专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

21. 发明专利

JP2005029848A Vacuum deposition apparatus 有权
标题翻译：真空沉积装置
公开(公告)号：JP2005029848A
公开(公告)日：2005-02-03
申请号：JP2003271248
申请日：2003-07-07
申请人： Kobe Steel Ltd , 株式会社神戸製鋼所
发明人： SHIMOJIMA KATSUHIKO , FUJII HIROBUMI , KAWAGUCHI HIROSHI
IPC分类号： C23C14/24 , C23C14/50 , C23C14/56 , H01J37/32
CPC分类号： H01J37/32055 , C23C14/505 , C23C14/56 , H01J37/32458
摘要： PROBLEM TO BE SOLVED: To provide a vacuum deposition apparatus which does not need to move a lower lid up and down and to put a workpiece support means in and out from a vacuum chamber, and is easily maintained.
SOLUTION: The vacuum deposition apparatus comprises the vacuum chamber 1; a rod-shaped evaporation source 2 which is installed so as to freely elevate toward the inside and outside of the vacuum chamber 1; and the workpiece support means 3 for supporting workpieces W which are arranged so as to surround the evaporation source 2 when the evaporation source 2 comes down into the vacuum chamber 1. The vacuum chamber 1 comprises a fixed chamber section 6 and a mobile chamber section 7B which is detachably installed in the fixing chamber section 6, and is provided with the workpiece support means 3. In a state that the evaporation source 2 moves outside the vacuum chamber 1 to make a space, one of the mobile chamber sections horizontally moves into the fixed chamber section 6 and is connected to it, and then vacuum deposition treatment is carried out.
COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：提供一种不需要上下移动下盖并将工件支撑装置从真空室中进出的真空沉积装置，并且容易地保持。真空沉积设备包括真空室1; 棒状蒸发源2，其安装成朝向真空室1的内部和外部自由升高; 以及用于在蒸发源2下降到真空室1中时用于支撑被布置成围绕蒸发源2的工件W的工件支撑装置3.真空室1包括固定室部分6和可移动室部分7B 其可拆卸地安装在定影室部分6中，并且设置有工件支撑装置3.在蒸发源2移动到真空室1外部以形成空间的状态下，移动室部分中的一个水平地移动到固定室部分6并连接到其上，然后进行真空沉积处理。版权所有（C）2005，JPO＆NCIPI

22. 发明专利

JP2003193219A VACUUM ARC VAPORIZATION SOURCE 审中-公开
公开(公告)号：JP2003193219A
公开(公告)日：2003-07-09
申请号：JP2001398223
申请日：2001-12-27
申请人： KOBE STEEL LTD
发明人： FUJII HIROBUMI
IPC分类号： C23C14/24
摘要： PROBLEM TO BE SOLVED: To provide a vacuum arc vaporization source in which arc is stably controlled to be confined in a prescribed area on a vaporization surface even if heavy current discharge from several 100A to ≥1000A is carried out. SOLUTION: A magnetic field producing source having the angle of line of magnetic force and an arc current value which are set to confine an arc spot into a nearly elliptic discharge region extending in the axial direction of a columnar evaporation material is provided on the evaporation surface of the columnar evaporation material. COPYRIGHT: (C)2003,JPO

23. 发明专利

JP2000336492A WORK CLEANING METHOD AND ITS DEVICE 失效
公开(公告)号：JP2000336492A
公开(公告)日：2000-12-05
申请号：JP14692099
申请日：1999-05-26
申请人： KOBE STEEL LTD
发明人： FUJII HIROBUMI
IPC分类号： H01L21/302 , C23F4/00 , H01L21/3065
摘要： PROBLEM TO BE SOLVED: To excellently clean a work by uniformly generating ions to collide with the work with respect to a vacuum chamber and the work. SOLUTION: In a work cleaning method in which ions are generated by emitting the electron to the inert gas from an electronic source within a vacuum chamber 1, the generated ions are made to collide with a surface of a work 7, and the surface of the work 7 is cleaned, the electronic source is arranged in a long range opposite to the work 7 within the vacuum chamber 1, and the electron is emitted to the inert gas from the electronic source within the vacuum chamber 1 to uniformly generate the ions in the vacuum chamber 1.

