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21. 发明授权

US06339940B1 Synthetic quartz glass manufacturing process 有权
标题翻译：合成石英玻璃制造工艺
公开(公告)号：US06339940B1
公开(公告)日：2002-01-22
申请号：US09553392
申请日：2000-04-20
申请人： Motoyuki Yamada , Hisatoshi Otsuka , Koji Matsuo
发明人： Motoyuki Yamada , Hisatoshi Otsuka , Koji Matsuo
IPC分类号： C03B1906
CPC分类号： C03B37/0144 , C03B19/1407 , C03B19/1446
摘要： A process for manufacturing synthetic quartz glass involves feeding a quartz glass-forming raw material to a high-temperature gas zone within a chamber, converting the quartz glass-forming raw material into quartz soot, and forming synthetic quartz glass from the soot. A suspended soot-discharging gas which has been flow-straightened in a suspended soot discharging direction flows through the chamber in the vicinity of the high-temperature gas zone. This process keeps free suspended soot from settling onto the surface of the quartz ingot where fusion and growth take place, thereby preventing the formation of bubbles within the quartz glass under growth.
摘要翻译：制造合成石英玻璃的方法包括将石英玻璃形成原料进料到室内的高温气体区域，将石英玻璃形成原料转化成石英烟灰，并从烟灰形成合成石英玻璃。在悬浮烟炱排出方向上流动整流的悬浮的烟灰排出气体在高温气体区域附近流过室。该过程保持游离的悬浮烟灰沉降到熔融和生长发生的石英锭的表面上，从而防止石英玻璃生长过程中的气泡形成。

22. 发明授权

US06236381B1 Image display apparatus 失效
标题翻译：图像显示装置
公开(公告)号：US06236381B1
公开(公告)日：2001-05-22
申请号：US09198167
申请日：1998-11-23
申请人： Takatsugu Kurata , Michio Ohsugi , Hironari Taniguchi , Koji Matsuo , Kanji Imai
发明人： Takatsugu Kurata , Michio Ohsugi , Hironari Taniguchi , Koji Matsuo , Kanji Imai
IPC分类号： H01J3112
CPC分类号： H01J29/467 , H01J31/125
摘要： An image display apparatus comprises, in a vacuum container whose inside is kept under vacuum, a fluorescent layer, an electron emission source having a plurality of electron sources, a deflecting electrode to deflect electron beams emitted from the electron emission source, and an ultrafocusing electrode to focus the electron beams and land the focused electron beams on predetermined positions of the fluorescent layer. The ultrafocusing electrode is arranged between the electron emission source and the fluorescent layer while the deflecting electrode is arranged between the electron emission source and the ultrafocusing electrode, so that the fluorescent layer is illuminated by the electron beams. If the landing position of the electron beam is deviated because of errors such as manufacturing errors in assembling the components into the image display apparatus, the deviation is minimized and an image display apparatus with high resolution can be obtained.
摘要翻译：图像显示装置在内部保持真空的真空容器中包括荧光层，具有多个电子源的电子发射源，用于偏转从电子发射源发射的电子束的偏转电极和超聚焦电极聚焦电子束并将聚焦电子束落在荧光层的预定位置上。超聚焦电极设置在电子发射源和荧光层之间，而偏转电极设置在电子发射源和超聚焦电极之间，使得荧光层被电子束照射。如果电子束的着陆位置由于诸如将部件组装到图像显示装置中的制造误差等错误而偏移，则偏差最小化，并且可以获得高分辨率的图像显示装置。

