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    • 25. 发明授权
    • Memory device with faster reset operation
    • 具有更快复位操作的存储器件
    • US06301173B2
    • 2001-10-09
    • US09307758
    • 1999-05-10
    • Shinya FujiokaYasuharu Sato
    • Shinya FujiokaYasuharu Sato
    • G11C700
    • G11C7/065G11C7/12
    • The present invention is a memory circuit having a plurality of word lines, a plurality of bit line pairs, and memory cells disposed at the cross-position thereof. The memory comprises: a sense amplifier which is shared by the first bit line pair and the second bit line pair disposed in the column direction and amplifies a voltage of the bit line pairs; a first and a second bit line transfer gates which are disposed between the sense amplifier and the first and second bit line pairs, and connects the bit line pair at the selected memory cell side to the sense amplifier; a bit line clamper, which is disposed between the first and second bit line transfer gates, is shared by the first bit line pair and the second bit line pair, and supplies the precharge level to the bit line pairs; and a bit line short circuit, which is disposed at the first and the second bit line pairs respectively and shorts the bit line pairs. According to the above structure, the reset operation involving a bit line short operation can be executed at high-speed, since the bit line short circuit is disposed for each bit line pair. Also area efficiency can be improved since the bit line clamper circuit is shared by the first and the second bit line pairs.
    • 本发明是具有多个字线,多个位线对和设置在其交叉位置的存储单元的存储电路。 存储器包括:读出放大器,由第一位线对和位于列方向上的第二位线对共享,并放大位线对的电压; 第一位线传输门和第二位线传输门,其布置在读出放大器与第一和第二位线对之间,并将所选存储单元侧的位线对连接到读出放大器; 位于第一和第二位线传输门之间的位线钳位器由第一位线对和第二位线对共用,并将预充电电平提供给位线对; 以及分别布置在第一和第二位线对上并使位线对短路的位线短路。 根据上述结构,由于对每个位线对设置位线短路,所以可以高速执行涉及位线短路操作的复位动作。 由于位线钳位电路由第一位线对和第二位线对共享,所以可以提高面积效率。
    • 26. 发明授权
    • Semiconductor memory
    • 半导体存储器
    • US06324111B1
    • 2001-11-27
    • US09561217
    • 2000-04-28
    • Yasuharu SatoShinya Fujioka
    • Yasuharu SatoShinya Fujioka
    • G11C702
    • G11C11/4091G11C7/06G11C7/065
    • A semiconductor memory includes p-type MOS transistors (11) dispersed in one-to-one correspondence with sense amplifiers (4−1-4−n) to activate their corresponding sense amplifiers, and a p-type MOS transistor (12) to activate the sense amplifiers (4−1-4−n). After the p-type MOS transistors (11) are overdriven by an external voltage (VCC) higher than a memory stored voltage, the p-type MOS transistor (12) is driven by an internal step-down voltage (VII) that is the memory stored voltage. This increases the driving capability per sense amplifier in comparison with a conventional method and further increases the speed of sense operation in comparison with a simple overdriving method.
    • 半导体存储器包括与读出放大器(4-1-4-n)一一对应地分散以激活其对应的读出放大器的p型MOS晶体管(11),以及p型MOS晶体管(12), 激活读出放大器(4-1-4-n)。 在p型MOS晶体管(11)被高于存储器存储电压的外部电压(VCC)驱动之后,p型MOS晶体管(12)由内部降压电压(VII)驱动, 存储电压。 与传统方法相比,这增加了每个读出放大器的驱动能力,并且与简单的过驱动方法相比进一步增加了感测操作的速度。
    • 30. 发明授权
    • Lithography process window analyzing method and analyzing program
    • 光刻过程窗口分析方法和分析程序
    • US08154710B2
    • 2012-04-10
    • US12400677
    • 2009-03-09
    • Shoji MimotogiYasuharu Sato
    • Shoji MimotogiYasuharu Sato
    • G03B27/32G03B27/52
    • G03B27/32G03F7/705
    • A lithography process window analyzing method for setting a process window based on ranges of exposure amounts and focus positions, and giving evaluation of reliability of the set process window, includes setting, based on a plurality of process conditions including exposure amounts and focus positions in the performed exposure processing, analysis reliability M for process conditions including an arbitrary exposure amount and an arbitrary focus position; calculating reliability R of the process window based on the analysis reliability M concerning the process conditions included in the process window; and comparing a magnitude relation between the reliability R and a predetermined threshold and determining presence or absence of reliability of the process window according to a result of the comparison.
    • 一种用于基于曝光量和焦点位置的范围来设置处理窗口的光刻处理窗口分析方法,以及对设置的处理窗口的可靠性的评估,包括基于多个处理条件,包括曝光量和焦点位置 执行曝光处理,包括任意曝光量和任意焦点位置的处理条件的分析可靠度M; 基于与处理窗口中包含的处理条件有关的分析可靠度M来计算处理窗口的可靠度R; 以及根据比较结果比较可靠度R和预定阈值之间的大小关系,并确定处理窗口的可靠性的存在与否。