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31. 发明申请

US20050007602A1 Device and method for wavefront measurement of an optical imaging system by means of phase-shifting interferometry 有权
标题翻译：通过相移干涉法对光学成像系统进行波前测量的装置和方法
公开(公告)号：US20050007602A1
公开(公告)日：2005-01-13
申请号：US10816896
申请日：2004-04-05
申请人： Helmut Haidner , Wolfgang Emer , Rainer Hoch , Ulrich Wegmann , Martin Schriever , Markus Goeppert
发明人： Helmut Haidner , Wolfgang Emer , Rainer Hoch , Ulrich Wegmann , Martin Schriever , Markus Goeppert
IPC分类号： G01B9/02 , G01J9/04
CPC分类号： G03F7/706 , G01J9/04 , G01M11/0264 , G01M11/0271
摘要： Device and method for wavefront measurement of an optical imaging system by means of phase-shifting interferometry, having a mask structure (6a) to be arranged on the object side, and/or a grating structure (7a) to be arranged on the image side. The object-side mask structure includes one or more one-dimensional mask structure patterns, and the image-side grating structure includes one or more two-dimensional grating structure patterns. Alternatively, conversely, the mask structure includes one or more two-dimensional patterns, and the grating structure includes one or more one-dimensional patterns. Additionally or alternatively, a pupil position offset caused by a lateral relative movement of the mask structure and detector element can be taken into account by back calculating the interferogram, respectively recorded by the detector element, using an associated phase-shift characteristic, or by a computational correction of wavefront derivatives, obtained from the recorded interferograms, in the direction of lateral movement. The method and/or the device can by used, for example, for determining aberration in the case of high-resolution projection objectives of microlithography exposure machines using shearing or point interferometry.
摘要翻译：用于通过相移干涉测量法对光学成像系统进行波前测量的装置和方法，具有要布置在物体侧的掩模结构（6a）和/或要布置在像侧的光栅结构（7a）。物体侧掩模结构包括一个或多个一维掩模结构图案，并且图像侧光栅结构包括一个或多个二维光栅结构图案。或者，相反地，掩模结构包括一个或多个二维图案，并且光栅结构包括一个或多个一维图案。附加地或替代地，由掩模结构和检测器元件的横向相对移动引起的瞳孔位置偏移可以通过使用相关联的相移特性反向计算分别由检测器元件记录的干涉图来考虑，从记录的干涉图中获得的横向运动方向的波前衍生的计算校正。该方法和/或装置可以通过例如用于在使用剪切或点干涉测量的微光刻曝光机的高分辨率投影物镜的情况下确定像差。

32. 发明授权

US07417745B2 Device and method for wavefront measurement of an optical imaging system by means of phase-shifting interferometry 有权
标题翻译：通过相移干涉法对光学成像系统进行波前测量的装置和方法
公开(公告)号：US07417745B2
公开(公告)日：2008-08-26
申请号：US10816896
申请日：2004-04-05
申请人： Helmut Haidner , Wolfgang Emer , Rainer Hoch , Ulrich Wegmann , Martin Schriever , Markus Goeppert
发明人： Helmut Haidner , Wolfgang Emer , Rainer Hoch , Ulrich Wegmann , Martin Schriever , Markus Goeppert
IPC分类号： G01B9/02
CPC分类号： G03F7/706 , G01J9/04 , G01M11/0264 , G01M11/0271
摘要： Device and method for wavefront measurement of an optical imaging system by means of phase-shifting interferometry, having a mask structure (6a) to be arranged on the object side, and/or a grating structure (7a) to be arranged on the image side. The object-side mask structure includes one or more one-dimensional mask structure patterns, and the image-side grating structure includes one or more two-dimensional grating structure patterns. Alternatively, conversely, the mask structure includes one or more two-dimensional patterns, and the grating structure includes one or more one-dimensional patterns. Additionally or alternatively, a pupil position offset caused by a lateral relative movement of the mask structure and detector element can be taken into account by back calculating the interferogram, respectively recorded by the detector element, using an associated phase-shift characteristic, or by a computational correction of wavefront derivatives, obtained from the recorded interferograms, in the direction of lateral movement. The method and/or the device can by used, for example, for determining aberration in the case of high-resolution projection objectives of microlithography exposure machines using shearing or point interferometry.
摘要翻译：用于通过相移干涉测量法对具有要布置在物体侧的掩模结构（6a）的光学成像系统的波前测量的装置和方法和/或布置在物体侧上的光栅结构（7a）形象一面物体侧掩模结构包括一个或多个一维掩模结构图案，并且图像侧光栅结构包括一个或多个二维光栅结构图案。或者，相反地，掩模结构包括一个或多个二维图案，并且光栅结构包括一个或多个一维图案。附加地或替代地，由掩模结构和检测器元件的横向相对移动引起的瞳孔位置偏移可以通过使用相关联的相移特性反向计算分别由检测器元件记录的干涉图来考虑，从记录的干涉图中获得的横向运动方向的波前衍生的计算校正。该方法和/或装置可以通过例如用于在使用剪切或点干涉测量的微光刻曝光机的高分辨率投影物镜的情况下确定像差。

