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21. 发明授权

US08246328B1 Seal section with sand trench 有权
标题翻译：密封段与沙沟
公开(公告)号：US08246328B1
公开(公告)日：2012-08-21
申请号：US12350297
申请日：2009-01-08
申请人： Alan Howell , Michael Barnes , Randy Karbs , Arcady Royzen
发明人： Alan Howell , Michael Barnes , Randy Karbs , Arcady Royzen
IPC分类号： F04B17/00 , F04B35/04
CPC分类号： F04B47/06
摘要： A seal section for use with a downhole pumping system includes a rotatable shaft, a seal section head and a mechanical seal chamber inside the seal section head. The mechanical seal chamber is bounded by a floor and a wall. The mechanical seal chamber includes a trench disposed in the floor that is configured to entrap solid particles in the mechanical seal chamber at a distance spaced apart from the mechanical seal.
摘要翻译：用于井下泵送系统的密封部分包括在密封部分头部内的可旋转轴，密封部分头部和机械密封室。机械密封室由地板和墙壁限定。机械密封室包括设置在地板中的沟槽，其被构造成以与机械密封件间隔开的距离将固体颗粒捕获在机械密封室中。

22. 发明申请

US20120195205A1 Network Topologies for Energy Efficient Networks 有权
标题翻译：节能网络的网络拓扑
公开(公告)号：US20120195205A1
公开(公告)日：2012-08-02
申请号：US13019157
申请日：2011-02-01
申请人： Alvaro Retana , Michael Barnes , Russell I. White , Alan Patrick Sheridan , Stanley M. Ratliff
发明人： Alvaro Retana , Michael Barnes , Russell I. White , Alan Patrick Sheridan , Stanley M. Ratliff
IPC分类号： H04L12/26 , H04L12/28
CPC分类号： H04L45/123 , H04L41/12 , H04L45/125 , H04W40/08 , H04W40/246 , Y02D70/122 , Y02D70/142 , Y02D70/144 , Y02D70/146 , Y02D70/22 , Y02D70/324
摘要： One embodiment identifies all one-hop neighbor nodes and two-hop neighbor nodes of a node; determines an active set of one-hop neighbor nodes for the node, comprising: includes in the active set each one-hop neighbor node that is either an edge node or connected with at least one two-hop neighbor node with which no other one-hop neighbor nodes are connected; and if the active set is not yet complete, then: determine all combinations of one-hop neighbor nodes that are not already in the active set; and tests each combination in order of each combination's total-energy value to determine whether a specific combination is able to complete the active set; if no combination is able to complete the active set, then including all one-hop neighbor nodes in the active set; and communicates a message to each one-hop neighbor node in the active set indicating that it is in the active set.
摘要翻译：一个实施例标识节点的所有一跳邻居节点和两跳邻居节点; 确定所述节点的一跳邻居节点的活动集，包括：在所述活动集中包括作为边缘节点或与至少一个两跳相邻节点连接的每个一跳邻居节点，跳邻居节点连接; 并且如果活动集尚未完成，则：确定尚未在活动集中的所有组合的一跳邻居节点; 并按照每个组合的总能量值的顺序测试每个组合，以确定特定组合是否能够完成活动集合; 如果没有组合能够完成活动集，则包括活动集中的所有一跳邻居节点; 并将消息传送到活动集中的每个一跳邻居节点，指示其在活动集中。

23. 发明申请

US20110214390A1 HOLLOW METAL DOOR 有权
标题翻译：中空金属门
公开(公告)号：US20110214390A1
公开(公告)日：2011-09-08
申请号：US12717672
申请日：2010-03-04
申请人： Michael Barnes
发明人： Michael Barnes
IPC分类号： E06B1/16 , B21D47/00
CPC分类号： B21D47/00 , E06B1/16 , Y10T29/49629
摘要： A hollow metal door using hollow structural sections with closed cross section, along with the method for making same, is described herein.
摘要翻译：本文描述了使用具有封闭横截面的中空结构部分的中空金属门及其制造方法。

