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    • 31. 发明申请
    • Liquid crystal display device having an improved aperture ratio and method for fabricating the same
    • 具有改善的开口率的液晶显示装置及其制造方法
    • US20030090608A1
    • 2003-05-15
    • US10134694
    • 2002-04-30
    • LG. Philips LCD Co., Ltd.
    • Gi-Hong KimHyung-Ki Hong
    • G02F001/1333
    • G02F1/136209G02F2001/133757
    • A liquid crystal display device includes first and second substrates facing and spaced apart from each other, a common electrode on an inner surface of the first substrate, a gate line on an inner surface of the second substrate, a data line crossing the gate line, a switching device connected to the gate and data lines, a first pixel electrode connected to the switching device and spaced apart from the data line, a black matrix covering the data line and having a first portion width extending from a center line of the data line to a first edge of the black matrix, and a second portion width different from the first portion width extending from the center line of the data line to a second edge of the black matrix opposite to the first edge of the black matrix, and a liquid crystal material layer interposed between the first pixel electrode and common electrode.
    • 液晶显示装置包括彼此面对并彼此分开的第一和第二基板,第一基板的内表面上的公共电极,第二基板的内表面上的栅极线,与栅极线交叉的数据线, 连接到栅极和数据线的开关装置,连接到开关装置并与数据线间隔开的第一像素电极,覆盖数据线的黑矩阵,并具有从数据线的中心线延伸的第一部分宽度 到与黑矩阵的第一边缘不同的第二部分宽度,以及从数据线的中心线延伸到与黑矩阵的第一边缘相反的黑矩阵的第二边缘的第一部分宽度的第二部分宽度,以及液体 晶体材料层插入在第一像素电极和公共电极之间。
    • 32. 发明申请
    • Direct-type back light device
    • 直型背光装置
    • US20030086261A1
    • 2003-05-08
    • US10180464
    • 2002-06-27
    • LG. Philips LCD Co., Ltd.
    • Jeong Min MoonJu Young Bang
    • F21V001/00
    • H01J5/50F21V19/009G02F1/133604G02F1/133608
    • A direct type back light device includes a plurality of luminescent lamps, each having first and second opposite ends, first and second lower supports separated at a constant interval corresponding to a length of each of the luminescent lamps, the first and second lower supports each have a plurality of grooves for receiving one of the first and second opposite ends of the luminescent lamps to fix and support the luminescent lamps in parallel and conductive layers for supplying power to the luminescent lamps, and first and second upper supports formed to oppose the first and second lower supports, each of the first and second upper supports having grooves and conductive layers corresponding to the grooves and conductive layers of the first and second lower supports.
    • 直接型背光装置包括多个发光灯,每个发光灯具有第一和第二相对端,第一和第二下支撑件以对应于每个发光灯的长度的恒定间隔分开,第一和第二下支撑件各自具有 多个槽,用于接收发光灯的第一和第二相对端之一,以平行地固定和支撑发光灯,并将导电层用于向发光灯供电;以及第一和第二上支撑件,其形成为与第一和 第二下支撑件,每个第一和第二上支撑件具有对应于第一和第二下支撑件的凹槽和导电层的凹槽和导电层。
    • 36. 发明申请
    • Method for fabricating thin film transistor-liquid crystal display
    • 薄膜晶体管液晶显示器的制造方法
    • US20020192883A1
    • 2002-12-19
    • US10029388
    • 2001-12-28
    • LG. PHILIPS LCD CO., LTD.
    • Hyung Chan LeeYoun Bo LeeGi Bum ParkII Nam SongBeung Hwa Jeong
    • H01L021/00
    • G02F1/13458G02F1/136204G02F1/136227
    • A method for fabricating thin film transistor-LCD is disclosed, wherein a pixel electrode and a gate metal in a cutting region of a pad part can be eliminated through two steps of etching in the same process. In a method for fabricating an LCD device provided with an active region where a plurality of gate lines are arranged to cross a plurality of data lines so as to define a pixel region, and a cutting region between a pad part of the gate line and a shorting bar, the method includes the steps of a first stage of forming gate line including a gate electrode in the active region on a substrate and forming a gate metal pattern for connecting the gate line and the shorting bar in the cutting region; a second stage of forming an insulating film on the entire surface of the active and cutting regions; a third stage of forming a TFT provided with source and drain electrodes in the active region; a fourth stage of depositing a passivation film on the entire surface of the active region and forming a contact hole at a drain electrode of the TFT and the gate metal pattern; a fifth stage of forming a transparent electrode for electrically connecting to the drain electrode through contact hole; a sixth stage of selectively etching the transparent electrode so that only a pixel electrode remains in the active region and the gate metal pattern is exposed in the cutting region; and a seventh stage of eliminating the gate metal pattern.
