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21. 发明申请

US20110085152A1 Vibration control apparatus, vibration control method, exposure apparatus, and device manufacturing method 审中-公开
标题翻译：振动控制装置，振动控制方法，曝光装置和装置的制造方法
公开(公告)号：US20110085152A1
公开(公告)日：2011-04-14
申请号：US12775022
申请日：2010-05-06
申请人： Hideaki Nishino , Hiroshi Shirasu
发明人： Hideaki Nishino , Hiroshi Shirasu
IPC分类号： G03B27/58 , F16F7/00 , G03F7/20
CPC分类号： G03F7/709 , F16F15/046
摘要： A vibration control apparatus suppresses a vibration of a structure which is vibrated. The vibration control apparatus includes: a vibration isolation apparatus that supports the structure and suppresses a transmission of a vibration to the structure, the vibration having an amplitude equal to or less than a first amplitude in a predetermined direction; and a damping apparatus that damps a vibration of the structure vibrating in the predetermined vibration direction with a second amplitude larger than the first amplitude, to thereby reduce the vibration to equal to or less than the first amplitude.
摘要翻译：振动控制装置抑制振动的结构的振动。所述振动控制装置包括：振动隔离装置，其支撑所述结构并抑制对所述结构的振动的传递，所述振动的振幅等于或小于在预定方向上的第一幅度; 以及阻尼装置，其以比第一振幅大的第二振幅来抑制在预定振动方向上振动的结构的振动，从而将振动减小到等于或小于第一振幅。

22. 发明申请

US20060238729A1 Exposure apparatus, optical projection apparatus and a method for adjusting the optical projection apparatus 失效
标题翻译：曝光装置，光学投影装置和调整光学投影装置的方法
公开(公告)号：US20060238729A1
公开(公告)日：2006-10-26
申请号：US11471658
申请日：2006-06-21
申请人： Masashi Tanaka , Masato Kumazawa , Kinya Kato , Masaki Kato , Hiroshi Chiba , Hiroshi Shirasu
发明人： Masashi Tanaka , Masato Kumazawa , Kinya Kato , Masaki Kato , Hiroshi Chiba , Hiroshi Shirasu
IPC分类号： G03B27/42
CPC分类号： G02B17/0892 , G02B13/22 , G02B17/002 , G02B17/008 , G02B17/045 , G02B17/0605 , G02B17/08 , G02B17/0812 , G02B17/082 , G02B17/0828 , G02B17/086 , G02B27/144 , G02B27/145 , G03B27/32 , G03F7/70066 , G03F7/70216 , G03F7/70225 , G03F7/70241 , G03F7/70275 , G03F7/70358 , G03F7/70791
摘要： An exposure apparatus includes a plurality of projection optical systems, each of which has optical elements arranged in an optical path between a first surface and a second surface and forms a radiation pattern from the first surface onto an exposure field on the second surface via the optical elements. The apparatus also includes a movable portion disposed in the side of the second surface with respect to the plurality of projection optical systems, which holds an object to be moved relative to the exposure field in a first direction during a scanning exposure of the object with the radiation patterns. Each of the plurality of projection optical systems is telecentric on the side of the second surface, and the exposure fields are arranged at different positions in a second direction crossing the first direction.
摘要翻译：曝光装置包括多个投影光学系统，每个投影光学系统具有布置在第一表面和第二表面之间的光路中的光学元件，并且通过光学器件从第一表面形成辐射图案到第二表面上的曝光场元素。所述装置还包括相对于所述多个投影光学系统设置在所述第二表面的侧面中的可移动部分，所述多个投影光学系统在所述物体与所述投影光学系统的扫描曝光期间在第一方向上相对于所述曝光场保持要移动的物体辐射图。多个投影光学系统中的每一个在第二表面的一侧是远心的，并且曝光区域在与第一方向交叉的第二方向上布置在不同的位置。

