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21. 发明授权

US08896406B2 Laminated coil 有权
标题翻译：层压线圈
公开(公告)号：US08896406B2
公开(公告)日：2014-11-25
申请号：US13611940
申请日：2012-09-12
申请人： Satoshi Yamamoto
发明人： Satoshi Yamamoto
IPC分类号： H01F27/30 , H01F5/00 , H01F27/28 , H01F27/32
CPC分类号： H01F5/00 , H01F27/2847 , H01F27/303 , H01F27/323
摘要： A laminated coil includes a plurality of circular conductive plates in the form of a flat plate, each of the circular conductive plates being laminated via an insulating material in an axis direction. The plurality of circular conductive plates each include a plurality of concentric circular arc parts having different inner diameter and outer diameter from each other, and a connection part interconnecting the plurality of circular arc parts. The plurality of circular conductive plates are arranged such that the connection parts thereof face each other and the circular arc parts thereof are juxtaposed to each other in a radial direction.
摘要翻译：层叠线圈包括平板形状的多个圆形导电板，每个圆形导电板通过绝缘材料沿轴向层压。多个圆形导电板各自包括彼此具有不同内径和外径的多个同心圆弧部分和将多个圆弧部分互连的连接部分。多个圆形导电板被布置成使得其连接部分彼此面对，并且其圆弧部分在径向方向上彼此并置。

22. 发明授权

US08690558B2 Compressor and manufacturing method thereof 有权
标题翻译：压缩机及其制造方法
公开(公告)号：US08690558B2
公开(公告)日：2014-04-08
申请号：US13438817
申请日：2012-04-03
申请人： Mitsuhiko Kishikawa , Takashi Hirouchi , Hiroyuki Yamaji , Mikio Kajiwara , Satoshi Yamamoto , Mie Arai
发明人： Mitsuhiko Kishikawa , Takashi Hirouchi , Hiroyuki Yamaji , Mikio Kajiwara , Satoshi Yamamoto , Mie Arai
IPC分类号： F01C21/00 , F04C15/00 , B23P15/00
CPC分类号： F01C21/108 , F04C18/0215 , F04C18/322 , F04C18/356 , F04C23/008 , F04C2230/231 , F04C2230/60 , Y10T29/49229 , Y10T29/49236 , Y10T29/4924 , Y10T29/49245
摘要： The compressor includes a first constituent element and a first slider. The first constituent element is capable of being laser welded. The first slider is composed of cast iron capable of being laser welded and having a carbon content of from 2.0 wt % or more to 2.7 wt % or less. This first slider is joined to the first constituent element by laser welding without using a filler.
摘要翻译：压缩机包括第一构成元件和第一滑块。第一组成元件可以被激光焊接。第一滑块由能够被激光焊接且碳含量为2.0重量％以上至2.7重量％以下的铸铁构成。该第一滑块通过激光焊接而不使用填充物与第一组成元件连接。

23. 发明授权

US08654464B2 Implementing magnetic defect classification using phase modulation 失效
标题翻译：使用相位调制实现磁缺陷分类
公开(公告)号：US08654464B2
公开(公告)日：2014-02-18
申请号：US13277047
申请日：2011-10-19
申请人： Richard Leo Galbraith , Weldon Mark Hanson , Martin Aureliano Hassner , Travis Roger Oenning , Satoshi Yamamoto
发明人： Richard Leo Galbraith , Weldon Mark Hanson , Martin Aureliano Hassner , Travis Roger Oenning , Satoshi Yamamoto
IPC分类号： G11B5/02
CPC分类号： G11B5/09 , G11B20/18 , G11B27/36 , G11B2020/1826 , G11B2220/2516
摘要： A method, apparatus, and system are provided for implementing magnetic defect classification using phase modulation for hard disk drives. A magnetic media readback signal of a hard disk drive is processed to identify predefined phase modulation (PM) characteristics to implement magnetic defect classification of magnetic media bump and pit defects.
摘要翻译：提供了一种使用硬盘驱动器的相位调制实现磁缺陷分类的方法，装置和系统。处理硬盘驱动器的磁性媒体回读信号以识别预定的相位调制（PM）特性，以实现磁性介质凸起和凹坑缺陷的磁性缺陷分类。