33. 发明申请

US20080144043A1 APPARATUS FOR WAVEFRONT DETECTION 审中-公开
标题翻译：用于波形检测的装置
公开(公告)号：US20080144043A1
公开(公告)日：2008-06-19
申请号：US12032623
申请日：2008-02-15
申请人： Ulrich WEGMANN , Helmut Haidner , Martin Schriever
发明人： Ulrich WEGMANN , Helmut Haidner , Martin Schriever
IPC分类号： G01B9/02 , G01B9/00
CPC分类号： G03F7/706 , G01J9/02
摘要： An arrangement for microlithography includes a projection objective having a plurality of optical elements; an aberration control circuit controlling imaging properties of the projection objective; and at least one operating element associated with an optical element of the projection objective to control imaging properties of the projection objective in response to operating signals generated by the control circuit.
摘要翻译：用于微光刻的装置包括具有多个光学元件的投影物镜; 控制投影物镜的成像特性的像差控制电路; 以及与投影物镜的光学元件相关联的至少一个操作元件，以响应于由控制电路产生的操作信号来控制投影物镜的成像特性。

34. 发明申请

US20080037905A1 METHOD AND APPARATUS FOR DETERMINING THE INFLUENCING OF THE STATE OF POLARIZATION BY AN OPTICAL SYSTEM, AND AN ANALYSER 审中-公开
标题翻译：用于确定光学系统极化状态的影响的方法和装置，以及分析仪
公开(公告)号：US20080037905A1
公开(公告)日：2008-02-14
申请号：US11874493
申请日：2007-10-18
申请人： Ulrich Wegmann , Michael Hartl , Markus Mengel , Manfred Dahl , Helmut Haidner , Martin Schriever , Michael Totzeck
发明人： Ulrich Wegmann , Michael Hartl , Markus Mengel , Manfred Dahl , Helmut Haidner , Martin Schriever , Michael Totzeck
IPC分类号： G06K9/03
CPC分类号： G03F7/70566 , G01J4/04 , G01M11/0271 , G01M11/0285 , G02B27/0025 , G03F7/70591
摘要： A method and an apparatus for determining the influencing of the state of polarization of optical radiation by an optical system under test, wherein radiation with a defined entrance state of polarization is directed onto the optical system, the exit-side state of polarization is measured, and the influencing of the state of polarization is determined by the optical system with the aid of evaluation of the exit state of polarization with reference to the entrance state of polarization. An analyser arrangement which can be used for this purpose is also disclosed. The method and the apparatus are used, e.g., to determine the influencing of the state of polarization of optical radiation by an optical imaging system of prescribable aperture, the determination being performed in a pupil-resolved fashion.
摘要翻译：一种用于通过被测光学系统确定光辐射的偏振状态的影响的方法和装置，其中具有限定的入射极化状态的辐射被引导到光学系统上，测量出射侧的偏振态，并且通过参考偏振的入射状态来评估偏振的退出状态，由光学系统确定极化状态的影响。还公开了可用于此目的的分析装置。使用该方法和装置，例如通过具有规定孔径的光学成像系统来确定光学辐射的偏振状态的影响，该确定以瞳孔分辨的方式执行。