23. 发明申请

US20110294271A1 SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF 有权
标题翻译：半导体器件及其制造方法
公开(公告)号：US20110294271A1
公开(公告)日：2011-12-01
申请号：US13205950
申请日：2011-08-09
申请人： Shinji MORI , Tsutomu Sato , Koji Matsuo
发明人： Shinji MORI , Tsutomu Sato , Koji Matsuo
IPC分类号： H01L21/8238
CPC分类号： H01L29/772 , H01L21/823807 , H01L21/823814 , H01L21/823842 , H01L29/66636 , H01L29/7848
摘要： A semiconductor device includes a first pMISFET region having an Si channel, a second pMISFET region having an Si channel and an nMISFET region having an Si channel. First SiGe layers which apply first compression strain to the Si channel are embedded and formed in the first pMISFET region to sandwich the Si channel thereof and second SiGe layers which apply second compression strain different from the first compression strain to the Si channel are embedded and formed in the second pMISFET region to sandwich the Si channel thereof.
摘要翻译：半导体器件包括具有Si沟道的第一pMISFET区，具有Si沟道的第二pMISFET区和具有Si沟道的nMISFET区。将第一压缩应变施加到Si沟道的第一SiGe层嵌入并形成在第一pMISFET区域中以夹持其Si沟道，并且将施加与第一压缩应变不同的第二压缩应变的第二SiGe层嵌入并形成在第二pMISFET区域夹持其Si通道。

24. 发明申请

US20080237732A1 SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF 有权
标题翻译：半导体器件及其制造方法
公开(公告)号：US20080237732A1
公开(公告)日：2008-10-02
申请号：US12056909
申请日：2008-03-27
申请人： Shinji MORI , Tsutomu Sato , Koji Matsuo
发明人： Shinji MORI , Tsutomu Sato , Koji Matsuo
IPC分类号： H01L29/78 , H01L21/8238
CPC分类号： H01L29/772 , H01L21/823807 , H01L21/823814 , H01L21/823842 , H01L29/66636 , H01L29/7848
摘要： A semiconductor device includes a first pMISFET region having an Si channel, a second pMISFET region having an Si channel and an nMISFET region having an Si channel. First SiGe layers which apply first compression strain to the Si channel are embedded and formed in the first pMISFET region to sandwich the Si channel thereof and second SiGe layers which apply second compression strain different from the first compression strain to the Si channel are embedded and formed in the second pMISFET region to sandwich the Si channel thereof.
摘要翻译：半导体器件包括具有Si沟道的第一pMISFET区，具有Si沟道的第二pMISFET区和具有Si沟道的nMISFET区。将第一压缩应变施加到Si沟道的第一SiGe层嵌入并形成在第一pMISFET区域中以夹持其Si沟道，并且将施加与第一压缩应变不同的第二压缩应变的第二SiGe层嵌入并形成在第二pMISFET区域夹持其Si通道。

25. 发明授权

US06990836B2 Method of producing fluorine-containing synthetic quartz glass 有权
标题翻译：含氟合成石英玻璃的制造方法
公开(公告)号：US06990836B2
公开(公告)日：2006-01-31
申请号：US09789744
申请日：2001-02-22
申请人： Shigeru Maida , Motoyuki Yamada , Hisatoshi Otsuka , Kazuo Shirota , Koji Matsuo
发明人： Shigeru Maida , Motoyuki Yamada , Hisatoshi Otsuka , Kazuo Shirota , Koji Matsuo
IPC分类号： C03B20/00
CPC分类号： C03B19/1453 , C03B19/1415 , C03B2201/075 , C03B2201/12 , C03B2201/21 , C03B2207/32 , C03C3/06 , C03C4/0085 , C03C2201/12 , C03C2203/40 , C03C2203/46 , C03C2203/54 , Y02P40/57
摘要： Synthetic quartz glass is produced by feeding a silica-forming raw material gas, hydrogen gas, oxygen gas and a fluorine compound gas from a burner to a reaction zone, flame hydrolyzing the silica-forming raw material gas in the reaction zone to form fine particles of fluorine-containing silica, depositing the silica fine particles on a rotatable substrate in the reaction zone so as to create a fluorine-containing porous silica matrix, and heat vitrifying the porous silica matrix in a fluorine compound gas-containing atmosphere. This process enables the low-cost manufacture of a synthetic quartz glass having a higher and more uniform transmittance to light in the vacuum ultraviolet region than has hitherto been achieved.
摘要翻译：合成石英玻璃是通过将来自燃烧器的二氧化硅形成原料气体，氢气，氧气和氟化合物气体从反应区域供给到反应区域而进行的，在反应区域中对二氧化硅形成原料气体进行火焰水解而形成微粒子的含氟二氧化硅，将二氧化硅微粒沉积在反应区中的可旋转基板上，以产生含氟多孔二氧化硅基质，并在含氟化合物气体的气氛中对多孔二氧化硅基质进行玻璃化。该方法使得能够低成本地制造与迄今为止已经实现的在真空紫外区域中对于光的透射率更高且更均匀的合成石英玻璃。