23. 发明授权

US06811953B2 Exposure apparatus, method for manufacturing therof, method for exposing and method for manufacturing microdevice 有权
标题翻译：曝光装置，制造方法，曝光方法以及制造微型装置的方法
公开(公告)号：US06811953B2
公开(公告)日：2004-11-02
申请号：US09861698
申请日：2001-05-22
申请人： Hitoshi Hatada , Masaki Kato , Motoo Koyama , Hiroshi Shirasu , Masahiro Iguchi
发明人： Hitoshi Hatada , Masaki Kato , Motoo Koyama , Hiroshi Shirasu , Masahiro Iguchi
IPC分类号： G01B1100
CPC分类号： G03F9/7026 , G03F7/70275 , G03F7/70358
摘要： The memory unit stores the correlation of the positional change in the image planes of the projection optical modules in the focusing direction and the light quantity change. The image plane position determination unit finds the positional change value of the image planes of the projection optical modules based on the correlation information that is stored in the memory unit and the information on changes in the amount of light that is emitted to the projection optical modules. The compensation value calculating unit calculates the compensation value corresponding to the change in the amount of curvature in the image planes of the projection optical modules. The compensating unit compensates the change value in conformity with the compensation value. The focus compensation optical system is driven based on the change value that is compensated.
摘要翻译：存储单元存储投影光学模块在聚焦方向上的图像平面中的位置变化与光量变化的相关性。图像平面位置确定单元基于存储在存储单元中的相关信息和关于发射到投影光学模块的光量变化的信息，找出投影光学模块的图像平面的位置变化值。补偿值计算单元计算与投影光学模块的图像平面中的曲率量的变化相对应的补偿值。补偿单元根据补偿值补偿变化值。基于补偿的变化值驱动聚焦补偿光学系统。

24. 发明授权

US06556278B1 Exposure/imaging apparatus and method in which imaging characteristics of a projection optical system are adjusted 失效
标题翻译：调整投影光学系统的成像特性的曝光/成像装置和方法
公开(公告)号：US06556278B1
公开(公告)日：2003-04-29
申请号：US09722516
申请日：2000-11-28
申请人： Masashi Tanaka , Masato Kumazawa , Kinya Kato , Masaki Kato , Hiroshi Chiba , Hiroshi Shirasu
发明人： Masashi Tanaka , Masato Kumazawa , Kinya Kato , Masaki Kato , Hiroshi Chiba , Hiroshi Shirasu
IPC分类号： G03B2754
CPC分类号： G02B17/0892 , G02B13/22 , G02B17/002 , G02B17/008 , G02B17/045 , G02B17/0605 , G02B17/08 , G02B17/0812 , G02B17/082 , G02B17/0828 , G02B17/086 , G02B27/144 , G02B27/145 , G03B27/32 , G03F7/70066 , G03F7/70216 , G03F7/70225 , G03F7/70241 , G03F7/70275 , G03F7/70358 , G03F7/70791
摘要： An exposure/imaging apparatus and method effects projection exposure while moving a first object and a second object in a predetermined moving direction, effecting projection exposure of an image of the first object onto the second object. An adjusting member is used to adjust imaging characteristics of a projection optical system that is used to perform the projection exposure.
摘要翻译：曝光/成像装置和方法在预定的移动方向上移动第一物体和第二物体时实现投影曝光，从而将第一物体的图像投射到第二物体上。调整构件用于调整用于进行投影曝光的投影光学系统的成像特性。

