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21. 发明申请

US20080036982A1 Method For Structuring A Substrate Using Multiple Exposure 审中-公开
标题翻译：使用多重曝光构造基板的方法
公开(公告)号：US20080036982A1
公开(公告)日：2008-02-14
申请号：US11547909
申请日：2005-04-11
申请人： Ulrich Wegmann , Gerd Reisinger , Manfred Maul , Paul Graeupner , Martin Schriever , Aksel Goehnermeier
发明人： Ulrich Wegmann , Gerd Reisinger , Manfred Maul , Paul Graeupner , Martin Schriever , Aksel Goehnermeier
IPC分类号： G03B27/42 , G03B27/52
CPC分类号： G03F7/70466 , G03F7/2022 , G03F7/70258 , G03F7/70266 , G03F7/706
摘要： 1. Method for patterning a substrate using multiple exposure.2.1. The invention relates to a method for patterning a substrate using exposure processes of an adjustable optical system, a multiple exposure being used for producing a structure image on the substrate.2.2. According to the invention, for at least one of the plurality of exposures, the imaging quality of the optical system is determined by means of a respective measurement step and at least one parameter of the optical system that influences the imaging quality is set depending on this.2.3. Use e.g. for the patterning of semiconductor wafers in microlithography projection exposure apparatuses.
摘要翻译： 1.使用多次曝光来图案化衬底的方法。 2.1。本发明涉及使用可调节光学系统的曝光工艺对衬底进行图案化的方法，多次曝光用于在衬底上产生结构图像。 2.2。根据本发明，对于多个曝光中的至少一个，通过相应的测量步骤确定光学系统的成像质量，并且根据这一点设置影响成像质量的光学系统的至少一个参数。 2.3。使用例如用于微光刻投影曝光设备中的半导体晶片的图案化。

22. 发明申请

US20080007706A1 Method of optimizing imaging performance 有权
标题翻译：优化成像性能的方法
公开(公告)号：US20080007706A1
公开(公告)日：2008-01-10
申请号：US11808316
申请日：2007-06-08
申请人： Gerd Reisinger , Manfred Maul , Paul Graeupner , Martin Schriever , Ulrich Wegmann
发明人： Gerd Reisinger , Manfred Maul , Paul Graeupner , Martin Schriever , Ulrich Wegmann
IPC分类号： G03B27/54
CPC分类号： G03F7/70191 , G03B27/52 , G03F7/70216
摘要： A method of optimizing an imaging performance of a projection exposure system is provided, wherein the projection exposure system includes an illumination optical system for illuminating a patterning structure and a projection optical system for imaging a region of the illuminated patterning structure onto a corresponding field. The method involves setting the field to a first exposure field, setting optical parameters of the projection exposure system to a first setting such that the imaging performance within the first exposure field is a first optimum performance, changing the field to a second exposure field, and changing the optical parameters to a second setting such that the imaging performance within the second exposure field is a second optimum performance.
摘要翻译：提供一种优化投影曝光系统的成像性能的方法，其中投影曝光系统包括用于照亮图案形成结构的照明光学系统和用于将照射的图案形成结构的区域成像到相应场上的投影光学系统。该方法包括将场设置为第一曝光场，将投影曝光系统的光学参数设置为第一设置，使得第一曝光区域内的成像性能是第一最佳性能，将场改为第二曝光场，以及将光学参数改变为第二设置，使得第二曝光区域内的成像性能是第二最佳性能。

