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31. 发明专利

JP2000077320A Method and apparatus for plotting rotating symmetric diagram 有权
标题翻译：旋转对称图的方法和装置
公开(公告)号：JP2000077320A
公开(公告)日：2000-03-14
申请号：JP25921698
申请日：1998-08-31
申请人： Kuresutetsuku:Kk , 株式会社クレステック
发明人： MIYAZAKI TAKESHI , HAYASHI KUNIHITO , KOBAYASHI KAZUHIKO , OI HIDEYUKI
IPC分类号： H01J37/305 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To simplify pattern data and improve accuracy in plotting, when a rotating symmetric diagram (radius L) made up of the same pattern repeated M times is plotted.
SOLUTION: A method for plotting a symmetric diagram includes a step for forming pattern data of each diagram, a step for calculating an M-times filed shifting position on a sample stage on the basis of pattern data L and M, moving the sample stage sequentially in an x-y rectangular coordinate system, and moving the field sequentially to this position, a step for plotting the base field by using the data pattern, and a step for plotting an N-th field (N=1 to M) from the base filed by causing the base field at an angle of (360/M)×N to be rotated, where second field, third field,... to M-th field are sequentially plotted from the base field.
COPYRIGHT: (C)2000,JPO
摘要翻译：要解决的问题：绘制由重复M次的相同图案构成的旋转对称图（半径L）时，为了简化图案数据并提高绘图精度。解决方案：用于绘制对称图的方法包括用于形成每个图的图案数据的步骤，基于图案数据L和M在样本台上计算M次归位移位位置的步骤，顺序地移动样本台在xy直角坐标系中，并且将场依次移动到该位置，通过使用数据模式来绘制基场的步骤，以及从基本场地绘制第N个场（N = 1到M）的步骤通过使基场以（360 / M）×N的角度旋转，其中从基场顺序绘制第二场，第三场，...至第M场。

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