25. 发明授权

US06266131B1 Exposure apparatus 有权
标题翻译：曝光装置
公开(公告)号：US06266131B1
公开(公告)日：2001-07-24
申请号：US09309709
申请日：1999-05-11
申请人： Tomohide Hamada , Hiroshi Shirasu
发明人： Tomohide Hamada , Hiroshi Shirasu
IPC分类号： G03B2742
CPC分类号： G03F7/70691 , G02F1/1303 , G03B27/58 , G03F7/70358
摘要： A method of transferring a pattern of a mask onto an object through a projection system, includes the steps of providing a carriage having a mask holder surface adapted to hold the mask in a position which is angularly displaced from a horizontal position by a predetermined angle and an object holder surface adapted to the object in a position which is angularly displaced from the horizontal position by the predetermined angle, the carriage being movable in a first direction; transferring the pattern onto the object, the projection system being located between the mask and the object during the transfer operation; moving the carriage so that the projection system comes to a position out of a place between the mask holder surface and the object holder surface; and conveying the object from the object holder surface.
摘要翻译：通过投影系统将掩模图案转印到物体上的方法包括以下步骤：提供具有掩模保持器表面的托架，所述托架表面适于将掩模保持在与水平位置成角度地移位预定角度的位置，以及所述物体保持器表面适于在与所述水平位置成角度地移位预定角度的位置处，所述托架能够沿第一方向移动; 将图案转移到物体上，投影系统在转印操作期间位于掩模和物体之间; 移动滑架使得投影系统进入位于掩模保持器表面和物体保持器表面之间的位置; 并从物体保持器表面传送物体。

26. 发明授权

US5729331A Exposure apparatus, optical projection apparatus and a method for adjusting the optical projection apparatus 失效
公开(公告)号：US5729331A
公开(公告)日：1998-03-17
申请号：US453538
申请日：1995-05-30
申请人： Masashi Tanaka , Masato Kumazawa , Kinya Kato , Masaki Kato , Hiroshi Chiba , Hiroshi Shirasu
发明人： Masashi Tanaka , Masato Kumazawa , Kinya Kato , Masaki Kato , Hiroshi Chiba , Hiroshi Shirasu
IPC分类号： G02B13/22 , G02B17/00 , G02B17/06 , G02B17/08 , G02B27/10 , G03F7/20 , H01L21/027 , G03F7/22
CPC分类号： G02B17/0892 , G02B13/22 , G02B17/002 , G02B17/008 , G02B17/045 , G02B17/0605 , G02B17/08 , G02B17/0812 , G02B17/082 , G02B17/0828 , G02B17/086 , G02B27/144 , G02B27/145 , G03B27/32 , G03F7/70066 , G03F7/70216 , G03F7/70225 , G03F7/70241 , G03F7/70275 , G03F7/70358 , G03F7/70791
摘要： There is disclosed an exposure apparatus for, while moving a first object and a second object in a certain moving direction, effecting projection exposure of an image of the first object onto the second object.

27. 发明授权

US5715037A Scanning exposure apparatus 失效
标题翻译：扫描曝光装置
公开(公告)号：US5715037A
公开(公告)日：1998-02-03
申请号：US615853
申请日：1996-03-12
申请人： Kazuaki Saiki , Susumu Mori , Hiroshi Shirasu
发明人： Kazuaki Saiki , Susumu Mori , Hiroshi Shirasu
IPC分类号： G03F7/20 , G03F9/00 , H01L21/027
CPC分类号： G03F7/70241 , G03F7/70275 , G03F7/70358 , G03F9/00 , G03F9/70
摘要： The present invention provides a scanning exposure apparatus for projecting an image of a pattern area of a mask having a first alignment mark onto a photosensitive substrate disposed on a substrate stage. A second alignment mark is provided on at least one of the photosensitive substrate and the substrate stage. The scanning exposure apparatus includes a plurality of projection optical systems disposed along a predetermined direction and adapted to receive the luminous fluxes passed through the mask and to project elected images of unchanged dimension of the plurality of illuminated regions of the mask onto the substrate. There is provided a mark detection system for detecting the first alignment mark on the mask and the second alignment mark, and at least one of the projection optical systems constitutes a part of the mark detection system.
摘要翻译：本发明提供了一种用于将具有第一对准标记的掩模的图案区域的图像投影到设置在基板台上的感光基板上的扫描曝光装置。在感光基板和基板台的至少一个上设置第二对准标记。扫描曝光装置包括沿着预定方向设置的多个投影光学系统，其适于接收通过掩模的光通量，并将掩模的多个照明区域的未改变尺寸的选定图像投影到基板上。提供了一种用于检测掩模上的第一对准标记和第二对准标记的标记检测系统，并且至少一个投影光学系统构成标记检测系统的一部分。

