专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

21. 发明授权

US5726757A Alignment method 失效
标题翻译：对齐方法
公开(公告)号：US5726757A
公开(公告)日：1998-03-10
申请号：US719315
申请日：1996-09-25
申请人： Masaki Kato , Kinya Kato , Kei Nara
发明人： Masaki Kato , Kinya Kato , Kei Nara
IPC分类号： G03F7/20 , G03F9/00 , G01B11/00
CPC分类号： G03F7/70275 , G03F7/70358 , G03F9/70
摘要： In an exposure apparatus, an alignment-detecting light component of a mask and that of a plate are spatially separated from each other, thereby enabling highly accurate alignment with little influence of the light from the plate on detection of the mask position. An alignment optical system comprises a light source means for supplying a luminous flux; a scan beam forming optical system for forming, based on the luminous flux, a scan beam at a visual field area on a first substrate with respect to a predetermined optical system; a scanning means for optically scanning, in a predetermined direction, the scan beam formed on the first substrate; a first detection means for detecting a diffracted and reflected light component from a first mark generated when optically scanned with the scan beam formed on the first substrate; and a second detection means for detecting, by way of the predetermined optical system and through a path different from the path through which the diffracted and reflected light component from the first mark is detected, a diffracted and reflected light component from a second mark generated when optically scanned with the scan beam which is formed on the second substrate by way of the predetermined optical system.
摘要翻译：在曝光装置中，掩模的对准检测光分量和板的对准检测光分量在空间上彼此分离，从而在对掩模位置的检测时几乎不受来自板的光的影响。对准光学系统包括用于提供光通量的光源装置; 扫描光束形成光学系统，用于基于光通量，相对于预定光学系统在第一基板上的视野区域处形成扫描光束; 扫描装置，用于在预定方向上光扫描形成在第一基板上的扫描光束; 第一检测装置，用于从由形成在第一基板上的扫描光束进行光扫描时产生的第一标记中检测衍射和反射光分量; 以及第二检测装置，用于通过预定的光学系统和通过不同于检测到来自第一标记的衍射和反射光分量的路径的路径来检测来自第二标记的衍射和反射光分量，通过预定的光学系统用形成在第二基板上的扫描光束进行光学扫描。

22. 发明授权

US5668624A Scan type exposure apparatus 失效
标题翻译：扫描式曝光装置
公开(公告)号：US5668624A
公开(公告)日：1997-09-16
申请号：US358590
申请日：1994-12-14
申请人： Tsuyoshi Naraki , Kei Nara
发明人： Tsuyoshi Naraki , Kei Nara
IPC分类号： G03F7/20 , H01L21/027 , G03B27/72
CPC分类号： G03F7/70058 , G03F7/70275 , G03F7/70358 , G03F7/70558
摘要： A scan type exposure apparatus has a mask stage for mounting a mask formed with an exposure pattern in a pattern area; a substrate stage for mounting a rectangular photosensitive substrate; a driving unit for moving the mask stage and the substrate stage in synchronism parallel to one side of the rectangular photosensitive substrate; illumination optical systems for illuminating partial areas of the mask with light beams; and projection optical systems for projecting images of the illuminated areas of the mask onto the photosensitive substrate. The projection optical system projects the light beams passing through the exposure pattern area of the illuminated mask on a central area, excluding peripheral areas, of an exposure area of the photosensitive substrate and projects the light beams passing through an area other than the exposure pattern area of the illuminated mask on the peripheral areas. The scan type exposure apparatus also has an exposure quantity control unit for setting an exposure quantity for the peripheral areas larger than an exposure quantity for the central area.
摘要翻译：扫描型曝光装置具有用于将形成有曝光图案的掩模安装在图案区域中的掩模台; 用于安装矩形感光基板的基板台; 驱动单元，用于与所述矩形感光基板的一侧平行地同步地移动所述掩模台和所述基板台; 照明光学系统，用于用光束照射面罩的部分区域; 以及用于将掩模的照射区域的图像投影到感光基板上的投影光学系统。投影光学系统将通过照射的掩模的曝光图案区域的光束投射到感光基板的曝光区域的除外围区域的中心区域上，并且突出通过除了曝光图案区域之外的区域的周边区域上的照明面具。扫描型曝光装置还具有曝光量控制单元，用于设定比中央区域的曝光量大的周边区域的曝光量。

