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21. 发明申请

US20100294929A1 Sample Electrification Measurement Method and Charged Particle Beam Apparatus 有权
标题翻译：样品电化测量方法和带电粒子束装置
公开(公告)号：US20100294929A1
公开(公告)日：2010-11-25
申请号：US12710679
申请日：2010-02-23
申请人： Makoto Ezumi , Yoichi Ose , Akira Ikegami , Hideo Todokoro , Tatsuaki Ishijima , Takahiro Sato , Ritsuo Fukaya , Kazunari Asao
发明人： Makoto Ezumi , Yoichi Ose , Akira Ikegami , Hideo Todokoro , Tatsuaki Ishijima , Takahiro Sato , Ritsuo Fukaya , Kazunari Asao
IPC分类号： G21K7/00
CPC分类号： H01J37/265 , G01N23/2251 , H01J37/21 , H01J37/244 , H01J37/28 , H01J2237/0041 , H01J2237/216 , H01J2237/244 , H01J2237/24564 , H01J2237/24592 , H01J2237/2594 , H01J2237/2817
摘要： The present invention has the object of providing charged particle beam irradiation method ideal for reducing the focus offset, magnification fluctuation and measurement length error in charged particle beam devices. To achieve these objects, a method is disclosed in the invention for measuring the electrical potential distribution on the sample with a static electrometer while loaded by a loader mechanism. Another method is disclosed for measuring the local electrical charge at specified points on the sample, and isolating and measuring the wide area electrostatic charge quantity from those local electrostatic charges. Yet another method is disclosed for correcting the measurement length value or magnification based on fluctuations found by measuring the amount of electrostatic charge at the specified points under at least two charged particle optical conditions, and then using a charged particle beam to measure fluctuations in measurement dimensions occurring due to fluctuations in the electrostatic charge at the specified locations.
摘要翻译：本发明的目的是提供一种理想的减少带电粒子束装置中的聚焦偏移，放大波动和测量长度误差的带电粒子束照射方法。为了实现这些目的，在本发明中公开了一种用于在由装载机构加载的情况下用静电静电计测量样品上的电位分布的方法。公开了另一种测量样品上特定点的局部电荷的方法，并且从这些局部静电电荷中分离和测量广域静电电荷量。公开了另一种用于基于通过测量至少两个带电粒子光学条件下的指定点处的静电电荷量而发现的波动来校正测量长度值或放大倍率的方法，然后使用带电粒子束来测量测量尺寸的波动由于在指定位置处的静电电荷的波动而发生。

22. 发明授权

US07825377B2 Electron beam apparatus with aberration corrector 有权
标题翻译：具有像差校正器的电子束装置
公开(公告)号：US07825377B2
公开(公告)日：2010-11-02
申请号：US12153068
申请日：2008-05-13
申请人： Takeshi Kawasaki , Takaho Yoshida , Yoichi Ose , Hideo Todokoro
发明人： Takeshi Kawasaki , Takaho Yoshida , Yoichi Ose , Hideo Todokoro
IPC分类号： G21K1/08 , H01J3/14
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J37/1471 , H01J37/153 , H01J37/265 , H01J37/28 , H01J37/302 , H01J2237/1501 , H01J2237/1534 , H01J2237/21 , H01J2237/2487 , H01J2237/2817 , H01J2237/31793
摘要： An electron beam apparatus with an aberration corrector using multipole lenses is provided. The electron beam apparatus has a scan mode for enabling the operation of the aberration corrector and a scan mode for disabling the operation of the aberration corrector and the operation of each of the aberration corrector, a condenser lens, and the like is controlled such that the object point of an objective lens does not change in either of the scan modes. If a comparison is made between the secondary electron images of a specimen in the two modes, the image scaling factor and the focus remain unchanged and evaluation and adjustment can be performed by distinctly recognizing only the effect of the aberration corrector. This reduces the time required to adjust an optical axis which has been long due to an axial alignment defect inherent in the aberration corrector and an axial alignment defect in a part other than the aberration corrector which are indistinguishably intermingled with each other.
摘要翻译：提供具有使用多极透镜的像差校正器的电子束装置。电子束装置具有能够进行像差校正器的操作的扫描模式和用于禁止像差校正器的操作的扫描模式，并且每个像差校正器，聚光透镜等的操作被控制，使得物镜的物体在任一种扫描模式下都不会改变。如果在两种模式中的样本的二次电子图像之间进行比较，则图像缩放因子和焦点保持不变，并且可以通过清楚地仅识别像差校正器的效果来进行评估和调整。这减少了由于像差校正器固有的轴向对准缺陷而长时间调整光轴所需的时间以及像差校正器之外的不同于彼此混合的部分的轴向对准缺陷所需的时间。

