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21. 发明专利

JP2011139604A Brushless motor 审中-公开
标题翻译：无刷电机
公开(公告)号：JP2011139604A
公开(公告)日：2011-07-14
申请号：JP2009298266
申请日：2009-12-28
申请人： Kobe Steel Ltd , 株式会社神戸製鋼所
发明人： HASE TAKASHI , INOUE KENICHI , OZAKI OSAMU , ICHIHARA CHIKARA , TAKAMATSU HIROYUKI , MARUYAMA MASAKATSU , MITANI HIROYUKI , MAEDA YASUSHI
IPC分类号： H02K1/14 , H02K21/14
摘要： PROBLEM TO BE SOLVED: To obtain a high-torque brushless motor by improving utilization efficiency of magnetic flux. SOLUTION: In a stator 2, a stator body 23 which accommodates a coil 22 is formed so that the coil 22 has a U-shaped cross section perpendicular to an axis, the coil 22 is fitted in a U-shaped groove 234, and claw teeth 24 and 25 are so extended in pairs from the ends 231a and 232a of both sidewalls 231 and 232 of the U-shaped groove 234 as to face each other. In the rotor 3, permanent magnets 33 are fitted in a gap G formed by the claw teeth 24 and 25, and arranged on a support member 32 so that the permanent magnets 33 are magnetized in the direction of the gap G while alternating the direction of magnetization in the circumferential direction. Consequently, an axial gap type brushless motor 1 is configured such that the stator 2 and the rotor 3 are spaced in the axial direction and the claw teeth 24 and 25 are arranged in the radial direction. A magnetic path is formed to converge a magnetic flux without leakage thereof. COPYRIGHT: (C)2011,JPO&INPIT
摘要翻译：要解决的问题：通过提高磁通的利用效率来获得高扭矩无刷电动机。解决方案：在定子2中，容纳线圈22的定子体23形成为线圈22具有垂直于轴线的U形横截面，线圈22装配在U形槽234中并且爪齿24和25从U型槽234的两个侧壁231和232的端部231a和232a成对延伸以彼此面对。在转子3中，永久磁铁33装配在由爪齿24和25形成的间隙G中，并且布置在支撑构件32上，使得永磁体33沿间隙G的方向被磁化，圆周方向的磁化。因此，轴向间隙型无刷电动机1被构造成使得定子2和转子3沿轴向间隔开，并且爪齿24和25沿径向布置。形成磁路以使磁通收敛而不泄漏。版权所有（C）2011，JPO＆INPIT

22. 发明专利

JP2010205446A Ion source 审中-公开
标题翻译：离子源
公开(公告)号：JP2010205446A
公开(公告)日：2010-09-16
申请号：JP2009046925
申请日：2009-02-27
申请人： Kobe Steel Ltd , 株式会社神戸製鋼所
发明人： KOBAYASHI AKIRA , ICHIHARA CHIKARA , HIRANO TAKAYUKI , TSUJI TOSHIYUKI
IPC分类号： H01J27/26 , H01J37/08
摘要： PROBLEM TO BE SOLVED: To provide an ion source capable of carrying out field ionization of an ion material gas in a weak electric field.
SOLUTION: The ion source 10 for irradiating ion beams is provided with a dielectric barrier discharging means 40 for radicalizing an ion material gas supplied inside a vessel 20, an the dielectric barrier discharging means 40 is provided with a first electrode 23b and a second electrode 42 opposed to the first electrode 23b and an AC source 43 for impressing across these first and the second electrodes 23b, 42, and at least one of the first and the second electrodes 23b, 42 is coated by a dielectric body, and these first and the second electrode 23b, 42 are so located at a position in the vessel 20 that the ion material gas supplied inside the vessel 20 is supplied around a tip end portion of a field ionization electrode 23 after it passes between the first and the second electrode 23b, 42.
COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：提供能够在弱电场中进行离子材料气体的场电离的离子源。解决方案：用于照射离子束的离子源10设置有用于使供应到容器20内的离子材料气体激化的电介质阻挡放电装置40，电介质阻挡放电装置40设置有第一电极23b和与第一电极23b相对的第二电极42和用于施加在这些第一和第二电极23b，42上的AC源43以及第一和第二电极23b，42中的至少一个被电介质体涂覆，并且这些第一电极23b和第二电极42位于容器20中的位置，供应到容器20内的离子材料气体在场电离电极23的前端部分在第一和第二电极23之间通过电极23b，42。版权所有（C）2010，JPO＆INPIT

