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    • 33. 发明授权
    • Synchronous raster scanning lithographic system
    • 同步光栅扫描光刻系统
    • US07425713B2
    • 2008-09-16
    • US11331545
    • 2006-01-13
    • David Beaulieu
    • David Beaulieu
    • G03F9/00G21K5/10
    • H01J37/3177B82Y10/00B82Y40/00G03F7/70383G03F7/70391G03F7/704H01J2237/31774
    • A multi-beam synchronous raster scanning lithography system includes a processor that generates electrical signals representing a desired exposure pattern at an output. A multi-beam source of exposing radiation generates a plurality of exposure beam. A beam modulator receives the electrical signals generated by the processor and modulates the plurality of exposing beams according to the desired exposure pattern. A beam deflector deflects the plurality of exposure beams by a predetermined distance along a first axis, thereby exposing a plurality of pixels along the first axis with the desired exposure pattern. A translation stage moves the substrate a predetermined distance along a second axis to position the substrate for a subsequent exposure of pixels along the first axis that results in a desired overlapping exposure dose profile.
    • 多光束同步光栅扫描光刻系统包括在输出处产生表示期望曝光图案的电信号的处理器。 曝光辐射的多光束源产生多个曝光光束。 光束调制器接收由处理器产生的电信号,并根据期望的曝光图案调制多个曝光光束。 光束偏转器沿着第一轴将多个曝光光束偏转预定距离,从而以期望的曝光图案沿着第一轴露出多个像素。 平移台沿着第二轴移动衬底预定距离以定位衬底,以便随后沿着第一轴曝光像素,导致期望的重叠曝光剂量分布。
    • 34. 发明授权
    • Microchannel amplifier with tailored pore resistance
    • 微通道放大器具有定制的孔隙电阻
    • US07408142B2
    • 2008-08-05
    • US11532008
    • 2006-09-14
    • David R. BeaulieuHarry F. LockwoodAnton S. Tremsin
    • David R. BeaulieuHarry F. LockwoodAnton S. Tremsin
    • H01J40/14
    • H01J29/023H01J43/246
    • A microchannel amplifier includes an insulating substrate that defines at least one microchannel pore through the substrate from an input surface to an output surface. A conductive layer is formed on an outer surface of the at least one microchannel pore that has a non-uniform resistance as a function of distance through the at least one microchannel pore. The non-uniform resistance is selected to simulate saturation by reducing gain as a function of input current and bias voltage compared with uniform resistance. A first and second electrode is deposited on a respective one of the input and the output surfaces of the insulating substrate. The microchannel amplifier amplifying emissions propagating through the at least one microchannel pore when the first and second electrodes are biased.
    • 微通道放大器包括绝缘基板,其从输入表面到输出表面限定穿过基板的至少一个微通道孔。 在所述至少一个微通道孔的外表面上形成导电层,所述微通道孔具有通过所述至少一个微通道孔的距离的函数的不均匀电阻。 选择非均匀电阻来模拟饱和,通过减小作为输入电流和偏置电压的函数的增益与均匀电阻相比。 第一和第二电极沉积在绝缘基板的输入和输出表面中的相应一个上。 当第一和第二电极偏置时,微通道放大器放大通过至少一个微通道孔传播的发射。
    • 37. 发明公开
    • IMAGE INTENSIFYING DEVICE
    • BILDVERSTÄRKERVORRICHTUNG
    • EP2274762A4
    • 2011-07-27
    • EP09731342
    • 2009-04-09
    • ARRADIANCE INC
    • SULLIVAN NEAL TTREMSIN ANTONSTENTON KENDE ROUFFIGNAC PHILIPPE
    • H01J31/50
    • H01J31/507H01J43/246H01J2231/5016
    • An image intensifying device includes a lens that is positioned at a light input that forms an image of a scene. The image intensifying device also includes an image intensifier tube that includes a photocathode that is positioned to receive the image formed by the lens. The photocathode generates photoelectrons in response to the light image of the scene. The image intensifier tube also includes a microchannel plate having an input surface comprising the photocathode. The microchannel plate receives the photoelectrons generated by the photocathode and generating secondary electrons. An electron detector receives the secondary electrons generated by the microchannel plate and generates an intensified image of the scene.
    • 图像增强装置包括位于形成场景图像的光输入处的透镜。 图像增强装置还包括图像增强管,其包括被定位成接收由透镜形成的图像的光电阴极。 光电阴极响应于场景的光图像而产生光电子。 图像增强管还包括具有包括光电阴极的输入表面的微通道板。 微通道板接收由光电阴极产生的光电子并产生二次电子。 电子检测器接收由微通道板产生的二次电子并产生场景的增强图像。