专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

21. 发明授权

US07639342B2 Ferroelectric composite, method of manufacturing the same and liquid crystal display apparatus having the ferroelectric composite 失效
标题翻译：铁电复合体及其制造方法以及具有铁电复合体的液晶显示装置
公开(公告)号：US07639342B2
公开(公告)日：2009-12-29
申请号：US11968667
申请日：2008-01-03
申请人： Tae-Hyung Hwang , Byeong-Seob Ban
发明人： Tae-Hyung Hwang , Byeong-Seob Ban
IPC分类号： C09K19/02 , G11C11/22
CPC分类号： C09K19/52 , B82Y30/00 , C01G33/00 , C01G49/009 , C01G51/006 , C01G53/006 , C01P2004/32 , C01P2004/64 , C01P2004/84 , C01P2006/40 , C09K19/0225 , Y10T428/1036
摘要： A ferroelectric composite includes a core including a ferroelectric material and a skin layer including a carbon structure comprising carbon atoms.
摘要翻译：铁电复合体包括具有铁电材料的芯和包含碳原子的碳结构的表皮层。

22. 发明申请

US20070080350A1 Panel for flexible display device and manufacturing method thereof 审中-公开
标题翻译：柔性显示装置用面板及其制造方法
公开(公告)号：US20070080350A1
公开(公告)日：2007-04-12
申请号：US11545364
申请日：2006-10-10
申请人： Hong-Kee Chin , Sang-Gab Kim , Tae-Hyung Hwang , Min-Seok Oh , Yu-Gwang Jeong , Seung-Ha Choi
发明人： Hong-Kee Chin , Sang-Gab Kim , Tae-Hyung Hwang , Min-Seok Oh , Yu-Gwang Jeong , Seung-Ha Choi
IPC分类号： H01L29/04 , H01L21/84
CPC分类号： H01L27/1222 , H01L27/1214 , H01L27/1218 , H01L27/127 , H01L27/1288 , H01L29/06 , H01L29/66765 , H01L29/78603
摘要： A flexible display panel according to an embodiment of the present invention includes a flexible substrate, a gate line formed on the substrate and including a gate electrode, a gate insulating layer formed on the substrate, a semiconductor layer formed on the gate insulating layer and disposed substantially on the entire gate electrode, a source electrode and a drain electrode formed on the semiconductor layer, and a pixel electrode connected to the drain electrode. The patterning of the semiconductor layer to form a second semiconductor member may include coating a photoresist film on a first semiconductor member, exposing the photoresist film to light from a back of the substrate, wherein the gate electrode is used as a light blocking mask, developing the exposed photoresist film to form a photoresist pattern having the same planar size as the gate electrode, and etching the semiconductor layer using the photoresist pattern as an etching mask.
摘要翻译：根据本发明的实施例的柔性显示面板包括柔性基板，形成在基板上并包括栅电极的栅极线，形成在基板上的栅极绝缘层，形成在栅极绝缘层上的半导体层，基本上在整个栅电极上，形成在半导体层上的源电极和漏电极以及连接到漏电极的像素电极。半导体层的图形化以形成第二半导体部件可以包括在第一半导体部件上涂覆光致抗蚀剂膜，将光致抗蚀剂膜暴露于来自基板的背面的光，其中栅电极用作遮光掩模，显影暴露的光致抗蚀剂膜以形成具有与栅电极相同的平面尺寸的光致抗蚀剂图案，并且使用光致抗蚀剂图案作为蚀刻掩模蚀刻半导体层。

