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21. 发明授权

US06930212B2 Method for purifying a fluorinated hydroxyl compound 失效
标题翻译：纯化氟化羟基化合物的方法
公开(公告)号：US06930212B2
公开(公告)日：2005-08-16
申请号：US10077794
申请日：2002-02-20
申请人： Hidekazu Okamoto , Akihiro Wada , Toshihiko Toma , Nobuyuki Yamagishi
发明人： Hidekazu Okamoto , Akihiro Wada , Toshihiko Toma , Nobuyuki Yamagishi
IPC分类号： C07C29/80 , C07C29/88 , C07C31/38 , C07C31/34
CPC分类号： C07C29/80 , C07C29/88 , C07C31/38 , C07C31/12
摘要： The present invention has an object to provide a method for purifying a fluorinated hydroxyl compound of the formula 1 safely in a high yield under industrially practical conditions. Namely, a mixture containing a fluorinated hydroxyl compound of Rf—CR1R2—OH (Formula 1, wherein Rf is a C1-20 polyfluoroalkyl group, and each of R1 and R2 is a hydrogen atom or a C1-3 alkyl group) such as 2,2,3,3-tetrafluoropropanol, and a compound having an unshared electron pair, is distilled by heating in the presence of a solid acid catalyst such as a cation exchange resin catalyst, or by adding a proton source such as water.
摘要翻译：本发明的目的是提供一种在工业实用条件下以高收率安全地纯化式1的氟化羟基化合物的方法。也就是说，将含有R f的氟化羟基化合物的混合物（式1，其中R f 其中R 1，R 2和R 2各自为氢原子或C 1 -C 20烷基，（例如2,2,3,3-四氟丙醇）和具有未共享电子对的化合物在固体酸催化剂如阳离子交换剂的存在下加热蒸馏树脂催化剂，或加入质子源如水。

22. 发明授权

US06894187B2 Method for producing a fluorine-containing compound 有权
标题翻译：含氟化合物的制造方法
公开(公告)号：US06894187B2
公开(公告)日：2005-05-17
申请号：US10340634
申请日：2003-01-13
申请人： Takashi Okazoe , Kunio Watanabe , Shin Tatematsu , Masahiro Ito , Daisuke Shirakawa , Masao Iwaya , Hidekazu Okamoto
发明人： Takashi Okazoe , Kunio Watanabe , Shin Tatematsu , Masahiro Ito , Daisuke Shirakawa , Masao Iwaya , Hidekazu Okamoto
IPC分类号： C07C51/58 , C07C55/40 , C07C59/135 , C07C67/307 , C07C69/63 , C07C69/708 , C07C69/66 , C07C57/64
CPC分类号： C07C69/708 , C07C51/58 , C07C55/40 , C07C59/135 , C07C67/307 , C07C69/63
摘要： The present invention provides a method for obtaining a compound useful as a raw material for various fluororesins in high yield by a short process by using a starting material which is inexpensive and readily available.
摘要翻译：本发明提供一种通过使用廉价且易于获得的起始材料，通过短时间获得用作各种氟树脂的原料的化合物的方法。

23. 发明申请

US20050038300A1 Method for producing diene compound 有权
标题翻译：生产二烯化合物的方法
公开(公告)号：US20050038300A1
公开(公告)日：2005-02-17
申请号：US10864497
申请日：2004-06-10
申请人： Masao Iwaya , Hidekazu Okamoto , Kazuya Oharu
发明人： Masao Iwaya , Hidekazu Okamoto , Kazuya Oharu
IPC分类号： C07C17/361 , C07C41/44 , C07C43/17 , C07C51/58 , C08F16/32 , C08F36/20 , C07C41/32
CPC分类号： C08F36/20 , C07C17/361 , C07C41/44 , C07C51/58 , C08F16/32 , C07C21/18 , C07C57/76 , C07C57/66 , C07C43/17
摘要： It is an object to obtain from a mixture of a specific diene compound (1) and a compound (2) with the same molecular weight and molecular formula hard to separate by distillation, the diene compound (1) in high purity without using any special reagent or complicated technique. Namely, the present invention provides a method of inducing the Claisen rearrangement reaction of the compound (2) in a mixture containing CR1R2═CR3CFR4CR5R6OCR7═CR8R9 (1) and CFR1R2CR3═CR4CR5R6OCR7═CR8R9 (2), and separating the diene compound (1) from a Claisen rearrangement reaction product; or converting the Claisen rearrangement reaction product into a derivative and then separating the diene compound (1) from the derivative of the Claisen rearrangement reaction product. Wherein, R1 to R9 each represent a fluorine atom or the like.
摘要翻译：本发明的目的是从具有相同分子量和分子式的特定二烯化合物（1）和化合物（2）的混合物中获得，其难以通过蒸馏分离，高纯度的二烯化合物（1）不使用任何特殊的试剂或复杂技术。即，本发明提供了一种在含有CR 1 R 2 = CR 3 CFR 4 CR 5 OCR的混合物中诱导化合物（2）的Claisen重排反应的方法 CR 7 <9>（1）和CFR 1 R 2 CR 3 = CR 4 CR 5 OCR 7 = CR 8 R 2（2），并将二烯化合物（1）与Claisen重排反应产物分离; 或将Claisen重排反应产物转化为衍生物，然后将二烯化合物（1）与Claisen重排反应产物的衍生物分离。其中，R 1〜R 9各自表示氟原子等。