23. 发明申请

US20060231731A1 Method of determining optical properties and projection exposure system comprising a wavefront detection system 有权
标题翻译：确定光学特性的方法和包括波前检测系统的投影曝光系统
公开(公告)号：US20060231731A1
公开(公告)日：2006-10-19
申请号：US11387945
申请日：2006-03-24
申请人： Steffen Lauer , Ulrich Wegmann , Wolfgang Emer , Harald Sakowski , Martin Schriever
发明人： Steffen Lauer , Ulrich Wegmann , Wolfgang Emer , Harald Sakowski , Martin Schriever
IPC分类号： G01J1/20 , G01B11/02
CPC分类号： G03F7/706 , G03F7/70258
摘要： A method of determining at least one optical property of a projection exposure system is described, wherein the exposure system includes a beam delivery system having a light source for generating an exposure optical beam having light of a first wavelength (λ1) and a second wavelength (λ2), wherein a first ratio is defined as an intensity of light λ2 to an intensity of light λ1 in the exposure optical beam. The method includes supplying at least one measuring optical beam including light of at least λ1 to the projection optical system, detecting wavefronts having traversed the projection optical system, and determining an optical property in dependence of the detected wavefronts, wherein a second ratio of an intensity of light of λ2 to an intensity of light of λ1 in the measuring optical beam being incident on the detector of the wavefront detection system is less than the first ratio.
摘要翻译：描述了一种确定投影曝光系统的至少一种光学特性的方法，其中曝光系统包括具有光源的光束传送系统，该光源用于产生具有第一波长（λ< SUB＆gt;）和第二波长（λ2 SUB），其中第一比率被定义为光λ2的光强度λ1， / SUB>曝光光束。该方法包括向投影光学系统提供包括至少λ1的光的至少一个测量光束，检测已经穿过投影光学系统的波前，以及根据检测到的波前来确定光学特性其中，所述测量光束中的λ2的光强度与λ1的光强度的第二比率入射在所述波前检测系统的检测器上小于第一比例。

24. 发明申请

US20060119838A1 Optical measuring apparatus and operating method for an optical imaging system 有权
标题翻译：用于光学成像系统的光学测量装置和操作方法
公开(公告)号：US20060119838A1
公开(公告)日：2006-06-08
申请号：US11271806
申请日：2005-11-14
申请人： Wolfgang Emer , Ulrich Wegmann , Martin Schriever , Rainer Hoch
发明人： Wolfgang Emer , Ulrich Wegmann , Martin Schriever , Rainer Hoch
IPC分类号： G01B9/00
CPC分类号： G01M11/0264 , G01M11/0271 , G03F7/706 , G03F7/70875 , G03F7/70891
摘要： A measuring apparatus for optical, for example interferometric, measurement of an optical imaging system, imaging of a useful pattern in an imaging operation, including a device for production of radiation information, for example interference information, which is indicative of imaging errors, having a mask structure arrangement which contains a measurement pattern, and a device for detection and evaluation of the interference information which is indicative of imaging errors; also a method for operation of the optical imaging system including imaging error correction. The apparatus further includes a heating irradiation arrangement for radiation heating of the optical imaging system during measurement operation such that the heating effect of the radiation which is applied to the optical imaging system to be measured equals, within a tolerance range which can be predetermined, the heating effect of the radiation which is passed through the useful pattern during imaging operation of the optical imaging system.
摘要翻译：用于光学，例如干涉测量光学成像系统的测量装置，成像操作中有用图案的成像，包括用于产生辐射信息的装置，例如指示成像误差的干扰信息，具有一个包含测量图案的掩模结构布置，以及用于检测和评估指示成像误差的干扰信息的装置; 也是包括成像误差校正的光学成像系统的操作方法。该装置还包括用于在测量操作期间对光学成像系统进行辐射加热的加热辐射装置，使得施加到待测量的光学成像系统的辐射的加热效应等于在可以预定的公差范围内在光学成像系统的成像操作期间通过有用图案的辐射的加热效果。

25. 发明申请

US20050237506A1 Method of optimizing imaging performance 有权
标题翻译：优化成像性能的方法
公开(公告)号：US20050237506A1
公开(公告)日：2005-10-27
申请号：US11102835
申请日：2005-04-11
申请人： Gerd Reisinger , Manfred Maul , Paul Graeupner , Martin Schriever , Ulrich Wegmann
发明人： Gerd Reisinger , Manfred Maul , Paul Graeupner , Martin Schriever , Ulrich Wegmann
IPC分类号： G03B27/52 , G03F7/20 , H01L21/027
CPC分类号： G03F7/70191 , G03B27/52 , G03F7/70216
摘要： A method of optimizing an imaging performance of a projection exposure system is provided, wherein the projection exposure system comprises an illumination optical system for illuminating a patterning structure and a projection optical system for imaging a region of the illuminated patterning structure onto a corresponding field. The method comprises setting the field to a first exposure field, setting optical parameters of the projection exposure system to a first setting such that the imaging performance within the first exposure field is a first optimum performance, changing the field to a second exposure field, and changing the optical parameters to a second setting such that the imaging performance within the second exposure field is a second optimum performance.
摘要翻译：提供一种优化投影曝光系统的成像性能的方法，其中投影曝光系统包括用于照亮图案形成结构的照明光学系统和用于将照射的图案形成结构的区域成像到相应场上的投影光学系统。该方法包括将场设置为第一曝光场，将投影曝光系统的光学参数设置为第一设置，使得第一曝光区域内的成像性能是第一最佳性能，将场改为第二曝光场，以及将光学参数改变为第二设置，使得第二曝光区域内的成像性能是第二最佳性能。