35. 发明授权

US07230220B2 Method of determining optical properties and projection exposure system comprising a wavefront detection system 有权
标题翻译：确定光学特性的方法和包括波前检测系统的投影曝光系统
公开(公告)号：US07230220B2
公开(公告)日：2007-06-12
申请号：US11387945
申请日：2006-03-24
申请人： Steffen Lauer , Ulrich Wegmann , Wolfgang Emer , Harald Sakowski , Martin Schriever
发明人： Steffen Lauer , Ulrich Wegmann , Wolfgang Emer , Harald Sakowski , Martin Schriever
IPC分类号： G01J1/20 , G03B27/74
CPC分类号： G03F7/706 , G03F7/70258
摘要： A method of determining at least one optical property of a projection exposure system is described, wherein the exposure system includes a beam delivery system having a light source for generating an exposure optical beam having light of a first wavelength (λ1) and a second wavelength (λ2), wherein a first ratio is defined as an intensity of light λ2 to an intensity of light λ1 in the exposure optical beam. The method includes supplying at least one measuring optical beam including light of at least λ1 to the projection optical system, detecting wavefronts having traversed the projection optical system, and determining an optical property in dependence of the detected wavefronts, wherein a second ratio of an intensity of light of λ2 to an intensity of light of λ1 in the measuring optical beam being incident on the detector of the wavefront detection system is less than the first ratio.
摘要翻译：描述了一种确定投影曝光系统的至少一种光学特性的方法，其中曝光系统包括具有光源的光束传送系统，该光源用于产生具有第一波长（λ< SUB＆gt;）和第二波长（λ2 SUB），其中第一比率被定义为光λ2的光强度λ1， / SUB>曝光光束。该方法包括向投影光学系统提供包括至少λ1的光的至少一个测量光束，检测已经穿过投影光学系统的波前，以及根据检测到的波前来确定光学特性其中，所述测量光束中的λ2的光强度与λ1的光强度的第二比率入射在所述波前检测系统的检测器上小于第一比例。

36. 发明申请

US20060109533A1 Diffuser, wavefront source, wavefront sensor and projection exposure apparatus 有权
标题翻译：漫射器，波前源，波前传感器和投影曝光设备
公开(公告)号：US20060109533A1
公开(公告)日：2006-05-25
申请号：US11246633
申请日：2005-10-11
申请人： Martin Schriever , Helmut Haidner
发明人： Martin Schriever , Helmut Haidner
IPC分类号： G02B5/32
CPC分类号： G02B5/0252 , G01J9/02 , G02B5/0278 , G02B5/0284 , G03F7/70075
摘要： A wavefront source having a wavefront formation structure (4a) and a diffuser with a scattering structure (2b) in the beam path in front of or at the level of the wavefront formation structure; also a diffuser configured to be used therefor, and a wavefront sensor equipped therewith, as well as a corresponding projection exposure apparatus. The diffuser has a diffractive computer-generated hologram (CGH) scattering structure with a predetermined angular scattering profile. The wavefront source includes such a diffuser and/or a focusing element with a reflecting diffractive focusing structure (3a) in the beam path at the level of the scattering structure or between the scattering structure (2b) and the wavefront formation structure (4a). The disclosed structures are used, e.g., in the wavefront measurement of projection objectives in microlithography projection exposure apparatuses in the EUV wavelength range.
摘要翻译：具有波前形成结构（4a）的波前源和在波前形成结构的前面或在其水平处的光束路径中具有散射结构（2b）的扩散器; 也是配置为用于其的扩散器，以及配备有它的波前传感器，以及相应的投影曝光装置。漫射器具有具有预定角散射曲线的衍射计算机生成的全息图（CGH）散射结构。波前源包括这样的漫射器和/或聚焦元件，其在散射结构的水平处的光束路径中或散射结构（2b）和波阵面结构（4）之间具有反射衍射聚焦结构（3a）一个）。所公开的结构用于例如在EUV波长范围内的微光刻投影曝光装置中的投影物镜的波前测量。

