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21. 发明申请

US20100261303A1 Manufacturing method for solid state image pickup device 有权
标题翻译：固态摄像装置的制造方法
公开(公告)号：US20100261303A1
公开(公告)日：2010-10-14
申请号：US12662368
申请日：2010-04-13
申请人： Keisuke Ogata , Kenzo Fukuyoshi , Tadashi Ishimatsu , Mitsuhiro Nakao , Satoshi Kitamura
发明人： Keisuke Ogata , Kenzo Fukuyoshi , Tadashi Ishimatsu , Mitsuhiro Nakao , Satoshi Kitamura
IPC分类号： H01L31/18
CPC分类号： G02B5/201 , G02B3/0018 , G02B3/0056 , H01L27/14621 , H01L27/14627 , H01L27/14685 , H04N9/045
摘要： A method of manufacturing a solid state image pickup device including photoelectric conversion elements which are two-dimensionally arranged in a semiconductor substrate, and a color filter having a plurality of color filter patterns differing in color from each other and disposed on a surface of the semiconductor substrate according to the photoelectric conversion elements. The method includes successively subjecting a plurality of filter layers differing in color from each other to a patterning process to form the plurality of color filter patterns. At least one color filter pattern to be formed at first among the plurality of color filter patterns is formed by dry etching, and the rest of the plurality of the color filter pattern is formed by photolithography.
摘要翻译：一种制造固体摄像装置的方法，该固体摄像装置包括二维排列在半导体衬底中的光电转换元件，以及滤色器，其具有彼此不同颜色的多个滤色器图案，并配置在半导体衬底的表面上基板根据光电转换元件。该方法包括将彼此不同颜色的多个滤光层连续地进行图案化处理以形成多个滤色器图案。通过干蚀刻形成要在多个滤色器图案中形成的至少一个滤色器图案，并且通过光刻形成多个滤色器图案的其余部分。

22. 发明申请

US20090206435A1 Solid state imaging device, manufacturing method of the same, and substrate for solid state imaging device 有权
标题翻译：固态成像装置及其制造方法以及固态成像装置用基板
公开(公告)号：US20090206435A1
公开(公告)日：2009-08-20
申请号：US12385969
申请日：2009-04-24
申请人： Kenzo Fukuyoshi , Tadashi Ishimatsu , Keisuke Ogata , Mitsuhiro Nakao , Akiko Ushibori
发明人： Kenzo Fukuyoshi , Tadashi Ishimatsu , Keisuke Ogata , Mitsuhiro Nakao , Akiko Ushibori
IPC分类号： H01L31/0232
CPC分类号： H01L27/14601 , H01L27/14627 , H01L27/14685
摘要： A method of manufacturing a solid state imaging device having photoelectric conversion devices, the method including: 1) forming a plurality of color filters differing in color from each other, 2) forming a transparent resin layer on the color filters, 3) forming an etching control layer on the transparent resin layer, the etching control layer being enabled to be etched at a different etching rate from the etching rate of the transparent resin layer, 4) forming a lens master on the etching control layer by using a heatflowable resin material, 5) transferring a pattern of the lens master to the etching control layer by dry etching to form an intermediate micro lens, and 6) transferring a pattern of the intermediate micro lens to the transparent resin layer by dry etching to form the transfer lenses.
摘要翻译：一种制造具有光电转换装置的固态成像装置的方法，所述方法包括：1）形成多个不同颜色的滤色器，2）在滤色器上形成透明树脂层，3）形成蚀刻控制层，能够以与透明树脂层的蚀刻速率不同的蚀刻速率蚀刻蚀刻控制层，4）通过使用可流动的树脂材料在蚀刻控制层上形成透镜主体， 5）通过干蚀刻将透镜主体的图案转印到蚀刻控制层上以形成中间微透镜，以及6）通过干法蚀刻将中间微透镜的图案转印到透明树脂层上以形成转印透镜。