26. 发明授权

US08169595B2 Optical apparatus and method for modifying the imaging behavior of such apparatus 有权
标题翻译：用于修改这种装置的成像行为的光学装置和方法
公开(公告)号：US08169595B2
公开(公告)日：2012-05-01
申请号：US12357126
申请日：2009-01-21
申请人： Martin Schriever , Ulrich Wegmann , Stefan Hembacher , Bernhard Geuppert , Juergen Huber , Norbert Kerwien , Michael Totzeck , Markus Hauf
发明人： Martin Schriever , Ulrich Wegmann , Stefan Hembacher , Bernhard Geuppert , Juergen Huber , Norbert Kerwien , Michael Totzeck , Markus Hauf
IPC分类号： G03B27/72 , G03B27/54
CPC分类号： G03F7/70825 , G03F7/70041 , G03F7/70266
摘要： The disclosure relates to an optical apparatus including a light source that emits light in the form of light pulses having a pulse frequency, and including at least one optical element. The disclosure also relates to a projection exposure machine including a pulsed light source and a projection objective, and to a method for modifying the imaging behavior of such an apparatus, such as in a projection exposure machine.
摘要翻译：本发明涉及一种光学装置，其包括以具有脉冲频率的光脉冲形式发光的光源，并且包括至少一个光学元件。本公开还涉及包括脉冲光源和投影物镜的投影曝光机，以及用于修改诸如投影曝光机中的这种装置的成像行为的方法。

27. 发明申请

US20090174876A1 OPTICAL APPARATUS AND METHOD FOR MODIFYING THE IMAGING BEHAVIOR OF SUCH APPARATUS 有权
标题翻译：用于修改这种装置的成像行为的光学装置和方法
公开(公告)号：US20090174876A1
公开(公告)日：2009-07-09
申请号：US12357126
申请日：2009-01-21
申请人： Martin Schriever , Ulrich Wegmann , Stefan Hembacher , Bernhard Geuppert , Juergen Huber , Norbert Kerwien , Michael Totzeck , Markus Hauf
发明人： Martin Schriever , Ulrich Wegmann , Stefan Hembacher , Bernhard Geuppert , Juergen Huber , Norbert Kerwien , Michael Totzeck , Markus Hauf
IPC分类号： G03B27/72 , G02B26/00
CPC分类号： G03F7/70825 , G03F7/70041 , G03F7/70266
摘要： The disclosure relates to an optical apparatus including a light source that emits light in the form of light pulses having a pulse frequency, and including at least one optical element. The disclosure also relates to a projection exposure machine including a pulsed light source and a projection objective, and to a method for modifying the imaging behavior of such an apparatus, such as in a projection exposure machine.
摘要翻译：本发明涉及一种光学装置，其包括以具有脉冲频率的光脉冲形式发光的光源，并且包括至少一个光学元件。本公开还涉及包括脉冲光源和投影物镜的投影曝光机，以及用于修改诸如投影曝光机中的这种装置的成像行为的方法。