    • 公开了一种用于制造薄膜晶体管-LCD的方法,其中可以通过在相同工艺中的两个蚀刻步骤来消除焊盘部分的切割区域中的像素电极和栅极金属。 在制造具有有源区域的LCD器件的方法中,其中多个栅极线布置成跨越多个数据线以限定像素区域,并且栅极线的焊盘部分和栅极线之间的切割区域 该方法包括以下步骤:在基板上的有源区域中形成栅极线的第一阶段,并形成用于连接切割区域中的栅极线和短路棒的栅极金属图案; 在活动和切割区域的整个表面上形成绝缘膜的第二阶段; 在有源区中形成设置有源极和漏极的TFT的第三阶段; 第四阶段在有源区的整个表面上沉积钝化膜,并在TFT和栅极金属图案的漏电极处形成接触孔; 形成用于通过接触孔电连接到漏电极的透明电极的第五阶段; 选择性地蚀刻透明电极的第六阶段,使得只有像素电极保留在有源区域中,并且栅极金属图案在切割区域中露出; 以及消除栅极金属图案的第七阶段。
    • 37. 发明申请
    • Laser annealing apparatus
    • 激光退火装置
    • US20020185059A1
    • 2002-12-12
    • US10211570
    • 2002-08-05
    • LG Philips LCD Co. Ltd.
    • Yun-Ho Jung
    • C30B023/00C30B025/00C30B028/12
    • C30B29/06C30B13/24Y10S117/90Y10T117/10
    • A laser annealing apparatus for sequential lateral solidification (SLS) to uniformly crystallize silicon on an entire silicon substrate by minimizing the dislocation of the silicon substrate during laser beam irradiation is disclosed. During the laser annealing, a vacuum chuck holds the silicon substrate on a movable stage. The device includes a laser source, an optical system patterning the shape and energy of a laser beam irradiated from the laser source, a vacuum chuck supporting a silicon substrate, and a movable stage supporting the vacuum chuck as well as transferring the vacuum chuck in a predetermined direction. Accordingly, the apparatus improves the degree of crystallization because it is able to uniformly carry out SLS on an entire surface of the silicon substrate.
    • 公开了一种用于顺序侧向固化(SLS)的激光退火装置,以通过在激光束照射期间使硅衬底的位错最小化来在整个硅衬底上均匀地结晶硅。 在激光退火期间,真空吸盘将硅衬底保持在可动台上。 该装置包括激光源,对从激光源照射的激光束的形状和能量进行图案化的光学系统,支撑硅基板的真空卡盘以及支撑真空卡盘的可移动台以及将真空卡盘传送到 预定方向。 因此,由于能够在硅基板的整个表面均匀地进行SLS,所以能够提高结晶度。
    • 38. 发明申请
    • Etchant for patterning indium tin oxide and method of fabricating liquid crystal display device using the same
    • 用于图案化氧化铟锡的蚀刻剂和使用其制造液晶显示装置的方法
    • US20020164888A1
    • 2002-11-07
    • US10138639
    • 2002-05-06
    • LG. Philips LCD Co., Ltd.
    • Byung Tae RohYou Shin Ahn
    • H01L021/302H01L021/461
    • H01L31/1884C09K13/06G02F1/13439H01L27/124Y02E10/50
    • An etchant for patterning indium tin oxide, wherein the etchant is a mixed solution of HCl, CH3COOH, and water, and a method of fabricating a liquid crystal display device are disclosed in the present invention. The method includes forming a gate electrode on a substrate, forming a gate insulating layer and an amorphous silicon layer on the gate electrode including the substrate, forming an active area by patterning the amorphous silicon layer, forming a source electrode and a drain electrode on the active area, forming a passivation layer on the source electrode and the drain electrode and the gate insulating layer, forming a contact hole exposing a part of the drain electrode, forming an indium tin oxide layer on the passivation layer, and forming an indium tin oxide electrode by selectively etching the indium tin oxide layer using a mixed solution of HCl, CH3COOH, and water as an etchant.
    • 在本发明中公开了用于图案化铟锡氧化物的蚀刻剂,其中所述蚀刻剂是HCl,CH 3 COOH和水的混合溶液,以及制造液晶显示装置的方法。 该方法包括在衬底上形成栅电极,在包括衬底的栅电极上形成栅极绝缘层和非晶硅层,通过图案化非晶硅层形成有源区,形成源电极和漏电极 在源电极和漏电极以及栅极绝缘层上形成钝化层,形成露出一部分漏电极的接触孔,在钝化层上形成氧化铟锡层,形成氧化铟锡 通过使用HCl,CH 3 COOH和水的混合溶液作为蚀刻剂选择性地蚀刻氧化铟锡层。