23. 发明申请

US20070298164A1 Solid state image pickup device and manufacturing method thereof 有权
标题翻译：固体摄像装置及其制造方法
公开(公告)号：US20070298164A1
公开(公告)日：2007-12-27
申请号：US11889070
申请日：2007-08-08
申请人： Keisuke Ogata , Kenzo Fukuyoshi , Tadashi Ishimatsu , Mitsuhiro Nakao , Satoshi Kitamura
发明人： Keisuke Ogata , Kenzo Fukuyoshi , Tadashi Ishimatsu , Mitsuhiro Nakao , Satoshi Kitamura
IPC分类号： B05D5/06
CPC分类号： G02B5/201 , G02B3/0018 , G02B3/0056 , H01L27/14621 , H01L27/14627 , H01L27/14685 , H04N9/045
摘要： A method of manufacturing a solid state image pickup device including photoelectric conversion elements which are two-dimensionally arranged in a semiconductor substrate, and a color filter having a plurality of color filter patterns differing in color from each other and disposed on a surface of the semiconductor substrate according to the photoelectric conversion elements. The method including the steps of successively subjecting a plurality of filter layers differing in color from each other to a patterning process to form the plurality of color filter patterns. At least one color filter pattern to be formed at first among the plurality of color filter patterns is formed by means of dry etching, and the rest of the plurality of the color filter pattern is formed by means of photolithography.
摘要翻译：一种制造固体摄像装置的方法，该固体摄像装置包括二维排列在半导体衬底中的光电转换元件，以及滤色器，其具有彼此不同颜色的多个滤色器图案，并配置在半导体衬底的表面上基板根据光电转换元件。该方法包括以下步骤：将彼此不同颜色的多个滤光层连续地进行图案化处理，以形成多个滤色器图案。通过干法蚀刻形成要在多个滤色器图案中首先形成的至少一个滤色器图案，并且通过光刻法形成多个滤色器图案的其余部分。

24. 发明授权

US06950140B2 Solid image-pickup device having a micro lens array and method of manufacturing the same 失效
标题翻译：具有微透镜阵列的固体摄像装置及其制造方法
公开(公告)号：US06950140B2
公开(公告)日：2005-09-27
申请号：US09768454
申请日：2001-01-25
申请人： Kenzo Fukuyoshi , Tadashi Ishimatsu , Satoshi Kitamura
发明人： Kenzo Fukuyoshi , Tadashi Ishimatsu , Satoshi Kitamura
IPC分类号： G02B3/00 , H01L27/14 , H01L27/148 , H01L31/062 , H04N5/225 , H04N5/335 , H04N5/359 , H04N5/369
CPC分类号： G02B3/0056 , G02B3/0018 , H01L27/14621 , H01L27/14623 , H01L27/14627 , H01L27/14806
摘要： A photovoltaic element, a light shielding portion, a planarized layer, a color filter, another planarized layer and an undercoat layer are formed successively on a semiconductor substrate, followed by forming resin lenses. The undercoat layer positioned between adjacent resin lenses is subjected to an etching treatment with the resin lenses used as a resist mask so as to form ditches extending in the X- and Y-directions and other ditches extending in the XY-direction. Further, a transparent resin layer having a predetermined thickness is formed to cover the resin lenses and the ditches, thereby obtaining a solid image-pickup device comprising a micro lens array including a plurality of micro lenses.
摘要翻译：在半导体衬底上依次形成光电元件，遮光部分，平坦化层，滤色器，另一平面化层和底涂层，然后形成树脂透镜。将位于相邻的树脂透镜之间的底涂层用用作抗蚀剂掩模的树脂透镜进行蚀刻处理，以形成沿X方向和Y方向延伸的沟槽以及沿XY方向延伸的其它沟道。此外，形成具有预定厚度的透明树脂层以覆盖树脂透镜和沟槽，从而获得包括包括多个微透镜的微透镜阵列的固体图像拾取装置。

25. 发明授权

US5045418A Electrode plate for display device and method for preparation thereof 失效
标题翻译：显示装置用电极板及其制造方法
公开(公告)号：US5045418A
公开(公告)日：1991-09-03
申请号：US303848
申请日：1989-01-30
申请人： Kenzo Fukuyoshi
发明人： Kenzo Fukuyoshi
IPC分类号： G02F1/1333 , G02F1/1335
CPC分类号： G02F1/133345 , G02F1/133514
摘要： An electrode plate for a display device is here disclosed which is characterized in that a protective material of elements constituting the electrode plate which is to be patterned comprises a novolak type epoxy resin into which a photosensitive group and a group to make the resin alkaline liquid-soluble are introduced. The protective material can be applied to a color filter coating layer on a color filter.