23. 发明专利

JP2010061925A Negative ion source, and method of operating the same 审中-公开
标题翻译：负离子源及其操作方法
公开(公告)号：JP2010061925A
公开(公告)日：2010-03-18
申请号：JP2008225179
申请日：2008-09-02
申请人： Kobe Steel Ltd , 株式会社神戸製鋼所
发明人： KOBAYASHI AKIRA , NARAI SATORU , TSUJI TOSHIYUKI , ICHIHARA CHIKARA
IPC分类号： H01J27/14 , H01J37/08
摘要： PROBLEM TO BE SOLVED: To provide a negative ion source for emitting negative ion beams of a greater beam current, and to provide a method of operating the same.
SOLUTION: The negative ion source 10 includes a plasma container 12, a filament 16 for emitting thermal electrons to generate plasma from material gas, a plurality of magnets M1 provided along the outer periphery of the plasma container 12 for forming a cusp field, an extraction electrode 20 for extracting negative ions from the plasma to the outside to generate negative ion beams, and a filter field forming means M2 for forming a filter field MF at a position where an internal space of the plasma container 12 is split into a discharge space S1 and an extraction space S2. Plasma potential Vp of the plasma formed in the extraction space S2 is measured, and extraction voltage is controlled so that the potential of the extraction electrode 20 is equal or almost equal to the measured value for the plasma potential Vp.
COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：提供用于发射较大束流的负离子束的负离子源，并提供其操作方法。解决方案：负离子源10包括等离子体容器12，用于发射热电子以从材料气体产生等离子体的细丝16，沿着等离子体容器12的外周设置的多个磁体M1，用于形成尖端场用于将等离子体中的负离子提取到外部以产生负离子束的提取电极20以及用于在将等离子体容器12的内部空间分成一个位置的位置形成滤波器场MF的滤波器场形成装置M2 放电空间S1和提取空间S2。测量在提取空间S2中形成的等离子体的等离子体电位Vp，并且控制提取电压，使得提取电极20的电位等于或几乎等于等离子体电位Vp的测量值。版权所有（C）2010，JPO＆INPIT

24. 发明专利

JP2009245767A Ion source and method of manufacturing the same 审中-公开
标题翻译：离子源及其制造方法
公开(公告)号：JP2009245767A
公开(公告)日：2009-10-22
申请号：JP2008091310
申请日：2008-03-31
申请人： Kobe Steel Ltd , 株式会社神戸製鋼所
发明人： HIRANO TAKAYUKI , ICHIHARA CHIKARA , KOBAYASHI AKIRA , TSUJI TOSHIYUKI
IPC分类号： H01J27/26
摘要： PROBLEM TO BE SOLVED: To provide an ion source hardly shifting a position in a micro opening at the tip part of a field ionization electrode, and a method of manufacturing the ion source. SOLUTION: The ion source 10 generating ion beams includes a vessel 20 having a micro opening 22 and an inner periphery face 20a connected to the micro opening 22, and a field ionization electrode 23 fixed inside the vessel 20 so as its tip part 23a to be positioned inside the micro opening 22. The field ionization electrode 23 includes a positioning member 30. The positioning member 30 includes a base 32 fixed to the field ionization electrode 23 and an abutment part 34a capable of contacting with the inner periphery face 20a of the vessel 20, and takes on a shape inhibiting the tip part 23A of the electrode from deviating outside an allowable range due to contact of the abutment part 34a and the inner periphery face 20a, and at the same time, allowing circulation of raw gas between an outer periphery face 23a of the field ionization electrode 23 and the inner periphery face 20a of the vessel 20. COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：提供离子源几乎不移动场离子化电极的尖端部分的微孔中的位置，以及制造离子源的方法。解决方案：产生离子束的离子源10包括具有微孔22和连接到微孔22的内周面20a的容器20和固定在容器20内的场电离电极23，作为其末端部分 23a定位在微孔22的内部。场离子化电极23包括定位构件30.定位构件30包括固定到场电离电极23的基座32和能够与内周面20a接触的抵接部34a 并且形成抑制电极的尖端部23A由于抵接部34a与内周面20a的接触而偏离容许范围的形状，同时允许原料气体的循环在场电离电极23的外周面23a和容器20的内周面20a之间。（C）2010，JPO＆INPIT