23. 发明授权

US07612336B2 Scanning electron microscope having a monochromator 有权
标题翻译：具有单色仪的扫描电子显微镜
公开(公告)号：US07612336B2
公开(公告)日：2009-11-03
申请号：US11649882
申请日：2007-01-05
申请人： Wataru Mori , Makoto Ezumi , Yoichi Ose
发明人： Wataru Mori , Makoto Ezumi , Yoichi Ose
IPC分类号： H01J37/26
CPC分类号： H01J37/28 , H01J37/05 , H01J37/153 , H01J2237/057 , H01J2237/1501 , H01J2237/216
摘要： A scanning electron microscope having a monochromator that can automatically adjust an electron beam entering the monochromator and operating conditions of the monochromator. The scanning electron microscope having a monochromator is equipped with, between an electron source and the monochromator, a first focusing lens for adjusting focusing of the electron beam entering the monochromator and a first astigmatism correcting lens for correcting astigmatism of the electron beam entering the monochromator. The microscope further includes a means of obtaining an image of an electron-beam adjustment sample disposed where the electron beam in the monochromator is focused, and based on the obtained image, driving the first focusing lens and the first astigmatism correcting lens so that the focusing and astigmatism of the electron beam entering the monochromator are adjusted.
摘要翻译：具有可自动调节进入单色仪的电子束和单色仪的操作条件的单色仪的扫描电子显微镜。具有单色仪的扫描电子显微镜在电子源和单色仪之间配备有用于调节进入单色仪的电子束的聚焦的第一聚焦透镜和用于校正进入单色仪的电子束的像散的第一散光校正透镜。显微镜还包括获得设置在单色仪中的电子束被聚焦的电子束调节样本的图像的装置，并且基于获得的图像，驱动第一聚焦透镜和第一散光校正透镜，使得聚焦并且调节进入单色仪的电子束的散光。

24. 发明申请

US20090008551A1 Electron beam apparatus with aberration corrector 有权
标题翻译：具有像差校正器的电子束装置
公开(公告)号：US20090008551A1
公开(公告)日：2009-01-08
申请号：US12153068
申请日：2008-05-13
申请人： Takeshi Kawasaki , Takaho Yoshida , Yoichi Ose , Hideo Todokoro
发明人： Takeshi Kawasaki , Takaho Yoshida , Yoichi Ose , Hideo Todokoro
IPC分类号： G01N23/00
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J37/1471 , H01J37/153 , H01J37/265 , H01J37/28 , H01J37/302 , H01J2237/1501 , H01J2237/1534 , H01J2237/21 , H01J2237/2487 , H01J2237/2817 , H01J2237/31793
摘要： An electron beam apparatus with an aberration corrector using multipole lenses is provided. The electron beam apparatus has a scan mode for enabling the operation of the aberration corrector and a scan mode for disabling the operation of the aberration corrector and the operation of each of the aberration corrector, a condenser lens, and the like is controlled such that the object point of an objective lens does not change in either of the scan modes. If a comparison is made between the secondary electron images of a specimen in the two modes, the image scaling factor and the focus remain unchanged and evaluation and adjustment can be performed by distinctly recognizing only the effect of the aberration corrector. This reduces the time required to adjust an optical axis which has been long due to an axial alignment defect inherent in the aberration corrector and an axial alignment defect in a part other than the aberration corrector which are indistinguishably intermingled with each other.
摘要翻译：提供具有使用多极透镜的像差校正器的电子束装置。电子束装置具有能够进行像差校正器的操作的扫描模式和用于禁止像差校正器的操作的扫描模式，并且每个像差校正器，聚光透镜等的操作被控制，使得物镜的物体在任一种扫描模式下都不会改变。如果在两种模式中的样本的二次电子图像之间进行比较，则图像缩放因子和焦点保持不变，并且可以通过清楚地仅识别像差校正器的效果来进行评估和调整。这减少了由于像差校正器固有的轴向对准缺陷而长时间调整光轴所需的时间以及像差校正器之外的不同于彼此混合的部分的轴向对准缺陷所需的时间。