37. 发明申请

US20050264827A1 Interferometric measuring device and projection exposure installation comprising such measuring device 失效
标题翻译：包括这种测量装置的干涉测量装置和投影曝光装置
公开(公告)号：US20050264827A1
公开(公告)日：2005-12-01
申请号：US10964868
申请日：2004-10-15
申请人： Martin Schriever , Ulrich Wegmann , Helmut Haidner
发明人： Martin Schriever , Ulrich Wegmann , Helmut Haidner
IPC分类号： G01B9/02 , G02B5/02 , G03F1/08 , G03F7/20 , H01L21/027 , G01B11/02
CPC分类号： G02B5/0221 , G02B5/0252 , G03F7/70075 , G03F7/706
摘要： A measuring device for interferometric measurement of an optical imaging system that is provided for projecting a useful pattern, provided on a mask, into the image plane of the imaging system, includes a wavefront source for generating at least one wavefront traversing the imaging system; a diffraction grating, arrangeable downstream of the imaging system, for interacting with the wavefront reshaped by the imaging system; and a spatially resolving detector, assigned to the diffraction grating, for acquiring interferometric information. The wavefront source has at least one measuring pattern that is formed on the mask in addition to the useful pattern. The useful pattern may represent the structure of a layer of a semiconductor component in a specific fabrication step. The measuring pattern may be formed as a coherence-forming structure periodic in one or two dimensions.
摘要翻译：一种用于光学成像系统的干涉测量的测量装置，其被提供用于将设置在掩模上的有用图案投影到成像系统的图像平面中，包括用于产生穿过成像系统的至少一个波前的波前源; 衍射光栅，其布置在成像系统的下游，用于与由成像系统重新形成的波前相互作用; 以及分配给衍射光栅的空间分辨检测器，用于获取干涉信息。除了有用的图案之外，波前源具有形成在掩模上的至少一个测量图案。有用的图案可以表示特定制造步骤中的半导体部件的层的结构。测量图案可以形成为一维或二维周期性的相干形成结构。

38. 发明申请

US20050243328A1 Device and method for the optical measurement of an optical system, a container therefor, and a microlithography projection exposure machine 有权
标题翻译：用于光学系统的光学测量的装置和方法，其容器以及微光刻投影曝光机
公开(公告)号：US20050243328A1
公开(公告)日：2005-11-03
申请号：US11080525
申请日：2005-03-16
申请人： Ulrich Wegmann , Uwe Schellhorn , Joachim Stuehler , Helmut Haidner , Albrecht Ehrmann , Martin Schriever , Markus Gobppert
发明人： Ulrich Wegmann , Uwe Schellhorn , Joachim Stuehler , Helmut Haidner , Albrecht Ehrmann , Martin Schriever , Markus Gobppert
IPC分类号： G03F7/20 , G01B9/02
CPC分类号： G03F7/2041 , G03F7/70341 , G03F7/706
摘要： A device and a method for the optical measurement of an optical system (1), in particular an optical imaging system. The device includes one or more object-side test optics components (2a, 2b) arranged in front of the optical system to be measured, and/or one or more image-side test optics components (3, 4, 5) arranged behind the optical system to be measured. A container for use in such a device, a microlithography projection exposure machine equipped with such a device, and a method which can be carried out with the aid of this device are also disclosed. An immersion fluid is introduced adjacent to at least one of the one or more object-side test optics components and/or image-side test optics components. Such device and method provide for optical measurement by microlithography projection objectives of high numerical aperture using wavefront detection with shearing or point diffraction interferometry or a Moiré measuring technique.
摘要翻译：一种用于光学系统（1）的光学测量的装置和方法，特别是光学成像系统。该装置包括布置在待测量的光学系统前面的一个或多个物体侧测试光学部件（2a，2b）和/或一个或多个图像侧测试光学部件（3,4,5）在要测量的光学系统后面。还公开了一种用于这种装置的容器，配备有这种装置的微光刻投影曝光机以及可借助该装置进行的方法。相邻于一个或多个物体侧测试光学部件和/或图像侧测试光学部件中的至少一个被引入浸没流体。这种装置和方法通过使用具有剪切或点衍射干涉测量或莫尔测量技术的波前检测的高数值孔径的微光刻投影物镜提供光学测量。

39. 发明申请

US20050083506A1 Projection exposure system for microlithography and method for generating microlithographic images 失效
公开(公告)号：US20050083506A1
公开(公告)日：2005-04-21
申请号：US10984161
申请日：2004-11-09
申请人： Karl-Heinz Schuster , Christian Wagner , Martin Schriever
发明人： Karl-Heinz Schuster , Christian Wagner , Martin Schriever
IPC分类号： G02B19/00 , G02B5/30 , G02B17/08 , G02B27/28 , G03F7/20 , G03F9/00 , H01L21/027 , G03B27/54
CPC分类号： G02B17/0892 , G02B17/08 , G02B27/28 , G03B27/72 , G03F7/70125 , G03F7/70225 , G03F7/70566
摘要： A method and an arrangement for microlithographic projection exposure at high aperture achieve a contrast increase by the polarization of the light perpendicular to the plane of incidence on the resist. Arrangements are provided which influence the tangential polarization or the linear polarization adapted to the dipole illumination in the illuminating system and in the reduction objective.

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