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21. 发明申请

US20070132811A1 Ink jet head manufacturing method and ink jet head manufactured by the manufacturing method 有权
标题翻译：喷墨头制造方法和通过制造方法制造的喷墨头
公开(公告)号：US20070132811A1
公开(公告)日：2007-06-14
申请号：US10576247
申请日：2005-06-27
申请人： Akihiko Okano , Shoji Shiba , Hiroe Ishikura
发明人： Akihiko Okano , Shoji Shiba , Hiroe Ishikura
IPC分类号： G03C5/00 , B41J2/04
CPC分类号： B41J2/1603 , B41J2/1631 , B41J2/1639 , B41J2/1645
摘要： A method of manufacturing an ink jet head which includes a discharge port for discharging an ink droplet, an ink flow path communicated with the discharge port, and an energy generating element for discharging the ink droplet from the discharge port, the method for manufacturing an ink jet head includes a process of forming a photodegradable positive type resist layer on a substrate having the energy generating element, a process of forming a structure which becomes the ink flow path by exposing and developing the photodegradable positive type resist layer, a process of coating the substrate having the structure which becomes the ink flow path with a negative type resist layer, a process of forming the ink discharge port in the negative type resist layer, and a process of forming the ink flow path communicated with the discharge port by removing the structure which becomes the ink flow path, wherein the photodegradable positive type resist layer includes an acrylic copolymer composition, the acrylic copolymer composition containing at least a unit obtained from (meta)acrylic ester as a main content, the acrylic copolymer composition further containing a unit obtained from (meta)acrylic acid, the acrylic copolymer composition contains the (meta)acrylic acid unit at a proportion of 5 to 30 weight %, and weight average molecular weight of the acrylic copolymer ranges from 50000 to 300000.
摘要翻译：一种制造喷墨头的方法，该喷墨头包括用于排出墨滴的排出口，与排出口连通的油墨流路，以及用于从排出口排出墨滴的能量产生元件，用于制造墨水的方法喷墨头包括在具有能量产生元件的基板上形成可光降解的正型抗蚀剂层的工艺，通过曝光和显影可光降解的正型抗蚀剂层形成成为油墨流动路径的结构的工艺，具有成为具有负型抗蚀剂层的油墨流路的结构的基板，在负型抗蚀剂层中形成油墨排出口的工序，以及通过除去结构形成与排出口连通的油墨流路的工序其变为油墨流动路径，其中可光降解的正型抗蚀剂层包括丙烯酸共聚物组合物 n，至少含有由（甲基）丙烯酸酯作为主要成分的单元的丙烯酸共聚物组合物，所述丙烯酸共聚物组合物还含有由（甲基）丙烯酸得到的单元，所述丙烯酸共聚物组合物含有（甲基）丙烯酸单元的比例为5〜30重量％，丙烯酸系共聚物的重均分子量为50000〜300000。

22. 发明申请

US20050046662A1 Ink jet recording head and method for manufacturing the same 失效
标题翻译：喷墨记录头及其制造方法
公开(公告)号：US20050046662A1
公开(公告)日：2005-03-03
申请号：US10914218
申请日：2004-08-10
申请人： Akihiko Okano , Shoji Shiba , Hiroe Ishikura
发明人： Akihiko Okano , Shoji Shiba , Hiroe Ishikura
IPC分类号： B41J2/16 , B41J2/015
CPC分类号： B41J2/1639 , B41J2/1603 , B41J2/1629 , B41J2/1631 , B41J2/1632 , B41J2/1645 , Y10T29/49401
摘要： A method for manufacturing an ink jet recording head comprising: (a) a process of forming a positive resist layer (I) made of a photodegradation positive resist (i) on a surface of a substrate having an energy generation element; (b) a process of removing a predetermined area of the positive resist layer (I) by photolithography to form a micro structure which becomes at least an ink flow path; (c) a process of forming a coating resin layer on the surface of the substrate on which the micro structure has been formed; (d) a process of forming ink discharge ports in a portion where the coating resin layer covers the micro structure by photolithography; and (e) a process of removing the micro structure to form the ink flow path communicated with the ink discharge ports, wherein the photodegradation positive resist (i) includes a polymer having a glutarimide structure shown by the following chemical formula (1) in a molecule; wherein R1 designates a hydrogen atom or an alkyl group, an allyl group, or an aralkyl group which has the carbon number ranging from 1 to 20.
摘要翻译：一种制造喷墨记录头的方法，包括：（a）在具有能量产生元件的基底的表面上形成由光降解正性抗蚀剂（i）制成的正性抗蚀剂层（I）的工艺; （b）通过光刻法去除正型抗蚀剂层（I）的预定区域以形成至少形成墨水流路的微结构的工艺; （c）在已经形成有微结构的基板的表面上形成涂布树脂层的工艺; （d）通过光刻法在涂覆树脂层覆盖微结构的部分中形成喷墨口的工艺; （e）除去微结构以形成与喷墨口连通的油墨流路的工序，其中光降解正性抗蚀剂（i）包括具有如下化学式（1）所示的戊二酰亚胺结构的聚合物：分子; 其中R 1表示氢原子或碳数为1至20的烷基，烯丙基或芳烷基。