25. 发明授权

US07459681B2 Scanning electron microscope 有权
标题翻译：扫描电子显微镜
公开(公告)号：US07459681B2
公开(公告)日：2008-12-02
申请号：US10566634
申请日：2005-08-10
申请人： Noriaki Arai , Makoto Ezumi , Yoichi Ose
发明人： Noriaki Arai , Makoto Ezumi , Yoichi Ose
IPC分类号： H01J37/28 , H01J37/00 , G21K5/08
CPC分类号： H01J37/026 , H01J37/28 , H01J2237/0044 , H01J2237/12 , H01J2237/2817
摘要： An object of the invention is to reduce the beam drift in which the orbit of the charged particle beam is deflected by a potential gradient generated by a nonuniform sample surface potential on a charged-particle-beam irradiation area surface, the nonuniform sample surface potential being generated by electrification made when observing an insulating-substance sample using a charged particle beam.Energy of the charged particle beam to be irradiated onto the sample is set so that generation efficiency of secondary electrons generated from the sample becomes equal to 1 or more. A flat-plate electrode (26) is located in such a manner as to be directly opposed to the sample. Here, the flat-plate electrode is an electrode to which a voltage can be applied independently, and which is equipped with a hole through which a primary charged particle beam can pass. Furthermore, a voltage can be applied independently to a sample stage (12) on which the sample is mounted. Here, the sample stage's surface directly opposed to the sample is formed into a planarized structure with no projections and depressions thereon. Also, diameter D of the hole provided in the flat-plate electrode (26) and distance L between the flat-plate electrode (26) and the sample are set such that a relation of D/L≦1.5 is satisfied.
摘要翻译：本发明的目的是减少带电粒子束的轨道偏转由带电粒子束照射区域表面上的不均匀样品表面电位产生的电位梯度的光束漂移，不均匀的样品表面电位为通过使用带电粒子束观察绝缘物质样品时进行通电而产生。设定要照射到样品上的带电粒子束的能量被设定为使得从样品产生的二次电子的产生效率等于1或更大。平板电极（26）以与样品直接相对的方式定位。这里，平板电极是能够独立施加电压的电极，并且具有一次带电粒子束可以穿过的孔。此外，可以独立地对安装有样品的样品台（12）施加电压。这里，与样品直接相对的样品台的表面形成为在其上没有凸起和凹陷的平坦化结构。此外，设置在平板电极（26）中的孔的直径D和平板电极（26）与样品之间的距离L被设定为使得满足D / L <1.5的关系。

