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21. 发明申请

US20080024601A1 Electron microscope 有权
标题翻译：电子显微镜
公开(公告)号：US20080024601A1
公开(公告)日：2008-01-31
申请号：US11699062
申请日：2007-01-29
申请人： Hidetoshi Sato , Takumichi Sutani , Yutaka Hojo
发明人： Hidetoshi Sato , Takumichi Sutani , Yutaka Hojo
IPC分类号： H04N9/47
CPC分类号： H01J37/28 , H01J2237/221 , H01J2237/2485 , H01J2237/2816 , H01J2237/2817
摘要： There is provided an electron microscope which is capable of making a significant contribution to accomplishment of efficiency in investigating causes for pattern abnormalities found out. The electron microscope including an I/O for capturing image data on a microscopic image acquired by another electron microscope, a computation processing unit for generating a display signal based on the image data on the microscopic image acquired by another electron microscope and captured via the I/O and image data on a microscopic image acquired by the electron microscope itself, in order that the microscopic image acquired by another electron microscope and the microscopic image acquired by the electron microscope itself are displayed at the same scale and under the same display condition, and a display unit for displaying both of the microscopic images based on the display signal from the computation processing unit.
摘要翻译：提供了一种电子显微镜，其能够对发现的图案异常的调查原因的效率的实现方面作出重大贡献。电子显微镜包括用于在由另一电子显微镜获取的显微镜图像上捕获图像数据的I / O，计算处理单元，用于根据由另一电子显微镜获取的显微图像上的图像数据产生显示信号，并通过I / O和通过电子显微镜本身获取的显微镜图像上的图像数据，以便通过另一电子显微镜获得的显微图像和由电子显微镜本身获取的显微图像以相同的尺度显示在相同的显示条件下，以及显示单元，用于基于来自计算处理单元的显示信号显示两个微观图像。

22. 发明申请

US20060284081A1 Method and apparatus for arranging recipe of scanning electron microscope and apparatus for evaluating shape of semiconductor device pattern 失效
标题翻译：用于布置扫描电子显微镜配方的方法和装置以及用于评估半导体器件图案形状的装置
公开(公告)号：US20060284081A1
公开(公告)日：2006-12-21
申请号：US11330215
申请日：2006-01-12
申请人： Atsushi Miyamoto , Wataru Nagatomo , Ryoichi Matsuoka , Hidetoshi Morokuma , Takumichi Sutani
发明人： Atsushi Miyamoto , Wataru Nagatomo , Ryoichi Matsuoka , Hidetoshi Morokuma , Takumichi Sutani
IPC分类号： G21K7/00
CPC分类号： H01J37/28 , H01J37/153 , H01J37/21 , H01J2237/1532 , H01J2237/216 , H01J2237/24592 , H01J2237/2487 , H01J2237/2816 , H01J2237/2817
摘要： In order to provide an imaging-recipe arranging or creating apparatus and method adapted so that selection rules for automatic arrangement of an imaging recipe can be optimized by teaching in a SEM apparatus or the like, the imaging-recipe arranging or creating apparatus in this invention that arranges an imaging recipe for SEM-observing a semiconductor pattern using a scanning electron microscope includes a database that receives and stores layout information of the above semiconductor pattern in a low-magnification field, and an imaging-recipe arranging unit which, on the basis of the database-stored semiconductor pattern layout information, arranges the imaging recipe automatically in accordance with the automatic arrangement algorithm that includes teaching-optimized selection rules for selecting an imaging point(s).
摘要翻译：为了提供一种成像配方布置或创建装置和方法，适于使得通过在SEM装置等中的教导来优化成像配方的自动布置的选择规则，本发明的成像配方布置或创建装置使用扫描型电子显微镜配置SEM观察半导体图案的成像配方，包括：数据库，其接收并存储在低倍率场中的上述半导体图案的布局信息;以及成像配方配置单元，其基于数据库存储的半导体图案布局信息，根据包括用于选择成像点的教学优化选择规则的自动布置算法自动布置成像配方。

23. 发明申请

US20060193508A1 Pattern measuring method and pattern measuring device 有权
公开(公告)号：US20060193508A1
公开(公告)日：2006-08-31
申请号：US11359374
申请日：2006-02-23
申请人： Takumichi Sutani , Ryoichi Matsuoka , Hidetoshi Morokuma , Hitoshi Komuro , Akiyuki Sugiyama
发明人： Takumichi Sutani , Ryoichi Matsuoka , Hidetoshi Morokuma , Hitoshi Komuro , Akiyuki Sugiyama
IPC分类号： G06K9/00
CPC分类号： H01J37/265 , H01J37/28 , H01J2237/2817
摘要： A pattern measuring method and device are provided which set a reference position for a measuring point to be measured by a scanning electron microscope and the like, based on position information of a reference pattern on an image acquired from the scanning electron microscope and based on a positional relation, detected by using design data, between the measuring point and the reference pattern formed at a position isolated from the measuring point.

