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31. 发明授权

US5880649A Multilayered frequency separator 失效
标题翻译：多层次分频器
公开(公告)号：US5880649A
公开(公告)日：1999-03-09
申请号：US805048
申请日：1997-02-24
申请人： Hiroyuki Tai , Tsuyoshi Taketa , Toshihiko Tanaka
发明人： Hiroyuki Tai , Tsuyoshi Taketa , Toshihiko Tanaka
IPC分类号： H01P1/213 , H01Q1/24 , H03H7/46
CPC分类号： H01Q1/241 , H01P1/2135
摘要： A multilayered frequency separator comprising a plurality of insulating layers, and having at least two notch circuits. The notch circuit is constituted by pattern electrodes formed on interfaces of each of the insulating layers which construct the multilayer structure, and comprises a capacitor component connected to an inductance component. The multilayered frequency separator is suitably used for branching the frequency bands for dual-band handy phone.
摘要翻译：一种多层频率分离器，包括多个绝缘层，并且具有至少两个陷波电路。陷波电路由形成在构成多层结构的每个绝缘层的界面上的图案电极构成，并且包括连接到电感部件的电容器部件。多层频率分离器适用于双频手机的频带分支。

32. 发明授权

US5760759A Liquid crystal display 失效
标题翻译：液晶显示器
公开(公告)号：US5760759A
公开(公告)日：1998-06-02
申请号：US553868
申请日：1995-11-06
申请人： Toshihiko Tanaka , Shoji Iwasaki , Masahiro Nakamura , Kouji Maeta , Jouji Yamada
发明人： Toshihiko Tanaka , Shoji Iwasaki , Masahiro Nakamura , Kouji Maeta , Jouji Yamada
IPC分类号： G09G3/36
CPC分类号： G09G3/3622 , G09G3/3696 , G09G2310/06 , G09G2330/02
摘要： A driving power supply and a driving circuit are provided which are suitable for use in a high resolution matrix liquid crystal display. A power source circuit generates two selecting potentials and an intermediate potential between the selecting potentials to be supplied to scanning electrodes through a scanning circuit, two potentials close to the intermediate potential to be supplied to signal electrodes through a signal circuit, and potentials for driving the scanning circuit and the signal circuit. A receiving circuit controls the scanning circuit and the signal circuit based on control signals and an image signal and monitors the potential of the power supplied to the liquid crystal display to start the potential generation by the power source circuit when the potential has sufficiently increased.
摘要翻译：提供适用于高分辨率矩阵液晶显示器的驱动电源和驱动电路。电源电路通过扫描电路产生两个选择电位和供给扫描电极的选择电位之间的中间电位，接近通过信号电路提供给信号电极的中间电位的两个电位和用于驱动扫描电路和信号电路。接收电路基于控制信号和图像信号来控制扫描电路和信号电路，并且当电位充分增加时，监视供给液晶显示器的电力的电位，以通过电源电路开始电位产生。

33. 发明授权

US5733712A Resist pattern forming method using anti-reflective layer, resist pattern formed, and method of etching using resist pattern and product formed 失效
标题翻译：使用抗反射层的抗蚀剂图案形成方法，形成的抗蚀剂图案，以及形成的抗蚀剂图案和产品的蚀刻方法
公开(公告)号：US5733712A
公开(公告)日：1998-03-31
申请号：US601361
申请日：1996-02-16
申请人： Toshihiko Tanaka , Shoichi Uchino , Naoko Asai
发明人： Toshihiko Tanaka , Shoichi Uchino , Naoko Asai
IPC分类号： G03F7/09 , G03C1/825
CPC分类号： G03F7/091 , Y10S430/151
摘要： A first method forms between the substrate and resist film an anti-reflective film whose photoabsorbance of the exposure light is greater on the substrate surface side than on the resist surface side. A second method forms between the substrate and resist film a two-layer anti-reflective film made up of an upper-layer film which is an interference film for the exposure light and a lower-layer film which has higher exposure light absorbance than the upper-layer film and functions as a light shielding film. A third method forms between the substrate and resist film a two-layer anti-reflective film consisting of a lower-layer film that reflects the exposure light and an upper-layer film that is an interference film for the exposure light. A very high anti-reflection effect can be obtained without aspect ratio problems during the process of forming the anti-reflective film and without being influenced by the kind of substrate including those having a transparent film. With these methods, it is possible to form a fine and highly precise resist pattern. These methods can be used to form patterned resist films to etch object films, e.g., in forming microcircuits and/or gates (and word lines) of semiconductor devices.
摘要翻译：在基板和抗蚀剂膜之间形成第一种方法，其中在基板表面侧的曝光光的光吸收性大于在抗蚀剂表面侧上的抗反射膜。在基板和抗蚀剂膜之间形成由作为曝光用的干涉膜的上层膜构成的双层抗反射膜的第二种方法和具有比上层的曝光吸光度高的下层膜并且用作遮光膜。在基板和抗蚀剂膜之间形成由反射曝光光的下层膜构成的两层抗反射膜和作为曝光用光的干涉膜的上层膜的第三种方法。在形成抗反射膜的过程中可以获得非常高的抗反射效果，而不受包括具有透明膜的基板的种类的影响。利用这些方法，可以形成精细且高精度的抗蚀剂图案。这些方法可以用于形成图案化的抗蚀剂膜以蚀刻对象膜，例如在形成半导体器件的微电路和/或栅极（和字线）中。