23. 发明授权

US07998843B2 Method of forming amorphous silicon layer and method of fabricating LCD using the same 有权
标题翻译：形成非晶硅层的方法和使用其制造LCD的方法
公开(公告)号：US07998843B2
公开(公告)日：2011-08-16
申请号：US12398978
申请日：2009-03-05
申请人： Tae-Hyung Hwang , Hyung-Il Jeon , Seok-Joon Hong
发明人： Tae-Hyung Hwang , Hyung-Il Jeon , Seok-Joon Hong
IPC分类号： H01L21/00
CPC分类号： H01L21/0262 , G02F1/1368 , H01L21/02532 , H01L21/02592 , H01L27/1214 , H01L27/1222 , H01L27/127
摘要： Methods and systems for forming an amorphous silicon layer are disclosed for one or more embodiments. For example, a substrate may be provided, and an amorphous silicon layer, in which a ratio of Si—H to Si—H2 has a value equal to or less than 4 to 1, may be formed on the substrate using chemical vapor deposition equipment.
摘要翻译：公开了用于形成非晶硅层的方法和系统，用于一个或多个实施例。例如，可以提供衬底，并且可以使用化学气相沉积设备在衬底上形成其中Si-H与Si-H 2的比例等于或小于4:1的非晶硅层。

24. 发明授权

US07993994B2 Method of forming crystallized silicon and method of fabricating thin film transistor and liquid crystal display using the same 有权
标题翻译：形成结晶硅的方法和使用其制造薄膜晶体管和液晶显示器的方法
公开(公告)号：US07993994B2
公开(公告)日：2011-08-09
申请号：US12412682
申请日：2009-03-27
申请人： Tae-Hyung Hwang , Hyun-Jae Kim , Do-Kyung Kim , Woong-Hee Jeong , Choong-Hee Lee , Tae-Hun Jung
发明人： Tae-Hyung Hwang , Hyun-Jae Kim , Do-Kyung Kim , Woong-Hee Jeong , Choong-Hee Lee , Tae-Hun Jung
IPC分类号： H01L21/00 , H01L21/84 , H01L21/20 , H01L21/36
CPC分类号： H01L21/02422 , H01L21/02532 , H01L21/02667 , H01L27/1281 , H01L27/1285
摘要： A method of crystallizing amorphous silicon comprises forming an amorphous silicon layer on a substrate; forming an insulating layer on the amorphous silicon layer; forming a heat distributing metal layer on the insulating layer; and forming a thermite layer on the heat distributing metal layer. Ignition heat is then applied to ignite the thermite layer and generate sufficient localized exothermic heat from the ignited thermite layer so as to crystallize the amorphous silicon layer. The substrate beneath the amorphous silicon layer can be a heat sensitive substrate which is not substantially deformed by the localized crystallizing heat applied to the top portion of the amorphous silicon layer by way of the heat distributing metal layer and the insulating layer.
摘要翻译：一种使非晶硅结晶的方法包括在衬底上形成非晶硅层; 在所述非晶硅层上形成绝缘层; 在绝缘层上形成热分布金属层; 以及在所述散热金属层上形成一个硅酸盐层。然后施加点火热以点燃铝酸盐层，并从点燃的铝酸盐层产生足够的局部放热，以使非晶硅层结晶。非晶硅层下面的衬底可以是通过通过散热金属层和绝缘层施加到非晶硅层的顶部的局部结晶热而基本上不变形的热敏衬底。

25. 发明申请

US20100087051A1 LOCAL CRYSTALLIZATION BY HEAT TREATMENT 有权
标题翻译：热处理本地结晶
公开(公告)号：US20100087051A1
公开(公告)日：2010-04-08
申请号：US12575347
申请日：2009-10-07
申请人： Tae-Hyung Hwang , Hyun-Jae Kim , Doh-Kyung Kim , Tae-Hun Jung , Woong-Hee Jeong , Choong-Hee Lee
发明人： Tae-Hyung Hwang , Hyun-Jae Kim , Doh-Kyung Kim , Tae-Hun Jung , Woong-Hee Jeong , Choong-Hee Lee
IPC分类号： H01L21/20 , B32B37/12 , B01D9/00
CPC分类号： C30B29/06 , B32B2457/202 , C30B1/023 , H01L21/02532 , H01L21/02667 , H01L27/1214 , H01L27/1218 , H01L27/1285
摘要： Disclosed is a crystallization apparatus capable of locally crystallizing amorphous silicon. The crystallization apparatus includes a heat emission part, a support part and a roller. The heat emission part emits heat upon receiving a heat emission source. The support part supports the heat emission part and provides the heat emission source to the heat emission part. The roller receives the heat emission part and has at least one opening to provide heat to a target (e.g., amorphous silicon). Local crystallization is performed without causing damage to a substrate.
摘要翻译：公开了能够局部结晶非晶硅的结晶装置。结晶装置包括发热部，支撑部和辊。发热部分在接收到发热源时发热。支撑部分支撑散热部分并将散热源提供给散热部分。辊接收热发射部分并且具有至少一个开口以向目标（例如非晶硅）提供热量。进行局部结晶而不会损坏基板。

