会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 23. 发明授权
    • Methods and apparatus for calling party number display solutions for 1xCSFB
    • 1xCSFB呼叫方号码显示解决方案和方法
    • US09374739B2
    • 2016-06-21
    • US13014583
    • 2011-01-26
    • Masakazu ShirotaJun WangGeorge CherianArvind SwaminathanSrinivasan BalasubramanianRavindra Manohar Patwardhan
    • Masakazu ShirotaJun WangGeorge CherianArvind SwaminathanSrinivasan BalasubramanianRavindra Manohar Patwardhan
    • H04W4/00H04W36/00H04W68/12
    • H04W36/0022H04W68/12
    • Controller and method for Handover (HO) based 1×CSFB communicates Calling Party Number (CPN) to User Equipment (UE) a in a cellular communication system. A first solution provides Interworking Solution (IWS) adding CPN sent to target Base Station Controller (BSC) via Mobile Switching Center (MSC) in Interoperability Specification (IOS) HO messages. A second solution provides that IWS sends CPN with Air Interface HO message and stores the CPN until UE transition to the target Radio Access Network and acquires a traffic channel. A third solution provides that IWS receives CPN from MSC with a paging message and stores the CPN until UE transition to the target Radio Access Network and acquires a traffic channel. A fourth solution provides sending AWI message to the target Radio Access Network from the MSC. A fifth solution provides that IWS sends CPN via Feature Notification Message (FNM) data tunneled to UE before the paging message to let user decide whether to accept a call before leaving 3G/4G cellular communication.
    • 基于移动(HO)的1×CSFB的控制器和方法在蜂窝通信系统中向用户设备(UE)a通信呼叫方号码(CPN)a。 第一个解决方案提供互通解决方案(IWS),通过移动交换中心(MSC)在互操作性规范(IOS)HO消息中添加发送到目标基站控制器(BSC)的CPN。 第二个解决方案规定,IWS向CPN发送空中接口HO消息,并存储CPN,直到UE转移到目标无线接入网络并获取业务信道。 第三个解决方案提供IWS从MSC接收CPN寻呼消息,并存储CPN,直到UE转移到目标无线接入网络并获取业务信道。 第四个解决方案提供从MSC向目标无线电接入网发送AWI消息。 第五个解决方案提供IWS在寻呼消息之前通过隧道传输到UE的功能通知消息(FNM)数据发送CPN,以便在离开3G / 4G蜂窝通信之前决定是否接受呼叫。
    • 25. 发明授权
    • Method for manufacturing liquid crystal panel
    • 液晶面板制造方法
    • US09151980B2
    • 2015-10-06
    • US13512590
    • 2012-05-02
    • Jun Wang
    • Jun Wang
    • H01L33/08G02F1/1335G02F1/13
    • G02F1/133514G02F2001/1316
    • The present invention relates to a method for manufacturing a liquid crystal panel, which comprises steps of: forming a plurality of array thin films on a first glass substrate in turn to form an array substrate; cleaning the array substrate by ultrasound to eliminate bubbles and dirt between the array thin films. The present invention can change surface properties of each thin film of the array substrate for tightening the combination between the thin films and efficiently decreasing or minimizing bubbles and dirt between the thin films of the liquid crystal panel.
    • 液晶面板的制造方法技术领域本发明涉及液晶面板的制造方法,其特征在于,包括以下步骤:依次在第一玻璃基板上形成多个阵列薄膜,形成阵列基板; 通过超声清洗阵列基板以消除阵列薄膜之间的气泡和污物。 本发明可以改变阵列基板的每个薄膜的表面特性,以紧固薄膜之间的组合,并有效地降低或最小化液晶面板的薄膜之间的气泡和污物。
    • 30. 发明申请
    • METHOD AND APPARATUS FOR PULSE ELECTROCHEMICAL POLISHING
    • 脉冲电化学抛光方法与装置
    • US20150155183A1
    • 2015-06-04
    • US14402853
    • 2012-05-24
    • Jian WangYinuo JinJun WangHui Wang
    • Jian WangYinuo JinJun WangHui Wang
    • H01L21/321C25F3/30H01L21/66
    • H01L21/32115C25F3/16C25F3/30C25F7/00H01L22/12H01L22/20
    • A method and apparatus for pulse electrochemical polishing a wafer are disclosed. The method comprises steps of: establishing a duty cycle table showing all points on the wafer, a removal thickness corresponding to every point and a duty cycle corresponding to the removal thickness; driving a wafer chuck holding and positioning the wafer to move at a preset speed so that a special point on the wafer is right above a nozzle ejecting charged electrolyte onto the wafer; looking up the duty cycle table and obtaining the removal thickness and the duty cycle corresponding to the special point; and applying a preset pulse power source to the wafer and the nozzle and the actual polishing power source for polishing the special point being equal to the duty cycle multiplying by the preset power source.
    • 公开了用于脉冲电化学抛光晶片的方法和装置。 该方法包括以下步骤:建立表示晶片上所有点的占空比表,对应于每个点的去除厚度和对应于去除厚度的占空比; 驱动晶片卡盘保持并定位晶片以预设速度移动,使得晶片上的特殊点恰好在喷射带电电解质的喷嘴上方到晶片上; 查找占空比表,获得与特殊点对应的去除厚度和占空比; 并且将预设的脉冲电源施加到晶片和喷嘴以及用于抛光特殊点的实际抛光电源等于乘以预设电源的占空比。