24. 发明授权

US08609908B2 Process for producing 1, 1-dichloro-2, 2, 3, 3, 3-pentafluoropropane 有权
标题翻译：制备1,1,1-二氯-2,2,3,3-五氟丙烷的方法
公开(公告)号：US08609908B2
公开(公告)日：2013-12-17
申请号：US13167455
申请日：2011-06-23
申请人： Hidekazu Okamoto
发明人： Hidekazu Okamoto
IPC分类号： C07C19/08
CPC分类号： C07C17/25 , C07C17/358 , C07C21/18 , C07C19/10
摘要： To provide a process for producing, at a high content ratio, 1,1-dichloro-2,2,3,3,3-pentafluoropropane (HCFC-225ca) which is useful as e.g. a starting material to obtain 1,1-dichloro-2,3,3,3-tetrafluoropropene (CFO1214ya).The process for producing HCFC-225ca of the present invention comprises subjecting a raw material composed of dichloropentafluoropropane (HCFC-225) including 2,2-dichloro-1,1,1,3,3-pentafluoropropane (HCFC225aa) to an isomerization reaction at a temperature of at most 290° C. in a gas phase in the presence of a metal oxide catalyst thereby to isomerize HCFC-225aa to HCFC-225ca.
摘要翻译：为了提供以高含量比制备可用作例如1,1-二氯-2,2,3,3,3-五氟丙烷（HCFC-225ca）的方法。得到1,1-二氯-2,3,3,3-四氟丙烯（CFO1214ya）的原料。本发明的制备HCFC-225ca的方法包括将包含2,2-二氯-1,1,1,3,3-五氟丙烷（HCFC225aa）的二氯五氟丙烷（HCFC-225）的原料经异构化反应在金属氧化物催化剂的存在下在气相中温度最高为290℃，从而将HCFC-225aa异构化为HCFC-225ca。

25. 发明授权

US08568534B2 Method for washing device substrate 失效
标题翻译：清洗装置基板的方法
公开(公告)号：US08568534B2
公开(公告)日：2013-10-29
申请号：US13303599
申请日：2011-11-23
申请人： Hidekazu Okamoto , Hideo Namatsu
发明人： Hidekazu Okamoto , Hideo Namatsu
IPC分类号： G03F7/30 , H01L21/033
CPC分类号： H01L21/0337 , C11D7/5018 , C11D11/0047 , G03F7/426 , H01L21/31133
摘要： The present invention provides a washing method for a device substrate, capable of sufficiently removing a resist attached to a device substrate, particularly a resist attached to fine pore portions of a pattern having a large aspect ratio.A method for washing a device substrate, which comprises a washing step of removing a resist attached to a device substrate by means of a solvent, wherein the solvent is a composition comprising at least one fluorinated compound selected from the group consisting of a hydrofluoroether, a hydrofluorocarbon and a perfluorocarbon, and a fluorinated alcohol.
摘要翻译：本发明提供了一种能够充分除去附着在器件基板上的抗蚀剂的器件基板的清洗方法，特别是附着在纵横比大的图案的细孔部分上的抗蚀剂。一种洗涤装置基板的方法，其包括通过溶剂除去附着在装置基板上的抗蚀剂的洗涤步骤，其中所述溶剂是包含至少一种氟化化合物的组合物，所述氟化化合物选自氢氟醚，氢氟烃和全氟化碳，以及氟化醇。

