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    • 22. 发明申请
    • Positive type radiation-sensitive resin composition
    • 正型辐射敏感树脂组合物
    • US20060223010A1
    • 2006-10-05
    • US11391257
    • 2006-03-29
    • Takayuki TsujiTomoki NagaiKentarou HaradaDaisuke Shimizu
    • Takayuki TsujiTomoki NagaiKentarou HaradaDaisuke Shimizu
    • G03C5/00
    • G03F7/0045G03F7/0392Y10S430/114
    • A positive type radiation-sensitive resin composition suitable as a chemically-amplified resist sensitive to active radiation particularly to deep ultraviolet rays represented by a KrF excimer laser, an ArF excimer laser, or an F2 excimer laser, excelling particularly in a process margin for the KrF excimer laser is provided. The positive type radiation-sensitive resin composition comprises a photoacid generator and an acid-labile group-containing resin which is insoluble or scarcely soluble in alkali, but becomes alkali-soluble by the action of an acid, wherein the photoacid generator is a mixed photoacid generator containing a photoacid generator of the following formula (1) and a photoacid generator which is at least one compound selected from sulfonyloxyimide and disulfonyldiazomethane.
    • 适合作为对活性辐射敏感的化学增幅抗蚀剂的正型辐射敏感树脂组合物,特别是由KrF准分子激光器,ArF准分子激光器或F 2激子准分子激光器表示的深紫外线, 提供特别是在KrF准分子激光器的工艺余量中优异。 正型辐射敏感性树脂组合物包含光酸产生剂和不溶于或几乎不溶于碱的酸不稳定基团的树脂,但通过酸的作用而变成碱溶性,其中光酸产生剂是混合的光酸 含有下式(1)的光致酸产生剂和光酸产生剂,其为选自磺酰氧基酰亚胺和二磺酰基重氮甲烷中的至少一种化合物。
    • 25. 发明授权
    • Polymer polyol composition, process for producing the same, and process for producing polyurethane resin
    • 聚合物多元醇组合物,其制造方法以及聚氨酯树脂的制造方法
    • US06624209B2
    • 2003-09-23
    • US10068182
    • 2002-02-06
    • Tetsuji KawamotoTomio KawazoeKiyoshi IkedaMunekazu SatakeFutoshi KitataniTsuyoshi TomosadaTakeshi FurutaTakayuki Tsuji
    • Tetsuji KawamotoTomio KawazoeKiyoshi IkedaMunekazu SatakeFutoshi KitataniTsuyoshi TomosadaTakeshi FurutaTakayuki Tsuji
    • C08G1863
    • C08F283/006C08F283/06C08G18/632C08G2101/00C08G2101/005C08G2101/0083
    • This invention provides a polymer polyol composition (I) comprising a polyol (A) and polymer particles (B) dispersed in (A), the polymer particles (B) being formed by polymerizing an ethylenically unsaturated compound (b) in a polyol, wherein the content of (B) in (I) is from 35 to 75 mass %, based on the mass of (I), and the amount of soluble polymers (P) dissolved in (A) is not more than 5 mass %, based on the mass of (A), and provides methods for producing the polymer polyol composition (I). Further, this invention provides a method for producing a foamed or non-foamed polyurethane resin, which method comprises reacting a polyol component with a polyisocyanate component in the presence or absence of a blowing agent, wherein the above polymer polyol composition is used at least as a portion of the polyol component. A polymer polyol having a low viscosity and excellent dispersion is stability is provided even when having a high concentration of polymer particles, and is used advantageously to produce polyurethane resins having excellent 25% ILD (hardness) and compression set, or foams thereof, with good operation efficiency.
    • 本发明提供一种包含分散在(A)中的多元醇(A)和聚合物颗粒(B))的聚合物多元醇组合物(I),聚合物颗粒(B)通过在多元醇中聚合烯属不饱和化合物(b)而形成,其中 基于(I)的质量,(I)中的(B)的含量为35〜75质量%,溶解在(A)中的可溶性聚合物(P)的量为5质量%以下 (A)的质量,并且提供了制备聚合物多元醇组合物(I)的方法。 此外,本发明提供一种发泡或非发泡聚氨酯树脂的制造方法,其特征在于,在发泡剂的存在或不存在下,使多元醇成分与多异氰酸酯成分反应,其中上述聚合物多元醇组合物至少使用 一部分多元醇组分。 具有低粘度和优异分散性的聚合物多元醇即使当具有高浓度聚合物颗粒时也是稳定的,并且有利地用于制备具有优异的25%ILD(硬度)和压缩永久变形或其泡沫的优异的聚氨酯树脂,具有良好的 运行效率。
    • 26. 发明授权
    • Preventing flow of current from sub-CPU to main-CPU during power saving mode in an image forming apparatus
    • 在图像形成装置中,防止在省电模式期间从副CPU到主CPU的电流流动
    • US09182806B2
    • 2015-11-10
    • US13560715
    • 2012-07-27
    • Atsushi TanakaTakayuki Tsuji
    • Atsushi TanakaTakayuki Tsuji
    • G06F1/32
    • G06F1/3265G06F1/3243G06F1/3287G06F1/3293Y02D10/122Y02D10/153Y02D10/171
    • An electronic device, comprising: an execution unit which executes a predetermined function; a first control unit that has an input terminal and causes the execution unit to execute the predetermined function; a power source unit that supplies power at least to the first control unit; and a second control unit that has an output terminal connected to the input terminal of the first control unit via a signal line, operates to output a signal to the first control unit via the signal line, and causes the power source unit to cut off power supply to the first control unit, and wherein the second control unit keeps a potential of the signal line at a reference level lower than or equal to a predetermined threshold while the second control unit causes the power source unit to cut off power supply to the first control unit.