23. 发明授权

US09172063B2 Method and apparatus for manufacturing display devices 有权
标题翻译：用于制造显示装置的方法和装置
公开(公告)号：US09172063B2
公开(公告)日：2015-10-27
申请号：US12102509
申请日：2008-04-14
申请人： Tomohide Hamada , Kei Nara
发明人： Tomohide Hamada , Kei Nara
IPC分类号： B05D5/12 , H01L51/56 , G02F1/13 , H01J9/24 , G02F1/1333 , H01L27/32 , H01L51/00
CPC分类号： H01L51/56 , G02F1/1303 , G02F2001/133302 , G02F2001/133325 , H01J9/241 , H01J9/242 , H01L27/3246 , H01L51/0005 , H01L51/0022
摘要： A method for fabricating a display device including forming a standard mark in a flexible substrate fed in a first direction, forming a partition wall in the flexible substrate, and forming an electrode by applying a conductive member at a predetermined position between the partition walls by an applicator based on the standard mark. An apparatus is provided that includes a transportation unit to transport a flexible substrate in a first direction, a mark formation unit to form a standard mark in the flexible substrate, a partition wall formation unit to form a partition wall in the flexible substrate, and an application unit to apply a conductive member to a predetermined position between the partition walls based on the standard mark. A display device is provided that includes a flexible substrate, a partition wall formed by pressing the flexible substrate, and an electrode formed by application between the partition walls.
摘要翻译：一种制造显示装置的方法，包括在沿第一方向馈送的柔性基板中形成标准标记，在柔性基板中形成分隔壁，并通过在隔壁之间的预定位置处施加导电构件，形成电极，涂抹器基于标准标记。提供了一种装置，其包括：沿第一方向输送柔性基板的输送单元，在柔性基板中形成标准标记的标记形成单元，在柔性基板中形成分隔壁的分隔壁形成单元，应用单元基于标准标记将导电构件施加到分隔壁之间的预定位置。提供一种显示装置，其包括柔性基板，通过按压柔性基板形成的分隔壁以及通过在分隔壁之间施加形成的电极。

24. 发明授权

US08301289B2 Defect detection method of display device and defect detection apparatus of display device 有权
标题翻译：显示装置的缺陷检测方法和显示装置的缺陷检测装置
公开(公告)号：US08301289B2
公开(公告)日：2012-10-30
申请号：US12753517
申请日：2010-04-02
申请人： Kei Nara , Tomohide Hamada
发明人： Kei Nara , Tomohide Hamada
IPC分类号： G06F19/00
CPC分类号： G01N21/95607 , G01N2021/9513 , G01N2021/95615 , G02F1/136259
摘要： A defect detecting method of a display device includes a defect counting process that measuring a feature amount for each partial region of a display device (P32), and counting regions which is determined as a defective portion based on the measured feature amount of the region (P36), a process that stopping a manufacturing line of the display device when a number of defects counted at the defect counting process is greater than a first threshold value (P38, P42), a defect density calculating process that calculating a defect density in a predetermined area when the number of defects counted at the defect counting process is smaller than the first threshold value (P38), and a process that stopping the manufacturing line of the display device when the defect density calculated at the defect density calculating process is higher than a second threshold value (P40, P42).
摘要翻译：显示装置的缺陷检测方法包括测量显示装置的每个部分区域的特征量的缺陷计数处理（P32），并且基于测量的区域的特征量对被确定为缺陷部分的区域进行计数（ P36），当在缺陷计数处理中计数的缺陷数量大于第一阈值（P38，P42）时停止显示装置的生产线的处理，计算缺陷密度的缺陷密度计算处理当在缺陷计数处理中计数的缺陷数量小于第一阈值（P38）时的预定区域，以及当在缺陷密度计算处理中计算的缺陷密度高于显示装置的制造线时，停止显示装置的制造线的处理第二阈值（P40，P42）。

25. 发明授权

US06342943B1 Exposure apparatus 失效
标题翻译：曝光装置
公开(公告)号：US06342943B1
公开(公告)日：2002-01-29
申请号：US09088571
申请日：1998-06-02
申请人： Kei Nara
发明人： Kei Nara
IPC分类号： G03B2754
CPC分类号： G03F7/70258 , G03F7/70275 , G03F7/70358
摘要： An exposure apparatus and methods for making and using the same. The exposure apparatus includes at least one projection optical system which projects illuminating light, a substrate stage which supports a substrate to be exposed by the illuminating light and which includes a first plurality of reference marks. The exposure apparatus also includes a mask stage which supports a mask that includes a mask pattern to be projected onto the substrate by at least one projection optical system. The mask further includes a second plurality of reference marks intended to correspond to the first plurality of reference marks. The second plurality of reference marks is integrally formed with the mask pattern. The projection optical system(s) project illuminating light based on the mask pattern and the second plurality of reference marks to produce a projected image corresponding to the mask pattern and a plurality of projected images corresponding to the second plurality of reference marks. The exposure apparatus also includes an adjustment mechanism which adjusts the position of the projected image on the substrate based on a plurality of positional relationships between the plurality of projected images and the first plurality of reference marks. Also included is a plurality of sensors which detect the positional relationships, and a control device which controls the adjustment mechanism based on the positional relationships to effect a predetermined plurality of positional relationships between the plurality of projected images and the first plurality of reference marks.
摘要翻译：曝光装置及其制作及使用方法。曝光装置包括投影照明光的至少一个投影光学系统，支撑要被照明光曝光的基板并包括第一多个参考标记的基板台。曝光装置还包括掩模台，其通过至少一个投影光学系统支持包括要投影到基板上的掩模图案的掩模。掩模还包括旨在对应于第一多个参考标记的第二多个参考标记。第二多个参考标记与掩模图案一体地形成。投影光学系统基于掩模图案和第二多个参考标记投射照明光，以产生对应于掩模图案的投影图像和对应于第二多个参考标记的多个投影图像。曝光装置还包括调整机构，其基于多个投影图像与第一多个参考标记之间的多个位置关系来调整投影图像在基板上的位置。还包括检测位置关系的多个传感器，以及基于位置关系来控制调节机构以实现多个投影图像与第一多个参考标记之间的预定多个位置关系的控制装置。

