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21. 发明授权

US5245403A Apparatus for detecting extraneous substances on a glass plate 失效
标题翻译：用于检测玻璃板上的特殊物质的装置
公开(公告)号：US5245403A
公开(公告)日：1993-09-14
申请号：US813837
申请日：1991-12-27
申请人： Noboru Kato , Izuo Horai , Toshihiro Kimura , Mitsuyoshi Koizumi
发明人： Noboru Kato , Izuo Horai , Toshihiro Kimura , Mitsuyoshi Koizumi
IPC分类号： G01B11/30 , G01N21/88 , G01N21/89 , G01N21/896 , G01N21/94 , G01N21/95 , G01N21/958
CPC分类号： G01N21/94 , G01N2021/4792 , G01N2021/887 , G01N2021/9513 , G01N21/9501
摘要： An apparatus for detecting extraneous substances on a glass plate includes a first light projecting system arranged above a plane under examination on a glass plate, the surface of which is irradiated with an S-polarized laser beam at a first elevation angle, a second light projecting system arranged above the surface thereof which is irradiated with a P-polarized laser beam at a second elevation angle greater than the first elevation angle, and a light receiving system for receiving scattered light from the surface irradiated with the laser beams respectively emitted from the first and the second light projecting system at an elevation angle smaller than the first elevation angle. The light receiving system is arranged on a side opposite to the direction of irradiation with the normal line set up at the laser beam irradiation point therebetween and the output level of the P-polarized laser beam is set in specific relation to the S-polarized laser beam.

22. 再颁专利

USRE33991E Foreign particle detecting method and apparatus 失效
公开(公告)号：USRE33991E
公开(公告)日：1992-07-14
申请号：US360971
申请日：1989-06-02
申请人： Masataka Shiba , Sachio Uto , Mitsuyoshi Koizumi
发明人： Masataka Shiba , Sachio Uto , Mitsuyoshi Koizumi
IPC分类号： G01N15/02 , G01N21/94
CPC分类号： G01N21/94 , G01N2015/0238 , G01N2021/4792 , G01N2201/1053
摘要： The foreign particle detecting method and apparatus are disclosed wherein a polarized laser beam emitted by a laser beam irradiating system from a direction inclined with respect to the direction perpendicular to the surface of a substrate is used by a scanning means to linearly scan the substrate surface from a direction approximately 90.degree. with respect to the laser light irradiating direction; and the laser light reflected from a foreign particle on the substrate surface is detected by a polarized light analyzer and a photoelectric conversion device from a direction set approximately equal to said scanning direction and inclined with respect to the direction perpendicular to the substrate surface.

23. 发明授权

US4740079A Method of and apparatus for detecting foreign substances 失效
标题翻译：异物检测方法及装置
公开(公告)号：US4740079A
公开(公告)日：1988-04-26
申请号：US792320
申请日：1985-10-28
申请人： Mitsuyoshi Koizumi , Yoshimasa Ohshima , Minoru Tanaka
发明人： Mitsuyoshi Koizumi , Yoshimasa Ohshima , Minoru Tanaka
IPC分类号： G01N21/21 , G01N21/94 , G01N21/95 , G01N21/01
CPC分类号： G01N21/94 , G01N2021/4721 , G01N21/21 , G01N21/9501
摘要： The present invention provides a method for detecting foreign substances which detects a foreign substance with a first photoelectric conversion element by emphasizing the foreign substance and detects a background on the object with a second photoelectric conversion element by emphasizing the background and detects a foreign substance detection signal obtained from the first photoelectric conversion element by emphasizing the signal with a detection signal obtained from the second photoelectric conversion element.
摘要翻译：本发明提供了一种通过强调异物检测第一光电转换元件的异物检测异物的方法，并且通过强调背景来检测物体上的背景，并检测异物检测信号通过用从第二光电转换元件获得的检测信号强调信号从第一光电转换元件获得。

24. 发明授权

US4504045A Wafer transforming device 失效
标题翻译：晶圆转换装置
公开(公告)号：US4504045A
公开(公告)日：1985-03-12
申请号：US434397
申请日：1982-10-14
申请人： Yukio Kenbo , Nobuyuki Akiyama , Mitsuyoshi Koizumi , Asahiro Kuni
发明人： Yukio Kenbo , Nobuyuki Akiyama , Mitsuyoshi Koizumi , Asahiro Kuni
IPC分类号： G03F7/20 , H01L21/027 , H01L21/30 , H01L21/673 , H05K3/00 , B25B11/00
CPC分类号： G03F7/707 , H01L21/30
摘要： A wafer transforming device defines an airtight space by means of a base, a hollow case, and a diaphragm type chuck which is fixed to the upper end of the case by suction. In this space, a large number of vertically moving elements are arranged at predetermined intervals. In the state in which a wafer is held by suction by means of the chuck and in which the chuck is held in contact with the upper ends of the vertically moving elements by supplying a vacuum pressure into the space, the vertically moving elements located within a required range are selectively actuated. Thus, the chuck is pushed up, and the wafer held on the chuck by the suction is transformed into a desired state.
摘要翻译：晶片转换装置通过基座，中空壳体和隔膜式卡盘来限定气密空间，其通过抽吸固定到壳体的上端。在该空间中，大量的垂直移动元件以预定的间隔布置。在通过卡盘吸附保持晶片的状态下，通过向该空间内供给真空压力使卡盘与垂直移动的元件的上端保持接触的状态下，位于所需范围被选择性地启动。因此，卡盘被向上推动，并且通过抽吸将保持在卡盘上的晶片转变成期望的状态。