26. 发明申请

US20080315188A1 Apparatus and method for depositing thin film 审中-公开
标题翻译：用于沉积薄膜的设备和方法
公开(公告)号：US20080315188A1
公开(公告)日：2008-12-25
申请号：US11999177
申请日：2007-12-03
申请人： Tae-Hyung Hwang , Geun-Young Yeom , Chang-Hyun Jeong , June-Hee Lee
发明人： Tae-Hyung Hwang , Geun-Young Yeom , Chang-Hyun Jeong , June-Hee Lee
IPC分类号： H01L51/05 , H01J1/62 , H05H1/24 , C23C16/00
CPC分类号： C23C16/509 , C23C16/029 , C23C16/30 , C23C16/401 , C23C28/00 , H01J37/32091 , H01L51/5256
摘要： In a thin film depositing apparatus, a first reaction gas, a second reaction gas, and a non-volatile gas are supplied to a reaction chamber in order to form a protective layer, in which an organic layer and an inorganic layer are alternately stacked, on a process substrate. The first reaction gas is supplied to the reaction chamber only while the inorganic layer is formed on the process substrate, and the second reaction gas and the non-volatile gas are supplied to the reaction chamber through while the inorganic and organic layers are formed on the process substrate. Thus, the discontinuous surfaces may be prevented from being formed between the organic layer and the inorganic layer, thereby preventing the peeling of the organic and inorganic layers and increasing light transmittance.
摘要翻译：在薄膜沉积装置中，向反应室供给第一反应气体，第二反应气体和非挥发性气体，以形成有机层和无机层交替层叠的保护层，在工艺衬底上。第一反应气体仅在无机层形成在处理基板上时才被供应到反应室，第二反应气体和非挥发性气体通过在无机层和有机层上形成时供应到反应室处理衬底。因此，可以防止在有机层和无机层之间形成不连续的表面，从而防止有机层和无机层的剥离，并增加透光率。

27. 发明授权

US08717529B2 Display apparatus and method of fabricating the same 有权
标题翻译：显示装置及其制造方法
公开(公告)号：US08717529B2
公开(公告)日：2014-05-06
申请号：US13570591
申请日：2012-08-09
申请人： Tae-Hyung Hwang , Sang-Il Kim
发明人： Tae-Hyung Hwang , Sang-Il Kim
IPC分类号： G02F1/1333 , G02F1/1335 , B05D5/06
CPC分类号： G02F1/133305 , G02F1/133514 , G02F2001/133567
摘要： A display apparatus that includes a first substrate, a second substrate, and a thin film transistor. The first substrate includes a fiber reinforced plastic substrate and a color filter layer formed on the fiber reinforced plastic substrate. The second substrate faces the first substrate. The thin film transistor is formed on the first substrate.
摘要翻译：一种显示装置，包括第一基板，第二基板和薄膜晶体管。第一基板包括纤维增强塑料基板和形成在纤维增强塑料基板上的滤色器层。第二基板面向第一基板。薄膜晶体管形成在第一基板上。