28. 发明授权

US5504596A Exposure method and apparatus using holographic techniques 失效
标题翻译：使用全息技术的曝光方法和装置
公开(公告)号：US5504596A
公开(公告)日：1996-04-02
申请号：US169055
申请日：1993-12-20
申请人： Akihiro Goto , Takashi Gemma , Yutaka Ichihara , Nobutaka Magome , Naomasa Shiraishi , Hiroshi Shirasu , Toshio Matsuura
发明人： Akihiro Goto , Takashi Gemma , Yutaka Ichihara , Nobutaka Magome , Naomasa Shiraishi , Hiroshi Shirasu , Toshio Matsuura
IPC分类号： G03F7/20 , G03H1/00 , G03H1/26
CPC分类号： G03F7/70558 , G03F7/70625 , G03H1/00
摘要： An exposure apparatus is used for reproducing a mask pattern of a semiconductor device or the like onto a photosensitive substrate using a holography. The holography is utilized also in a process for alignment between a mask pattern hologram and an exposure region of the substrate. The pattern hologram is recorded to a recording medium by interference between an object wave from the pattern and a reference wave, and a second hologram is formed to the medium by diffraction light from an alignment mark formed on the mask. Prior to reconstruction of the pattern image, reconstruction light from the second hologram, illuminated with a reconstruction wave, is irradiated onto the substrate arranged in place of the mask. A reproduction image of the alignment mark on the substrate surface illuminated with the reconstruction light is measured, and relative displacement between the medium and the substrate is detected from a result of the measurement. The relative positional relationship between the medium and the substrate is corrected in accordance with the displacement information, and, thereafter, the surface is exposed with a reconstruction image of the pattern hologram.
摘要翻译：使用曝光装置将半导体装置等的掩模图案再现到使用全息术的感光基板上。全息术也用于掩模图案全息图和衬底的曝光区域之间的对准的过程。图案全息图通过来自图案的对象波与参考波之间的干涉而被记录到记录介质上，并且通过衍射光从形成在掩模上的对准标记的衍射光形成第二全息图。在图案图像重建之前，用重建波照射的来自第二全息图的重建光被照射到布置在掩模上的衬底上。测量用重建光照射的基板表面上的对准标记的再现图像，并且从测量结果检测介质和基板之间的相对位移。根据位移信息来校正介质和基板之间的相对位置关系，然后用图案全息图的重构图像曝光表面。