24. 发明授权

US07888233B1 Flowable film dielectric gap fill process 有权
标题翻译：可流动薄膜电介质间隙填充工艺
公开(公告)号：US07888233B1
公开(公告)日：2011-02-15
申请号：US12411243
申请日：2009-03-25
申请人： Vishal Gauri , Raashina Humayun , Chi-I Lang , Judy H. Huang , Michael Barnes , Sunil Shanker
发明人： Vishal Gauri , Raashina Humayun , Chi-I Lang , Judy H. Huang , Michael Barnes , Sunil Shanker
IPC分类号： H01L21/4757
CPC分类号： H01L21/31 , C23C16/045 , C23C16/401 , C23C16/56 , H01L21/02164 , H01L21/02271 , H01L21/0234 , H01L21/3121 , H01L21/3122 , H01L21/31608 , H01L21/76224
摘要： Methods of this invention relate to filling gaps on substrates with a solid dielectric material by forming a flowable film in the gap. The flowable film provides consistent, void-free gap fill. The film is then converted to a solid dielectric material. In this manner gaps on the substrate are filled with a solid dielectric material. According to various embodiments, the methods involve reacting a dielectric precursor with an oxidant to form the dielectric material. In certain embodiments, the dielectric precursor condenses and subsequently reacts with the oxidant to form dielectric material. In certain embodiments, vapor phase reactants react to form a condensed flowable film.
摘要翻译：本发明的方法涉及通过在间隙中形成可流动的膜来填充具有固体电介质材料的衬底上的间隙。可流动膜提供一致的，无空隙的间隙填充。然后将膜转化成固体电介质材料。以这种方式，用固体电介质材料填充衬底上的间隙。根据各种实施方案，所述方法包括使电介质前体与氧化剂反应以形成电介质材料。在某些实施方案中，电介质前体冷凝并随后与氧化剂反应以形成电介质材料。在某些实施方案中，气相反应物反应形成冷凝的可流动的膜。

25. 发明申请

US20090326383A1 SYSTEMS AND METHODS FOR HYPERSPECTRAL IMAGING 有权
标题翻译：用于高速成像的系统和方法
公开(公告)号：US20090326383A1
公开(公告)日：2009-12-31
申请号：US12370557
申请日：2009-02-12
申请人： Michael Barnes , Zhihong Pan , Sizhong Zhang
发明人： Michael Barnes , Zhihong Pan , Sizhong Zhang
IPC分类号： A61B6/00 , G01N13/10
CPC分类号： H04N5/332 , A61B5/0059 , A61B5/0064 , A61B5/0075 , A61B5/0077 , A61B5/417 , A61B5/442 , A61B5/444 , A61B5/445 , A61B5/7246 , A61B5/726 , A61B5/7267 , A61B5/742 , G06K9/2018 , G06K2209/05 , G06T7/0012 , G06T2207/30088 , G06T2207/30096 , H04N5/2256 , H04N5/2351 , H04N5/238
摘要： An apparatus for analyzing a subject including a hyperspectral image module is provided. It is used to identify a suspect region of a subject by using a hyperspectral sensor (for obtaining a hyperspectral image of the subject), a control computer including a processor unit (PU) and a computer readable memory (CRM) (for controlling and is in electronic communication with the sensor), a control software module including instructions stored in the CRM and executed by the PU (for controlling said at least one operating parameter of the sensor), a spectral calibrator module including instructions stored in the CRM and executed by the PU (for applying a wavelength dependent spectral calibration standard constructed for the sensor to a hyperspectral image), and a light source for illuminating the subject. An optional contact probe module is used to collect a signal of the suspect region for medical diagnosis.
摘要翻译：提供了一种用于分析包括高光谱图像模块的对象的装置。它用于通过使用高光谱传感器（用于获得对象的高光谱图像）来识别受试者的可疑区域，包括处理器单元（PU）和计算机可读存储器（CRM）的控制计算机（用于控制并且是与传感器电子通信），包括存储在CRM中并由PU执行的指令（用于控制传感器的所述至少一个操作参数）的控制软件模块，包括存储在CRM中的指令并由 PU（用于将针对传感器构建的波长相关光谱校准标准应用于高光谱图像）以及用于照亮被摄体的光源。可选的接触探针模块用于收集可疑区域的信号用于医疗诊断。