26. 发明申请

US20080237463A1 Monochromator and scanning electron microscope using the same 有权
公开(公告)号：US20080237463A1
公开(公告)日：2008-10-02
申请号：US11987018
申请日：2007-11-26
申请人： Yoichi Ose , Shunroku Taya , Hideo Todokoro , Tadashi Otaka , Mitsugu Sato , Makoto Ezumi
发明人： Yoichi Ose , Shunroku Taya , Hideo Todokoro , Tadashi Otaka , Mitsugu Sato , Makoto Ezumi
IPC分类号： G01N23/00 , G21K1/08
CPC分类号： H01J37/05 , H01J37/153 , H01J37/28
摘要： An invention providing a scanning electron microscope composed of a monochromator capable of high resolution, monochromatizing the energy and reducing chromatic aberrations without significantly lowering the electrical current strength of the primary electron beam. A scanning electron microscope is installed with a pair of sectorial magnetic and electrical fields having opposite deflection directions to focus the electron beam and then limit the energy width by means of slits, and another pair of sectorial magnetic and electrical fields of the same shape is installed at a position forming a symmetrical mirror versus the surface containing the slits. This structure acts to cancel out energy dispersion at the object point and symmetrical mirror positions, and by spatially contracting the point-converged spot beam with a converging lens system, improves the image resolution of the scanning electron microscope.

27. 发明授权

US07399966B2 Scanning electron microscope 有权
标题翻译：扫描电子显微镜
公开(公告)号：US07399966B2
公开(公告)日：2008-07-15
申请号：US11802738
申请日：2007-05-24
申请人： Hideo Todokoro , Makoto Ezumi , Yoichi Ose , Naomasa Suzuki
发明人： Hideo Todokoro , Makoto Ezumi , Yoichi Ose , Naomasa Suzuki
IPC分类号： H01J37/20
CPC分类号： H01J37/244 , G01N23/225 , G01R31/307 , H01J37/05 , H01J37/28 , H01J2237/004 , H01J2237/04735 , H01J2237/04756 , H01J2237/053 , H01J2237/0535 , H01J2237/24475 , H01J2237/2448 , H01J2237/24485 , H01J2237/2449 , H01J2237/24495 , H01J2237/24585 , H01J2237/24592 , H01J2237/281 , H01J2237/2817
摘要： A scanning electron microscope with an energy filter which can positively utilize secondary electrons and/or reflected electrons which collide against a mesh electrode and are lost. The scanning electron microscope which has a porous electrode for producing an electric field for energy-filtering electrons produced by applying a primary electron beam to a sample and a 1st electron detector which detects electrons passing through the porous electrode is characterized by further having a porous structure provided near the sample, a deflector which deflects electrons from the axis of the primary electron beam, and a 2nd electron detector which detects the electrons deflected by the deflector.
摘要翻译：具有能量过滤器的扫描电子显微镜，其能够正确地利用与网状电极碰撞而损失的二次电子和/或反射电子。具有用于产生用于对样品施加一次电子束产生的电子能量的电场的多孔电极的扫描电子显微镜和检测通过多孔电极的电子的第一电子检测器的特征在于还具有多孔结构设置在样品附近，偏转器从一次电子束的轴线偏转电子;以及第二电子检测器，其检测偏转器偏转的电子。

28. 发明申请

US20070221846A1 Scanning electron microscope 有权
标题翻译：扫描电子显微镜
公开(公告)号：US20070221846A1
公开(公告)日：2007-09-27
申请号：US11802738
申请日：2007-05-24
申请人： Hideo Todokoro , Makoto Ezumi , Yoichi Ose , Naomasa Suzuki
发明人： Hideo Todokoro , Makoto Ezumi , Yoichi Ose , Naomasa Suzuki
IPC分类号： G01N23/00
CPC分类号： H01J37/244 , G01N23/225 , G01R31/307 , H01J37/05 , H01J37/28 , H01J2237/004 , H01J2237/04735 , H01J2237/04756 , H01J2237/053 , H01J2237/0535 , H01J2237/24475 , H01J2237/2448 , H01J2237/24485 , H01J2237/2449 , H01J2237/24495 , H01J2237/24585 , H01J2237/24592 , H01J2237/281 , H01J2237/2817
摘要： A scanning electron microscope with an energy filter which can positively utilize secondary electrons and/or reflected electrons which collide against a mesh electrode and are lost. The scanning electron microscope which has a porous electrode for producing an electric field for energy-filtering electrons produced by applying a primary electron beam to a sample and a 1st electron detector which detects electrons passing through the porous electrode is characterized by further having a porous structure provided near the sample, a deflector which deflects electrons from the axis of the primary electron beam, and a 2nd electron detector which detects the electrons deflected by the deflector.
摘要翻译：具有能量过滤器的扫描电子显微镜，其能够正确地利用与网状电极碰撞而损失的二次电子和/或反射电子。具有用于产生用于对样品施加一次电子束产生的电子能量的电场的多孔电极的扫描电子显微镜和检测通过多孔电极的电子的第一电子检测器的特征在于进一步具有多孔结构设置在样品附近，偏转器从一次电子束的轴线偏转电子;以及第二电子检测器，其检测偏转器偏转的电子。