24. 发明专利

JP2000204466A VACUUM ARC EVAPORATION SOURCE AND VACUUM ARC EVAPORATION SYSTEM 失效
公开(公告)号：JP2000204466A
公开(公告)日：2000-07-25
申请号：JP804599
申请日：1999-01-14
申请人： KOBE STEEL LTD
发明人： FUJII HIROBUMI
IPC分类号： C23C14/24
摘要： PROBLEM TO BE SOLVED: To reduce the number of molten particles arriving at a substrate by the magnetic fields and to prevent the deviation of arc spots by generating only magnetic lines of force almost vertically crossed with an evaporating face via magnetic field generating sources surrounding an evaporating material being the cathode in arc discharge. SOLUTION: In a vacuum vessel 2, an evaporating material 3 is used as a cathode, arc discharge is caused between it and an anode, and, by the energy, the evaporating material 3 is evaporated and ionized to deposit a film on a substrate 5. In this vacuum arc vapor deposition device 1, magnetic field generating sources 7 surrounding the evaporating material 3 are arranged to compose an evaporating source 9. This magnetic field generating sources 7 are composed of annular permanent magnets having annular magnetic poles, and the magnetic lines of force to be generated are crossed almost vertically to the evaporating face 11, preferably within 30 degrees, more preferably within 10 degrees to the normal. Moreover, the evaporating face 11 is located preferably almost at the center of N and S both magnetic poles of the magnetic field generating sources 7. In this way, the quality of the deposited film is improved, and also, the availability of the evaporating material is improved.

25. 发明专利

JP2000087222A VACUUM ARC VAPOR DEPOSITION DEVICE 失效
公开(公告)号：JP2000087222A
公开(公告)日：2000-03-28
申请号：JP26309898
申请日：1998-09-17
申请人： KOBE STEEL LTD
发明人： FUJII HIROBUMI
IPC分类号： C23C14/24
摘要： PROBLEM TO BE SOLVED: To suppress production of fused particles during vacuum arc discharge and to improve smoothness of a film. SOLUTION: The vacuum arc vapor deposition device is equipped with a cathode 2 made of a vaporizing material and an anode 3 to perform vacuum arc discharge with the cathode in the vacuum chamber 1. In this device, the cathode and the vacuum chamber are connected with an electric wire 5 so as to increase the potential of the cathode. Or, a DC source may be interposed between the cathode and the vacuum chamber.

26. 发明专利

JPH07173617A VACUUM ARC DEPOSITION DEVICE 失效
公开(公告)号：JPH07173617A
公开(公告)日：1995-07-11
申请号：JP31860393
申请日：1993-12-17
申请人： KOBE STEEL LTD
发明人： FUJII HIROBUMI , TAMAGAKI HIROSHI , SHIMOJIMA KATSUHIKO , KAWAGUCHI HIROSHI
IPC分类号： C23C14/24
摘要： PURPOSE:To facilitate arc spot scanning control by placing an anode electrode near a deposition source and to make a charging electric current value to anode controllable in the vacuum arc deposition device having an anode for a cylindrical evaporating source. CONSTITUTION:Anode electrides 3, 4 are placed near both ends of an evaporating source 2. Further, an arc power source device 5 and control device 6 are provided, independently controlling the charging electric current value to the anode electrodes 3, 4. Next, vacuum arc discharge is generated from the evaporating source 2, arc spot is appeared on the surface of the evaporating source 2, controlling spot scanning, a target material is evaporated. This vapor is moved to a base plate 7. The film is formed on the base plate 7.

27. 发明专利

JP2014227598A 成膜装置およびそれを用いた成膜方法有权
标题翻译：薄膜沉积装置和使用装置的薄膜沉积方法
公开(公告)号：JP2014227598A
公开(公告)日：2014-12-08
申请号：JP2013110997
申请日：2013-05-27
申请人：株式会社神戸製鋼所 , Kobe Steel Ltd
发明人： SEGAWA TOSHINORI , ISHIYAMA ATSUSHI , FUJII HIROBUMI
IPC分类号： C23C14/50
CPC分类号： C23C14/541 , C23C14/505
摘要：【課題】冷媒のリークのリスクが大幅に低減され、かつ、冷却効率を向上することが可能な成膜装置および成膜方法を提供する。【解決手段】成膜装置1は、チャンバ2の空間2e内でワークWを冷却する冷却部4と、ワークWを載置した状態で垂直軸回りに回転する回転テーブル本体11であって、冷却部4を載置する冷却部載置部21と、当該冷却部載置部21の周囲を取り囲むように配置され、ワークWを載置するワーク載置部22とを有する回転テーブル本体11と、冷却部4を、空間2e内において、回転テーブル本体11に載置された第1位置と当該回転テーブル本体11から上方に離間するとともにワーク載置部22に載置されたワークWの側面と対向する第2位置との間で昇降させる昇降機構5と、チャンバ2に取り付けられ、冷却部4に着脱可能に接続される冷媒配管6とを備えている。【選択図】図1
摘要翻译：要解决的问题：提供一种可以显着降低冷却剂泄漏的风险并可提高冷却效率的成膜装置和成膜方法。成膜装置1包括：冷却部4，用于在室2的空间2e中冷却工件W; 一个转动台本体11，用于在加载工件W的同时转动垂直轴线，并且包括用于装载冷却部件4的冷却部分装载部分21以及用于封闭用于装载工件的冷却部分21的工件装载部分22 瓦; 升降机构5，用于将空间2e中的冷却部分4升高在与转台主体11上放置的第一位置和从转台主体11向上间隔的第二位置; 相同地面对放置在工件装载部22上的工件W的侧面; 以及附接到室2并可拆卸地连接到冷却部件4的制冷剂管道6。