26. 发明授权

US08659724B2 Liquid crystal display device, black matrix substrate and color filter substrate 失效
标题翻译：液晶显示装置，黑矩阵基板和滤色片基板
公开(公告)号：US08659724B2
公开(公告)日：2014-02-25
申请号：US12805731
申请日：2010-08-17
申请人： Hidesato Hagiwara , Kenzo Fukuyoshi
发明人： Hidesato Hagiwara , Kenzo Fukuyoshi
IPC分类号： G02F1/1335
CPC分类号： G06F3/042 , G02F1/133512 , G02F1/133514 , G02F2001/13312 , G02F2001/13396 , G06F3/0412
摘要： A liquid crystal display device includes a first substrate, a second substrate located opposite the first substrate via a liquid crystal, a blue display element, a green display element, a red display element, a short-wavelength optical sensor, a red optical sensor, and an infrared optical sensor formed on a liquid crystal side surface of the first substrate, and a color filter formed between the first substrate and the second substrate and includes a blue filter, a green filter, a first red filter, a short-wavelength transmission filter, a second red filter, and an infrared transmission filter corresponding to the blue display element, the green display element, the red display element, the short-wavelength optical sensor, the red optical sensor, and the infrared optical sensor, respectively.
摘要翻译：液晶显示装置包括第一基板，通过液晶与第一基板相对的第二基板，蓝色显示元件，绿色显示元件，红色显示元件，短波长光学传感器，红色光学传感器，以及形成在第一基板的液晶侧表面上的红外光学传感器和形成在第一基板和第二基板之间的滤色器，并且包括蓝色滤光器，绿色滤光器，第一红色滤光器，短波长透射滤色器，第二红色滤色器以及对应于蓝色显示元件，绿色显示元件，红色显示元件，短波长光学传感器，红色光学传感器和红外光学传感器的红外透射滤光器。

27. 发明授权

US08049805B2 Color imaging device and color imaging device manufacturing method 有权
标题翻译：彩色成像装置和彩色成像装置的制造方法
公开(公告)号：US08049805B2
公开(公告)日：2011-11-01
申请号：US12285367
申请日：2008-10-02
申请人： Kenzo Fukuyoshi , Satoshi Kitamura , Tadashi Ishimatsu
发明人： Kenzo Fukuyoshi , Satoshi Kitamura , Tadashi Ishimatsu
IPC分类号： H04N9/07 , H04N5/225 , H01L21/00 , H01L31/0232 , H01J40/14
CPC分类号： H01L27/14621 , G02B5/201 , H01L27/14627 , H01L27/14632 , H01L27/14685
摘要： A color imaging device includes a semiconductor substrate including a plurality of photoelectric transducers, and a color filter including a plurality of coloring layers provided to associate with the photoelectric transducers of the semiconductor substrate. Each of the coloring layers of the color filter including a side surface that is erected with respect to a surface of the semiconductor substrate, and an inclined surface that is continuous from an end of the side surface located in the opposite side of the semiconductor substrate toward an end portion of the coloring layer located in the opposite side of the semiconductor substrate. The coloring layers are arranged with their side surfaces being in contact with each other without a gap therebetween, and the end portion of the coloring layer has a curved surface shape protruding toward the opposite side of the corresponding photoelectric transducer.
摘要翻译：彩色成像装置包括包括多个光电换能器的半导体衬底，以及包括多个着色层的滤色器，所述着色层设置成与半导体衬底的光电变换器相关联。滤色器的每个着色层包括相对于半导体衬底的表面竖立的侧表面，以及从位于半导体衬底的相对侧的侧表面的端部连续的倾斜表面朝向着色层的位于半导体衬底的相对侧的端部。着色层被布置成其侧表面彼此接触而没有间隙，着色层的端部具有朝向相应的光电转换器的相对侧突出的弯曲表面形状。