24. 发明授权

US08331651B2 Method and apparatus for inspecting defect of pattern formed on semiconductor device 有权
标题翻译：用于检查在半导体器件上形成的图案的缺陷的方法和装置
公开(公告)号：US08331651B2
公开(公告)日：2012-12-11
申请号：US13231394
申请日：2011-09-13
申请人： Tomofumi Nishiura , Atsushi Miyamoto , Chie Shishido , Takumichi Sutani
发明人： Tomofumi Nishiura , Atsushi Miyamoto , Chie Shishido , Takumichi Sutani
IPC分类号： G06K9/00
CPC分类号： G06T7/001 , G06K9/6255 , G06T2207/10056 , G06T2207/30148 , H01L22/12 , H01L2924/0002 , H01L2924/00
摘要： An apparatus and method for inspecting a defect of a circuit pattern formed on a semiconductor wafer includes a defect classifier have a comparison shape forming section for forming a plurality of comparison shapes corresponding to an SEM image of an inspection region by deforming the shape of the circuit pattern in accordance with a plurality of shape deformation rules using design data corresponding to the circuit pattern within the inspection region and a shape similar to the SEM image of the inspection region out of the plurality of comparison shapes formed and selected as the comparison shape, and a shape comparing and classifying section for classifying the SEM image using information of the comparison shape selected in the comparison shape forming section and the inspection shape of the circuit pattern of the SEM image of the inspection region.
摘要翻译：用于检查形成在半导体晶片上的电路图案的缺陷的装置和方法包括：缺陷分类器，具有比较形状形成部，用于通过使电路的形状变形来形成与检查区域的SEM图像对应的多个比较形状使用与检查区域内的电路图案相对应的设计数据的多个形状变形规则的形状以及形成和选择为比较形状的多个比较形状中的检查区域的SEM图像的形状，以及形状比较和分类部分，用于使用在比较形状形成部分中选择的比较形状的信息和检查区域的SEM图像的电路图案的检查形状来对SEM图像进行分类。

25. 发明授权

US08199191B2 Electron microscope for inspecting dimension and shape of a pattern formed on a wafer 有权
标题翻译：用于检查在晶片上形成的图案的尺寸和形状的电子显微镜
公开(公告)号：US08199191B2
公开(公告)日：2012-06-12
申请号：US11699062
申请日：2007-01-29
申请人： Hidetoshi Sato , Takumichi Sutani , Yutaka Hojo
发明人： Hidetoshi Sato , Takumichi Sutani , Yutaka Hojo
IPC分类号： H04N7/18 , G02B21/00 , G06K9/00
CPC分类号： H01J37/28 , H01J2237/221 , H01J2237/2485 , H01J2237/2816 , H01J2237/2817
摘要： There is provided an electron microscope which is capable of making a significant contribution to accomplishment of efficiency in investigating causes for pattern abnormalities found out. The electron microscope including an I/O for capturing image data on a microscopic image acquired by another electron microscope, a computation processing unit for generating a display signal based on the image data on the microscopic image acquired by another electron microscope and captured via the I/O and image data on a microscopic image acquired by the electron microscope itself, in order that the microscopic image acquired by another electron microscope and the microscopic image acquired by the electron microscope itself are displayed at the same scale and under the same display condition, and a display unit for displaying both of the microscopic images based on the display signal from the computation processing unit.
摘要翻译：提供了一种电子显微镜，其能够对发现的图案异常的调查原因的效率的实现方面作出重大贡献。电子显微镜包括用于在由另一电子显微镜获取的显微镜图像上捕获图像数据的I / O，计算处理单元，用于根据由另一电子显微镜获取的显微图像上的图像数据产生显示信号，并通过I / O和通过电子显微镜本身获取的显微镜图像上的图像数据，以便通过另一电子显微镜获得的显微图像和由电子显微镜本身获取的显微图像以相同的尺度显示在相同的显示条件下，以及显示单元，用于基于来自计算处理单元的显示信号显示两个微观图像。

