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    • 21. 发明申请
    • SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME
    • 半导体器件及其制造方法
    • US20110260276A1
    • 2011-10-27
    • US13092633
    • 2011-04-22
    • Shinzo ISHIBEKatsuhiko Kitagawa
    • Shinzo ISHIBEKatsuhiko Kitagawa
    • H01L31/0232H01L31/18
    • H01L27/14618H01L27/14681H01L31/0203H01L2924/0002H01L2924/00
    • In a semiconductor device in which a glass substrate is attached to a surface of a semiconductor die with an adhesive layer being interposed therebetween, it is an object to fill a recess portion of an insulation film formed on a photodiode with the adhesive layer without bubbles therein. In a semiconductor die in which an optical semiconductor integrated circuit including a photodiode having a recess portion of an interlayer insulation film in the upper portion, an NPN bipolar transistor, and so on are formed, generally, a light shield film covers a portion except the recess portion region on the photodiode and except a dicing region. In the invention, an opening slit is further formed in the light shield film, extending from the recess portion to the outside of the recess portion, so as to attain the object.
    • 在玻璃基板与半导体管芯的表面连接的半导体器件中,其间插入有粘合剂层,其目的是填充在具有粘合层的光电二极管上形成的绝缘膜的凹部,而没有气泡 。 在其中形成有包括上部具有层间绝缘膜的凹部的光电二极管,NPN双极晶体管等的光半导体集成电路的半导体管芯中,通常,遮光膜覆盖除了 凹陷部分区域,除了切割区域。 在本发明中,在遮光膜中还形成有从凹部向凹部延伸的开口狭缝,以达到目的。
    • 23. 发明授权
    • Semiconductor device and method of manufacturing the same
    • 半导体装置及其制造方法
    • US08653529B2
    • 2014-02-18
    • US13092633
    • 2011-04-22
    • Shinzo IshibeKatsuhiko Kitagawa
    • Shinzo IshibeKatsuhiko Kitagawa
    • H01L29/04H01L21/339
    • H01L27/14618H01L27/14681H01L31/0203H01L2924/0002H01L2924/00
    • In a semiconductor device in which a glass substrate is attached to a surface of a semiconductor die with an adhesive layer being interposed therebetween, it is an object to fill a recess portion of an insulation film formed on a photodiode with the adhesive layer without bubbles therein. In a semiconductor die in which an optical semiconductor integrated circuit including a photodiode having a recess portion of an interlayer insulation film in the upper portion, an NPN bipolar transistor, and so on are formed, generally, a light shield film covers a portion except the recess portion region on the photodiode and except a dicing region. In the invention, an opening slit is further formed in the light shield film, extending from the recess portion to the outside of the recess portion, so as to attain the object.
    • 在玻璃基板与半导体管芯的表面连接的半导体器件中,其间插入有粘合剂层,其目的是填充在具有粘合层的光电二极管上形成的绝缘膜的凹部,而没有气泡 。 在其中形成有包括上部具有层间绝缘膜的凹部的光电二极管,NPN双极晶体管等的光半导体集成电路的半导体管芯中,通常,遮光膜覆盖除了 凹陷部分区域,除了切割区域。 在本发明中,在遮光膜中还形成有从凹部向凹部延伸的开口狭缝,以达到目的。
    • 24. 发明授权
    • Semiconductor device and manufacturing method thereof
    • 半导体装置及其制造方法
    • US08148811B2
    • 2012-04-03
    • US12438888
    • 2007-08-22
    • Hiroyuki ShinogiKatsuhiko KitagawaKazuo OkadaHiroshi Yamada
    • Hiroyuki ShinogiKatsuhiko KitagawaKazuo OkadaHiroshi Yamada
    • H01L23/12H01L31/0232
    • H01L27/14618B81C1/00269H01L23/315H01L27/14625H01L27/14685H01L2924/0002H01L2924/09701H01L2924/12044H01L2924/00
    • This invention is directed to offer a semiconductor device in which a cavity space is easily provided in a specific region when a supporting member is bonded to a semiconductor substrate through an adhesive layer, and its manufacturing method. A resist layer is applied to an entire top surface of the semiconductor substrate 2, and exposure to transfer a pattern is performed. By subsequent development and selective removal of the resist layer, the resist layer is formed into a shape of a plurality of columnar structures 4. Then, an adhesive material made of an epoxy resin or the like is applied to the entire top surface of the semiconductor substrate 2. The adhesive material is gathered around the columnar structures 4 by itself to form an adhesive layer 5. Therefore, in contrast, the adhesive layer 5 does not deposit in a region where the cavity is to be formed. Then, the supporting member 6 is bonded through the columnar structures 4 and the adhesive layer 5. By bonding the supporting member 6, there is formed the cavity 7 surrounded with the semiconductor substrate 2, the columnar structures 3 and the supporting member 6.