34. 发明授权

US5665836A Method of preparing vinyl chloride polymers and copolymers of improved antistatic performance 失效
标题翻译：制备氯乙烯聚合物的方法和提高抗静电性能的共聚物
公开(公告)号：US5665836A
公开(公告)日：1997-09-09
申请号：US510938
申请日：1995-08-03
申请人： Toshihiko Tanaka , Hiroshi Minamide
发明人： Toshihiko Tanaka , Hiroshi Minamide
IPC分类号： C08F2/00 , C08F6/24
CPC分类号： C08F6/24
摘要： A method of producing suspension polymerized vinyl chloride polymers or copolymers of improved flowability by polymerizing vinyl chloride monomers alone, or in a mixture with other monomers, in an aqueous medium, to form a slurry of polymer suspended in said aqueous medium. After removing unreacted monomers, a polyhydric alcohol is added to the slurry containing the suspension polymerized polymer or to a product obtained after the dewatering of the slurry, in an amount of 0.001 to 0.5 parts by weight based on 100 parts by weight of the vinyl chloride polymer or copolymer suspended in the slurry.
摘要翻译：通过在水性介质中单独聚合氯乙烯单体或与其它单体的混合物来生产悬浮聚合氯乙烯聚合物或改进流动性的共聚物的方法，以形成悬浮在所述水性介质中的聚合物浆料。除去未反应的单体之后，将含有悬浮聚合聚合物的浆料或浆料脱水后得到的产物加入到多元醇中，相对于100重量份的氯乙烯为0.001〜0.5重量份悬浮在浆料中的聚合物或共聚物。

35. 发明授权

US5656397A Mask having a phase shifter and method of manufacturing same 失效
标题翻译：具有移相器的掩模及其制造方法
公开(公告)号：US5656397A
公开(公告)日：1997-08-12
申请号：US282543
申请日：1994-07-29
申请人： Akira Imai , Norio Hasegawa , Hiroshi Fukuda , Toshihiko Tanaka
发明人： Akira Imai , Norio Hasegawa , Hiroshi Fukuda , Toshihiko Tanaka
IPC分类号： G03F1/00 , G03F1/26 , G03F1/29 , G03F1/72 , G03F9/00
CPC分类号： G03F1/72 , G03F1/26 , G03F1/29 , G03F1/38
摘要： There is disclosed a mask which includes a first phase shifter layer and a second phase shifter layer formed on the first phase shifter layer and has a structure capable of easily effecting highly precise control of the phase of exposure light and correction for a defect in the phase shifter layers. There are also disclosed a method of manufacturing the mask and a method of forming by use of the mask a pattern which has a smaller local error in pattern dimension and is free of a defect.
摘要翻译：公开了一种掩模，其包括形成在第一移相器层上的第一移相器层和第二移相器层，并且具有能够容易地实现对曝光光的相位的高度精确控制和对相的缺陷进行校正的结构移位层。还公开了一种制造掩模的方法以及通过使用掩模形成图案的图案尺寸较小的局部误差并且没有缺陷的图案的方法。