25. 发明授权

US4475223A Exposure process and system 失效
标题翻译：曝光过程和系统
公开(公告)号：US4475223A
公开(公告)日：1984-10-02
申请号：US387206
申请日：1982-06-10
申请人： Motoya Taniguchi , Mitsuyoshi Koizumi , Nobuyuki Akiyama , Yukio Kembo , Minoru Ikeda
发明人： Motoya Taniguchi , Mitsuyoshi Koizumi , Nobuyuki Akiyama , Yukio Kembo , Minoru Ikeda
IPC分类号： H01L21/027 , G03B27/02 , G03F7/20 , G03F7/207 , G03F9/00 , G03F9/02 , G21K5/00
CPC分类号： G03F7/707 , G03F7/20 , G03F7/703 , G03F9/703 , G03F9/7034
摘要： An X ray exposure process and system for transferring a mask pattern onto a wafer with use of X rays, wherein heights on the mask at many points are measured on a light interference band basis by a mask-height measuring device of non-contact measurement type at an X ray exposure position, the mask being mounted on a chamber which is filled with a He gas and or the like to prevent attenuation of an X ray source, heights on the wafer at many points are measured at a wafer-height measuring position different from said exposure position, and according to the measured results, the wafer is finely moved upwardly or downwardly (that is, deformed) individually independently by means of a chuck which sucks and holds the wafer at many points thereon so that, a gap between the mask and wafer is adjusted to a desired level.
摘要翻译： X射线曝光处理和系统，用于使用X射线将掩模图案转印到晶片上，其中通过非接触测量型的掩模高度测量装置在光干涉条带下测量许多点上的掩模上的高度在X射线曝光位置，掩模被安装在填充有He气体等的室中以防止X射线源的衰减，在晶片高度测量位置处测量许多点上的晶片上的高度与所述曝光位置不同，并且根据测量结果，通过在其上的许多点吸附并保持晶片的卡盘，晶片被独立地独立地向上或向下（即变形）精细地移动，使得晶片之间的间隙掩模和晶片被调节到期望的水平。

26. 发明授权

US4423331A Method and apparatus for inspecting specimen surface 失效
标题翻译：检测样品表面的方法和装置
公开(公告)号：US4423331A
公开(公告)日：1983-12-27
申请号：US242483
申请日：1981-03-11
申请人： Mitsuyoshi Koizumi , Nobuyuki Akiyama , Yoshimasa Oshima
发明人： Mitsuyoshi Koizumi , Nobuyuki Akiyama , Yoshimasa Oshima
IPC分类号： G01B11/30 , G01N21/88 , G01N21/95 , G11B5/84
CPC分类号： G01N21/88
摘要： A method and apparatus of inspecting a surface of a specimen for the presence of defects, foreign substance and the like are disclosed. The surface has a mark such as a cutting mark formed thereon and composed of fine grooves or recesses extending in a predetermined direction. The surface is scanned two-dimensionally with an irradiating laser beam impinging or illuminating on the specimen surface perpendicularly thereto. Those of the irregularly scattered laser light rays reflected from the specimen surface which are in a first direction perpendicular to the lengthwise direction of the mark are intercepted by a shielding member or caused to pass through regions other than a reflecting region of a reflecting mirror, while those scattered light rays which are in other directions than the first direction are directed to a photoelectric converter tube along a bypass path across the shielding member or through reflection of the mirror. A picture signal derived from the output of the photoelectric converter tube is digitalized into binary picture element signals by a sampling and binary encoding circuit, the resulting signals being then stored in a two-dimensional memory. The presence and forms of defects, foreign substances and the like on the specimen surface are discriminatively determined in dependence on particular combinations of the binary picture element signals stored in the memory.
摘要翻译：公开了一种检查样品表面存在缺陷，异物等的方法和装置。该表面具有形成在其上的切割标记和由沿预定方向延伸的细小凹槽或凹部组成的标记。使用照射激光束在垂直于其的样品表面上照射或照射二维地扫描该表面。从与标记的长度方向垂直的第一方向从试样表面反射的不规则散射的激光光线被屏蔽部件遮断，或者通过反射镜的反射区域以外的区域，同时沿着除了第一方向以外的方向的那些散射光线沿着穿过屏蔽部件的旁通路径或者通过反射镜的反射被引导到光电转换管。从光电转换管的输出得到的图像信号由采样和二进制编码电路数字化成二进制像素信号，然后将所得到的信号存储在二维存储器中。根据存储在存储器中的二进制像素信号的特定组合，鉴别地确定样本表面上的缺陷，异物等的存在和形式。

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