24. 发明授权

US08357688B2 Substituted imidazo[1,5-a]quinoxalin-4(5H)-ones as PDE9 inhibitors 有权
标题翻译：取代的咪唑并[1,5-a]喹喔啉-4（5H） - 酮作为PDE9抑制剂
公开(公告)号：US08357688B2
公开(公告)日：2013-01-22
申请号：US13254368
申请日：2010-03-04
申请人： Hiroyuki Kaizawa , Mari Sugita , Hidenori Azami , Ryushi Seo , Takaho Nomura , Satoshi Yamamoto , Hirofumi Yamamoto , Kazuyuki Tsuchiya , Hideki Kubota , Kazunori Kamijo
发明人： Hiroyuki Kaizawa , Mari Sugita , Hidenori Azami , Ryushi Seo , Takaho Nomura , Satoshi Yamamoto , Hirofumi Yamamoto , Kazuyuki Tsuchiya , Hideki Kubota , Kazunori Kamijo
IPC分类号： A61K31/495
CPC分类号： C07D498/04 , C07D487/04 , C07D491/107 , C07D519/00
摘要： Substituted imidazo[1,5-a]quinoxalin-4(5H)-ones are useful as PDE9 inhibitors.
摘要翻译：取代的咪唑并[1,5-a]喹喔啉-4（5H） - 酮可用作PDE9抑制剂。

25. 发明授权

US08329742B2 Macrocyclic compounds useful as pharmaceuticals 有权
标题翻译：用作药物的大环化合物
公开(公告)号：US08329742B2
公开(公告)日：2012-12-11
申请号：US12839873
申请日：2010-07-20
申请人： Roch Boivin , Kenichi Chiba , Jesse Chow , Hong Du , Yoshihito Eguchi , Masanori Fujita , Masaki Goto , Fabian Gusovsky , Jean-Christophe Harmange , Atsushi Inoue , Yimin Jiang , Megumi Kawada , Takatoshi Kawai , Yoshiyuki Kawakami , Akifumi Kimura , Makoto Kotake , Yoshikazu Kuboi , Charles-André Lemelin , Xiang-Yi Li , Tomohiro Matsushima , Yoshiharu Mizui , Kenzo Muramoto , Hideki Sakurai , Yong-Chun Shen , Hiroshi Shirota , Mark Spyvee , Isao Tanaka , John (Yuan) Wang , Satoshi Yamamoto , Naoki Yoneda
发明人： Roch Boivin , Kenichi Chiba , Jesse Chow , Hong Du , Yoshihito Eguchi , Masanori Fujita , Masaki Goto , Fabian Gusovsky , Jean-Christophe Harmange , Atsushi Inoue , Yimin Jiang , Megumi Kawada , Takatoshi Kawai , Yoshiyuki Kawakami , Akifumi Kimura , Makoto Kotake , Yoshikazu Kuboi , Charles-André Lemelin , Xiang-Yi Li , Tomohiro Matsushima , Yoshiharu Mizui , Kenzo Muramoto , Hideki Sakurai , Yong-Chun Shen , Hiroshi Shirota , Mark Spyvee , Isao Tanaka , John (Yuan) Wang , Satoshi Yamamoto , Naoki Yoneda
IPC分类号： A61K31/355 , C07D313/00
CPC分类号： C07D405/12 , A61K31/335 , A61K31/36 , A61K31/395 , C07D231/12 , C07D233/56 , C07D249/08 , C07D313/00 , C07D401/12 , C07D491/04 , C07D491/044 , C07D493/04 , Y02A50/411
摘要： The present invention provides methods for the use of compounds having formula (I) in the treatment of various disorders including inflammatory or autoimmune disorders, and disorders involving malignancy or increased angiogenesis, wherein R1-R11, t, X, Y, Z, and n are as defined herein.
摘要翻译：本发明提供了使用具有式（I）的化合物在治疗各种疾病（包括炎性或自身免疫性疾病）以及涉及恶性肿瘤或增加血管发生的疾病的方法，其中R1-R11，t，X，Y，Z和n 如本文所定义。