26. 发明授权

US08115169B2 Method and apparatus of pattern inspection and semiconductor inspection system using the same 有权
标题翻译：图案检查方法和装置以及使用其的半导体检查系统
公开(公告)号：US08115169B2
公开(公告)日：2012-02-14
申请号：US12388968
申请日：2009-02-19
申请人： Yasutaka Toyoda , Akiyuki Sugiyama , Ryoichi Matsuoka , Takumichi Sutani , Hidemitsu Naya
发明人： Yasutaka Toyoda , Akiyuki Sugiyama , Ryoichi Matsuoka , Takumichi Sutani , Hidemitsu Naya
IPC分类号： G21K7/00 , G06F17/50 , G06K9/00
CPC分类号： G06T7/0006 , G06T2207/30148 , H01J2237/221 , H01J2237/2817
摘要： A pattern inspection apparatus can be provided, for example, in a scanning electron microscope system. When patterns of a plurality of layers are included in a SEM image, the apparatus separates the patterns according to each layer by using design data of the plurality of layers corresponding to the patterns. Consequently, the apparatus can realize inspection with use of only the pattern of a target layer to be inspected, pattern inspection differently for different layers, or detection of a positional offset between the layers.
摘要翻译：例如，可以在扫描型电子显微镜系统中设置图案检查装置。当在SEM图像中包含多层图案时，该装置通过使用与图案相对应的多个层的设计数据，根据每层分离图案。因此，该装置可以仅使用要检查的目标层的图案，不同层的图案检查或层之间的位置偏移的检测来实现检查。

27. 发明授权

US07978904B2 Pattern inspection apparatus and semiconductor inspection system 有权
标题翻译：图案检验仪器和半导体检测系统
公开(公告)号：US07978904B2
公开(公告)日：2011-07-12
申请号：US11834218
申请日：2007-08-06
申请人： Yasutaka Toyoda , Takumichi Sutani , Ryoichi Matsuoka , Hidemitsu Naya
发明人： Yasutaka Toyoda , Takumichi Sutani , Ryoichi Matsuoka , Hidemitsu Naya
IPC分类号： G06K9/00 , G06K9/48
CPC分类号： G06T7/0004 , G06T7/001
摘要： There is provided a pattern inspection apparatus that is capable of detecting a defect accurately and efficiently to inspect a pattern of a semiconductor device. The pattern inspection apparatus includes: a contour extraction means for extracting contour data of a pattern from a captured image of the semiconductor device; a non-linear part extraction means for extracting a non-linear part from the contour data; an angular part extraction means for extracting an angular part of a pattern from design data of the semiconductor device; and a defect detection section that compares a position of the non-linear part extracted by the non-linear part extraction section with a position of the angular part extracted by the angular part extraction section so as to detect a position of a defective part of a pattern.
摘要翻译：提供了能够精确有效地检测缺陷以检查半导体器件的图案的图案检查装置。图案检查装置包括：轮廓提取装置，用于从半导体装置的拍摄图像中提取图案的轮廓数据; 非线性部分提取装置，用于从轮廓数据中提取非线性部分; 角部分提取装置，用于从半导体器件的设计数据提取图案的角部; 以及缺陷检测部，其将由非线性部分提取部提取的非线性部的位置与由角部提取部提取的角部的位置进行比较，以检测不均匀部分的位置模式。

28. 发明申请

US20110150345A1 PATTERN MATCHING METHOD AND COMPUTER PROGRAM FOR EXECUTING PATTERN MATCHING 有权
标题翻译：图案匹配方法和计算机程序执行模式匹配
公开(公告)号：US20110150345A1
公开(公告)日：2011-06-23
申请号：US13034237
申请日：2011-02-24
申请人： Akiyuki SUGIYAMA , Hiroyuki Shindo , Hitoshi Komuro , Takumichi Sutani , Hidetoshi Morokuma
发明人： Akiyuki SUGIYAMA , Hiroyuki Shindo , Hitoshi Komuro , Takumichi Sutani , Hidetoshi Morokuma
IPC分类号： G06K9/62
CPC分类号： G06K9/6204 , G06K9/4633
摘要： A pattern matching method which is capable of selecting a suitable measurement object pattern, even on a sample containing a periodic structure, and a computer program for making a computer execute the pattern matching. In a pattern matching method which executes matching between the design data-based first image of an object sample, and a second image, whether or not a periodic structure is included in a region to execute the matching is determined, so as to select a pattern, based on distance between an original point which is set in said image, and the pattern configuring said periodic structure, in the case where the periodic structure is included in said region, and to select a pattern based on coincidence of the pattern in said image, in the case where the periodic structure is not included in said region, and a computer program product.
摘要翻译：能够选择合适的测量对象图案的模式匹配方法，即使在包含周期性结构的样本上，也可以使计算机程序使计算机执行模式匹配。在执行对象样本的基于设计数据的第一图像与第二图像之间的匹配的图案匹配方法中，确定在区域中是否包括周期性结构以执行匹配，以便选择图案基于在所述图像中设置的原始点与构成所述周期性结构的图案之间的距离，在所述区域中包括周期性结构的情况下，以及基于所述图像中的图案的一致性来选择图案在周期性结构不包括在所述区域中的情况下，以及计算机程序产品。