23. 发明授权

US07485412B2 Ink jet head manufacturing method and ink jet head manufactured by the manufacturing method 有权
标题翻译：喷墨头制造方法和通过制造方法制造的喷墨头
公开(公告)号：US07485412B2
公开(公告)日：2009-02-03
申请号：US10576247
申请日：2005-06-27
申请人： Akihiko Okano , Shoji Shiba , Hiroe Ishikura
发明人： Akihiko Okano , Shoji Shiba , Hiroe Ishikura
IPC分类号： B41J2/01
CPC分类号： B41J2/1603 , B41J2/1631 , B41J2/1639 , B41J2/1645
摘要： A method of manufacturing an ink jet head, which includes a discharge port for discharging an ink droplet, an ink flow path communicated with the discharge port, and an energy generating element for discharging the ink droplet from the discharge port, includes providing a photodegradable resin layer on a substrate having the energy generating element, forming a structure which becomes the ink flow path by exposing and developing the photodegradable resin layer, coating the substrate having the structure which becomes the ink flow path with a negative type photosensitive resin layer, forming the ink discharge port in the negative type photosensitive resin layer, and forming the ink flow path communicated with the discharge port by removing the structure which becomes the ink flow path. The photodegradable resin layer includes a binary acrylic copolymer composition, which contains a unit obtained from (meta)acrylic ester as a main component and further contains a unit obtained from (meta)acrylic acid. The composition contains the (meta)acrylic acid unit at a proportion of 5 to 30 weight %, and a weight average molecular weight of the composition ranges from 50000 to 300000.
摘要翻译：一种制造喷墨头的方法，其包括用于排出墨滴的排出口，与排出口连通的油墨流路，以及用于从排出口排出墨滴的能量产生元件，包括提供光可降解树脂在具有能量产生元件的基板上形成通过曝光和显影光可降解树脂层而成为油墨流动路径的结构，用负型感光树脂层涂覆具有成为油墨流动通道的结构的基板，形成通过除去成为油墨流路的结构，形成与排出口连通的油墨流路。可光降解树脂层包括二元丙烯酸共聚物组合物，其包含由（甲基）丙烯酸酯作为主要成分获得的单元，并且还包含由（甲基）丙烯酸获得的单元。该组合物含有5〜30重量％的（甲基）丙烯酸单元，组合物的重均分子量为50000〜300000。

24. 发明申请

US20050093924A1 Photosensitive resin composition, ink-jet recording head using the composition, and production method for the same 失效
标题翻译：光敏树脂组合物，使用该组合物的喷墨记录头及其制备方法
公开(公告)号：US20050093924A1
公开(公告)日：2005-05-05
申请号：US11008221
申请日：2004-12-10
申请人： Shoji Shiba , Hiroe Ishikura
发明人： Shoji Shiba , Hiroe Ishikura
IPC分类号： B41J2/05 , B41J2/16 , C08G69/48 , C08K5/3477 , C08L77/06 , G03F7/038 , B41J2/135
CPC分类号： B41J2/1631 , B41J2/1603 , B41J2/1626 , B41J2/1639 , G03F7/0387
摘要： A photosensitive resin composition usable in forming an ink-jet recording head, and a production method of the head. The composition comprises a polyetheramide resin having a repeating unit represented by the following formula (1), a compound that generates an acid by light irradiation, and a crosslinking agent for the polyetheramide resin which acts under acidic conditions. The composition improves adhesion between a substrate and an ink flow path forming member which constitute the ink-jet recording head.
摘要翻译：可用于形成喷墨记录头的感光性树脂组合物及其制造方法。该组合物包含具有下式（1）表示的重复单元的聚醚酰胺树脂，通过光照射产生酸的化合物和在酸性条件下起作用的聚醚酰胺树脂交联剂。该组合物提高了构成喷墨记录头的基板和油墨流路形成部件之间的粘合性。