25. 发明专利

JP2009059628A Ion source 有权
标题翻译：离子源
公开(公告)号：JP2009059628A
公开(公告)日：2009-03-19
申请号：JP2007226967
申请日：2007-08-31
申请人： Kobe Steel Ltd , 株式会社神戸製鋼所
发明人： ICHIHARA CHIKARA , KOBAYASHI AKIRA , HIRANO TAKAYUKI , TSUJI TOSHIYUKI
IPC分类号： H01J27/26 , H01J37/08 , H01J37/252 , H01J37/317
CPC分类号： H01J2237/0807
摘要： PROBLEM TO BE SOLVED: To provide an ion source capable of obtaining high-brightness ion beams in a simple structure.
SOLUTION: The ion source 10 is provided with a vessel 20 equipped with a micro opening 22 and supplied with raw gas inside, and a field ionization electrode 23 extended along a beam axis K direction with a sharpened tip and arranged inside the vessel 20 with this tip directed toward the micro opening 22. An inner periphery face 22a regulating the micro opening 22 of the vessel 20 is formed so that a gas blowing area Gs as a difference between an opening area 22s of the micro opening 22 and a cross-section area 23s of the field ionization electrode 23 on a common flat face perpendicularly crossing the beam axis K direction is to be the minimum at the tip or slightly to a base part side of the field ionization electrode 23, and to be larger than the minimum area at other positions.
COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：提供能够以简单的结构获得高亮度离子束的离子源。解决方案：离子源10设置有装备有微孔22并在其内部供应原料气体的容器20和沿着光轴K方向延伸的场离子化电极23，其具有尖锐的尖端并且布置在容器内 20，其中该尖端指向微孔22.形成容器20的微孔22的内周面22a，使得气体吹入区域Gs作为微孔22的开口区域22s与十字形与离子束轴K方向垂直的共同的平面上的场电离电极23的截面积23s在场离子化电极23的尖端或稍微相对于基极侧是最小的，并且大于其他职位的最小面积。版权所有（C）2009，JPO＆INPIT

26. 发明专利

JP2008047498A Electron emitter material, and electron emission application device 有权
标题翻译：电子发射材料和电子发射应用器件
公开(公告)号：JP2008047498A
公开(公告)日：2008-02-28
申请号：JP2006224422
申请日：2006-08-21
申请人： Kobe Steel Ltd , 株式会社神戸製鋼所
发明人： KOBASHI KOJI , TACHIBANA TAKESHI , ICHIHARA CHIKARA , KOBAYASHI AKIRA
IPC分类号： H01J1/304
摘要： PROBLEM TO BE SOLVED: To provide an electron emitter material excelling in durability and capable of large-current field electron emission; and an electron emission application device using such an electron emitter material. SOLUTION: This electron emitter material is formed by adsorbing diamond powder to a surface of carbon foam, and thereafter growing diamond on the carbon foam by a chemical vapor deposition (CVD) treatment. In the electron emitter material, the diamond powder is nano-diamond powder. This electron emission application device is composed by installing an electron extracting grid electrode on the front surface of the electron emitter material. COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：提供耐久性优异且能够实现大电流场电子发射的电子发射体材料; 以及使用这种电子发射体材料的电子发射施加装置。解决方案：该电子发射体材料通过将金刚石粉末吸附到碳泡沫表面上形成，然后通过化学气相沉积（CVD）处理在碳泡沫上生长金刚石。在电子发射体材料中，金刚石粉末是纳米金刚石粉末。该电子发射施加装置通过在电子发射体材料的前表面上安装电子提取栅电极而构成。版权所有（C）2008，JPO＆INPIT