    • 本发明旨在提供一种半导体器件及其制造方法,其中当支撑构件通过粘合剂层结合到半导体衬底时,在特定区域中容易设置空腔。 将抗蚀剂层施加到半导体衬底2的整个顶表面,并且进行曝光以转印图案。 通过随后的抗蚀剂层的显影和选择性去除,将抗蚀剂层形成为多个柱状结构体4的形状。然后,将由环氧树脂等制成的粘合剂材料施加到半导体的整个顶表面 基材2.粘合剂材料自身聚集在柱状结构4周围以形成粘合剂层5.因此,相反,粘合剂层5不会沉积在要形成空腔的区域中。 然后,支撑部件6通过柱状结构体4和粘合剂层5接合。通过粘合支撑部件6,形成有被半导体基板2,柱状结构体3和支撑部件6包围的空腔7。
    • 25. 发明申请
    • SEMICONDUCTOR DEVICE
    • 半导体器件
    • US20100065929A1
    • 2010-03-18
    • US12438879
    • 2007-08-22
    • Kazuo OkadaKatsuhiko KitagawaHiroshi Yamada
    • Kazuo OkadaKatsuhiko KitagawaHiroshi Yamada
    • H01L29/84H01L31/0232
    • H01L27/14625H01L23/3135H01L27/14618H01L31/0203H01L31/02325H01L2924/0002H01L2924/3025H01L2924/00
    • An object of the invention is to provide a smaller semiconductor device of which the manufacturing process is simplified and the manufacturing cost is reduced. Furthermore, an object of the invention is to provide a semiconductor device having a cavity. A device element 3 is formed on a front surface of a semiconductor substrate 4, and a sealing body 1 is attached to the semiconductor substrate 4 with an adhesive layer 6 being interposed therebetween. A main surface (a back surface) of the sealing body 1 which faces the semiconductor substrate 4 is curved inward, and there is a given space (a cavity 2) between the sealing body 1 and the semiconductor substrate 4. Since the back surface of the sealing body 1 is curved, the sealing body 1 is used as a planoconcave lens (a reverse direction) as well as a sealing member for the device element 3.