25. 发明授权

US07063933B2 Photosensitive resin composition, ink-jet recording head using the composition, and production method for the same 失效
标题翻译：光敏树脂组合物，使用该组合物的喷墨记录头及其制备方法
公开(公告)号：US07063933B2
公开(公告)日：2006-06-20
申请号：US11008221
申请日：2004-12-10
申请人： Shoji Shiba , Hiroe Ishikura
发明人： Shoji Shiba , Hiroe Ishikura
IPC分类号： G03F7/40 , G03F7/038 , H01L21/311 , G01D15/18 , B41J2/16
CPC分类号： B41J2/1631 , B41J2/1603 , B41J2/1626 , B41J2/1639 , G03F7/0387
摘要： A photosensitive resin composition usable in forming an ink-jet recording head, and a production method of the head. The composition comprises a polyetheramide resin having a repeating unit represented by the following formula (1), a compound that generates an acid by light irradiation, and a crosslinking agent for the polyetheramide resin which acts under acidic conditions. The composition improves adhesion between a substrate and an ink flow path forming member which constitute the ink-jet recording head
摘要翻译：可用于形成喷墨记录头的感光性树脂组合物及其制造方法。该组合物包含具有下式（1）表示的重复单元的聚醚酰胺树脂，通过光照射产生酸的化合物和在酸性条件下起作用的聚醚酰胺树脂交联剂。该组合物提高了构成喷墨记录头的基板和油墨流路形成部件之间的粘合性

26. 发明授权

US08124791B2 Active energy ray curable liquid composition and liquid cartridge 有权
标题翻译：活性能量射线固化液体组合物和液体盒
公开(公告)号：US08124791B2
公开(公告)日：2012-02-28
申请号：US12530720
申请日：2008-03-25
申请人： Kenji Shinjo , Norio Ohkuma , Shoji Shiba , Hikaru Ueda , Hiroe Ishikura , Shinsuke Tsuji , Yoshikazu Saito , Kouji Harada , Yuichiro Kanasugi
发明人： Kenji Shinjo , Norio Ohkuma , Shoji Shiba , Hikaru Ueda , Hiroe Ishikura , Shinsuke Tsuji , Yoshikazu Saito , Kouji Harada , Yuichiro Kanasugi
IPC分类号： C07D403/14
CPC分类号： C09D11/30 , C08F222/40 , C09D11/101
摘要： The invention provides an active energy ray curable liquid composition containing a compound represented by a general formula (I): wherein A is a hydrogen atom or a monovalent organic residue which may be substituted, R1 and R2 are, independently of each other, a divalent organic group which may be substituted, E is an amide bond, Rn is a cyclic linking group having a carbonyl group and an unsaturated carbon-carbon bond adjacent to the carbon atom of the carbonyl group, m is a number of 0 or greater, n is a number of 2 or greater, m+n is 3, and Z is a secondary or tertiary amino bond structure, with the proviso that the amino bond may be a salt of a secondary or tertiary amine, and a liquid cartridge.
摘要翻译：本发明提供含有通式（I）表示的化合物的活性能量射线固化性液体组合物：其中A为氢原子或可被取代的一价有机残基，R 1和R 2彼此独立地为二价可以被取代的有机基团，E是酰胺键，Rn是与羰基的碳原子相邻的具有羰基和不饱和碳 - 碳键的环状连接基，m为0以上数，n 是2或更大的数，m + n是3，Z是仲或叔氨基键结构，条件是氨基键可以是仲胺或叔胺的盐和液体盒。

27. 发明申请

US20100094024A1 ACTIVE ENERGY RAY CURABLE LIQUID COMPOSITION AND LIQUID CARTRIDGE 有权
标题翻译：活性能量可固化液体组合物和液体盒
公开(公告)号：US20100094024A1
公开(公告)日：2010-04-15
申请号：US12530720
申请日：2008-03-25
申请人： Kenji Shinjo , Norio Ohkuma , Shoji Shiba , Hikaru Ueda , Hiroe Ishikura , Shinsuke Tsuji , Yoshikazu Saito , Kouji Harada , Yuichiro Kanasugi
发明人： Kenji Shinjo , Norio Ohkuma , Shoji Shiba , Hikaru Ueda , Hiroe Ishikura , Shinsuke Tsuji , Yoshikazu Saito , Kouji Harada , Yuichiro Kanasugi
IPC分类号： C07D403/12 , C07D403/14
CPC分类号： C09D11/30 , C08F222/40 , C09D11/101
摘要： The invention provides an active energy ray curable liquid composition containing a compound represented by a general formula (I): wherein A is a hydrogen atom or a monovalent organic residue which may be substituted, R1 and R2 are, independently of each other, a divalent organic group which may be substituted, E is an amide bond, Rn is a cyclic linking group having a carbonyl group and an unsaturated carbon-carbon bond adjacent to the carbon atom of the carbonyl group, m is a number of 0 or greater, n is a number of 2 or greater, m+n is 3, and Z is a secondary or tertiary amino bond structure, with the proviso that the amino bond may be a salt of a secondary or tertiary amine, and a liquid cartridge.
摘要翻译：本发明提供含有通式（I）表示的化合物的活性能量射线固化性液体组合物：其中A为氢原子或可被取代的一价有机残基，R 1和R 2彼此独立地为二价可以被取代的有机基团，E是酰胺键，Rn是与羰基的碳原子相邻的具有羰基和不饱和碳 - 碳键的环状连接基，m为0以上数，n 是2或更大的数，m + n是3，Z是仲或叔氨基键结构，条件是氨基键可以是仲胺或叔胺的盐和液体盒。