29. 发明授权

US07199365B2 Electron beam apparatus with aberration corrector 有权
公开(公告)号：US07199365B2
公开(公告)日：2007-04-03
申请号：US11220548
申请日：2005-09-08
申请人： Takeshi Kawasaki , Takaho Yoshida , Yoichi Ose , Hideo Todokoro
发明人： Takeshi Kawasaki , Takaho Yoshida , Yoichi Ose , Hideo Todokoro
IPC分类号： G21K1/08 , H01J3/14
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J37/1471 , H01J37/153 , H01J37/265 , H01J37/28 , H01J37/302 , H01J2237/1501 , H01J2237/1534 , H01J2237/21 , H01J2237/2487 , H01J2237/2817 , H01J2237/31793
摘要： An electron beam apparatus with an aberration corrector using multipole lenses is provided. The electron beam apparatus has a scan mode for enabling the operation of the aberration corrector and a scan mode for disabling the operation of the aberration corrector and the operation of each of the aberration corrector, a condenser lens, and the like is controlled such that the object point of an objective lens does not change in either of the scan modes. If a comparison is made between the secondary electron images of a specimen in the two modes, the image scaling factor and the focus remain unchanged and evaluation and adjustment can be performed by distinctly recognizing only the effect of the aberration corrector. This reduces the time required to adjust an optical axis which has been long due to an axial alignment defect inherent in the aberration corrector and an axial alignment defect in a part other than the aberration corrector which are indistinguishably intermingled with each other.

30. 发明申请

US20060016991A1 Electron beam apparatus with aberration corrector 有权
公开(公告)号：US20060016991A1
公开(公告)日：2006-01-26
申请号：US11220548
申请日：2005-09-08
申请人： Takeshi Kawasaki , Takaho Yoshida , Yoichi Ose , Hideo Todokoro
发明人： Takeshi Kawasaki , Takaho Yoshida , Yoichi Ose , Hideo Todokoro
IPC分类号： G21K7/00
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J37/1471 , H01J37/153 , H01J37/265 , H01J37/28 , H01J37/302 , H01J2237/1501 , H01J2237/1534 , H01J2237/21 , H01J2237/2487 , H01J2237/2817 , H01J2237/31793
摘要： An electron beam apparatus with an aberration corrector using multipole lenses is provided. The electron beam apparatus has a scan mode for enabling the operation of the aberration corrector and a scan mode for disabling the operation of the aberration corrector and the operation of each of the aberration corrector, a condenser lens, and the like is controlled such that the object point of an objective lens does not change in either of the scan modes. If a comparison is made between the secondary electron images of a specimen in the two modes, the image scaling factor and the focus remain unchanged and evaluation and adjustment can be performed by distinctly recognizing only the effect of the aberration corrector. This reduces the time required to adjust an optical axis which has been long due to an axial alignment defect inherent in the aberration corrector and an axial alignment defect in a part other than the aberration corrector which are indistinguishably intermingled with each other.

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