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    • 23. 发明授权
    • Field emission display device
    • 场致发射显示装置
    • US08007336B2
    • 2011-08-30
    • US12351730
    • 2009-01-09
    • Peng LiuLiang LiuKai-Li JiangShou-Shan Fan
    • Peng LiuLiang LiuKai-Li JiangShou-Shan Fan
    • H01J17/49
    • H01J1/304H01J9/025H01J2201/30469
    • A method for manufacturing a field emission element includes the following steps. The insulating substrate is provided. At least one grid, a first electrode and a second electrode are formed on the insulating substrate. The first and second electrodes are within the grid. The insulating substrate having at least one grid, the first electrode and the second electrode is covered with a carbon nanotube structure. The carbon nanotube structure includes a plurality of carbon nanotubes successively extended from the second electrode to the first electrode. The carbon nanotubes between the first electrode and the second electrode are cut to form a plurality of substantially parallel electron emitters in the at least one grid. One end of each electron emitter is electrically connected to the second electrode and opposite end of each electron emitter faces towards the first electrode.
    • 场致发射元件的制造方法包括以下步骤。 设置绝缘基板。 在绝缘基板上形成至少一个格栅,第一电极和第二电极。 第一和第二电极在电网内。 具有至少一个格栅的绝缘基板,第一电极和第二电极被碳纳米管结构覆盖。 碳纳米管结构包括从第二电极相继延伸到第一电极的多个碳纳米管。 切割第一电极和第二电极之间的碳纳米管,以在至少一个栅格中形成多个基本平行的电子发射体。 每个电子发射器的一端电连接到第二电极,并且每个电子发射体的相对端朝向第一电极。
    • 24. 发明授权
    • Plane waves to control critical dimension
    • 平面波来控制关键维度
    • US07974027B2
    • 2011-07-05
    • US12316711
    • 2008-12-16
    • Peng Liu
    • Peng Liu
    • G02B5/00
    • G03F1/70G03F7/701G03F7/70125G03F7/70425Y10S430/146
    • The present invention describes an aperture including: an opaque plate; two sliver openings located in the opaque plate, the two sliver openings having rectangular shapes, the two sliver openings being parallel to each other.The present invention further describes a method including: decomposing a pattern into horizontal sub-features and vertical sub-features; forming a first mask corresponding to the horizontal sub-features; forming a second mask corresponding to the vertical sub-features; forming a first aperture with two parallel horizontal sliver openings corresponding to the first mask; forming a second aperture with two parallel vertical sliver openings corresponding to the second mask; exposing a wafer using the first aperture and the first mask; exposing the wafer using the second aperture and the second mask; and exposing the wafer with the third mask.
    • 本发明描述了一种孔,包括:不透明板; 位于不透明板中的两条纱条开口,两条条形开口具有矩形形状,两根条条开口彼此平行。 本发明还描述了一种方法,包括:将图案分解为水平子特征和垂直子特征; 形成对应于水平子特征的第一掩模; 形成对应于垂直子特征的第二掩模; 形成具有与所述第一掩模相对应的两个平行的水平条形开口的第一孔; 形成具有对应于所述第二掩模的两个平行的垂直条形开口的第二孔; 使用第一孔和第一掩模曝光晶片; 使用第二孔和第二掩模曝光晶片; 并用第三掩模曝光晶片。