29. 发明申请

US20100245795A1 INTERMEDIATE VACUUM SEAL ASSEMBLY FOR SEALING A CHAMBER HOUSING TO A WORKPIECE 审中-公开
标题翻译：用于将工作室密封住的室内真空密封组件
公开(公告)号：US20100245795A1
公开(公告)日：2010-09-30
申请号：US12721493
申请日：2010-03-10
申请人： Fardad A. Hashemi , Hiroshi Shirasu , Douglas C. Watson
发明人： Fardad A. Hashemi , Hiroshi Shirasu , Douglas C. Watson
IPC分类号： G03B27/54 , H01J9/00
CPC分类号： G03F7/70841 , G03B27/54 , G03F7/70525 , G03F7/70808
摘要： A chamber assembly (226) for providing a sealed chamber (38) adjacent to a workpiece (28) includes a chamber housing (244), a chamber pressure source (246) and a seal assembly (250). The chamber housing (244) cooperates with the workpiece (28) to define at least a portion of the sealed chamber (38). The chamber pressure source (246) controls a chamber pressure within the sealed chamber (38) to be different than the environmental pressure. The seal assembly (250) seals the chamber housing (244) to the workpiece (28). The seal assembly (250) can include a first seal contact region (270) and a second seal contact region (272) that cooperate to define a seal gap (274) adjacent to at least one of the chamber housing (244) and the workpiece (28). The seal assembly (250) may further include a seal pressure source (276) for controlling a seal pressure within the seal gap (274) so that the seal pressure is different than the chamber pressure and the environmental pressure. The first seal contact region (270) and the second seal contact region (272) cooperate to exert a first force (284) on a surface (278). The seal pressure source (276) generates a second force (286) on the surface (278). The first force (284) is approximately equal in magnitude and opposite in direction to the second force (286).
摘要翻译：用于提供与工件（28）相邻的密封腔（38）的腔室组件（226）包括腔室壳体（244），腔室压力源（246）和密封组件（250）。腔室壳体（244）与工件（28）配合以限定密封腔室（38）的至少一部分。腔室压力源（246）控制密封腔室（38）内的腔室压力不同于环境压力。密封组件（250）将腔室壳体（244）密封到工件（28）。密封组件（250）可以包括第一密封接触区域（270）和第二密封接触区域（272），第一密封接触区域（270）和第二密封接触区域（272）协作以限定邻近腔室壳体（244）和工件（28）。密封组件（250）还可以包括用于控制密封间隙（274）内的密封压力的密封压力源（276），使得密封压力不同于腔室压力和环境压力。第一密封接触区域（270）和第二密封接触区域（272）协作以在表面（278）上施加第一力（284）。密封压力源（276）在表面（278）上产生第二力（286）。第一力（284）的大小相等并且在与第二力（286）相反的方向上相反。

30. 发明授权

US06317196B1 Projection exposure apparatus 失效
标题翻译：投影曝光装置
公开(公告)号：US06317196B1
公开(公告)日：2001-11-13
申请号：US09209270
申请日：1998-12-11
申请人： Tomohide Hamada , Hiroshi Shirasu , Yukio Kakizaki , Kinya Kats
发明人： Tomohide Hamada , Hiroshi Shirasu , Yukio Kakizaki , Kinya Kats
IPC分类号： G03B2118
CPC分类号： G03F7/70775 , G03F7/70358 , G03F7/70716 , G03F9/70
摘要： A projection exposure apparatus is provided. The projection exposure apparatus includes an illumination optical system for illuminating a portion of a mask pattern on a mask with an exposing radiation flux of a predetermined shape, a fixed support, a projection optical system fixed to the fixed support for projecting the image of the illuminated portion of the mask pattern onto a substrate, and a carriage for integrally holding the mask and the substrate, the carriage being movable in a predetermined direction with respect to the projection optical system to successively exposing the substrate with the image of the mask pattern formed by the exposing radiation flux. The projection exposure apparatus further includes a long mirror elongated in the predetermined direction and fixed to the fixed support, the length of the long mirror being at least equal to the stroke of the carriage movement in the predetermined direction, and a measurement system for measuring the position of the mask and the position of the substrate with respect to the long mirror to determine the position of the mask relative to the substrate in a direction perpendicular to the predetermined direction.
摘要翻译：提供投影曝光装置。投影曝光装置包括：照射光学系统，用于以掩模形式曝光掩模图案的一部分，其具有预定形状的曝光辐射通量;固定支架;固定在固定支架上的投影光学系统，用于投射照明图像掩模图案的一部分到基板上，以及滑架，用于一体地保持掩模和基板，托架可相对于投影光学系统沿预定方向移动，以使基板与由曝光辐射通量。投影曝光装置还包括在预定方向上延伸并固定到固定支撑件上的长镜，长反射镜的长度至少等于滑架在预定方向上的行程的行程，以及测量系统掩模的位置和基板相对于长镜的位置，以确定掩模相对于基板在垂直于预定方向的方向上的位置。

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