interfering electromagnetic waves from the MHz bands to the GHz bands, capable of exhibiting an electromagnetic wave absorption effect when divided into individual semiconductor devices, and excelling in the volume production of noise-suppressed semiconductor devices, together with a manufacturing method therefore and semiconductor devices wherein those semiconductor substrates are used. CONSTITUTION: A semiconductor wafer(27) has a plurality of chip wafers(29) on the surface of each whereof is formed an integrated circuit, and each whereof has a chip(31) electrode(electrode pad) formed on top thereof. The chip electrodes(31) as diagrammed are formed along the outer circumferential edge of the chip wafers(29), but the chip electrodes(31) may be formed in active areas. An aluminum alloy is commonly used for the metal of which the chip electrodes are formed. The semiconductor wafer 27 also comprises a passivation film(33). More specifically, the entire surface of the semiconductor wafer(27) is covered by the passivation film(33). The passivation film(33) is made of a polyimide, silicon nitride film, or silicon oxide film, for example, using a well known technique such as spin coating. The thickness of the passivation film(33) should be 20 mu m or less. After the passivation film(33) has been formed, the chip electrodes(31) are exposed to atmospheric air by exposing and etching the semiconductor wafer(27). As a result, the passivation film(33) will cover the entire surface of the semiconductor wafer(27) excluding those positions where the chip electrodes(31) are formed. The chip wafers 29 are then mutually separated into individual semiconductor bare chips along scribe lines(35). That separation is done by means of a commonly known dicing technique using a dicing saw. These chip wafers(29) are semiconductor bare chips(37).
    • 目的:提供一种电磁噪声抑制器,使用该电磁噪声抑制器的半导体器件及其制造方法,能够有效地吸收从MHz频带到GHz频带的干扰电磁波,能够呈现电磁波吸收效果,当 分为单独的半导体器件,并且优良的噪声抑制半导体器件的批量生产以及其制造方法以及其中使用那些半导体衬底的半导体器件。 构成:半导体晶片(27)在其表面上形成有多个芯片晶片(29),形成集成电路,并且每个具有形成在其顶部的芯片(31)电极(电极焊盘)。 如图所示的芯片电极(31)沿着芯片晶片(29)的外周缘形成,但是芯片电极(31)可以形成在有源区域中。 铝合金通常用于形成芯片电极的金属。 半导体晶片27还包括钝化膜(33)。 更具体地,半导体晶片(27)的整个表面被钝化膜(33)覆盖。 钝化膜(33)例如使用旋涂法等公知技术由聚酰亚胺,氮化硅膜或氧化硅膜构成。 钝化膜(33)的厚度应为20μm以下。 在形成钝化膜(33)之后,通过曝光和蚀刻半导体晶片(27)将芯片电极(31)暴露于大气中。 结果,除了形成芯片电极(31)的位置之外,钝化膜(33)将覆盖半导体晶片(27)的整个表面。 然后,芯片晶片29沿着划线(35)相互分离成单独的半导体裸芯片。 该分离通过使用切割锯的公知的切割技术完成。 这些芯片晶片(29)是半导体裸芯片(37)。