28. 发明授权

US07233386B2 Method of optimizing imaging performance 有权
标题翻译：优化成像性能的方法
公开(公告)号：US07233386B2
公开(公告)日：2007-06-19
申请号：US11102835
申请日：2005-04-11
申请人： Gerd Reisinger , Manfred Maul , Paul Graeupner , Martin Schriever , Ulrich Wegmann
发明人： Gerd Reisinger , Manfred Maul , Paul Graeupner , Martin Schriever , Ulrich Wegmann
IPC分类号： G03B27/52 , G03B27/42
CPC分类号： G03F7/70191 , G03B27/52 , G03F7/70216
摘要： A method of optimizing an imaging performance of a projection exposure system is provided, wherein the projection exposure system includes an illumination optical system for illuminating a patterning structure and a projection optical system for imaging a region of the illuminated patterning structure onto a corresponding field. The method involves setting the field to a first exposure field, setting optical parameters of the projection exposure system to a first setting such that the imaging performance within the first exposure field is a first optimum performance, changing the field to a second exposure field, and changing the optical parameters to a second setting such that the imaging performance within the second exposure field is a second optimum performance.
摘要翻译：提供一种优化投影曝光系统的成像性能的方法，其中投影曝光系统包括用于照亮图案形成结构的照明光学系统和用于将照射的图案形成结构的区域成像到相应场上的投影光学系统。该方法包括将场设置为第一曝光场，将投影曝光系统的光学参数设置为第一设置，使得第一曝光区域内的成像性能是第一最佳性能，将场改为第二曝光场，以及将光学参数改变为第二设置，使得第二曝光区域内的成像性能是第二最佳性能。

29. 发明授权

US07230220B2 Method of determining optical properties and projection exposure system comprising a wavefront detection system 有权
标题翻译：确定光学特性的方法和包括波前检测系统的投影曝光系统
公开(公告)号：US07230220B2
公开(公告)日：2007-06-12
申请号：US11387945
申请日：2006-03-24
申请人： Steffen Lauer , Ulrich Wegmann , Wolfgang Emer , Harald Sakowski , Martin Schriever
发明人： Steffen Lauer , Ulrich Wegmann , Wolfgang Emer , Harald Sakowski , Martin Schriever
IPC分类号： G01J1/20 , G03B27/74
CPC分类号： G03F7/706 , G03F7/70258
摘要： A method of determining at least one optical property of a projection exposure system is described, wherein the exposure system includes a beam delivery system having a light source for generating an exposure optical beam having light of a first wavelength (λ1) and a second wavelength (λ2), wherein a first ratio is defined as an intensity of light λ2 to an intensity of light λ1 in the exposure optical beam. The method includes supplying at least one measuring optical beam including light of at least λ1 to the projection optical system, detecting wavefronts having traversed the projection optical system, and determining an optical property in dependence of the detected wavefronts, wherein a second ratio of an intensity of light of λ2 to an intensity of light of λ1 in the measuring optical beam being incident on the detector of the wavefront detection system is less than the first ratio.
摘要翻译：描述了一种确定投影曝光系统的至少一种光学特性的方法，其中曝光系统包括具有光源的光束传送系统，该光源用于产生具有第一波长（λ< SUB＆gt;）和第二波长（λ2 SUB），其中第一比率被定义为光λ2的光强度λ1， / SUB>曝光光束。该方法包括向投影光学系统提供包括至少λ1的光的至少一个测量光束，检测已经穿过投影光学系统的波前，以及根据检测到的波前来确定光学特性其中，所述测量光束中的λ2的光强度与λ1的光强度的第二比率入射在所述波前检测系统的检测器上小于第一比例。

30. 发明申请

US20060023193A1 Projection exposure system for microlithography and method for generating microlithographic images 有权
公开(公告)号：US20060023193A1
公开(公告)日：2006-02-02
申请号：US11248684
申请日：2005-10-11
申请人： Karl-Heinz Schuster , Christian Wagner , Martin Schriever
发明人： Karl-Heinz Schuster , Christian Wagner , Martin Schriever
IPC分类号： G03B27/72
CPC分类号： G02B17/0892 , G02B17/08 , G02B27/28 , G03B27/72 , G03F7/70125 , G03F7/70225 , G03F7/70566
摘要： A method and an arrangement for microlithographic projection exposure at high aperture achieve a contrast increase by the polarization of the light perpendicular to the plane of incidence on the resist. Arrangements are provided which influence the tangential polarization or the linear polarization adapted to the dipole illumination in the illuminating system and in the reduction objective.

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