    • 本发明的目的是提供一种较小的半导体器件,其制造过程被简化并且制造成本降低。 此外,本发明的目的是提供一种具有空腔的半导体器件。 器件元件3形成在半导体衬底4的前表面上,并且密封体1被粘附在半导体衬底4上,其间夹有粘合剂层6。 密封体1的面向半导体基板4的主表面(背面)向内弯曲,并且在密封体1和半导体基板4之间存在给定的空间(空腔2)。由于背面 密封体1弯曲,密封体1用作平凸透镜(反方向)以及用于装置元件3的密封构件。
    • 26. 发明授权
    • Semiconductor device
    • 半导体器件
    • US08653612B2
    • 2014-02-18
    • US12438879
    • 2007-08-22
    • Kazuo OkadaKatsuhiko KitagawaHiroshi Yamada
    • Kazuo OkadaKatsuhiko KitagawaHiroshi Yamada
    • H01L29/84
    • H01L27/14625H01L23/3135H01L27/14618H01L31/0203H01L31/02325H01L2924/0002H01L2924/3025H01L2924/00
    • An object of the invention is to provide a smaller semiconductor device of which the manufacturing process is simplified and the manufacturing cost is reduced. Furthermore, an object of the invention is to provide a semiconductor device having a cavity. A device element 3 is formed on a front surface of a semiconductor substrate 4, and a sealing body 1 is attached to the semiconductor substrate 4 with an adhesive layer 6 being interposed therebetween. A main surface (a back surface) of the sealing body 1 which faces the semiconductor substrate 4 is curved inward, and there is a given space (a cavity 2) between the sealing body 1 and the semiconductor substrate 4. Since the back surface of the sealing body 1 is curved, the sealing body 1 is used as a planoconcave lens (a reverse direction) as well as a sealing member for the device element 3.
    • 本发明的目的是提供一种较小的半导体器件,其制造过程被简化并且制造成本降低。 此外,本发明的目的是提供一种具有空腔的半导体器件。 器件元件3形成在半导体衬底4的前表面上,并且密封体1被粘附在半导体衬底4上,其间夹有粘合剂层6。 密封体1的面向半导体基板4的主表面(背面)向内弯曲,并且在密封体1和半导体基板4之间具有给定的空间(空腔2)。由于背面 密封体1弯曲,密封体1用作平凸透镜(反方向)以及用于装置元件3的密封构件。
    • 27. 发明申请
    • SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF
    • 半导体器件及其制造方法
    • US20090321903A1
    • 2009-12-31
    • US12438888
    • 2007-08-22
    • Hiroyuki ShinogiKatsuhiko KitagawaKazuo OkadaHiroshi Yamada
    • Hiroyuki ShinogiKatsuhiko KitagawaKazuo OkadaHiroshi Yamada
    • H01L23/02H01L21/50
    • H01L27/14618B81C1/00269H01L23/315H01L27/14625H01L27/14685H01L2924/0002H01L2924/09701H01L2924/12044H01L2924/00
    • This invention is directed to offer a semiconductor device in which a cavity space is easily provided in a specific region when a supporting member is bonded to a semiconductor substrate through an adhesive layer, and its manufacturing method. A resist layer is applied to an entire top surface of the semiconductor substrate 2, and exposure to transfer a pattern is performed. By subsequent development and selective removal of the resist layer, the resist layer is formed into a shape of a plurality of columnar structures 4. Then, an adhesive material made of an epoxy resin or the like is applied to the entire top surface of the semiconductor substrate 2. The adhesive material is gathered around the columnar structures 4 by itself to form an adhesive layer 5. Therefore, in contrast, the adhesive layer 5 does not deposit in a region where the cavity is to be formed. Then, the supporting member 6 is bonded through the columnar structures 4 and the adhesive layer 5. By bonding the supporting member 6, there is formed the cavity 7 surrounded with the semiconductor substrate 2, the columnar structures 3 and the supporting member 6.
    • 本发明旨在提供一种半导体器件及其制造方法,其中当支撑构件通过粘合剂层结合到半导体衬底时,在特定区域中容易设置空腔。 将抗蚀剂层施加到半导体衬底2的整个顶表面,并且进行曝光以转印图案。 通过随后的抗蚀剂层的显影和选择性去除,将抗蚀剂层形成为多个柱状结构体4的形状。然后,将由环氧树脂等制成的粘合剂材料施加到半导体的整个顶表面 基材2.粘合剂材料自身聚集在柱状结构4周围以形成粘合剂层5.因此,相反,粘合剂层5不会沉积在要形成空腔的区域中。 然后,支撑部件6通过柱状结构体4和粘合剂层5接合。通过粘合支撑部件6,形成有被半导体基板2,柱状结构体3和支撑部件6包围的空腔7。