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21. 发明授权

EP3031073B1 DIFFERENTIAL METHODS AND APPARATUS FOR METROLOGY OF SEMICONDUCTOR TARGETS 有权
公开(公告)号：EP3031073B1
公开(公告)日：2019-05-22
申请号：EP14836663.6
申请日：2014-08-11
申请人： KLA - Tencor Corporation
发明人： PANDEV, Stilian Ivanov , SHCHEGROV, Andrei V.
IPC分类号： H01L21/027 , G03F7/20 , H01L21/66 , G01N21/956

22. 发明授权

EP2959503B1 SYSTEMS FOR PROVIDING ILLUMINATION IN OPTICAL METROLOGY 有权
公开(公告)号：EP2959503B1
公开(公告)日：2018-05-30
申请号：EP14753960.5
申请日：2014-02-21
申请人： Kla-Tencor Corporation
发明人： BRADY, Gregory , SHCHEGROV, Andrei V. , ROTTER, Lawrence D. , SHAUGHNESSY, Derrick , SHCEMELININ, Anatoly , BEZEL, Ilya , ARAIN, Muzammil , VASILIEV, Anatoly , ALLEN, James , SHULEPOV, Oleg , HILL, Andrew , BACHAR, Ohad , MARKOWITZ, Moshe , ISH-SHALOM, Yaron , SELA, Ilan , MANASSEN, Amnon , SVIZHER, Alexander , KHOKHLOV, Maxim , ABRAMOV, Avi , TSIBULEVSKY, Oleg , KANDEL, Daniel , GHINOVKER, Mark
IPC分类号： G01J3/10 , G01J3/12 , H01J65/04 , G01J3/02 , G02B6/35 , F21V13/00 , F21V13/08 , F21V13/12 , G02B6/293
CPC分类号： G01J3/10 , F21V13/00 , F21V13/08 , F21V13/12 , G01J3/0218 , G01J3/12 , G02B6/29332 , G02B6/29362 , G02B6/29388 , G02B6/29395 , G02B6/3508 , G02B6/353 , H01J65/04
摘要： The disclosure is directed to systems for providing illumination to a measurement head for optical metrology. In some embodiments of the disclosure, illumination beams from a plurality of illumination sources are combined to deliver illumination at one or more selected wavelengths to the measurement head. In some embodiments of the disclosure, intensity and/or spatial coherence of illumination delivered to the measurement head is controlled. In some embodiments of the disclosure, illumination at one or more selected wavelengths is delivered from a broadband illumination source configured for providing illumination at a continuous range of wavelengths.

23. 发明公开

EP3087594A1 MEASUREMENT OF MULTIPLE PATTERNING PARAMETERS 有权
标题翻译： MESSUNG MEHRERER STRUKTURIERUNGSPARAMETER
公开(公告)号：EP3087594A1
公开(公告)日：2016-11-02
申请号：EP14875032.6
申请日：2014-12-23
申请人： Kla-Tencor Corporation
发明人： SHCHEGROV, Andrei V. , KRISHNAN, Shankar , PTERLINZ, Kevin , DZIURA, Thaddeus Gerard , SAPIENS, Noam , PANDEV, Stilian Ivanov
IPC分类号： H01L21/66
CPC分类号： G01B11/272 , G01B2210/56 , G03F7/0002 , G03F7/70141 , G03F7/70625 , H01L22/12 , H01L22/30
摘要： Methods and systems for evaluating the performance of multiple patterning processes are presented. Patterned structures are measured and one or more parameter values characterizing geometric errors induced by the multiple patterning process are determined. In some examples, a single patterned target and a multiple patterned target are measured, the collected data fit to a combined measurement model, and the value of a structural parameter indicative of a geometric error induced by the multiple patterning process is determined based on the fit. In some other examples, light having a diffraction order different from zero is collected and analyzed to determine the value of a structural parameter that is indicative of a geometric error induced by a multiple patterning process. In some embodiments, a single diffraction order different from zero is collected. In some examples, a metrology target is designed to enhance light diffracted at an order different from zero.
摘要翻译：提出了用于评估多个图案化工艺性能的方法和系统。测量图案化结构，并且确定表征由多重图案化工艺引起的几何误差的一个或多个参数值。在一些示例中，测量单个图案化靶和多个图案化靶，所收集的数据拟合到组合测量模型，并且基于拟合来确定指示由多次图案化工艺引起的几何误差的结构参数的值。在一些其它示例中，收集并分析具有不同于零的衍射级的光并分析以确定指示由多次图案化工艺引起的几何误差的结构参数的值。在一些实施例中，收集不同于零的单个衍射级。在一些示例中，度量目标被设计为增强以不同于零的顺序衍射的光。

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