会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 25. 发明专利
    • FR2697926B1
    • 1996-04-12
    • FR9313176
    • 1993-11-05
    • SEIKO EPSON CORP
    • SHIMURA HIDETSUGUKURIHARA HAJIMEIKEGAMI AKIHIKOTANAKA HIROSHIYOSHIOKA KENJIROU
    • B41J2/385G03G15/00G03G15/02G03G15/16
    • A contact charge supply device for externally controlling the charges, which are supplied to a member to be charged by bringing a contact member appled with an external voltage into contact with the member to be charged, which at least includes an underlayer, and holds the following inequality log (R)>/=log {Rpx(Va-Vt)/Vt}+( alpha - beta )xlog(S/s)+ gamma xlog (i/I) where |Va|>/=|Vt|, Va (V): voltage applied to a contact member in contact with the member to be charged; I ( mu A): current flowing from the contact member to the member to be charged; S (cm2): contact area of the member to be charged and the contact member; R ( OMEGA ): resistance of the contact member when current I ( mu A) is fed to an area corresponding to the contact area S (cm2) of the contact member; gamma : current dependency of the resistance of the contact member; 1- beta : area dependency of the resistance of the contact member; s (cm2): area of a defective part of the member to be charged; Vt (V): breakdown voltage of the underlayer; i ( mu A): current flowing into an area of the underlayer corresponding to the contact area S (cm2) when a voltage, slightly lower than the breakdown voltage Vt (V), is applied to that area; Rp ( OMEGA ): resistance of the underlayer when the current i ( mu A) flows into the area of the underlayer corresponding to the contact area S (cm2) when a voltage, slightly lower than the breakdown voltage Vt (V), is applied to that area; 1- alpha : area dependency of the resistance of the underlayer.