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21. 发明申请

US20050250338A1 Plasma device 失效
标题翻译：等离子体装置
公开(公告)号：US20050250338A1
公开(公告)日：2005-11-10
申请号：US10706423
申请日：2003-11-10
申请人： Tadahiro Ohmi , Takahisa Nitta , Masaki Hirayama , Haruyuki Takano , Ryu Kaiwara
发明人： Tadahiro Ohmi , Takahisa Nitta , Masaki Hirayama , Haruyuki Takano , Ryu Kaiwara
IPC分类号： C23C16/511 , H01J37/32 , H01L21/302 , H01L21/316
CPC分类号： H01J37/32238 , C23C16/511 , H01J37/32192 , H01J37/3244 , H01L21/02115 , H01L21/0212 , H01L21/02129 , H01L21/02164 , H01L21/0217 , H01L21/02197 , H01L21/02238 , H01L21/02247 , H01L21/02252 , H01L21/02274 , H01L21/31612 , H01L21/31625 , H01L21/31675 , H01L21/31691
摘要： A plasma device which is provided with a container, a gas supply system, and an exhaust system. The container is composed of a first dielectric plate made of a material capable of transmitting microwaves. An antenna for radiating microwaves is located on the outside of the container, and an electrode for holding an object to be treated is located inside the container. The microwave radiating surface of the antenna and the surface of the object to be treated with plasma are positioned in parallel and opposite to each other. A wall section of the container other than that constituting the first dielectric plate is composed of a member of a material having electrical conductivity higher than that of aluminum, or the internal surface of the wall section is covered with the member. The thickness (d) of the member is larger that (2/μ0σ)1/2, where σ, μ0 and ω respectively represent the electrical conductivity of the member, the permeability of vacuum and the angular frequency of the microwaves radiated from the antenna.
摘要翻译：设置有容器，气体供给系统和排气系统的等离子体装置。容器由能够传输微波的材料制成的第一电介质板组成。用于辐射微波的天线位于容器的外部，并且用于保持待处理物体的电极位于容器内部。天线的微波辐射表面和待处理物体的表面等离子体彼此平行并相对定位。容器的除构成第一电介质板之外的壁部分由导电率高于铝的材料的构件构成，或者壁部的内表面被构件覆盖。该部件的厚度（d）大于（2 /μS≤Sigma）1/2，其中σ，μ0和ω 分别表示构件的导电性，真空的磁导率和从天线辐射的微波的角频率。

22. 发明申请

US20050011935A1 Welding method for fluorine-passivated memberfor welding, fluorine-passivated method after being weld, and welded parts priority data 失效
标题翻译：用于焊接的氟钝化件的焊接方法，焊接后的氟钝化方法以及焊接部件优先数据
公开(公告)号：US20050011935A1
公开(公告)日：2005-01-20
申请号：US10805555
申请日：2004-03-19
申请人： Tadahiro Ohmi , Takahisa Nitta , Yasuyuki Shirai , Osamu Nakamura
发明人： Tadahiro Ohmi , Takahisa Nitta , Yasuyuki Shirai , Osamu Nakamura
IPC分类号： B23K9/16 , B23K1/20 , B23K9/23 , B23K35/38
CPC分类号： B23K35/383 , B23K1/20 , Y10T428/12535 , Y10T428/12979 , Y10T428/31678
摘要： The present invention provides a welding method for materials to be welded which are subjected to fluoride passivation treatment, and a fluoride passivation retreatment method, wherein, when fluoride passivation retreatment was conducted after welding, there is no generation of particles or dust, and superior resistance is provided to fluorine system gases. In the present invention, when materials to be welded comprising stainless steel subjected to fluoride passivation treatment are welded, hydrogen is added to the gas (the back shield gas) flowing through the materials to be welded. Furthermore, in the welding method for materials to be welded which are subjected to fluoride passivation treatment in accordance with the present invention, the thickness of the fluoride passivated film in a predetermined range from the butt end surfaces of the materials to be welded, comprising stainless steel subjected to a fluoride passivation treatment, is set to 10 nm or less, and welding is conducted. Furthermore, in the fluoride passivation retreatment method in accordance with the present invention, after conducting the welding method described above, at least the welded parts are heated, and a gas containing fluorine gas is caused to flow in the interior part.
摘要翻译：本发明提供一种待进行氟化物钝化处理的待焊接材料的焊接方法，以及氟化物钝化再处理方法，其中，在焊接后进行氟化物钝化再处理时，不产生颗粒或灰尘，且具有优异的电阻被提供给氟系气体。在本发明中，当焊接包含不锈钢的待焊接材料进行氟化物钝化处理时，向流过待焊接材料的气体（背面保护气体）添加氢。此外，在根据本发明的被氟化物钝化处理的待焊接材料的焊接方法中，氟化钝化膜的厚度在待焊接材料的对接端面的预定范围内，包括不锈钢进行氟化物钝化处理的钢被设定为10nm以下，进行焊接。此外，在本发明的氟化物钝化再处理方法中，在进行了上述的焊接方法之后，至少加热了焊接部，并且使含有氟气的气体在内部流动。