26. 发明授权

US07582555B1 CVD flowable gap fill 有权
标题翻译： CVD可流动缝隙填充
公开(公告)号：US07582555B1
公开(公告)日：2009-09-01
申请号：US11323812
申请日：2005-12-29
申请人： Chi-I Lang , Judy H. Huang , Michael Barnes , Sunil Shanker
发明人： Chi-I Lang , Judy H. Huang , Michael Barnes , Sunil Shanker
IPC分类号： H01L21/4763
CPC分类号： H01L21/76837 , H01L21/02164 , H01L21/02216 , H01L21/02271 , H01L21/0234 , H01L21/31612 , H01L21/76826
摘要： The present invention meets these needs by providing improved methods of filling gaps. In certain embodiments, the methods involve placing a substrate into a reaction chamber and introducing a vapor phase silicon-containing compound and oxidant into the chamber. Reactor conditions are controlled so that the silicon-containing compound and the oxidant are made to react and condense onto the substrate. The chemical reaction causes the formation of a flowable film, in some instances containing Si—OH, Si—H and Si—O bonds. The flowable film fills gaps on the substrates. The flowable film is then converted into a silicon oxide film, for example by plasma or thermal annealing. The methods of this invention may be used to fill high aspect ratio gaps, including gaps having aspect ratios ranging from 3:1 to 10:1.
摘要翻译：本发明通过提供填充间隙的改进方法来满足这些需要。在某些实施方案中，所述方法包括将基材置于反应室中并将气相含硅化合物和氧化剂引入所述室中。控制反应器条件使得含硅化合物和氧化剂反应并冷凝到基底上。化学反应导致形成可流动的膜，在某些情况下，含有Si-OH，Si-H和Si-O键。可流动膜填充基板上的间隙。然后将可流动膜转化成氧化硅膜，例如通过等离子体或热退火。本发明的方法可用于填充高纵横比间隙，包括具有3:1至10:1的纵横比的间隙。

27. 发明授权

US07491653B1 Metal-free catalysts for pulsed deposition layer process for conformal silica laminates 有权
标题翻译：用于保形二氧化硅层压板的脉冲沉积层工艺的无金属催化剂
公开(公告)号：US07491653B1
公开(公告)日：2009-02-17
申请号：US11318268
申请日：2005-12-23
申请人： George D. Papasouliotis , Seon-Mee Cho , Ron Rulkens , Mihai Buretea , Dennis M. Hausmann , Michael Barnes
发明人： George D. Papasouliotis , Seon-Mee Cho , Ron Rulkens , Mihai Buretea , Dennis M. Hausmann , Michael Barnes
IPC分类号： H01L21/469 , H01L21/31
CPC分类号： H01L21/31612 , H01L21/02129 , H01L21/02164 , H01L21/02216 , H01L21/02271 , H01L21/0228 , H01L21/31625 , H01L21/31629 , H01L21/31633 , H01L21/76837
摘要： A metal- and metalloid-free nanolaminate dielectric film can be formed according to a pulsed layer deposition (PDL) process. A metal- and metalloid-free compound is used to catalyze the reaction of silica deposition by surface reaction of alkoxysilanols. Films can be grown at rates faster than 30 nm per exposure cycle. The invention can be used for the deposition of both doped (e.g., PSG) and undoped silicon oxide films. The films deposited are conformal, hence the method can accomplish void free gap-fill in high aspect ratio gaps encountered in advanced technology nodes (e.g., the 45 nm technology node and beyond), and can be used in other applications requiring conformal dielectric deposition.
摘要翻译：可以根据脉冲层沉积（PDL）工艺形成不含金属和非准金属的纳米酸盐电介质膜。使用金属和非准金属化合物催化二氧化硅沉积与烷氧基硅烷醇表面反应的反应。膜可以以每个曝光周期快30nm的速度生长。本发明可用于沉积掺杂（例如PSG）和未掺杂的氧化硅膜。沉积的膜是共形的，因此该方法可以在高级技术节点（例如，45nm技术节点及其以外）中遇到的高纵横比间隙中实现无空隙间隙填充，并可用于需要保形电介质沉积的其它应用中。