26. 发明申请

US20120149433A1 SMART PHONE DISPLAY AND KEYBOARD EXTENSION 审中-公开
标题翻译：智能手机显示屏和键盘扩展
公开(公告)号：US20120149433A1
公开(公告)日：2012-06-14
申请号：US12966920
申请日：2010-12-13
申请人： Fu-Ying Huang , Lidu Huang , Jia-Yang Juang , Chiaoping Ku , Satoshi Yamamoto
发明人： Fu-Ying Huang , Lidu Huang , Jia-Yang Juang , Chiaoping Ku , Satoshi Yamamoto
IPC分类号： H04W88/02
CPC分类号： H04M1/72527
摘要： A device for providing an external display and keypad for a smart-phone. The device has a port for receiving the smart phone. The device does not have its own computing power, but uses the computing power of the smart phone itself, thereby allowing the device to be smaller, lighter and less expensive than a standard lap-top computer not notebook device. The device is configured with a port for receiving a smart-phone and preferably holds the smart phone so that does not extend above the surface of the device or is flush with the surface of the device. The device can also be configured to allow the smart phone itself to act as a numerical keypad adjacent to the keypad provided on the device.
摘要翻译：用于为智能手机提供外部显示器和键盘的设备。该设备具有用于接收智能电话的端口。该设备不具有自己的计算能力，而是使用智能手机本身的计算能力，从而允许设备比标准笔记本电脑而不是笔记本设备更小，更轻，更便宜。该设备配置有用于接收智能电话的端口，并且优选地保持智能电话，使得其不在设备的表面上方延伸或者与设备的表面齐平。该设备还可以被配置为允许智能电话本身充当与设备上提供的小键盘相邻的数字键盘。

27. 发明申请

US20120035364A1 TETRATHIAFULVALENE DERIVATIVE, AND ORGANIC FILM AND ORGANIC TRANSISTOR USING THE SAME 失效
标题翻译：四面体衍生物，有机膜和有机晶体管
公开(公告)号：US20120035364A1
公开(公告)日：2012-02-09
申请号：US13259535
申请日：2010-03-17
申请人： Masato Shinoda , Satoshi Yamamoto , Toshiya Sagisaka , Takuji Kato , Takashi Okada , Daisuke Goto , Shinji Matsumoto , Masataka Mohri
发明人： Masato Shinoda , Satoshi Yamamoto , Toshiya Sagisaka , Takuji Kato , Takashi Okada , Daisuke Goto , Shinji Matsumoto , Masataka Mohri
IPC分类号： C07D495/04 , C07D409/04
CPC分类号： C07D339/06 , C07D495/04 , H01L51/0074 , H01L51/0545 , H01L51/0558
摘要： A tetrathiafulvalene derivative expressed by General Formula (I): General Formula (I) in General Formula (I), X represents an atom selected from a carbon atom, a sulfur atom, and a nitrogen atom, and Xs may be the same or different; provided that when X is the carbon atom or the nitrogen atom, R1 to R8 each represent one of a hydrogen atom, a halogen atom, a substituted or unsubstituted alkyl group, a substituted or unsubstituted alkoxy group, and a substituted or unsubstituted thioalkoxy group, and may be the same or different; and Y1 and Y2 each represent one of structures expressed by General Formulas (II) and (III), and may be the same or different: General Formula (II) General Formula (III).
摘要翻译：由通式（I）表示的四硫富瓦烯衍生物：通式（I）中的通式（I），X表示选自碳原子，硫原子和氮原子的原子，X可以相同或不同 ; 条件是当X是碳原子或氮原子时，R 1至R 8各自表示氢原子，卤素原子，取代或未取代的烷基，取代或未取代的烷氧基和取代或未取代的硫代烷氧基中的一个，并且可以相同或不同; 并且Y1和Y2各自表示通式（II）和（III）表示的结构之一，并且可以相同或不同：通式（II）通式（III）。

28. 发明申请

US20120034563A1 RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN 有权
标题翻译：耐蚀组合物及其制造方法
公开(公告)号：US20120034563A1
公开(公告)日：2012-02-09
申请号：US13196446
申请日：2011-08-02
申请人： Koji ICHIKAWA , Satoshi Yamamoto
发明人： Koji ICHIKAWA , Satoshi Yamamoto
IPC分类号： G03F7/38 , G03F7/039
CPC分类号： G03F7/0045 , G03F7/0046 , G03F7/0397 , G03F7/2041 , G03F7/2059
摘要： A resist composition contains; a resin having a structural unit derived from a compound represented by the formula (a); and an acid generator represented by the formula (B1). wherein R1 represents a hydrogen atom or a methyl group; A10 represents a single bond, an optionally substituted C1 to C6 alkanediyl group or the like; W1 represents an optionally substituted C4 to C36 alicyclic hydrocarbon group; A20 in each occurrence independently represents an optionally substituted C1 to C6 aliphatic hydrocarbon group; R2 in each occurrence independently represents a C1 to C12 perfluoroalkyl group; n represents 1 or 2; Q1 and Q2 independently represent a fluorine atom or a C1 to C6 perfluoroalkyl group; Lb1 represents an optionally substituted C1 to C17 divalent aliphatic hydrocarbon group; Y represents an optionally substituted C1 to C18 aliphatic hydrocarbon group; and Z+ represents an organic cation.
摘要翻译：抗蚀剂组合物含有具有衍生自由式（a）表示的化合物的结构单元的树脂; 和由式（B1）表示的酸发生剂。其中R1表示氢原子或甲基; A10表示单键，可以具有取代基的C1〜C6烷二基等; W1表示任选取代的C4至C36脂环族烃基; A20每次独立地表示任选取代的C 1至C 6脂族烃基; R2各自独立地表示C1〜C12全氟烷基; n表示1或2; Q1和Q2独立地表示氟原子或C1〜C6全氟烷基; Lb1表示任选取代的C 1至C 17二价脂族烃基; Y表示任选取代的C 1至C 18脂族烃基; Z +表示有机阳离子。

