专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

31. 发明申请

US20080203881A1 Micro-Column With Simple Structure 有权
标题翻译：微柱结构简单
公开(公告)号：US20080203881A1
公开(公告)日：2008-08-28
申请号：US11915679
申请日：2006-05-29
申请人： Ho Seob Kim , Byeng Jin
发明人： Ho Seob Kim , Byeng Jin
IPC分类号： H01J1/00 , H01K1/30
CPC分类号： H01J3/18 , H01J3/26 , H01J37/12 , H01J2237/0492 , H01J2237/1205
摘要： The present invention relates to an electron column including an electron emission source and lenses, and, more particularly, to an electron column having a structure that can facilitate the alignment and assembly of an electron emission source and lenses. The electron column having an electron emission source and a lens unit according to the present invention is characterized in that the lens unit includes two or more lens layers and performs both a source lens function and a focusing function. Furthermore, the electron column is characterized in that the lens unit includes one or more deflector-type lens layers and additionally performs a deflector function.
摘要翻译：本发明涉及包括电子发射源和透镜的电子柱，更具体地说，涉及具有能够促进电子发射源和透镜的对准和组装的结构的电子柱。具有根据本发明的电子发射源和透镜单元的电子柱的特征在于，透镜单元包括两个或更多个透镜层，并且执行源透镜功能和聚焦功能。此外，电子柱的特征在于，透镜单元包括一个或多个偏转器型透镜层，并且另外执行偏转器功能。

32. 发明授权

US07394071B2 Micro column electron beam apparatus formed in low temperature co-fired ceramic substrate 失效
标题翻译：微柱电子束装置形成于低温共烧陶瓷基片中
公开(公告)号：US07394071B2
公开(公告)日：2008-07-01
申请号：US11260025
申请日：2005-10-24
申请人： Dae Jun Kim , Jin Woo Jeong , Sang Kuk Choi , Dae Yong Kim , Ho Seob Kim
发明人： Dae Jun Kim , Jin Woo Jeong , Sang Kuk Choi , Dae Yong Kim , Ho Seob Kim
IPC分类号： H01J37/304
CPC分类号： H01J37/3177 , B82Y10/00 , B82Y40/00 , H01J37/1477 , H01J2237/03 , H01J2237/1205
摘要： A micro column electron beam apparatus having a reduced number of interconnections is provided. The micro column electron beam apparatus includes: a low temperature co-fired ceramic (LTCC) substrate; a plurality of deflector electrodes attached to a predetermined top portion of the LTCC substrate; a pad electrode placed at a top edge of the LTCC substrate and transmitting an external signal to the deflector electrodes; and a connection unit placed in the LTCC substrate and electrically connecting the deflector electrode and the pad electrode.
摘要翻译：提供了具有减少数量的互连的微型列电子束装置。微柱电子束装置包括：低温共烧陶瓷（LTCC）基板; 多个偏转器电极，附着到LTCC衬底的预定顶部; 放置在LTCC衬底的顶部边缘处并将外部信号传输到偏转器电极的焊盘电极; 以及连接单元，其放置在LTCC基板中并电连接偏转器电极和焊盘电极。

33. 发明授权

US06369385B1 Integrated microcolumn and scanning probe microscope arrays 失效
标题翻译：集成微柱和扫描探针显微镜阵列
公开(公告)号：US06369385B1
公开(公告)日：2002-04-09
申请号：US09305975
申请日：1999-05-05
申请人： Lawrence P. Muray , Ho-Seob Kim , T. H. Philip Chang
发明人： Lawrence P. Muray , Ho-Seob Kim , T. H. Philip Chang
IPC分类号： H01J3728
CPC分类号： G01Q30/02 , H01J37/28 , H01J37/3174 , H01J2237/1205 , H01J2237/2818 , Y10S977/707 , Y10S977/849 , Y10S977/86 , Y10S977/869 , Y10S977/874 , Y10S977/881 , Y10S977/887
摘要： An apparatus for surface inspection and processing of a wafer includes a microcolumn and an associated scanning probe microscope. The microcolumn enables high speed scanning of the wafer at a relatively high resolution, while the scanning probe microscope provides atomic resolution of highly localized areas of the wafer. The microcolumn and scanning probe microscope can be partially fabricated out of the same substrate. Additionally, the microcolumn and scanning probe microscope can be a portion of an array of microcolumns and/or scanning probe microscopes. The apparatus may be used for imaging, lithography and spectroscopy.
摘要翻译：用于表面检查和处理晶片的装置包括微柱和相关联的扫描探针显微镜。微柱可以以相对高的分辨率高速扫描晶片，而扫描探针显微镜提供晶片的高度局部化区域的原子分辨率。微柱和扫描探针显微镜可以由相同的基底部分制成。另外，微柱和扫描探针显微镜可以是微柱阵列和/或扫描探针显微镜的一部分。该装置可用于成像，光刻和光谱学。