36. 发明授权

US5328807A Method of forming a pattern 失效
标题翻译：形成图案的方法
公开(公告)号：US5328807A
公开(公告)日：1994-07-12
申请号：US711954
申请日：1991-06-07
申请人： Toshihiko Tanaka , Norio Hasegawa , Toshiaki Yamanaka , Akira Imai , Hiroshi Shiraishi , Takumi Ueno , Hiroshi Fukuda
发明人： Toshihiko Tanaka , Norio Hasegawa , Toshiaki Yamanaka , Akira Imai , Hiroshi Shiraishi , Takumi Ueno , Hiroshi Fukuda
IPC分类号： G03F1/34 , G03F7/20 , G03C5/00 , G03F9/00
CPC分类号： G03F1/34 , G03F7/2022
摘要： A comb-like or dot-like phase shifter pattern is added to a phase shifter used in phase shifting mask technology, which is then exposed onto a wafer. This enables the formation of extremely fine line patterns or space patterns having widths different from each other simultaneously. Further, when two reticles are disposed such that phase shifter patterns disposed therein intersect each other and are exposed consecutively onto a wafer, a fine hole pattern or dot pattern can be formed at a position where the phase shifter patterns intersect each other.
摘要翻译：将梳状或点状移相器图案添加到用于相移掩模技术的移相器中，然后将其暴露在晶片上。这使得能够同时形成彼此宽度不同的极细线图案或空间图案。此外，当两个掩模版被布置成使得设置在其中的移相器图案彼此相交并且连续地暴露在晶片上时，可以在移相器图案彼此相交的位置处形成细孔图案或点图案。

37. 发明授权

US5326672A Resist patterns and method of forming resist patterns 失效
标题翻译：抗蚀剂图案和形成抗蚀剂图案的方法
公开(公告)号：US5326672A
公开(公告)日：1994-07-05
申请号：US964715
申请日：1992-10-22
申请人： Toshihiko Tanaka , Mitsuaki Morigami , Iwao Higashikawa , Takeo Watanabe
发明人： Toshihiko Tanaka , Mitsuaki Morigami , Iwao Higashikawa , Takeo Watanabe
IPC分类号： G03F7/30 , G03C5/00
CPC分类号： G03F7/30
摘要： In accordance with a proposed resist pattern forming method, contact angles between the surface of a resist and a rinse is adjusted within a predetermined range, a volatil surfactant which does not remain by drying is mixed in the rinse so as to reduce a surface tension, the rinse is dried under a critical condition of the rinse in order not to cause the surface tension to exert. The occurrence of an attractive force between the resist patterns may be thereby weakened or nullified, so that falling of the patterns can be effectively prevented which very often happened at forming fine resist patterns or resist patterns of high aspect. On the other hand, depending upon structure of said resist pattern, it is possible to effectively prevent outermost main patterns of gathering resist patterns from falling down. By providing such effects, yielding of products are increased. Further, the present invention may be also applied to a lithography illumination sources of which are light, electron, X-ray, ion beam, etc.
摘要翻译：根据所提出的抗蚀剂图案形成方法，将抗蚀剂表面和冲洗液之间的接触角调节到预定范围内，将不保持干燥的挥发性表面活性剂在冲洗液中混合以降低表面张力，冲洗液在冲洗的临界条件下干燥，以免引起表面张力。因此抗蚀剂图案之间的吸引力的发生可能被削弱或消失，从而可以有效地防止图形的下降，这在形成精细抗蚀剂图案或高方面的抗蚀剂图案时经常发生。另一方面，根据所述抗蚀剂图案的结构，可以有效地防止聚集抗蚀剂图案的最外面的主要图案掉落。通过提供这种效果，产品的产量增加。此外，本发明还可以应用于光，电子，X射线，离子束等的光刻照明源

38. 发明授权

US4988608A Method for forming fine pattern of conjugated polymer film 失效
标题翻译：用于形成共轭聚合物薄膜精细图案的方法
公开(公告)号：US4988608A
公开(公告)日：1991-01-29
申请号：US431178
申请日：1989-11-03
申请人： Toshihiko Tanaka , Shuji Doi
发明人： Toshihiko Tanaka , Shuji Doi
IPC分类号： G03F7/038 , H01L21/027
CPC分类号： G03F7/038 , Y10S430/115
摘要： Disclosed is a method for forming a fine pattern of a conjugated polymer according to which the fine pattern can be formed even by using a high pressure mercury lamp as a light source for irradiation. This method comprises irradiating a coat containing a precursor for conjugated polymers which has a recurring unit represented by the formula (1): ##STR1## wherein R.sub.1 represents ##STR2## ps in which R.sub.3 and R.sub.4 each represents a hydrogen atom or an alkyl or alkoxy group of 1-5 carbon atoms, R.sub.5 represents a hydrocarbon group of 1-5 carbon atoms and m is 1 or 2; and R.sub.2 represents a hydrogen atom or a hydrocarbon group of 1-10 carbon atoms with a light of 200-500 nm in wavelength in pattern form and then dissolving and removing the polymer of unirradiated portion. It is preferred to heat treat the resulting fine pattern. Furthermore, the resulting pattern can have electrical conductivity by doping it with an electron donating or accepting dopant.
摘要翻译：公开了一种用于形成共轭聚合物的精细图案的方法，通过使用高压汞灯作为照射光源，可以形成精细图案。该方法包括：照射含有共轭聚合物前体的涂层，该共聚物具有式（1）表示的重复单元：其中R 1表示其中R 3和R 4各自表示氢原子或 1-5个碳原子的烷基或烷氧基，R5代表1-5个碳原子的烃基，m是1或2; R2表示氢原子或1-10个碳原子的烃基，其波长为200-500nm的图案形式，然后溶解并除去未照射部分的聚合物。优选热处理所得到的精细图案。此外，所得到的图案可以通过用给电子或接受掺杂剂掺杂而具有导电性。