26. 发明授权

US08395001B2 Processes for producing 2-chloro-1,1,1,2-tetrafluoropropane and 2,3,3,3-tetrafluoropropene 有权
标题翻译：制备2-氯-1,1,1,2-四氟丙烷和2,3,3,3-四氟丙烯的方法
公开(公告)号：US08395001B2
公开(公告)日：2013-03-12
申请号：US13157370
申请日：2011-06-10
申请人： Satoshi Kawaguchi , Takashi Okazoe , Hidekazu Okamoto
发明人： Satoshi Kawaguchi , Takashi Okazoe , Hidekazu Okamoto
IPC分类号： C07C17/25
CPC分类号： C07C17/20 , C07C17/10 , C07C17/206 , C07C17/25 , C07C19/10 , C07C21/18
摘要： To provide processes for efficiently and economically producing 2-chloro-1,1,1,2-tetrafluoropropane (R244bb) and 2,3,3,3-tetrafluoropropene (R1234yf) in an industrially practical manner.A process for producing 2-chloro-1,1,1,2-tetrafluoropropane, which comprises a chlorination step of reacting 1,2-dichloro-2-fluoropropane and chlorine in the presence of a solvent under irradiation with light to obtain 1,1,1,2-tetrachloro-2-fluoropropane, and a fluorination step of reacting the 1,1,1,2-tetrachloro-2-fluoropropane obtained in the chlorination step and hydrogen fluoride in the presence of a catalyst to obtain 2-chloro-1,1,1,2-tetrafluoropropane, and a process for producing 2,3,3,3-tetrafluoropropene, which comprises dehydrochlorinating it in the presence of a catalyst.
摘要翻译：以工业上实用的方式提供有效和经济地生产2-氯-1,1,1,2-四氟丙烷（R244bb）和2,3,3,3-四氟丙烯（R1234yf）的方法。一种2-氯-1,1,1,2-四氟丙烷的制备方法，该方法包括在溶剂存在下，在光照下使1,2-二氯-2-氟丙烷和氯反应的氯化步骤，得到1， 1,1,2-四氯-2-氟丙烷，和在氯化步骤中得到的1,1,1,2-四氯-2-氟丙烷和氟化氢在催化剂存在下反应的氟化步骤，得到2- 氯-1,1,1,2-四氟丙烷，以及2,3,3,3-四氟丙烯的制备方法，其包括在催化剂存在下对其进行脱氯化氢。

27. 发明授权

US08357828B2 Processes for producing 1,1-dichloro-2,3,3,3-tetrafluoropropene and 2,3,3,3-tetrafluoropropene 有权
标题翻译：制备1,1-二氯-2,3,3,3-四氟丙烯和2,3,3,3-四氟丙烯的方法
公开(公告)号：US08357828B2
公开(公告)日：2013-01-22
申请号：US13163809
申请日：2011-06-20
申请人： Hidekazu Okamoto , Yasuyuki Sasao
发明人： Hidekazu Okamoto , Yasuyuki Sasao
IPC分类号： C07C21/18
CPC分类号： C07C17/23 , C07C17/25 , C07C21/18
摘要： To provide a simple and economical process for producing 1,1-dichloro-2,3,3,3-tetrafluoropropene, which does not require purification of the raw material component obtained in the form of a mixture of isomers, and a process for producing 2,3,3,3-tetrafluoropropene from the product thereby obtained.A process for producing 1,1-dichloro-2,3,3,3-tetrafluoropropene, characterized by bringing a mixture of dichloropentafluoropropane isomers which contains 1,1-dichloro-2,2,3,3,3-pentafluoropropane into contact with an aqueous alkali solution in the presence of a phase transfer catalyst, and thereby selectively dehydrofluorinating only the 1,1-dichloro-2,2,3,3,3-pentafluoropropane in the mixture, and a process for producing 2,3,3,3-tetrafluoropropene from the 1,1-dichloro-2,3,3,3-tetrafluoropropene thereby obtained.
摘要翻译：为了提供简单经济的制备1,1-二氯-2,3,3,3-四氟丙烯的方法，其不需要纯化以异构体混合物形式获得的原料组分，以及制备方法从得到的产物中加入2,3,3,3-四氟丙烯。一种制备1,1-二氯-2,3,3,3-四氟丙烯的方法，其特征在于使含有1,1-二氯-2,2,3,3,3-五氟丙烷的二氯五氟丙烷异构体与在相转移催化剂存在下的碱性水溶液，从而仅选择性地将该混合物中的1,1-二氯-2,2,3,3,3-五氟丙烷脱氟化氢，以及制备2,3,3 由1,1-二氯-2,3,3,3-四氟丙烯得到3-四氟丙烯。