28. 发明授权

US08004028B2 Solid state imaging device, manufacturing method of the same, and substrate for solid state imaging device 有权
标题翻译：固态成像装置及其制造方法以及固态成像装置用基板
公开(公告)号：US08004028B2
公开(公告)日：2011-08-23
申请号：US12385969
申请日：2009-04-24
申请人： Kenzo Fukuyoshi , Tadashi Ishimatsu , Keisuke Ogata , Mitsuhiro Nakao , Akiko Uchibori
发明人： Kenzo Fukuyoshi , Tadashi Ishimatsu , Keisuke Ogata , Mitsuhiro Nakao , Akiko Uchibori
IPC分类号： H01L31/062 , H01L31/113
CPC分类号： H01L27/14601 , H01L27/14627 , H01L27/14685
摘要： A solid state imaging device including photoelectric conversion devices which are arranged two-dimensionally; a color filter including a plurality of picture elements, each disposed corresponding to each of the photoelectric conversion devices; and a plurality of transfer lenses each disposed corresponding to each of the picture elements, formed of a thermoset acrylic resin, and formed directly on each of the picture elements, wherein a gap between neighboring transfer lenses is not more than 0.035 μm, and a contact length between neighboring transfer lenses is within the range of 3-80% of the pitch of the plurality of transfer lenses.
摘要翻译：一种包括二维布置的光电转换装置的固态成像装置; 包括多个像素的滤色器，每个图像元素分别对应于每个光电转换器件; 以及多个转印透镜，每个透镜对应于由热固性丙烯酸树脂形成的每个图像元素，并且直接形成在每个像素上，其中相邻转印透镜之间的间隙不大于0.035μm，并且接触相邻转印透镜之间的长度在多个转印透镜的间距的3-80％的范围内。

29. 发明申请

US20070058068A1 Solid state imaging device, manufacturing method of the same, and substrate for solid state imaging device 有权
标题翻译：固态成像装置及其制造方法以及固态成像装置用基板
公开(公告)号：US20070058068A1
公开(公告)日：2007-03-15
申请号：US11599373
申请日：2006-11-15
申请人： Kenzo Fukuyoshi , Tadashi Ishimatsu , Keisuke Ogata , Mitsuhiro Nakao , Akiko Uchibori
发明人： Kenzo Fukuyoshi , Tadashi Ishimatsu , Keisuke Ogata , Mitsuhiro Nakao , Akiko Uchibori
IPC分类号： G02B13/16 , H04N5/225 , H01L21/82
CPC分类号： H01L27/14601 , H01L27/14627 , H01L27/14685
摘要： A method of manufacturing a solid state imaging device having photoelectric conversion devices, the method including: 1) forming a plurality of color filters differing in color from each other, 2) forming a transparent resin layer on the color filters, 3) forming an etching control layer on the transparent resin layer, the etching control layer being enabled to be etched at a different etching rate from the etching rate of the transparent resin layer, 4) forming a lens master on the etching control layer by using a heat-flowable resin material, 5) transferring a pattern of the lens master to the etching control layer by dry etching to form an intermediate micro lens, and 6) transferring a pattern of the intermediate micro lens to the transparent resin layer by dry etching to form the transfer lenses.
摘要翻译：一种制造具有光电转换装置的固态成像装置的方法，所述方法包括：1）形成多个不同颜色的滤色器，2）在滤色器上形成透明树脂层，3）形成蚀刻控制层，能够以与透明树脂层的蚀刻速率不同的蚀刻速率蚀刻蚀刻控制层，4）通过使用热可流动树脂在蚀刻控制层上形成透镜母版材料，5）通过干蚀刻将透镜主体的图案转移到蚀刻控制层以形成中间微透镜，以及6）通过干蚀刻将中间微透镜的图案通过干蚀刻转印到透明树脂层上以形成转印透镜。

30. 发明申请

US20070045517A1 Image sensor 失效
标题翻译：图像传感器
公开(公告)号：US20070045517A1
公开(公告)日：2007-03-01
申请号：US11590824
申请日：2006-11-01
申请人： Kenzo Fukuyoshi , Satoshi Kitamura
发明人： Kenzo Fukuyoshi , Satoshi Kitamura
IPC分类号： H01L27/00 , G01J3/50
CPC分类号： G02B5/201 , G02B3/0018 , G02B3/0056 , H01L27/14621 , H01L31/02162 , H01L31/02327 , H04N9/045
摘要： In an embodiment example of the present invention, an image sensor comprises a filter used for an extraction of a specific color component of an incident light, a light receiving element which observes the incident light via the filter, a compensating filter having a transmission restraining characteristic in a visible light wavelength range and a transmission characteristic in a wavelength range on a longer wavelength out of the visible light wavelength range, and a compensating light receiving element which observes the incident light via the compensating filter for compensating an observation result by the light receiving element.
摘要翻译：在本发明的实施例中，图像传感器包括用于提取入射光的特定颜色分量的滤光器，经由滤光器观察入射光的光接收元件，具有透射抑制特性的补偿滤光器在可见光波长范围内的可见光波长范围和在可见光波长范围内的较长波长的波长范围内的透射特性，以及补偿光接收元件，其经由补偿滤波器观察入射光，以补偿由光接收的观察结果元件。

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