23. 发明授权

US06818320B2 Welding method for welded members subjected to fluoride passivation treatment, fluoride passivation retreatment method, and welded parts 失效
标题翻译：氟化物钝化处理焊接件的焊接方法，氟化物钝化再处理方法和焊接部件
公开(公告)号：US06818320B2
公开(公告)日：2004-11-16
申请号：US09748883
申请日：2000-12-27
申请人： Tadahiro Ohmi , Takahisa Nitta , Yasuyuki Shirai , Osamu Nakamura
发明人： Tadahiro Ohmi , Takahisa Nitta , Yasuyuki Shirai , Osamu Nakamura
IPC分类号： B21D3900
CPC分类号： B23K35/383 , B23K1/20 , Y10T428/12535 , Y10T428/12979 , Y10T428/31678
摘要： A welding method for materials to be welded which are subjected to fluoride passivation treatment, and a fluoride passivation retreatment method, wherein, when fluoride passivation retreatment is conducted after welding, there is no generation of particles or dust. The method provides superior resistance to fluorine system gases. During fluoride passivation treatment, hydrogen is added to the gas (the back shield gas) flowing through the materials to be welded. In one embodiment of the welding method, the thickness of the fluoride passivated film in a predetermined range from the butt end surfaces of the materials to be welded is set to 10 nm or less, followed by subsequent welding. Furthermore, the fluoride passivation retreatment method, includes the steps of heating at least the welded parts following welding and flowing a gas containing fluorine gas in the interior portion of the parts.
摘要翻译：对经过氟化物钝化处理的待焊接材料的焊接方法以及氟化物钝化再处理方法，其中，在焊接后进行氟化物钝化再处理时，不产生颗粒或灰尘。该方法提供了优异的耐氟体系气体阻力。在氟化物钝化处理期间，将氢气流入待焊接材料的气体（背面保护气体）。在焊接方法的一个实施例中，氟化钝化膜在待焊接材料的对接端面的预定范围内的厚度设定为10nm以下，随后进行焊接。此外，氟化物钝化再处理方法包括以下步骤：至少在焊接之后加热焊接部分，并且在部件的内部部分使含有氟气的气体流动。

