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    • 25. 发明授权
    • Semiconductor device
    • 半导体器件
    • US08604544B2
    • 2013-12-10
    • US13049540
    • 2011-03-16
    • Kenichi Matsushita
    • Kenichi Matsushita
    • H01L29/66
    • H01L27/0623H01L29/1095H01L29/7397
    • According to one embodiment, a semiconductor device includes a first main electrode, a base layer of a first conductivity type, a barrier layer of the first conductivity type, a diffusion layer of a second conductivity type, a base layer of the second conductivity type, a first conductor layer, a second conductor layer, and a second main electrode. Bottoms of the barrier layer of the first conductivity type and the diffusion layer of the second conductivity type are positioned on the first main electrode side of lower ends of the first conductor layer and the second conductor layer. The barrier layer of the first conductivity type and the diffusion layer of the second conductivity type form a super junction proximally to tips of the first conductor layer and the second conductor layer.
    • 根据一个实施例,半导体器件包括第一主电极,第一导电类型的基极层,第一导电类型的势垒层,第二导电类型的扩散层,第二导电类型的基极层, 第一导体层,第二导体层和第二主电极。 第一导电类型的阻挡层的底部和第二导电类型的扩散层位于第一导体层和第二导体层的下端的第一主电极侧上。 第一导电类型的阻挡层和第二导电类型的扩散层形成与第一导体层和第二导体层的尖端近端的超级结。
    • 27. 发明授权
    • Diode
    • 二极管
    • US06822313B2
    • 2004-11-23
    • US10105390
    • 2002-03-26
    • Kenichi Matsushita
    • Kenichi Matsushita
    • H01L2900
    • H01L27/0814H01L29/861
    • A diode has a semiconductor layer of a first conductive type having a first principal plane and a second principal plane facing the first principal plane; a first impurity layer of a second conductive type which is opposite to said first conductive type, said first impurity layer being selectively formed on said first principal plane of said semiconductor layer; a second impurity layer of the first conductive type which is selectively formed on said first principal plane of said semiconductor layer apart from said first impurity layer; a first main electrode connected to said first impurity layer; a second main electrode connected to said second impurity layer; a third impurity layer of the first conductive type which is selectively formed on said second principal plane of said semiconductor layer and which is formed so as to face said first impurity layer; a fourth impurity layer of the second conductive type which is selectively formed on said second principal plane of said semiconductor layer and which is formed so as to face said second impurity layer; and short-circuit part to electrically connect said third impurity layer to said fourth impurity layer.
    • 二极管具有第一导电类型的半导体层,其具有第一主平面和面向第一主平面的第二主平面; 与所述第一导电类型相反的第二导电类型的第一杂质层,所述第一杂质层选择性地形成在所述半导体层的所述第一主平面上; 所述第一导电类型的第二杂质层选择性地形成在所述半导体层的与所述第一杂质层之间的所述第一主平面上; 连接到所述第一杂质层的第一主电极; 连接到所述第二杂质层的第二主电极; 所述第一导电类型的第三杂质层选择性地形成在所述半导体层的所述第二主平面上,并且形成为面对所述第一杂质层; 所述第二导电类型的第四杂质层选择性地形成在所述半导体层的所述第二主平面上,并且形成为面对所述第二杂质层; 以及将所述第三杂质层电连接到所述第四杂质层的短路部分。