会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 23. 发明授权
    • Correction system for droplet placement errors in the scan axis in inkjet printers
    • 喷墨打印机中扫描轴上液滴放置误差的校正系统
    • US06364447B1
    • 2002-04-02
    • US09506736
    • 2000-02-18
    • Miguel BoledaStefano SchiaffinoAlbert Serra
    • Miguel BoledaStefano SchiaffinoAlbert Serra
    • B41J201
    • B41J19/145
    • A method and apparatus for correcting for drop placement errors due to relative rotation between an inkjet printhead mounted in a printer carriage and the print media to be printed on comprises first determining the relative contribution to the drop placement error due to rotation of the printhead about the scan axis (Y axis error), then, with respect to any determined Y axis error, applying the same magnitude and sense of correction for drop placement errors while printing in both a first scanning direction of the carriage and while printing in a second scanning direction of the carriage. Errors due to rotation about the Z axis are also corrected for. Preferably the errors are determined by printing and scanning a test pattern.
    • 用于校正由于安装在打印机托架中的喷墨打印头和要打印的打印介质之间的相对旋转引起的墨滴放置误差的方法和装置包括首先确定由于打印头围绕着打印头的旋转而引起的落放位置误差的相对贡献 扫描轴(Y轴误差),然后相对于任何确定的Y轴误差,在打印在滑架的第一扫描方向上并且在第二扫描方向上打印时施加相同的幅度和校正误差感 的马车。 由于绕Z轴旋转的错误也会被修正。 优选地,通过打印和扫描测试图案来确定错误。
    • 27. 发明授权
    • Electrical contacts for a semiconductor light emitting apparatus
    • 用于半导体发光装置的电触头
    • US07842963B2
    • 2010-11-30
    • US11550488
    • 2006-10-18
    • Stefano SchiaffinoJohn Julian Uebbing
    • Stefano SchiaffinoJohn Julian Uebbing
    • H01L33/62
    • H01L33/382H01L33/20
    • A process for forming electrical contacts for a semiconductor light emitting apparatus is disclosed. The light emitting apparatus has a first layer of first conductivity type, an active layer for generating light overlying the first layer, and a second layer of second conductivity type overlying the active layer. The process involves forming at least a first and a second elongate electrical contact through the second layer and the active layer to provide electrical connection to the first layer, the first and second contacts oriented at an angle to each other, the first contact having a first end in proximity with the second contact, the first end being sufficiently spaced apart from the second contact such that when current is supplied to the first layer through the contacts, current contributions from the first end of the first contact and the second contact in an area generally between the first end and the second contact cause a current density in the area that is approximately equal to a current density elsewhere along the first and second contacts.
    • 公开了一种用于形成用于半导体发光装置的电触头的工艺。 发光装置具有第一导电类型的第一层,用于产生覆盖第一层的光的有源层和覆盖有源层的第二导电类型的第二层。 该方法包括通过第二层和有源层至少形成第一和第二细长电接触以提供与第一层的电连接,第一和第二接触彼此成一定角度,第一接触具有第一 在第二触点附近端部,第一端与第二触点充分隔开,使得当电流通过触点供应到第一层时,来自第一触点的第一端和第一触点的区域中的电流贡献 通常在第一端和第二接触之间引起区域中的电流密度近似等于沿着第一和第二接触件的其他地方的电流密度。