24. 发明授权

US06733732B2 Reactor for generating moisture 有权
标题翻译：反应器产生水分
公开(公告)号：US06733732B2
公开(公告)日：2004-05-11
申请号：US09783287
申请日：2001-02-15
申请人： Tadahiro Ohmi , Koji Kawada , Yoshikazu Tanabe , Takahisa Nitta , Nobukazu Ikeda , Akihiro Morimoto , Keiji Hirao , Hiroshi Morokoshi , Yukio Minami
发明人： Tadahiro Ohmi , Koji Kawada , Yoshikazu Tanabe , Takahisa Nitta , Nobukazu Ikeda , Akihiro Morimoto , Keiji Hirao , Hiroshi Morokoshi , Yukio Minami
IPC分类号： B01J802
CPC分类号： C01B5/00
摘要： A reactor comprising a body made of a heat-resistant material and having an inlet and an outlet for water/moisture gas, having a gas-diffusing member provided in an internal space of the body, and having a platinum coating on an internal wall surface of the body. Hydrogen and oxygen fed from the inlet are diffused by the gas-diffusing member and then come into contact with the platinum coating to enhance reactivity, thereby producing water. A temperature of the reactor is held to be below an ignition temperature of hydrogen or a hydrogen-containing gas. The platinum-coated catalyst layer on the internal wall of the reactor body is formed by treating the surface of the internal wall of the body, cleaning the treated surface, forming a barrier coating of a nonmetallic material of an oxide or nitride on the wall surface, and forming the platinum coating on the barrier coating.
摘要翻译：一种反应器，包括由耐热材料制成并具有用于水/湿气的入口和出口的本体，其具有设置在所述主体的内部空间中的气体扩散构件，并且在内壁表面上具有铂涂层的身体。从入口供给的氢气和氧气被气体扩散构件扩散，然后与铂涂层接触以提高反应性，从而产生水。反应器的温度保持在低于氢气或含氢气体的点火温度。反应器主体内壁上的铂涂层催化剂层是通过处理体内表面，清洁处理过的表面，在壁表面上形成氧化物或氮化物的非金属材料的阻挡涂层形成的，并在阻挡涂层上形成铂涂层。

25. 发明授权

US06719875B1 Plasma process apparatus 失效
标题翻译：等离子体处理装置
公开(公告)号：US06719875B1
公开(公告)日：2004-04-13
申请号：US09365923
申请日：1999-08-03
申请人： Tadahiro Ohmi , Takahisa Nitta , Masaki Hirayama , Ryu Kaiwara , Kazuhide Ino
发明人： Tadahiro Ohmi , Takahisa Nitta , Masaki Hirayama , Ryu Kaiwara , Kazuhide Ino
IPC分类号： H05H100
CPC分类号： H01J37/32623 , H01J37/3266 , H01J37/32697
摘要： The plasma process apparatus is capable of uniformalizing the density of a plasma generated thereby and a self-bias voltage associated therewith. This apparatus include two parallel plates electrodes I and II, one of electrodes I and II being configured for carrying a substrate to be plasma processed. The apparatus further includes a magnetic field applying means for applying a magnetic field horizontal and one-directional to a surface of the substrate. An additional element of the apparatus is a single auxiliary electrode positioned around the periphery of electrode I and having high-frequency power applied thereto. The alignment of the electrodes is such that they define a space where a plasma for use in processing the substrate is to be excited.
摘要翻译：等离子体处理装置能够均匀化由此产生的等离子体的密度和与其相关联的自偏压。该装置包括两个平行板电极I和II，电极I和II中的一个被配置为承载待等离子体处理的衬底。该装置还包括一个磁场施加装置，用于将一个水平和一个方向的磁场施加到基板的表面。设备的附加元件是位于电极I的周边周围并具有施加到其上的高频功率的单个辅助电极。电极的对准使得它们限定了用于处理衬底的等离子体被激发的空间。

26. 发明授权

US5990060A Cleaning liquid and cleaning method 失效
标题翻译：清洗液和清洗方法
公开(公告)号：US5990060A
公开(公告)日：1999-11-23
申请号：US30299
申请日：1998-02-25
申请人： Tadahiro Ohmi , Shunkichi Omae , Takayuki Jizaimaru , Takahisa Nitta
发明人： Tadahiro Ohmi , Shunkichi Omae , Takayuki Jizaimaru , Takahisa Nitta
IPC分类号： B08B3/08 , C03C23/00 , C09K13/00 , C11D3/02 , C11D3/39 , C11D7/10 , C11D7/18 , C11D11/00 , H01L21/027 , H01L21/304 , C09K13/08
CPC分类号： C11D3/046 , C03C23/0075 , C09K13/00 , C11D11/0047 , C11D3/3947
摘要： A cleaning method and a cleaning device which require an extremely short time for processing and also insure and extremely high cleaning effect. Foreign materials deposited on a substrate are removed with a cleaning liquid prepared by mixing a basic and water-soluble fluoride and an oxidizing agent in pure water.
摘要翻译：一种清洁方法和清洁装置，其需要极短的时间进行加工，并且还具有高的清洁效果。通过将碱性和水溶性氟化物和氧化剂在纯水中混合而制备的清洗液除去沉积在基材上的异物。