34. 发明授权

US06195214B1 Microcolumn assembly using laser spot welding 失效
标题翻译：使用激光点焊的微柱组件
公开(公告)号：US06195214B1
公开(公告)日：2001-02-27
申请号：US09364822
申请日：1999-07-30
申请人： Lawrence Peter Muray , Kim Y. Lee , Stephen A. Rishton , Ho-Seob Kim , Tai-Hon Philip Chang
发明人： Lawrence Peter Muray , Kim Y. Lee , Stephen A. Rishton , Ho-Seob Kim , Tai-Hon Philip Chang
IPC分类号： G02B702
CPC分类号： H01J37/12 , H01J9/18 , H01J2237/1205
摘要： A method for forming microcolumns in which laser spot welding bonds the multiple layers of an electron beam microcolumn. A silicon microlens is laser spot welded to a glass insulation layer by focusing a laser through the insulation layer onto the silicon microlens. The glass layer is transparent to the laser, allowing all of the energy to be absorbed by the silicon. This causes the silicon to heat, which, in turn, heats the adjacent surface of the glass insulation layer creating a micro-weld between the silicon and glass. The insulation layer includes a portion which protrudes beyond the edge of the first microlens so that when a second microlens is attached to the opposite side of the insulation layer, the second microlens can be laser spot welded to the protruding portion of the insulation layer by focusing a laser through the protruding portion of the insulation layer to heat the second microlens.
摘要翻译：一种形成微柱的方法，其中激光点焊结合电子束微柱的多层。将硅微透镜通过将激光通过绝缘层聚焦到硅微透镜上而被激光点焊到玻璃绝缘层。玻璃层对于激光是透明的，允许所有的能量被硅吸收。这导致硅加热，这进而加热玻璃绝缘层的相邻表面，从而在硅和玻璃之间形成微焊缝。绝缘层包括突出超过第一微透镜的边缘的部分，使得当第二微透镜附着到绝缘层的相对侧时，第二微透镜可以通过聚焦被激光点焊到绝缘层的突出部分激光穿过绝缘层的突出部分以加热第二微透镜。

35. 发明申请

US20160268929A1 Micro Stage using piezo elements 有权
标题翻译：微型舞台使用压电元件
公开(公告)号：US20160268929A1
公开(公告)日：2016-09-15
申请号：US14657234
申请日：2015-03-13
申请人： Ho Seob KIM , Byeng Jin KIM , Do Jin SEONG
发明人： Ho Seob KIM , Byeng Jin KIM , Do Jin SEONG
IPC分类号： H02N2/02 , H01J37/10 , H01J37/26 , H01J37/20
CPC分类号： H01J37/261 , H01J37/10 , H01J37/20 , H01J37/28 , H01J2237/10 , H01J2237/20207 , H01J2237/20228 , H01J2237/20235 , H01J2237/20264 , H01J2237/2602 , H02N2/006 , H02N2/026
摘要： Disclosed herein is a micro stage using a piezoelectric element that can be reliably operated even in a vacuum environment. In a particle column requiring a high precision, for example, a microelectronic column, the micro stage can be used as a stage with micro or nano degree precision for alignment of parts of the column, or for moving a sample, and so on.
摘要翻译：这里公开了使用即使在真空环境中也可靠地运行的压电元件的微型平台。在需要高精度的微粒子柱（例如微电子柱）中，微型载物台可以用作具有微量级或纳米级精度的阶段，用于校准塔的部分或用于移动样品等。

36. 发明申请

US20160247659A1 Electrostatic Quadrupole Deflector for Microcolumn 有权
标题翻译：微柱静电四极杆偏转器
公开(公告)号：US20160247659A1
公开(公告)日：2016-08-25
申请号：US14631330
申请日：2015-02-25
申请人： Tae Sik OH , Ho Seob KIM , Dae Wook KIM
发明人： Tae Sik OH , Ho Seob KIM , Dae Wook KIM
IPC分类号： H01J37/147 , H01J37/26 , H01J37/073
CPC分类号： H01J37/1477 , H01J9/02 , H01J37/073 , H01J37/26 , H01J2237/04924 , H01J2237/1516
摘要： Disclosed is an electrostatic quadrupole deflector for a microcolumn. The deflector includes an electron beam passage hole, deflecting electrodes to which a deflection voltage is applied, and floating electrodes to which the deflection voltage is not applied. The deflector is structurally stable and has a simple driving system. The deflector has good performance and characteristics.
摘要翻译：公开了用于微柱的静电四极偏转器。偏转器包括电子束通过孔，施加偏转电压的偏转电极和不施加偏转电压的浮动电极。导流板结构稳定，驱动系统简单。导流板具有良好的性能和特点。