39. 发明授权

US4869999A Method of forming pattern and projection aligner for carrying out the same 失效
标题翻译：形成图案和投影对准器的方法，用于执行它们
公开(公告)号：US4869999A
公开(公告)日：1989-09-26
申请号：US83211
申请日：1987-08-10
申请人： Hiroshi Fukuda , Norio Hasegawa , Toshihiko Tanaka , Toshiei Kurosaki
发明人： Hiroshi Fukuda , Norio Hasegawa , Toshihiko Tanaka , Toshiei Kurosaki
IPC分类号： G03F7/20
CPC分类号： G03F7/70575 , G03F7/2022 , G03F7/70241 , G03F7/70333 , G03F7/70858
摘要： An area on a photoresist film which is formed on a substrate surface having a topography, is exposed a plurality of times in such a manner that the image plane of a mask pattern is formed at a plurality of positions which are spaced apart from a reference plane in the substrate in the direction of an optical axis, and then the photoresist film is developed to form a resist pattern. According to the above method, the effective focal depth of the projection aligner used is enhanced, and moreover the reduction of the image contrast at the photoresist film is very small by the plural exposure operations. Accordingly, a fine pattern can be formed accurately on the substrate surface having the topography.
摘要翻译：在具有形貌的基板表面上形成的光致抗蚀剂膜上的区域被曝光多次，使得掩模图案的像面形成在与参考平面间隔开的多个位置在光轴方向上的基板中，然后使光致抗蚀剂膜显影以形成抗蚀剂图案。根据上述方法，增强了所使用的投影对准器的有效焦深，并且通过多次曝光操作，光致抗蚀剂膜的图像对比度的降低非常小。因此，可以在具有形貌的基板表面上精确地形成精细图案。

40. 发明授权

US4829749A Tire handling system 失效
标题翻译：轮胎处理系统
公开(公告)号：US4829749A
公开(公告)日：1989-05-16
申请号：US947460
申请日：1986-12-29
申请人： Hisato Hiyama , Yukiyasu Joe , Shunro Kubota , Toshihiko Tanaka , Takuichi Kameda
发明人： Hisato Hiyama , Yukiyasu Joe , Shunro Kubota , Toshihiko Tanaka , Takuichi Kameda
IPC分类号： B29D30/00 , B65G1/137
CPC分类号： B65G1/1371 , B29D30/0016
摘要： A tire handling system capable of automatically performing a series of tire handling operations including sorting of the tires from a production/inspection line according to types and sizes, stacking the sorted tires, and shelving the stacks of tires in frame pallets. The tire handling system incorporates a novel tire supplying device which supplies the sorted tire to the tire stacking device in one-by-one fashion, a tire inverting device disposed between the tire supplying device and the tire stacking device and adapted for selectively inverting tires conveyed along the sorting line, and an automatic tire shelving device for shelving the stacks of tires. These devices have simple constructions but yet are capable of performing the supplying, inverting and shelving operations with a high degree of reliability.
摘要翻译：一种轮胎处理系统，其能够自动执行一系列轮胎处理操作，包括根据类型和尺寸从生产/检查线分选轮胎，堆叠排序的轮胎，以及将轮胎堆叠在框架托盘中。轮胎处理系统包括一种新颖的轮胎供给装置，其以一种一种方式将分拣轮胎供应到轮胎堆叠装置;轮胎翻转装置，设置在轮胎供给装置和轮胎堆叠装置之间，沿着分拣线，以及用于将轮辋叠放的自动轮胎搁置装置。这些装置具有简单的结构，但是能够以高可靠性执行供给，反转和搁置操作。

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