27. 发明授权

US5895509A Abrasive composition 失效
标题翻译：磨料组成
公开(公告)号：US5895509A
公开(公告)日：1999-04-20
申请号：US980649
申请日：1997-12-01
申请人： Tadahiro Ohmi , Takahisa Nitta
发明人： Tadahiro Ohmi , Takahisa Nitta
IPC分类号： B24B37/00 , C09K3/14 , H01L21/304 , H01L21/306 , B24D3/34
CPC分类号： C09K3/1463 , H01L21/30625
摘要： An abrasive composition which can realize chemical-mechanical polishing superior in polishing speed and polishing uniformity.The abrasive composition comprises abrasive grains, isopropyl alcohol, and water. Grain sizes of the abrasive grains are preferably 30 to 250 nm, and the abrasive grains are preferably SiO.sub.2. Further, it is preferable that contents of the abrasive grains and isopropyl alcohol are 5 to 30 wt % and 1 to 15 wt %, respectively. The abrasive composition of the present invention is characterized in that it is deaerated.
摘要翻译：可以实现抛光速度和抛光均匀性优异的化学机械抛光的磨料组合物。磨料组合物包括磨料颗粒，异丙醇和水。磨粒的粒径优选为30〜250nm，磨粒优选为SiO 2。此外，优选磨粒和异丙醇的含量分别为5〜30重量％和1〜15重量％。本发明的磨料组合物的特征在于它是脱气的。

28. 发明授权

US08420974B2 Long life welding electrode and its fixing structure, welding head, and welding method 有权
标题翻译：长寿命焊接电极及其固定结构，焊接头和焊接方法
公开(公告)号：US08420974B2
公开(公告)日：2013-04-16
申请号：US10266480
申请日：2002-10-08
申请人： Tadahiro Ohmi , Takahisa Nitta , Yasuyuki Shirai , Osamu Nakamura
发明人： Tadahiro Ohmi , Takahisa Nitta , Yasuyuki Shirai , Osamu Nakamura
IPC分类号： B23K9/16 , B23K9/24
CPC分类号： B23K9/28 , B23K9/24 , B23K35/0205 , B23K35/222 , B23K35/383
摘要： A fixing structure for a welding electrode and a welding head is shown which enable improvement of durability of a welding electrode, improvement of work efficiency in welding, and a reduction of time required for welding and also which make it possible to execute welding for an extended time with high reliability. In the fixing structure, a fixed section of a welding electrode is inserted via a thermally conductive material into an inserting section of a fixing base and a peripheral surface of the fixed section of the welding electrode is uniformly contacted to the fixing base to affix the welding electrode to the fixing base.
摘要翻译：示出了用于焊接电极和焊接头的固定结构，其能够提高焊接电极的耐久性，提高焊接中的工作效率，并且减少焊接所需的时间，并且还可以执行用于扩展的焊接时间高可靠性。在固定结构中，焊接电极的固定部分经由导热材料插入到固定基座的插入部分中，并且焊接电极的固定部分的周面与固定基座均匀接触以固定焊接电极到固定基座。

