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21. 发明授权

US6109303A Process gas supply unit 有权
标题翻译：工艺气体供应单元
公开(公告)号：US6109303A
公开(公告)日：2000-08-29
申请号：US296671
申请日：1999-04-22
申请人： Hiroshi Itafuji , Toshiyasu Inagaki
发明人： Hiroshi Itafuji , Toshiyasu Inagaki
IPC分类号： F16K27/00 , F16K51/00 , F16K11/20
CPC分类号： F16K27/003 , Y10T137/5109 , Y10T137/87885
摘要： A process gas supply unit includes an upper module block provided with flow passages, a passage block provided with flow passages connected with the flow passages of the upper module block, and a base block provided with a connection passage connected with the flow passages of the passage block. The upper module block is attached with a component used for the supply of process gas and is down mounted on the passage block by bolts. The base block is mounted underneath the adjacent passage blocks. Accordingly, a sequence of the components are communicated through the flow passages of the upper module block and the passage block, and the connection passage of the base block.
摘要翻译：一种处理气体供应单元，包括设置有流动通道的上部模块块，设置有与上部模块块的流动通道连接的流动通道的通道块，以及设置有与通道的流动通道连接的连接通道的基座块。上部模块块附有用于供应工艺气体的部件，并通过螺栓下降安装在通道块上。基座安装在相邻通道块的下方。因此，这些部件的顺序通过上部模块块和通道块的流动通道以及基础块的连接通道进行连通。

22. 外观设计

USD367516S Air operated valve 失效
公开(公告)号：USD367516S
公开(公告)日：1996-02-27
申请号：US035855
申请日：1995-03-08
申请人： Hiroshi Itafuji
设计人： Hiroshi Itafuji

23. 发明授权

US08581220B2 Target supply apparatus, control system, control apparatus and control circuit thereof 有权
公开(公告)号：US08581220B2
公开(公告)日：2013-11-12
申请号：US12646025
申请日：2009-12-23
申请人： Takanobu Ishihara , Hiroshi Itafuji
发明人： Takanobu Ishihara , Hiroshi Itafuji
IPC分类号： H05H1/04
CPC分类号： H05G2/006 , G03F7/70033 , H05G2/003 , H05G2/008
摘要： A target supply apparatus includes a tank for storing a liquid target material, a nozzle for outputting the liquid target material in the tank, and a gas supply source for supplying gas into the tank, and controls a gas pressure inside the tank with a pressure of the gas supplied from the gas supply source which is provided with a pressure regulator. The target supply apparatus also includes a pressure-decrease gas passage of which one end is connected to the tank and the other end forms an exhaust port, a pressure-decrease valve provided on the pressure-decrease gas passage, and a controller for controlling open/close of the pressure-decrease valve. The controller, when the target material is caused not to output from the nozzle, opens the pressure-decrease valve and decreases the pressure inside the tank.

24. 发明申请

US20100213275A1 TARGET SUPPLY APPARATUS, CONTROL SYSTEM, CONTROL APPARATUS AND CONTROL CIRCUIT THEREOF 有权
标题翻译：目标供应装置，控制系统，控制装置及其控制电路
公开(公告)号：US20100213275A1
公开(公告)日：2010-08-26
申请号：US12646025
申请日：2009-12-23
申请人： Takanobu ISHIHARA , Hiroshi Itafuji
发明人： Takanobu ISHIHARA , Hiroshi Itafuji
IPC分类号： B05B1/08
CPC分类号： H05G2/006 , G03F7/70033 , H05G2/003 , H05G2/008
摘要： A target supply apparatus includes a tank for storing a liquid target material, a nozzle for outputting the liquid target material in the tank, and a gas supply source for supplying gas into the tank, and controls a gas pressure inside the tank with a pressure of the gas supplied from the gas supply source which is provided with a pressure regulator. The target supply apparatus also includes a pressure-decrease gas passage of which one end is connected to the tank and the other end forms an exhaust port, a pressure-decrease valve provided on the pressure-decrease gas passage, and a controller for controlling open/close of the pressure-decrease valve. The controller, when the target material is caused not to output from the nozzle, opens the pressure-decrease valve and decreases the pressure inside the tank.
摘要翻译：目标供给装置包括用于储存液体目标材料的罐，用于在罐中输出液体目标材料的喷嘴和用于将气体供应到罐中的气体供应源，并且以从设置有压力调节器的气体供给源供给的气体。目标供给装置还包括其一端连接到罐并且另一端形成排气口的减压气体通道，设置在减压气体通道上的减压阀，以及用于控制开路的控制器 /关闭减压阀。当目标材料不从喷嘴输出时，控制器打开减压阀并降低罐内的压力。

25. 外观设计

USD366928S Air operated valve 失效
公开(公告)号：USD366928S
公开(公告)日：1996-02-06
申请号：US35853
申请日：1995-03-08
申请人： Hiroshi Itafuji
设计人： Hiroshi Itafuji

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