29. 发明授权

US07800060B2 Pattern measurement method and pattern measurement system 有权
标题翻译：图案测量方法和图案测量系统
公开(公告)号：US07800060B2
公开(公告)日：2010-09-21
申请号：US12182810
申请日：2008-07-30
申请人： Hidetoshi Sato , Ryoichi Matsuoka , Takumichi Sutani
发明人： Hidetoshi Sato , Ryoichi Matsuoka , Takumichi Sutani
IPC分类号： G01N23/00 , G21K7/00
CPC分类号： G01N23/2251 , G03F1/86
摘要： Easily and correctly measuring a dimension of a pattern of a photomask or of an OPC pattern of the photomask.A pattern measurement method of the present invention includes steps of obtaining both a standard pattern corresponding to a predetermined pattern and a measurement point specified in advance; setting a measurement area so that it includes two straight line segments on both sides of the measurement point among outlines of the standard pattern; and measuring a dimension between two contours of the scanned image of the predetermined pattern in the measurement area by superposing the measurement area on the scanned image of the predetermined pattern. The measurement area is set so as not to include portions near corner portions connected to two line segments.
摘要翻译：轻松正确地测量光掩模图案或光掩模的OPC图案的尺寸。本发明的图案测量方法包括以下步骤：获得与预定图案相对应的标准图案和预先指定的测量点; 设置测量区域，使其在标准图案的轮廓中包括测量点两侧的两条直线段; 以及通过将测量区域叠加在预定图案的扫描图像上，来测量测量区域中预定图案的扫描图像的两个轮廓之间的尺寸。测量区域被设置成不包括连接到两个线段的拐角部分附近的部分。

30. 发明授权

US07681159B2 System and method for detecting defects in a semiconductor during manufacturing thereof 有权
标题翻译：用于在其制造期间检测半导体中的缺陷的系统和方法
公开(公告)号：US07681159B2
公开(公告)日：2010-03-16
申请号：US11812774
申请日：2007-06-21
申请人： Ryoichi Matsuoka , Hidetoshi Morokuma , Takumichi Sutani
发明人： Ryoichi Matsuoka , Hidetoshi Morokuma , Takumichi Sutani
IPC分类号： G06F17/50
CPC分类号： G06F17/5081 , G01R31/303
摘要： A system and a method for detecting a defect, capable of extracting a defect occurring depending on finishing accuracy required for circuit operation are provided. The system includes a timing analyzer for extracting a critical path in which a high accuracy is required for a signal transmission operation as compared with other portions based on circuit design data, a critical path extractor for comparing the circuit design data with layout design data on a pattern and for extracting graphical data including the critical path extracted by the timing analyzer, an inspection recipe creator for deciding a portion to be inspected, based on coordinate information on the graphical data including the critical path extracted by the critical path extractor, and an SEM defect review apparatus for acquiring an image of the decided portion to be inspected on a wafer according to an inspection recipe created by the inspection recipe creator.
摘要翻译：提供一种用于检测缺陷的系统和方法，其能够提取根据电路操作所需的精加工精度而发生的缺陷。该系统包括用于提取与其他部分相比基于电路设计数据而与信号传输操作相比需要高精度的关键路径的定时分析器，用于将电路设计数据与布局设计数据进行比较的关键路径提取器基于关于包括由关键路径提取器提取的关键路径的图形数据的坐标信息，以及扫描电子显微镜（SEM）来提取包括由定时分析器提取的关键路径的图形数据，用于决定待检查部分的检查配方生成器缺陷检查装置，用于根据由检查配方创建者创建的检查配方在晶片上获取所确定的待检查部分的图像。

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