29. 发明授权

US07312415B2 Plasma method with high input power 失效
标题翻译：具有高输入功率的等离子体方法
公开(公告)号：US07312415B2
公开(公告)日：2007-12-25
申请号：US10706423
申请日：2003-11-10
申请人： Tadahiro Ohmi , Takahisa Nitta , Masaki Hirayama , Haruyuki Takano , Ryu Kaiwara
发明人： Tadahiro Ohmi , Takahisa Nitta , Masaki Hirayama , Haruyuki Takano , Ryu Kaiwara
IPC分类号： B23K10/00
CPC分类号： H01J37/32238 , C23C16/511 , H01J37/32192 , H01J37/3244 , H01L21/02115 , H01L21/0212 , H01L21/02129 , H01L21/02164 , H01L21/0217 , H01L21/02197 , H01L21/02238 , H01L21/02247 , H01L21/02252 , H01L21/02274 , H01L21/31612 , H01L21/31625 , H01L21/31675 , H01L21/31691
摘要： A plasma device which is provided with a container, a gas supply system, and an exhaust system. The container is composed of a first dielectric plate made of a material capable of transmitting microwaves. An antenna for radiating microwaves is located on the outside of the container, and an electrode for holding an object to be treated is located inside the container. The microwave radiating surface of the antenna and the surface of the object to be treated with plasma are positioned in parallel and opposite to each other. A wall section of the container other than that constituting the first dielectric plate is composed of a member of a material having electrical conductivity higher than that of aluminum, or the internal surface of the wall section is covered with the member. The thickness (d) of the member is larger that (2/μ0σ)1/2, where σ, μ0 and ω respectively represent the electrical conductivity of the member, the permeability of vacuum and the angular frequency of the microwaves radiated from the antenna.
摘要翻译：设置有容器，气体供给系统和排气系统的等离子体装置。容器由能够传输微波的材料制成的第一电介质板组成。用于辐射微波的天线位于容器的外部，并且用于保持待处理物体的电极位于容器内部。天线的微波辐射表面和待处理物体的表面等离子体彼此平行并相对定位。容器的除构成第一电介质板之外的壁部分由导电率高于铝的材料的构件构成，或者壁部的内表面被构件覆盖。该部件的厚度（d）大于（2 /μS≤Sigma）1/2，其中σ，μ0和ω 分别表示构件的导电性，真空的磁导率和从天线辐射的微波的角频率。

30. 发明授权

US06962283B2 Welding method for fluorine-passivated member for welding, fluorine-passivated method after being weld, and welded parts priority data 失效
标题翻译：用于焊接的氟钝化部件的焊接方法，焊接后的氟钝化方法以及焊接部件的优先权数据
公开(公告)号：US06962283B2
公开(公告)日：2005-11-08
申请号：US10805555
申请日：2004-03-19
申请人： Tadahiro Ohmi , Takahisa Nitta , Yasuyuki Shirai , Osamu Nakamura
发明人： Tadahiro Ohmi , Takahisa Nitta , Yasuyuki Shirai , Osamu Nakamura
IPC分类号： B23K9/16 , B23K1/20 , B23K9/23 , B23K35/38 , B23K5/213 , B23K20/24 , B23K31/02
CPC分类号： B23K35/383 , B23K1/20 , Y10T428/12535 , Y10T428/12979 , Y10T428/31678
摘要： The present invention provides a welding method for materials to be welded which are subjected to fluoride passivation treatment, and a fluoride passivation retreatment method, wherein, when fluoride passivation retreatment was conducted after welding, there is no generation of particles or dust, and superior resistance is provided to fluorine system gases.In the present invention, when materials to be welded comprising stainless steel subjected to fluoride passivation treatment are welded, hydrogen is added to the gas (the back shield gas) flowing through the materials to be welded. Furthermore, in the welding method for materials to be welded which are subjected to fluoride passivation treatment in accordance with the present invention, the thickness of the fluoride passivated film in a predetermined range from the butt end surfaces of the materials to be welded, comprising stainless steel subjected to a fluoride passivation treatment, is set to 10 nm or less, and welding is conducted. Furthermore, in the fluoride passivation retreatment method in accordance with the present invention, after conducting the welding method described above, at least the welded parts are heated, and a gas containing fluorine gas is caused to flow in the interior part.
摘要翻译：本发明提供一种待进行氟化物钝化处理的待焊接材料的焊接方法，以及氟化物钝化再处理方法，其中，在焊接后进行氟化物钝化再处理时，不产生颗粒或灰尘，且具有优异的电阻被提供给氟系气体。在本发明中，当焊接包含不锈钢的待焊接材料进行氟化物钝化处理时，向流过待焊接材料的气体（背面保护气体）添加氢。此外，在根据本发明的被氟化物钝化处理的待焊接材料的焊接方法中，氟化钝化膜的厚度在待焊接材料的对接端面的预定范围内，包括不锈钢进行氟化物钝化处理的钢被设定为10nm以下，进行焊接。此外，在本发明的氟化物钝化再处理方法中，在进行了上述的焊接方法之后，至少加热了焊接部，并且使含有氟气的气体在内部流动。

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