27. 发明专利

JP2007141754A Track misalignment detector, composition analyzer, and track adjustment method of charged particle beam 审中-公开
标题翻译：跟踪误差检测器，组成分析器和充电粒子束的跟踪调整方法
公开(公告)号：JP2007141754A
公开(公告)日：2007-06-07
申请号：JP2005336671
申请日：2005-11-22
申请人： Kobe Steel Ltd , 株式会社神戸製鋼所
发明人： KOBAYASHI AKIRA , ICHIHARA CHIKARA
IPC分类号： H01J37/04 , G01N23/225 , G01T1/29 , G21K1/04 , G21K5/04 , H01J37/09 , H01J37/252
摘要： PROBLEM TO BE SOLVED: To provide a track misalignment detector capable of improving the adjustment precision, by facilitating the adjustment work of the track of charged particle beam, to provide a composition analyzer and a track adjustment method of charged particle beams, and to provide the composition analyzer, capable of easily changing energy resolution and the acquisition efficiency of scattered particles.
SOLUTION: The opening diameter (open state) of an opening 31a for passing charged particle beam, while being arranged at a prescribed position on the reference beam axis can be changed by an open-state changing apparatus 30, comprising a constriction section 31, an ultrasonic motor 32, and a drive shaft 33. The intensity of the charged particle beam passing through or deviating from the opening 31a is measured, and the presence or the absence of the misalignment between the track of the charged particle beam and the reference beam axis is detected, based on the intensities of the charged particle beam.
COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：提供能够通过促进带电粒子束的轨迹的调整工作来提高调整精度的轨迹失准检测器，以提供组成分析器和带电粒子束的轨迹调节方法，以及提供组成分析仪，能够容易地改变分散粒子的能量分辨率和采集效率。解决方案：通过带电粒子束的开口31a的开口直径（打开状态）可以通过开放状态改变装置30来改变，该打开状态改变装置30包括收缩部分 31，超声波马达32和驱动轴33.测量通过或偏离开口31a的带电粒子束的强度，并且带电粒子束的轨迹与基于带电粒子束的强度检测参考光束轴。版权所有（C）2007，JPO＆INPIT

28. 发明专利

JP2005191136A Semiconductor detector 有权
标题翻译：半导体检测器
公开(公告)号：JP2005191136A
公开(公告)日：2005-07-14
申请号：JP2003428235
申请日：2003-12-24
申请人： Kobe Steel Ltd , 株式会社神戸製鋼所
发明人： INOUE KENICHI , GOTO YASUSHI , ICHIHARA CHIKARA , KOHORI TAKASHI , HIRANO TAKAYUKI , KOBAYASHI AKIRA
IPC分类号： G01T1/24 , H01L27/14 , H01L31/09
摘要： PROBLEM TO BE SOLVED: To provide a semiconductor detector which catches and collects paired electron holes generated therein with respect to charged heavy particle rays such as α rays having the energy of a few MeV or less which make their way only as deep as a few μm below the surface skin of a detection surface of the semiconductor detector efficiently with good responsibility, in order to solve the problem of declined counting efficiency of a conventional detector due to the arrangement of an anode and a cathode on the surface and backsides of the detector; and thereby can directly convert the incident rays into a one-dimensional or two-dimensional positional information signal.
SOLUTION: In the semiconductor detector, both anode and cathode are arranged on one incident face of charged particles and thereby the attenuation of a detection signal current can be reduced. Furthermore, the semiconductor detector, etc. which employ a device to expand a depletion layer which is the charged particle detection face are provided in order to obtain favorable detection characteristics.
COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：提供一种半导体检测器，其捕获并收集在其中产生的成对的电子空穴相对于具有几MeV或更低MeV或更少能量的α射线的带电重粒子，这使得它们的方式只有为了解决常规检测器的计数效率下降的问题，由于在阳极和阴极的表面和背面的排列方面，阳极和阴极的排列方面，检测器; 从而可以将入射光线直接转换为一维或二维位置信息信号。解决方案：在半导体检测器中，阳极和阴极均布置在带电粒子的一个入射面上，从而可以减小检测信号电流的衰减。此外，为了获得良好的检测特性，提供了采用扩大作为带电粒子检测面的耗尽层的装置的半导体检测器等。版权所有（C）2005，JPO＆NCIPI