29. 发明授权

US08041153B2 Processing device, processing method and computer readable medium 有权
标题翻译：处理装置，处理方法和计算机可读介质
公开(公告)号：US08041153B2
公开(公告)日：2011-10-18
申请号：US13006549
申请日：2011-01-14
申请人： Yasuhiko Kaneko , Junichi Kaneko , Satoshi Yamamoto , Michitaka Hariya , Takashi Nagao , Yukio Kumazawa , Noriaki Seki
发明人： Yasuhiko Kaneko , Junichi Kaneko , Satoshi Yamamoto , Michitaka Hariya , Takashi Nagao , Yukio Kumazawa , Noriaki Seki
IPC分类号： G06K9/60
CPC分类号： G06T1/20
摘要： A processing device has plural processing modules executing a processing; and plural connectors each having a linking section, an associating section, and a controller. The linking section is able to link with at least one other connector at an input side or an output side. The associating section associates the connector with one of the processing modules. In accordance with a linked state, the controller controls the processing module associated by the associating section.
摘要翻译：处理装置具有执行处理的多个处理模块; 以及多个连接器，每个具有连接部分，关联部分和控制器。连接部分能够在输入侧或输出侧与至少一个其它连接器连接。关联部分将连接器与其中一个处理模块相关联。根据链接状态，控制器控制由关联部分相关联的处理模块。

30. 发明申请

US20110189618A1 RESIST PROCESSING METHOD 审中-公开
标题翻译：电阻加工方法
公开(公告)号：US20110189618A1
公开(公告)日：2011-08-04
申请号：US13062180
申请日：2009-09-01
申请人： Mitsuhiro Hata , Nobuo Ando , Satoshi Yamamoto , Junji Shigematsu , Akira Kamabuchi
发明人： Mitsuhiro Hata , Nobuo Ando , Satoshi Yamamoto , Junji Shigematsu , Akira Kamabuchi
IPC分类号： G03F7/20
CPC分类号： G03F7/0035 , G03F7/0045 , G03F7/0046 , G03F7/0397 , G03F7/40
摘要： A resist processing method comprises the steps of: (1) forming a first resist film by applying a first resist composition comprising: a resin (A) having an acid-labile group, being insoluble or poorly soluble in alkali aqueous solution, and being rendered soluble in alkali aqueous solution through the action of an acid, a photo acid generator (B), a cross-linking agent (C) and an acid amplifier (D) onto a substrate and drying; (2) prebaking the first resist film; (3) exposing to the first resist film; (4) post-exposure baking of the first resist film; (5) developing with a first alkali developer to obtain a first resist pattern; (6) hard-baking the first resist pattern, (7) obtaining a second resist film by applying a second resist composition onto the first resist pattern, and drying; (8) pre-baking the second resist film; (9) exposing the second resist film; (10) post-exposure baking the second resist film; and (11) developing with a second alkali developer to obtain a second resist pattern.
摘要翻译：抗蚀剂处理方法包括以下步骤：（1）通过施加第一抗蚀剂组合物形成第一抗蚀剂膜，所述第一抗蚀剂组合物包含：具有酸不稳定基团的树脂（A），其在碱性水溶液中不溶或难溶，并且呈现通过酸，光酸产生剂（B），交联剂（C）和酸放大器（D）的作用将其溶于碱水溶液中并干燥; （2）预烘第一抗蚀膜; （3）暴露于第一抗蚀膜; （4）第一抗蚀剂膜的曝光后烘烤; （5）用第一碱性显影剂显影以获得第一抗蚀剂图案; （6）硬烘烤第一抗蚀剂图案，（7）通过将第二抗蚀剂组合物施加到第一抗蚀剂图案上并干燥获得第二抗蚀剂膜; （8）预烘烤第二抗蚀剂膜; （9）使第二抗蚀剂膜曝光; （10）曝光后烘烤第二抗蚀膜; 和（11）用第二碱性显影剂显影以获得第二抗蚀剂图案。

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