26. 发明授权

US6141082A Alignment method, exposure method, and exposure apparatus 有权
标题翻译：对准方法，曝光方法和曝光装置
公开(公告)号：US6141082A
公开(公告)日：2000-10-31
申请号：US172144
申请日：1998-10-14
申请人： Kei Nara , Seiji Miyazaki , Hideki Koitabashi
发明人： Kei Nara , Seiji Miyazaki , Hideki Koitabashi
IPC分类号： G03F9/00 , G03B27/52
CPC分类号： G03F9/7011 , G03F9/00 , G03F9/7003 , G03F9/7076 , G03F9/7088 , Y10S438/975
摘要： In order to provide a search alignment method capable of high-speed alignment without a relative movement between an alignment system and a substrate, an alignment mark is constituted by a plurality of element marks having shapes different from each other, the plurality of element marks are provided in such a manner that each two of them has a gap a little shorter than the size of the field of view of the alignment system therebetween, and if even one of the element marks constituting the alignment mark comes into the field of view of the alignment system, said element mark is identified out of all of said element marks, whereby the position of the entire alignment is measured from the position of said one element mark. Therefore, if the alignment mark is moved in a range wider than the field of view of the alignment system, it is possible to detect the position of the alignment mark by one measurement.
摘要翻译：为了提供能够在对准系统和基板之间没有相对移动的情况下进行高速对准的搜索对准方法，由具有彼此不同的形状的多个元素标记构成对准标记，多个元素标记设置成使得它们中的每一个具有比它们之间的对准系统的视场尺寸稍短的间隙，并且如果构成对准标记的元件标记中的一个进入到对准系统中，从所有元件标记中识别所述元件标记，由此从所述一个元件标记的位置测量整个对准的位置。因此，如果对准标记在比对准系统的视野宽的范围内移动，则可以通过一次测量来检测对准标记的位置。

27. 发明授权

US5985496A Exposure method and apparatus 失效
标题翻译：曝光方法和装置
公开(公告)号：US5985496A
公开(公告)日：1999-11-16
申请号：US837277
申请日：1997-04-11
申请人： Kei Nara , Toshio Matsuura
发明人： Kei Nara , Toshio Matsuura
IPC分类号： G03F7/20 , H01L21/027
CPC分类号： G03F7/70275 , G03F7/2002 , G03F7/70358 , G03F7/70475 , G03F7/70791
摘要： An exposure apparatus for exposing a photomask pattern onto a photosensitive substrate via a plurality of optical systems includes a source of illumination for irradiating the photomask pattern with beams of light adapted to pass through the pattern and optical systems onto the substrate. A scanning mechanism for synchronously scanning the photomask pattern with the beams of light is included to transfer the pattern to the substrate. A plurality of illumination intensity measuring devices is provided for substantially simultaneously measuring the illumination intensities of the beams of light passing through the optical systems.
摘要翻译：用于通过多个光学系统将光掩模图案曝光到感光基板上的曝光装置包括用于将适合于穿过图案的光束照射到光掩模图案和光学系统到基板上的照明源。包括用于将光束同时扫描光掩模图案的扫描机构，以将图案转移到基板。提供了多个照明强度测量装置，用于基本上同时测量通过光学系统的光束的照明强度。