28. 发明授权

US08476634B2 Display device and method of manufacturing the same 有权
标题翻译：显示装置及其制造方法
公开(公告)号：US08476634B2
公开(公告)日：2013-07-02
申请号：US12907537
申请日：2010-10-19
申请人： Hyung-Il Jeon , Dae-Jin Park , Tae-Hyung Hwang
发明人： Hyung-Il Jeon , Dae-Jin Park , Tae-Hyung Hwang
IPC分类号： H01L29/04 , H01L29/10 , H01L31/00
CPC分类号： H01L27/1218 , H01L27/1248 , H01L29/78603
摘要： A display device includes a flexible panel and a cover member. The flexible panel includes a first substrate and a second substrate. The first substrate includes a first support layer in which an organic insulation layer and an inorganic insulation layer are stacked thereon, and a thin-film transistor and a pixel electrode disposed on the first support layer. The second substrate is opposite to the first substrate. The second substrate includes an organic insulation layer and a second support layer on which the inorganic insulation layer is deposited. The cover member covers an outer surface of the flexible panel. Thus, a display device is manufactured by using a support layer on which an organic insulation layer and an inorganic insulation layer are coated as a base substrate, so that defects generated in a manufacturing process may be prevented.
摘要翻译：显示装置包括柔性面板和盖构件。柔性面板包括第一基板和第二基板。第一基板包括其中堆叠有机绝缘层和无机绝缘层的第一支撑层，以及设置在第一支撑层上的薄膜晶体管和像素电极。第二基板与第一基板相对。第二基板包括有机绝缘层和沉积有无机绝缘层的第二支撑层。盖构件覆盖柔性面板的外表面。因此，通过使用其上涂覆有机绝缘层和无机绝缘层的支撑层作为基底基板来制造显示装置，从而可以防止制造过程中产生的缺陷。

29. 发明授权

US08222070B2 Method of forming a thin film transistor having openings formed therein 有权
公开(公告)号：US08222070B2
公开(公告)日：2012-07-17
申请号：US12857442
申请日：2010-08-16
申请人： Keun-Kyu Song , Tae-Young Choi , Tae-Hyung Hwang , Seung-Hwan Cho
发明人： Keun-Kyu Song , Tae-Young Choi , Tae-Hyung Hwang , Seung-Hwan Cho
IPC分类号： H01L21/336
摘要： A thin film transistor array panel includes a substrate, a plurality of first and second signal lines crossing each other on the substrate, source electrodes connected to the first signal lines, drain electrodes connected to the second signal lines, pixel electrodes connected to the drain electrodes, a first partition formed on the source and drain electrodes and having a first opening, wherein a lower width of the first opening is wider than an upper width of the first opening, an organic semiconductor formed in the first opening and at least overlapping the portions of the source electrode and the drain electrode, and a gate electrode connected to the second signal line and at least overlapping the portion of the organic semiconductor.

30. 发明申请

US20100067211A1 DISPLAY SUBSTRATE AND DISPLAY APPARATUS HAVING THE SAME 审中-公开
标题翻译：显示基板和显示装置
公开(公告)号：US20100067211A1
公开(公告)日：2010-03-18
申请号：US12558075
申请日：2009-09-11
申请人： Mi-Jung Han , Tae-Hyung Hwang , Sung-Jin Hong
发明人： Mi-Jung Han , Tae-Hyung Hwang , Sung-Jin Hong
IPC分类号： H05K9/00
CPC分类号： G02F1/167 , G02F2001/136218
摘要： A display substrate includes a base substrate having a plurality of pixel areas, a switching device arranged in each pixel area to switch a pixel voltage, a pixel electrode arranged in each pixel area and electrically connected to the switching device to receive the pixel voltage, and a shielding member positioned between two adjacent pixel areas.
摘要翻译：显示基板包括具有多个像素区域的基底基板，设置在每个像素区域中以切换像素电压的开关元件，布置在每个像素区域中的电连接到开关器件以接收像素电压的像素电极，以及位于两个相邻像素区域之间的屏蔽构件。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式