29. 发明专利

JP2005043227A Magnetic field producing device for analyzing apparatuses 有权
标题翻译：用于分析装置的磁场制造装置
公开(公告)号：JP2005043227A
公开(公告)日：2005-02-17
申请号：JP2003277883
申请日：2003-07-22
申请人： Kobe Steel Ltd , 株式会社神戸製鋼所
发明人： HAMADA MAMORU , ICHIHARA CHIKARA , KOBAYASHI AKIRA
IPC分类号： G01N23/203 , G01N23/225 , H01J37/244 , H01J37/252 , H01J49/46
摘要： PROBLEM TO BE SOLVED: To downsize a magnetic field producing device having a sample holding member, a shield plate and a detector in its main coil, and to expand its spatial resolution.
SOLUTION: A sample 12 and the shield plate 13 are symmetrically arranged to the center position of the main coil 31 making up the magnetic field producing device, and the detector 14 is disposed outside the shield plate 13. As a result, the magnetic flux density between the sample 12 and the shield plate 13 becomes uniform, and the magnetic flux density is reduced in the section of the detector 14. Therefore, the spatial resolution is expanded, and the main coil 31 can be downsized.
COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：解决的问题：为了在其主线圈中小型化具有采样保持部件，屏蔽板和检测器的磁场产生装置，并且扩大其空间分辨率。解决方案：样品12和屏蔽板13对称地布置在构成磁场产生装置的主线圈31的中心位置，并且检测器14设置在屏蔽板13的外部。结果，样品12和屏蔽板13之间的磁通密度变得均匀，并且在检测器14的部分中的磁通密度降低。因此，空间分辨率被扩大，并且主线圈31可以被小型化。版权所有（C）2005，JPO＆NCIPI

30. 发明专利

JP2004362937A Ion source 审中-公开
标题翻译：离子源
公开(公告)号：JP2004362937A
公开(公告)日：2004-12-24
申请号：JP2003159816
申请日：2003-06-04
申请人： Kobe Steel Ltd , 株式会社神戸製鋼所
发明人： KOBAYASHI AKIRA , ICHIHARA CHIKARA , INOUE KENICHI
IPC分类号： H01J27/20 , H01J37/08
摘要： PROBLEM TO BE SOLVED: To provide a scattering analyzer which is excellent in efficiency and hardly generates X-ray by suppressing impurity ion beams in a gas ion source mounted in a high-voltage terminal casing of the high-energy ion beam scattering analyzer. SOLUTION: In the gas ion source equipped with a vacuum container for introducing a raw material gas such as helium, a means 5 for generating a magnetic field in its axis direction, cathode electrodes 4a, 4b and an anode electrode 3, the raw material gas introduced in the vacuum container is ionized by applying voltage between the anode electrode and the cathode electrodes, and generated electrons 7 collide with the unionized raw material gas and ionize it. Gas ions are drawn out from a drawing opening hole 8 as the gas ion source. Titanium metal is used as a component material of the cathode electrodes. Since clean surfaces of the titanium metal which adsorb impurity gas are formed on the anode electrode 3 and the titanium electrode 12b due to titanium atoms 14 emitted from the titanium electrode 12b with the collision of the gas ions, a high-purity ion beam can be obtained. COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：提供一种散射分析仪，其效率优异，并且通过抑制安装在高能离子束散射的高压端子壳体中的气体离子源中的杂质离子束几乎不产生X射线分析仪。解决方案：在装备有用于引入诸如氦气的原料气体的真空容器的气体离子源中，用于在其轴向上产生磁场的装置5，阴极电极4a，4b和阳极电极3，通过在阳极电极和阴极电极之间施加电压使引入真空容器的原料气体离子化，并且产生的电子7与被原子化的原料气体碰撞并将其电离。气体离子作为气体离子源从拉拔孔8中拉出。钛金属用作阴极电极的组分材料。由于吸附杂质气体的钛金属的清洁表面由于气体离子的碰撞而由钛电极12b发射的钛原子14形成在阳极电极3和钛电极12b上，所以高纯度离子束可以获得。版权所有（C）2005，JPO＆NCIPI

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