28. 发明申请

US20110319679A1 PROCESS FOR PRODUCING 2,3,3,3-TETRAFLUOROPROPENE 有权
标题翻译：生产2,3,3,3-四氯丙烯的方法
公开(公告)号：US20110319679A1
公开(公告)日：2011-12-29
申请号：US13167464
申请日：2011-06-23
申请人： Hirokazu Takagi , Hidekazu Okamoto
发明人： Hirokazu Takagi , Hidekazu Okamoto
IPC分类号： C07C17/23
CPC分类号： C07C17/23 , B01J21/06 , B01J21/08 , B01J23/44 , B01J35/002 , C07C21/18
摘要： The object is to provide a process whereby it is possible to produce 2,3,3,3-tetrafluoropropene at a high conversion ratio constantly for a long period of time.A process for producing 2,3,3,3-tetrafluoropropene, which comprises reacting a raw material compound of at least one of 1,1-dichloro-2,3,3,3-tetrafluoropropene and 1-chloro-2,3,3,3-tetrafluoropropene, and hydrogen, in the presence of a catalyst, wherein the catalyst is a noble metal catalyst supported on a metal oxide having a Hammett acidity function value (H0) of at least −5.6.
摘要翻译：本发明的目的是提供一种能够长时间恒定地以高转化率制备2,3,3,3-四氟丙烯的方法。一种制备2,3,3,3-四氟丙烯的方法，其包括使1,1-二氯-2,3,3,3-四氟丙烯和1-氯-2,3中的至少一种的原料化合物反应， 3,3-四氟丙烯和氢气，其中催化剂是负载在哈米特酸度函数值（H0）至少为-5.6的金属氧化物上的贵金属催化剂。

29. 发明申请

US20090029894A1 METHOD FOR WASHING DEVICE SUBSTRATE 失效
标题翻译：洗涤装置基板的方法
公开(公告)号：US20090029894A1
公开(公告)日：2009-01-29
申请号：US12233669
申请日：2008-09-19
申请人： Hidekazu Okamoto , Hideo Namatsu
发明人： Hidekazu Okamoto , Hideo Namatsu
IPC分类号： G03F7/42
CPC分类号： H01L21/0337 , C11D7/5018 , C11D11/0047 , G03F7/426 , H01L21/31133
摘要： The present invention provides a washing method for a device substrate, capable of sufficiently removing a resist attached to a device substrate, particularly a resist attached to fine pore portions of a pattern having a large aspect ratio.A method for washing a device substrate, which comprises a washing step of removing a resist attached to a device substrate by means of a solvent, wherein the solvent is a composition comprising at least one fluorinated compound selected from the group consisting of a hydrofluoroether, a hydrofluorocarbon and a perfluorocarbon, and a fluorinated alcohol.
摘要翻译：本发明提供了一种能够充分除去附着在器件基板上的抗蚀剂的器件基板的清洗方法，特别是附着在纵横比大的图案的细孔部分上的抗蚀剂。一种洗涤装置基板的方法，其包括通过溶剂除去附着在装置基板上的抗蚀剂的洗涤步骤，其中所述溶剂是包含至少一种氟化化合物的组合物，所述氟化化合物选自氢氟醚，氢氟烃和全氟化碳，以及氟化醇。

30. 发明授权

US07442815B2 Ultraviolet transmitting fluoropolymer and pellicle comprising said polymer 失效
标题翻译：包含所述聚合物的紫外透射含氟聚合物和防护薄膜
公开(公告)号：US07442815B2
公开(公告)日：2008-10-28
申请号：US11061689
申请日：2005-02-22
申请人： Ikuo Matsukura , Hidekazu Okamoto , Eisuke Murotani , Kazuya Oharu
发明人： Ikuo Matsukura , Hidekazu Okamoto , Eisuke Murotani , Kazuya Oharu
IPC分类号： C07D307/77
CPC分类号： C07D307/16 , C07D307/18 , C07D307/30 , C08F34/02 , G03F1/62 , G03F1/64
摘要： A pellicle which is excellent in transmittance and durability against short wavelength light, and which can be used for photolithography by using e.g. a KrF excimer laser, is provided.A pellicle for exposure to a light having a wavelength of at most 200 nm, which comprises a frame and a pellicle membrane bonded to the frame by means of an adhesive, wherein the pellicle membrane and/or the adhesive comprises a polymer containing repeating units represented by the following formula (1): wherein Q represents a C1-3 polyfluoroalkylene group having a linear structure, or a group having at least one atom selected from hydrogen atoms and fluorine atoms in such a polyfluoroalkylene group substituted by a substituent comprising a polyfluoroalkyl group which may contain an ethereal oxygen atom, or the like, and X represents a hydrogen atom, a fluorine atom or a C1-3 polyfluoroalkyl group which may contain an ethereal oxygen atom.
摘要翻译：对于短波长光透射率和耐久性优异的防护薄膜组件，其可以通过使用例如紫外线照射用于光刻。提供KrF准分子激光器。用于暴露于具有至多200nm的波长的光的防护薄膜组件，其包括通过粘合剂粘合到框架上的框架和防护薄膜组件，其中防护薄膜组件和/或粘合剂包含含有重复单元的聚合物通过下式（1）表示：其中Q表示具有直链结构的C 1-3-3多氟亚烷基或在该多氟亚烷基中具有至少一个选自氢原子和氟原子的原子的基团被含有可以含有醚性氧原子的多氟烷基等的取代基取代，X表示可以含有醚原子的氢原子，氟原子或C 1-3-3多氟烷基氧原子。

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