28. 发明授权

US5978094A Alignment device and method based on imaging characteristics of the image pickup system 失效
标题翻译：基于图像拾取系统的成像特性的对准装置和方法
公开(公告)号：US5978094A
公开(公告)日：1999-11-02
申请号：US940289
申请日：1997-09-30
申请人： Tsuyoshi Narabe , Kei Nara , Masamitsu Yanagihara
发明人： Tsuyoshi Narabe , Kei Nara , Masamitsu Yanagihara
IPC分类号： G01B11/27 , G03F7/20 , G03F9/00 , H01L21/027 , G01B11/00
CPC分类号： G03F7/70358 , G01B11/27 , G03F9/70
摘要： An alignment device includes an image pickup optical system for picking up an image of a first reference mark disposed on a mask and an image of a second reference mark disposed on a photosensitive substrate through an image pickup optical system, a memory for storing information associated with the imaging characteristics of the image pickup optical system, and a correction system for correcting the positions of the first and second reference marks, detected using image information from the image pickup system, on the basis of the information associated with the imaging characteristics of the image pickup optical system.
摘要翻译：对准装置包括：图像拾取光学系统，用于拾取设置在掩模上的第一参考标记的图像和通过图像拾取光学系统设置在感光基板上的第二参考标记的图像;存储器，用于存储与图像拾取光学系统的成像特性，以及用于校正使用来自图像拾取系统的图像信息检测的第一和第二参考标记的位置的校正系统，其基于与图像的成像特性相关联的信息拾取光学系统。

29. 发明授权

US5838449A Optical apparatus 失效
标题翻译：光学仪器
公开(公告)号：US5838449A
公开(公告)日：1998-11-17
申请号：US912954
申请日：1997-08-14
申请人： Kinya Kato , Masaki Kato , Kei Nara
发明人： Kinya Kato , Masaki Kato , Kei Nara
IPC分类号： G03F7/20 , G03F9/00 , G01B9/02
CPC分类号： G03F7/70275 , G03F7/70358 , G03F7/70791 , G03F9/70
摘要： An exposure apparatus of a large-substrate single scan-exposure type by which a mask mark and a plate mark are two-dimensionally scanned in relatively narrow respective scan areas at the same time to effect highly accurate alignment. In the present invention, a first substrate and a second substrate are relatively moved in a predetermined direction with respect to a projection optical system, while an image of a pattern formed in the first substrate projectively impinges on the second substrate by way of the projection optical system. The projection optical system comprises a plurality of projection optical units arranged in a direction orthogonal to the scanning direction in order to form, on the second substrate, a same-magnification erected image of the pattern formed on the first substrate. The exposure apparatus has an alignment means for detecting a first mark formed on the first substrate and a second mark formed on the second substrate by optical scanning so as to measure a positional deviation between the first substrate and the second substrate.
摘要翻译：大面积单扫描曝光型的曝光装置，通过该曝光装置在相对较窄的各个扫描区域中同时二维地扫描掩码标记和印记标记，以实现高精度对准。在本发明中，第一基板和第二基板相对于投影光学系统相对于预定方向相对移动，而形成在第一基板中的图案的图像通过投影光学投射到第二基板上系统。投影光学系统包括沿与扫描方向正交的方向布置的多个投影光学单元，以在第二基板上形成在第一基板上形成的图案的相同放大率的竖立图像。曝光装置具有用于检测形成在第一基板上的第一标记的对准装置和通过光学扫描形成在第二基板上的第二标记，以便测量第一基板和第二基板之间的位置偏差。

30. 发明授权

US09086585B2 Display element manufacturing method and manufacturing apparatus 有权
标题翻译：显示元件制造方法和制造装置
公开(公告)号：US09086585B2
公开(公告)日：2015-07-21
申请号：US12978976
申请日：2010-12-27
申请人： Tomohide Hamada , Kei Nara
发明人： Tomohide Hamada , Kei Nara
IPC分类号： G01C3/16 , G01C3/00 , G01C3/02 , G01C3/18 , G02F1/1333 , G02F1/13 , H01L51/56
CPC分类号： H01L22/20 , G02F1/1303 , G02F1/1333 , H01L27/3244 , H01L51/56 , H01L2227/323 , H01L2251/5338
摘要： The display element manufacturing apparatus has a transporting part, which transports a substrate in a first direction, a first alignment system, which detects fiducial marks, a second alignment system, which is arranged at a prescribed distance from the first alignment system in the first direction and detects fiducial marks, calculating parts, which detect the fiducial marks and calculate the expansion/contraction of the substrate in the first direction or the transport speed of the substrate, and a processing part, which processes a prescribed position of the substrate based on at least one of the expansion/contraction of the substrate in the first direction or the transport speed of the substrate and the fiducial marks.
摘要翻译：显示元件制造装置具有沿第一方向输送基板的输送部，检测基准标记的第一对准系统，与第一对准系统沿第一方向以规定距离配置的第二对准系统检测检测基准标记的基准标记，计算部分，并计算基板在基板的第一方向或输送速度上的膨胀/收缩;以及处理部，其基于a处理基板的规定位置基板在第一方向上的扩张/收缩或基板的传送速度和基准标记中的至少一个。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式