28. 发明专利

JP2007247030A Vacuum arc evaporation source and vacuum arc deposition device 有权
标题翻译：真空蒸发源和真空沉积装置
公开(公告)号：JP2007247030A
公开(公告)日：2007-09-27
申请号：JP2006075276
申请日：2006-03-17
申请人： Kobe Steel Ltd , 株式会社神戸製鋼所
发明人： FUJII HIROBUMI
IPC分类号： C23C14/32
摘要： PROBLEM TO BE SOLVED: To provide a vacuum arc evaporation source where, even in the case the magnitude of a magnetic field is reduced, the position of an arc spot can be controlled, and, even under the influence of the magnetic field, a film composition similar to that in the case where the magnetic field is not present can be composed.
SOLUTION: An evaporation source 3 is provided with a power feed part 6 and further has a discharge starting part 5 so as to be the starting position of arc discharge at an evaporation face 2, and a control means 4 for controlling the position of an arc spot generated on the evaporation face 2 is provided with: a current feed source 8 for feeding arc current to the power feed part 6 of the evaporation source 3; and a magnetic field generation source 9 for forming a ferromagnetic field capable of regulating the movement of the arc spot at a region between the discharge starting part 5 of the evaporation face 2 and the power feed part 6. The magnetic field generation source 9 can form a weak magnetic field whose magnitude is smaller than that of the ferromagnetic field at a region on the evaporation face 2 beyond the ferromagnetic field viewed from the power feed part 6.
COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：为了提供一种真空电弧蒸发源，其中即使在磁场强度减小的情况下，也可以控制电弧点的位置，并且即使在磁场的影响下可以构成与不存在磁场的情况相似的膜组成。解决方案：蒸发源3设置有供电部6，并且还具有放电起始部5，以便成为在蒸发面2处的电弧放电的起始位置，以及用于控制位置的控制装置4 在蒸发面2上产生的电弧点设置有：用于将电弧电流馈送到蒸发源3的供电部分6的电流馈送源8; 以及用于形成铁磁场的磁场产生源9，其能够调节在蒸发面2的放电起始部5和供电部6之间的区域处的电弧点的移动。磁场产生源9可以形成在从供电部分6观察到的铁磁场之外，其幅度小于蒸发面2上的区域处的铁磁场的幅度的弱磁场。（C）2007，JPO＆INPIT

29. 发明专利

JP2004107750A Rod target for arc evaporation source, its production method and arc vapor deposition system 有权
公开(公告)号：JP2004107750A
公开(公告)日：2004-04-08
申请号：JP2002273880
申请日：2002-09-19
申请人： Kobe Steel Ltd , 株式会社神戸製鋼所
发明人： FUJII HIROBUMI , MIYAMOTO RYOJI , SHIMOJIMA KATSUHIKO
IPC分类号： C23C14/24 , C23C14/32
CPC分类号： C23C14/325
摘要： PROBLEM TO BE SOLVED: To obtain a uniform film thickness to a work, to improve the utilization rate of a rod target, and to eliminate the waste of the target.
SOLUTION: In the rod target for an arc evaporation source whose outer circumferential face is an evaporation face, both end parts in a longitudinal direction are formed so as to be thicker than the side of a central part. Further, the length of the thick parts in both the end parts in a longitudinal direction is set to 75 to 200 mm, respectively.
COPYRIGHT: (C)2004,JPO

30. 发明专利

JP2002053946A HARD FILM AND WEAR RESISTANT MEMBER, AND MANUFACTURING METHOD THEREOF 失效
公开(公告)号：JP2002053946A
公开(公告)日：2002-02-19
申请号：JP2000237443
申请日：2000-08-04
申请人： KOBE STEEL LTD
发明人： MORIKAWA YASUOMI , SATO TOSHIKI , FUJII HIROBUMI
IPC分类号： B23B27/14 , C23C14/06
摘要： PROBLEM TO BE SOLVED: To provide a useful hard film with which an aluminum oxide of corundum structure having excellent heat resistance, wear resistance, etc., can be formed under a low-temperature condition which does not cause deterioration in the characteristics of a base material. SOLUTION: An oxide film of corundum structure having 4.779 to 5.000 Ålattice constant and at least 0.005 μm film thickness is formed. Then, the aluminum oxide film of corundum structure is formed on one side of the above oxide film. Further, an oxide film composed of any of Cr2O3, (Fe, Cr)2O3 and (Al, Cr)2O3 is recommended as the above-mentioned oxide film.

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式