26. 发明授权

US06488349B1 Ink-jet head and ink-jet type recording apparatus 有权
标题翻译：喷墨头和喷墨式记录装置
公开(公告)号：US06488349B1
公开(公告)日：2002-12-03
申请号：US09856347
申请日：2001-05-18
申请人： Koji Matsuo , Koji Ikeda
发明人： Koji Matsuo , Koji Ikeda
IPC分类号： B41J2938
CPC分类号： B41J2/04581 , B41J2/04588 , B41J2/04593 , B41J2/04595 , B41J2/14233 , B41J2/2128 , B41J2002/1425 , B41J2202/06
摘要： A plurality of ink droplets are discharged from the same nozzle during one printing cycle so as to perform multiple gray level printing. A group of driving pulses including an initial pulse P1, a first subsequent pulse P2 and a second subsequent pulse P3 in one printing cycle is supplied to an actuator. Time intervals t1, t2 and t3 between pulses are set to satisfy t1≦t2
摘要翻译：在一个打印周期期间，多个墨滴从相同的喷嘴排出，以进行多次灰度打印。在一个打印周期中包括初始脉冲P1，第一后续脉冲P2和第二后续脉冲P3的一组驱动脉冲被提供给致动器。脉冲之间的时间间隔t1，t2和t3相对于致动器的自然周期t0被设定为满足t1 <= t2

27. 发明授权

US5795485A Process for treating photographic processing waste solution 失效
标题翻译：处理照相处理废液的方法
公开(公告)号：US5795485A
公开(公告)日：1998-08-18
申请号：US399658
申请日：1995-03-07
申请人： Takashi Nakamura , Haruhiko Iwano , Koji Matsuo
发明人： Takashi Nakamura , Haruhiko Iwano , Koji Matsuo
IPC分类号： G03C5/00 , C02F1/52 , C02F1/56 , C02F1/62 , G03D3/00
CPC分类号： C02F1/5272 , C02F1/5281 , Y10S210/912
摘要： A process for treating a photographic processing waste solution which comprises: placing a polymer precipitate in a lower portion of a tank having a U-shaped treating space which comprises (i) a first partition, (ii) a second partition and (iii) an interconnecting partition for interconnecting the first partition and the second partition in the lower portion of a tank; introducing into the first partition a photographic processing waste solution containing a processing solution having fixing ability which has processed a silver halide photographic material; treating the photographic processing waste solution in the U-shaped treating space in the presence of a polymer having S atom which can coordinate with a metal; and removing the metal in said photographic processing waste solution.
摘要翻译：一种用于处理照相处理废液的方法，包括：将聚合物沉淀物放置在具有U形处理空间的罐的下部，所述罐的形状包括（i）第一隔板，（ii）第二隔板和（iii）互连分隔件，用于将第一分隔件和第二隔板互相连接在罐的下部; 将具有处理卤化银照相材料的具有定影能力的处理溶液的照相处理废溶液引入第一隔板中; 在具有可与金属配合的S原子的聚合物的存在下处理U形处理空间中的照相处理废液; 并去除所述照相处理废液中的金属。

