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    • 21. 发明授权
    • Method for manufacturing silicon carbide semiconductor device
    • 碳化硅半导体器件的制造方法
    • US08367536B2
    • 2013-02-05
    • US13319739
    • 2010-07-16
    • Hiroshi WatanabeNaruhisa Miura
    • Hiroshi WatanabeNaruhisa Miura
    • H01L21/3205H01L21/4763
    • H01L29/7802H01L29/0696H01L29/1608H01L29/66068
    • The present invention includes steps below: (a) forming, on a drift layer, a first ion implantation mask and a second ion implantation mask individually by photolithography to form a third ion implantation mask, the first ion implantation mask having a mask region corresponding to a channel region and having a first opening corresponding to a source region, the second ion implantation mask being positioned in contact with an outer edge of the first ion implantation mask and configured to form a base region; (b) implanting impurities of a first conductivity type from the first opening with an ion beam using the third ion implantation mask to form a source region in an upper layer part of the silicon carbide drift layer; (c) removing the first ion implantation mask after the formation of the source region; and (d) implanting impurities of a second conductivity type with an ion beam from a second opening formed in the second ion implantation mask after the removal of the first ion implantation mask to form a base region deeper than the source region in the upper layer part of the drift layer.
    • 本发明包括以下步骤:(a)通过光刻法分别在漂移层上形成第一离子注入掩模和第二离子注入掩模,以形成第三离子注入掩模,第一离子注入掩模具有对应于 沟道区,具有对应于源极区的第一开口,所述第二离子注入掩模定位成与所述第一离子注入掩模的外边缘接触并且被配置为形成基区; (b)使用第三离子注入掩模,用离子束从第一开口注入第一导电类型的杂质,以在碳化硅漂移层的上层部分中形成源极区; (c)在形成源极区域之后去除第一离子注入掩模; 以及(d)在除去第一离子注入掩模之后,从形成在第二离子注入掩模中的第二开口用离子束注入第二导电类型的杂质以形成比上层部分中的源极区更深的基极区 的漂移层。
    • 27. 发明授权
    • Nonvolatile semiconductor memory
    • 非易失性半导体存储器
    • US08227852B2
    • 2012-07-24
    • US11839156
    • 2007-08-15
    • Hiroshi Watanabe
    • Hiroshi Watanabe
    • H01L29/788
    • H01L29/4925H01L21/28273H01L27/115H01L29/42324
    • A nonvolatile semiconductor memory includes a memory cell including, a semiconductor substrate, a first insulating layer on the semiconductor substrate, a floating gate on the first insulating layer, a second insulating layer on the floating gate, and a control gate electrode on the second insulating layer, wherein the floating gate is comprised a first conductive layer which is contact with the first insulating layer, a second conductive layer which is contact with the second insulating layer, and a semiconductor layer between the first and second conductive layers, and each of the first and second conductive layer is a metal layer or a silicide layer.
    • 非易失性半导体存储器包括:存储单元,包括半导体衬底,半导体衬底上的第一绝缘层,第一绝缘层上的浮置栅极,浮置栅极上的第二绝缘层,以及位于第二绝缘层上的控制栅电极 层,其中所述浮栅包括与所述第一绝缘层接触的第一导电层,与所述第二绝缘层接触的第二导电层,以及所述第一和第二导电层之间的半导体层, 第一和第二导电层是金属层或硅化物层。
    • 28. 发明申请
    • POWER TRANSDUCER
    • 电力变压器
    • US20120119685A1
    • 2012-05-17
    • US13357104
    • 2012-01-24
    • Satoshi IboriYoshihiro UchinoHiroshi WatanabeMasahiro Hiraga
    • Satoshi IboriYoshihiro UchinoHiroshi WatanabeMasahiro Hiraga
    • H02P3/12
    • H02P3/22H02M1/32H02M5/458H02P3/14
    • The performance of a power transducer is improved while efficiently using a power semiconductor also by managing the permissible duty factor of the power semiconductor in the regenerative braking circuit provided in the power transducer. The user is allowed to set, through an operation panel provided on the power transducer, the resistance value of the regenerative braking resistor for thermally consuming the rotational energy generated during motor deceleration. The power transducer performs the steps of: calculating the current which flows in the regenerative braking circuit from the resistance value setting; obtaining the generation loss of the power semiconductor in the regenerative braking circuit with the calculated current value; and determining the permissible duty factor of the power semiconductor from the obtained generation loss.
    • 功率传感器的性能得到改善,同时通过管理设置在功率传感器中的再生制动电路中的功率半导体的允许占空比来有效地使用功率半导体。 允许用户通过设置在功率传感器上的操作面板设置再生制动电阻器的电阻值,用于热消耗电动机减速期间产生的旋转能量。 功率传感器执行以下步骤:从电阻值设定计算在再生制动电路中流动的电流; 以所计算的电流值获得再生制动电路中的功率半导体的发电损失; 以及从所获得的发电损失确定功率半导体的允许占空比。
    • 29. 发明授权
    • Three-dimensional (3D) structure data creation method, 3D structure data creation apparatus, computer-readable record media and computer system
    • 三维(3D)结构数据创建方法,3D结构数据创建装置,计算机可读记录介质和计算机系统
    • US08174522B2
    • 2012-05-08
    • US12052198
    • 2008-03-20
    • Hiroshi Watanabe
    • Hiroshi Watanabe
    • G06T15/00
    • G06F17/50
    • A three-dimensional (3D) structure data creation technique capable of readily creating 3D structure data is disclosed. This method is for producing data of a 3D structure which is made up of a plurality of elements. The method includes the steps of preparing first and second two-dimensional (2D) sectional images different in normal vector from each other, forming first and second unit graphics based on these 2D images, partitioning each unit graphic on a per-element basis, performing layout arrangement of two unit graphics in accordance with normal vectors, expanding these unit graphics for conversion to 3D objects, and allocating a selected element to a region in which elements of the unit graphics failing to coincide with each other, which region is included in and specified from those regions with intersection of respective partitioned parts of the unit graphics, thereby to create the 3D structure data required.
    • 公开了能够容易地创建3D结构数据的三维(3D)结构数据创建技术。 该方法用于生成由多个元素构成的3D结构的数据。 该方法包括以下步骤:在法向量中彼此不同的第一和第二二维(2D)截面图像,基于这些2D图像形成第一和第二单位图形,基于每个元素划分每个单位图形,执行 根据法向量布置两个单位图形的布局布置,将这些单位图形扩展到3D对象,并将所选择的元素分配到单元图形的元素彼此不一致的区域,该区域包括在哪个区域中, 从具有相应的单位图形的分割部分的区域指定,从而创建所需的3D结构数据。