28. 发明授权

US08409454B2 Production process for structure and production process for liquid discharge head 有权
标题翻译：液体排放头结构和生产工艺的生产工艺
公开(公告)号：US08409454B2
公开(公告)日：2013-04-02
申请号：US12731563
申请日：2010-03-25
申请人： Etsuko Hino , Shoji Shiba
发明人： Etsuko Hino , Shoji Shiba
IPC分类号： G01D15/00 , G11B5/127
CPC分类号： B41J2/1603 , B41J2/1629 , B41J2/1639 , Y10T29/49401
摘要： A production process for a structure includes preparing a substrate on which a first layer and a second layer are provided in this order; forming a second mold, which is a part of a mold member serving as a mold for forming the structure, from the second layer; etching the first layer using the second mold as a mask and thereby forming a first mold, which is another part of the mold member from the first layer; providing a coating layer which serves as the structure to cover the first mold and the second mold; and removing the first mold and the second mold and thereby forming the structure.
摘要翻译：用于结构的制造方法包括制备其上以该顺序设置有第一层和第二层的基板; 从所述第二层形成作为用于形成所述结构的模具的模具部件的一部分的第二模具; 使用第二模具作为掩模蚀刻第一层，从而形成第一模具，该第一模具是来自第一层的模具构件的另一部分; 提供用作覆盖第一模具和第二模具的结构的涂层; 并移除第一模具和第二模具，从而形成结构。

29. 发明申请

US20100252529A1 PRODUCTION PROCESS FOR STRUCTURE AND PRODUCTION PROCESS FOR LIQUID DISCHARGE HEAD 有权
标题翻译：液体排放头结构和生产过程的生产工艺
公开(公告)号：US20100252529A1
公开(公告)日：2010-10-07
申请号：US12731563
申请日：2010-03-25
申请人： Etsuko Hino , Shoji Shiba
发明人： Etsuko Hino , Shoji Shiba
IPC分类号： B41J2/16 , B44C1/22
CPC分类号： B41J2/1603 , B41J2/1629 , B41J2/1639 , Y10T29/49401
摘要： A production process for a structure comprising: preparing a substrate on which a first layer and a second layer are provided in this order; forming a second mold which is a part of a mold member serving as a mold for forming the structure from the second layer; etching the first layer using the second mold as a mask and thereby forming a first mold which is another part of the mold member from the first layer; providing a coating layer which serves as the structure to cover the first mold and the second mold; and removing the first mold and the second mold and thereby forming the structure.
摘要翻译：一种用于结构的制造方法，包括：准备其上以该顺序设置有第一层和第二层的基板; 形成作为用于从第二层形成结构的模具的模具构件的一部分的第二模具; 使用第二模具作为掩模蚀刻第一层，从而从第一层形成作为模具构件的另一部分的第一模具; 提供用作覆盖第一模具和第二模具的结构的涂层; 并移除第一模具和第二模具，从而形成结构。

30. 发明申请

US20090162797A1 METHOD OF MANUFACTURING LIQUID EJECTION HEAD 审中-公开
标题翻译：制造液体喷射头的方法
公开(公告)号：US20090162797A1
公开(公告)日：2009-06-25
申请号：US12334149
申请日：2008-12-12
申请人： Shinsuke Tsuji , Shoji Shiba , Tamaki Sato
发明人： Shinsuke Tsuji , Shoji Shiba , Tamaki Sato
IPC分类号： G03F7/20
CPC分类号： G03F7/039 , B41J2/1603 , B41J2/1631 , B41J2/1639 , B41J2/1645
摘要： A method of manufacturing a liquid ejection head includes a step of forming a layer of a positive-type photosensitive resin on a substrate; a step of forming a pattern, used to form a liquid channel, by exposing the positive-type photosensitive resin layer to light; a step of forming a photosensitive layer, used to form a discharge port-forming member, on the pattern; and a step of forming a discharge port in such a manner that the photosensitive layer is patterned by exposing the photosensitive layer to i-line. The pattern has a predetermined absorbance for i-line and contains a specific compound.
摘要翻译：液体喷射头的制造方法包括在基板上形成正型感光性树脂层的工序; 通过将正型感光性树脂层曝光而形成用于形成液体通道的图案的步骤; 在图案上形成用于形成排出口形成构件的感光层的步骤; 以及以使得感光层通过将感光层暴露于i线而被图案化的方式形成排出口的步骤。该图案对于i线具有预定的吸光度并且含有特定的化合物。

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