28. 发明授权

US5605633A Process for treating photographic waste water 失效
标题翻译：处理照相废水的方法
公开(公告)号：US5605633A
公开(公告)日：1997-02-25
申请号：US348806
申请日：1994-11-29
申请人： Takashi Nakamura , Koji Matsuo , Masaharu Yamada
发明人： Takashi Nakamura , Koji Matsuo , Masaharu Yamada
IPC分类号： G03C5/00 , C02F1/62 , C02F1/64 , C02F1/68 , C25C1/20 , G03C7/44 , G03D3/00 , C02F1/56
CPC分类号： G03C7/44 , C02F1/683 , C02F2101/10 , C02F2103/40 , Y10S210/912
摘要： A process for treating a photographic waste liquid containing a used processing liquid resulting from a processing step having a bleaching ability or a fixing ability in the processing of a silver halide photographic material which process comprises adding a polymer-complex-forming agent to the waste liquid in an amount in the range of from 0.5 to 4 equivalents to a metal contained in the waste liquid to thereby form a polymer-metal complex and then filtering off the polymer-metal complex with a mono-membrane filter having a pore size of 0.05 to 10 .mu.m to thereby remove the metal. A device for use in practicing the process is also disclosed.
摘要翻译：一种处理含有使用的处理液的照相废液的方法，所述处理液由在加工卤化银照相材料中具有漂白能力或定影能力的处理步骤产生，该方法包括向废液中加入聚合物复合物形成剂相对于废液中含有的金属为0.5〜4当量，从而形成聚合物 - 金属络合物，然后用孔径为0.05的单膜滤器过滤掉聚合物 - 金属络合物，至 10微米，从而去除金属。还公开了用于实施该方法的装置。

29. 发明授权

US5072451A Molecular crystal and method for converting light wavelength by use thereof 失效
标题翻译：分子晶体以及通过其使用来转换光波长的方法
公开(公告)号：US5072451A
公开(公告)日：1991-12-10
申请号：US642759
申请日：1991-01-18
申请人： Masaki Okazaki , Makoto Ishihara , Koji Matsuo
发明人： Masaki Okazaki , Makoto Ishihara , Koji Matsuo
IPC分类号： G02F1/35 , C07D413/06 , C30B7/00 , C30B11/00 , G02F1/355 , G02F1/361
CPC分类号： C07D413/06 , C30B11/00 , C30B29/54 , C30B7/00 , G02F1/3612
摘要： A molecular crystal comprising a molecule represented by formula (I) shown below: ##STR1## The crystal has high blue light transmittance and non-linear optical characteristics.
摘要翻译：包含由下式（I）表示的分子的分子晶体：（I）晶体具有高的蓝光透射率和非线性光学特性。

30. 发明授权

US4699150A Ultrasonic transducer assembly for medical diagnostic examinations 失效
标题翻译：用于医学诊断检查的超声波换能器组件
公开(公告)号：US4699150A
公开(公告)日：1987-10-13
申请号：US864563
申请日：1986-05-16
申请人： Masami Kawabuchi , Koji Matsuo , Fumio Muramatsu , Akira Fukumoto , Koetsu Saito
发明人： Masami Kawabuchi , Koji Matsuo , Fumio Muramatsu , Akira Fukumoto , Koetsu Saito
IPC分类号： A61B8/00 , G01N29/04 , G01N29/24 , G10K11/02 , G10K11/30 , H04R17/00 , A61B10/00
CPC分类号： G10K11/02 , G10K11/30
摘要： An ultrasonic transducer for medical diagnostic examinations which comprises a transducer element having one surface through ultrasonic waves are emitted, an acoustic impedance matcher, and a contact member brought to contact with an object being examined and formed on the one surface of the ultrasonic transducer element. The contact member includes at least a flat plate or an acoustic lens made of a-4-methylpentene-1-base polymer which has high mechanical strength. Transducer arrays and assemblies using such polymer as a member directly contacted with human body are also described.
摘要翻译：发射用于医疗诊断检查的超声波换能器，其包括具有通过超声波的一个表面的换能器元件，声阻抗匹配器和与被检查物体接触并且形成在超声换能器元件的一个表面上的接触构件。接触构件至少包括具有高机械强度的由4-甲基戊烯-1-基聚合物制成的平板或声透镜。还描述了使用这种聚合物作为与人体直接接触的部件的传感器阵列和组件。

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