37. 发明申请

US20140209813A1 MULTI-PARTICLE BEAM COLUMN HAVING AN ELECTRODE LAYER INCLUDING AN ECCENTRIC APERTURE 有权
标题翻译：具有电极层的多颗粒束柱，包括偏心孔
公开(公告)号：US20140209813A1
公开(公告)日：2014-07-31
申请号：US13752040
申请日：2013-01-28
申请人： Ho Seob Kim , Dae Wook Kim , Seung Jun Ahn , Tae Sik Oh
发明人： Ho Seob Kim , Dae Wook Kim , Seung Jun Ahn , Tae Sik Oh
IPC分类号： G21K1/08
CPC分类号： G21K5/04 , H01J37/045 , H01J37/28 , H01J2237/045 , H01J2237/15 , H01J2237/30483
摘要： Disclosed herein is a multi-particle beam column including electrode layer with eccentric apertures. The multi-particle beam column includes two or more particle beam columns each comprising a particle beam emission source, a deflector, and two or more electrode layers. The multi-particle beam column includes at least one electrode layer having one or more apertures that are eccentric from respective beam optical axes of the particle beam columns.
摘要翻译：本文公开了包括具有偏心孔的电极层的多粒子束柱。多粒子束柱包括两个或更多个粒子束柱，每个粒子束柱包括粒子束发射源，偏转器和两个或更多个电极层。多粒子束柱包括至少一个具有一个或多个孔的至少一个电极层，所述孔径与颗粒束柱的各个光束轴线偏心。

38. 发明授权

US08044351B2 Micro-column with simple structure 有权
标题翻译：微柱结构简单
公开(公告)号：US08044351B2
公开(公告)日：2011-10-25
申请号：US11915679
申请日：2006-05-29
申请人： Ho Seob Kim , Byeng Jin Kim
发明人： Ho Seob Kim , Byeng Jin Kim
IPC分类号： G21K5/04
CPC分类号： H01J3/18 , H01J3/26 , H01J37/12 , H01J2237/0492 , H01J2237/1205
摘要： The present invention relates to an electron column including an electron emission source and lenses, and, more particularly, to an electron column having a structure that can facilitate the alignment and assembly of an electron emission source and lenses. The electron column having an electron emission source and a lens unit according to the present invention is characterized in that the lens unit includes two or more lens layers and performs both a source lens function and a focusing function. Furthermore, the electron column is characterized in that the lens unit includes one or more deflector-type lens layers and additionally performs a deflector function.
摘要翻译：本发明涉及包括电子发射源和透镜的电子柱，更具体地说，涉及具有能够促进电子发射源和透镜的对准和组装的结构的电子柱。具有根据本发明的电子发射源和透镜单元的电子柱的特征在于，透镜单元包括两个或更多个透镜层，并且执行源透镜功能和聚焦功能。此外，电子柱的特征在于，透镜单元包括一个或多个偏转器型透镜层，并且另外执行偏转器功能。

39. 发明授权

US07902521B2 Method for focusing electron beam in electron column 有权
标题翻译：电子束聚焦电子束的方法
公开(公告)号：US07902521B2
公开(公告)日：2011-03-08
申请号：US12096095
申请日：2006-12-05
申请人： Ho Seob Kim , Seung Joon Ahn , Dae Wook Kim , Young Chul Kim
发明人： Ho Seob Kim , Seung Joon Ahn , Dae Wook Kim , Young Chul Kim
IPC分类号： H01J37/06 , H01J37/12
CPC分类号： H01J37/12 , B82Y10/00 , B82Y40/00 , H01J37/3174
摘要： The present invention relates to a method for improving focusing in an electron column that generates an electron beam. The method for controlling the focusing of an electron beam in according to the present invention reduces the spot size of the electron beam when the electron beam reaches a specimen, so that resolution can be increased and the line width of a pattern in a semiconductor lithography process can be reduced, with the result that the performance of the electron can be improved.
摘要翻译：本发明涉及一种改善产生电子束的电子束聚焦的方法。根据本发明的用于控制电子束的聚焦的方法当电子束到达样本时减小了电子束的光斑尺寸，从而可以提高分辨率，并且半导体光刻工艺中的图案的线宽可以减少，结果可以提高电子的性能。

40. 发明申请

US20100148656A1 ELECTRON COLUMN USING CNT-TIP AND METHOD FOR ALIGNMENT OF CNT-TIP 审中-公开
标题翻译：使用CNT-TIP的电子柱和用于对准CNT-TIP的方法
公开(公告)号：US20100148656A1
公开(公告)日：2010-06-17
申请号：US12600331
申请日：2008-05-28
申请人： Ho Seob Kim
发明人： Ho Seob Kim
IPC分类号： H01J1/304
CPC分类号： H01J37/073 , H01J1/14 , H01J1/304 , H01J9/025 , H01J2201/30469 , H01J2237/06341 , H01J2237/26
摘要： The present invention relates to an electron column using an electron emission source, to which one or more carbon nanotubes (CNTs) are attached, in an electron column structure including an electron emission source and lenses. More particularly, the present invention relates to a method of easily aligning a carbon nanotube (CNT) tip, and an electron column capable of using the method.
摘要翻译：本发明涉及一种使用电子发射源的电子柱，其中一个或多个碳纳米管（CNT）被附着在包括电子发射源和透镜的电子柱结构中。更具体地说，本发明涉及容易对准碳纳米管（CNT）尖端的方法和能够使用该方法的电子柱。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式