    • 一种电子设备,包括:执行单元,其执行预定功能; 第一控制单元,具有输入端子,并使执行单元执行预定功能; 至少向第一控制单元供电的电源单元; 以及第二控制单元,其具有通过信号线连接到第一控制单元的输入端的输出端,经由信号线将信号输出到第一控制单元,并且使电源单元切断电力 提供给第一控制单元,并且其中第二控制单元将信号线的电位保持在低于或等于预定阈值的参考电平,而第二控制单元使电源单元切断到第一控制单元的电源 控制单元
    • 27. 发明授权
    • Method for producing fine-particle-dispersed polyol, and method for producing polyurethane resin
    • 微粒分散多元醇的制造方法以及聚氨酯树脂的制造方法
    • US09062148B2
    • 2015-06-23
    • US12670585
    • 2008-10-01
    • Shigekuni NakadaTakayuki TsujiYukiya Kobayashi
    • Shigekuni NakadaTakayuki TsujiYukiya Kobayashi
    • C08K5/06C08G18/63C08F2/10C08F2/22C08F2/44C08F283/06C08G18/40C08G101/00
    • C08G18/63C08F2/10C08F2/22C08F2/44C08F283/06C08G18/4072C08G18/632C08G2101/0008C08G2101/005C08G2101/0083
    • A method for producing a fine-particle-dispersed polyol (I) is provided, the method including the steps (1) and (n−1): the step (1) of polymerizing an ethylenically unsaturated monomer (b) in a polyol (a), in the presence of fine particles (P1) and a radical polymerization initiator (c), so as to obtain a fine-particle-dispersed polyol intermediate (B2); and the step (n−1) of polymerizing (b) in a fine-particle-dispersed polyol intermediate (B(n−1)), in the presence of (c), so as to obtain a fine-particle-dispersed polyol intermediate (Bn) or the fine-particle-dispersed polyol (I), where n represents an integer of 3 to 7, wherein (P1) have a volume-average particle diameter (R1) of 0.01 μm to 1.0 μm, and a concentration of (b) in the step (1) is 7 wt % to 40 wt %. Thus, a method for producing a fine-particle-dispersed polyol can be provided that contains polymer fine particles dispersed in a polyol having a small particle diameter, and that, when it is used for forming a polyurethane resin, allows the polyurethane resin to exhibit excellent resin properties.
    • 提供了分散微粒分散多元醇(I)的方法,所述方法包括步骤(1)和(n-1):在多元醇中聚合烯属不饱和单体(b)的步骤(1) a),在细颗粒(P1)和自由基聚合引发剂(c)的存在下,得到分散于细颗粒的多元醇中间体(B2); 和(b)在分散于细颗粒的多元醇中间体(B(n-1)中)聚合的步骤(n-1),以获得分散于细颗粒的多元醇 中间体(Bn)或微粒分散多元醇(I),其中n表示3〜7的整数,其中(P1)的体积平均粒径(R1)为0.01〜1.0μm,浓度 的步骤(1)中的(b)为7重量%至40重量%。 因此,可以提供含有分散在粒径小的多元醇中的聚合物微粒的分散微粒分散体的方法,当用于形成聚氨酯树脂时,可以使聚氨酯树脂显示出来 优良的树脂性能。
    • 30. 发明申请
    • LIQUID IMMERSION LITHOGRAPHY
    • 液体渗透光刻
    • US20090305161A1
    • 2009-12-10
    • US12094493
    • 2006-11-20
    • Atsushi NakamuraYong WangTakayuki Tsuji
    • Atsushi NakamuraYong WangTakayuki Tsuji
    • G03F7/004
    • G03F7/2041G03F7/0397
    • A radiation-sensitive resin composition for liquid immersion lithography which produces an excellent pattern profile, exhibits excellent resolution, provides sufficient focal depth allowance, and elutes only the minimal amount in the liquid when brought in contact with the liquid during exposure to radiation. The radiation-sensitive resin composition forms a photoresist film in liquid immersion lithography, in which radiation is emitted through a liquid for use in liquid immersion lithography having a refractive index larger than 1.44 and smaller than 1.85 at a wavelength of 193 nm, existing between a lens and a photoresist, the composition comprising a resin having a recurring unit with a lactone structure, which is insoluble or scarcely soluble in alkali, but becomes soluble in alkali by the action of an acid, and a radiation-sensitive acid generator.
    • 用于液浸光刻的辐射敏感性树脂组合物,其产生优异的图案轮廓,显示出优异的分辨率,提供足够的焦点深度余量,并且在暴露于辐射期间与液体接触时仅洗脱液体中的最小量。 辐射敏感树脂组合物在液浸光刻中形成光致抗蚀剂膜,其中辐射通过用于液体浸渍光刻的液体发射,其在193nm波长处的折射率大于1.44且小于1.85,存在于 透镜和光致抗蚀剂,该组合物包含具有内酯结构的重复单元的树脂,其不溶于或几乎不溶于碱,但通过酸的作用变得可溶于碱,并且具有辐射敏感性的酸产生剂。