28. 发明申请

US20080067304A1 Combination Awning Bracket and Light Support System 有权
标题翻译：组合遮阳棚支架和灯支撑系统
公开(公告)号：US20080067304A1
公开(公告)日：2008-03-20
申请号：US11948986
申请日：2007-11-30
申请人： Michael Barnes
发明人： Michael Barnes
IPC分类号： A47F5/08
CPC分类号： F21V33/006 , E04F10/0662 , F21V19/006
摘要： Components for constructing and installing an awning and light support system to provide sun and weather protection to a window or door of a structure are disclosed. Included are a pair of uniquely-constructed bracket members having an L-shaped configuration used to removably secure horizontally-disposed supports and awning spars to provide a frame to support the awning material or skin. Also disclosed is an awning support structure comprising a support channel that extends along the top of an awning and supports a corresponding member attached to an awning frame. In some instances, the awning may be further supported by awning projection props secured between the awning frame and the building at a lower portion of the awning.
摘要翻译：公开了用于构造和安装遮阳篷和轻型支撑系统以向建筑物的窗户或门提供阳光和天气保护的部件。包括一对独特构造的支架构件，其具有用于可移除地固定水平布置的支撑件和遮阳翼片的L形构造，以提供支撑遮阳篷材料或皮肤的框架。还公开了一种遮阳篷支撑结构，其包括沿着遮篷的顶部延伸的支撑通道并且支撑附接到遮阳篷框架的相应构件。在一些情况下，遮阳篷可以进一步由在遮篷框架和建筑物之间固定在遮篷的下部的遮阳篷投影道具进一步支撑。

29. 发明申请

US20060016529A1 Alkali metal perchlorate-containing gas generants 有权
公开(公告)号：US20060016529A1
公开(公告)日：2006-01-26
申请号：US10899452
申请日：2004-07-26
申请人： Michael Barnes , Ivan Mendenhall , Robert Taylor
发明人： Michael Barnes , Ivan Mendenhall , Robert Taylor
IPC分类号： C06B31/00
CPC分类号： C06D5/06
摘要： Alkali metal perchlorate-containing gas generant compositions which, upon combustion, produce or result in an improved effluent and related methods for generating an inflation gas for use in an inflatable restraint system are provided. Such alkali metal perchlorate-containing gas generant compositions include at least one alkali metal perchlorate present with a mean particle size in excess of 100 microns. Such alkali metal perchlorate-containing gas generant compositions also include or contain a suitable non-azide, organic, nitrogen-containing fuel and at least one copper-containing compound selected from the group consisting of basic copper nitrate, cupric oxide, copper diammine dinitrate-ammonium nitrate mixture wherein ammonium nitrate is present in the mixture in a range of about 3 to about 90 weight percent, copper diammine bitetrazole, a copper-nitrate complex resulting from reaction of 5-aminotetrazole with basic copper nitrate and combinations thereof.

30. 发明申请

US20050098115A1 Atmospheric substrate processing apparatus for depositing multiple layers on a substrate 审中-公开
标题翻译：用于在基板上沉积多层的大气基板处理装置
公开(公告)号：US20050098115A1
公开(公告)日：2005-05-12
申请号：US10992005
申请日：2004-11-17
申请人： Michael Barnes , Michael Cox , Canfeng Lai , John Parks
发明人： Michael Barnes , Michael Cox , Canfeng Lai , John Parks
IPC分类号： C23C16/54 , C30B25/08 , H01L21/00 , C23C16/00
CPC分类号： H01L21/67167 , C23C16/54 , C30B25/08 , H01L21/67184 , Y10S414/139
摘要： A substrate processing apparatus is disclosed. In one embodiment, the apparatus includes a first atmospheric deposition station and a second atmospheric deposition station. The second atmospheric deposition station comprises an atmospheric pressure vapor deposition chamber. A substrate handling system is adapted to transfer substrates between the first and the second atmospheric deposition stations.
摘要翻译：公开了一种基板处理装置。在一个实施例中，该装置包括第一大气沉积站和第二大气沉积站。第二大气沉积站包括大气压气相沉积室。衬底处理系统适于在第一和第二大气沉积站之间传送衬底。

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