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21. 发明申请

US20110172372A1 CURABLE COMPOSITION AND METHOD FOR IMPROVING RECOVERY PROPERTIES AND CREEP PROPERTIES 有权
标题翻译：可固化组合物和改善回收性能和韧性的方法
公开(公告)号：US20110172372A1
公开(公告)日：2011-07-14
申请号：US13053181
申请日：2011-03-21
申请人： Toshihiko OKAMOTO , Katsuyu Wakabayashi , Hiroshi Ito , Hiroshi Ando
发明人： Toshihiko OKAMOTO , Katsuyu Wakabayashi , Hiroshi Ito , Hiroshi Ando
IPC分类号： C08L71/02 , C08L83/00 , C08K5/544
CPC分类号： C08G65/336 , C08L101/10 , C09K3/1018
摘要： Disclosed are a curable composition characterized by using a curable composition including an organic polymer (A1) having one or more silicon-containing functional groups capable of cross-linking by forming siloxane bonds in which the one or more silicon-containing functional groups capable of cross-linking by forming siloxane bonds are silicon-containing functional groups each having three or more hydrolyzable groups on one or more silicon atoms thereof; and a method for controlling the recovery properties, durability and creep resistance of the cured article. Herewith, the present invention provides a curable composition capable of giving a cured article excellent in recovery properties, durability and creep resistance, and a method for controlling the recovery properties, durability and creep resistance of the cured article.
摘要翻译：公开了一种可固化组合物，其特征在于使用包含具有一个或多个能够通过形成硅氧烷键交联的含硅官能团的有机聚合物（A1）的固化性组合物，其中所述一个或多个能够交叉的含硅官能团通过形成硅氧烷键的连接是在其一个或多个硅原子上具有三个或更多个可水解基团的含硅官能团; 以及用于控制固化制品的回收性能，耐久性和抗蠕变性的方法。因此，本发明提供了能够提供回收性，耐久性和抗蠕变性优异的固化物的固化性组合物，以及控制固化物的回收性，耐久性和抗蠕变性的方法。

22. 发明授权

US07965968B2 Image forming apparatus 失效
标题翻译：图像形成装置
公开(公告)号：US07965968B2
公开(公告)日：2011-06-21
申请号：US12708732
申请日：2010-02-19
申请人： Makoto Shihoh , Hiroshi Ito , Yoshihiro Shigemura
发明人： Makoto Shihoh , Hiroshi Ito , Yoshihiro Shigemura
IPC分类号： G03G15/01
CPC分类号： G03G15/5008 , G03G15/0131 , G03G15/0194 , G03G2215/0158
摘要： The image forming apparatus includes a plurality of photosensitive members, a plurality of exposure portions to perform exposure on the plurality of photosensitive members, a development portion to form a toner image at the plurality of photosensitive members, a transfer medium to which the respective toner images formed on the plurality of photosensitive members are sequentially transferred so as to form an image, and a position correction portion to perform position correction by moving at least one photosensitive member among the plurality of photosensitive members, and the position correction of the photosensitive member is performed by swinging the photosensitive member by the position correction portion having a line on a circumference surface of the photosensitive member corresponding to an exposure position of the exposure portion as the center axis.
摘要翻译：图像形成装置包括多个感光构件，多个曝光部分，以在多个感光构件上进行曝光;显影部分，用于在多个感光构件上形成调色剂图像;转印介质，各调色剂图像形成在多个感光构件上的多个感光构件被顺序地转印以形成图像，以及位置校正部分，通过移动多个感光构件中的至少一个感光构件来执行位置校正，并且执行感光构件的位置校正通过位置校正部分使感光部件摆动，该位置校正部分具有与感光部件的曝光位置相对应的感光部件的圆周表面上的直线作为中心轴线。

23. 发明授权

US07947425B2 Fluorinated vinyl ethers, copolymers thereof, and use in lithographic photoresist compositions 有权
标题翻译：氟化乙烯基醚，其共聚物，并用于平版印刷光刻胶组合物
公开(公告)号：US07947425B2
公开(公告)日：2011-05-24
申请号：US11501186
申请日：2006-08-07
申请人： Richard A. DiPietro , Hiroshi Ito
发明人： Richard A. DiPietro , Hiroshi Ito
IPC分类号： G03C1/00
CPC分类号： C07C43/178 , C07C43/196 , C07C2602/42 , C08F16/24 , G03F7/0046 , G03F7/0382 , G03F7/0392
摘要： Copolymers prepared by copolymerization of at least one fluorinated vinyl ether are provided. In one embodiment, the at least one fluorinated vinyl ether comprises ethylene directly substituted at an olefinic carbon atom with a moiety —OR* and optionally substituted with one, two, or three additional nonhydrogen substituents, wherein R* comprises a fluorinated alkyl moiety substituted with a protected or unprotected hydroxyl group, and further wherein an atom within R* may be (i) taken together with one of the additional nonhydrogen substituents, if present, or (ii) directly bound to an olefinic carbon atom, to form a ring. The polymers are useful, for example, in lithographic photoresist compositions, particularly chemical amplification resists. In a preferred embodiment, the polymers are substantially transparent to deep ultraviolet (DUV) radiation, and are thus useful in DUV lithographic photoresist compositions. A method for using the composition to generate resist images on a substrate is also provided, i.e., in the manufacture of integrated circuits or the like.
摘要翻译：提供通过至少一种氟化乙烯基醚的共聚制备的共聚物。在一个实施方案中，所述至少一种氟化乙烯基醚包括在烯烃碳原子处直接被部分-OR *取代的乙烯，并任选地被一个，两个或三个另外的非氢取代基取代，其中R *包含被保护或未保护的羟基，并且其中R *中的原子可以（i）与另外的非氢取代基之一（如果存在）或（ii）直接键合到烯属碳原子一起形成环。聚合物可用于例如平版光刻胶组合物，特别是化学增强抗蚀剂。在优选的实施方案中，聚合物对深紫外（DUV）辐射基本上是透明的，因此可用于DUV平版光刻胶组合物。还提供了使用该组合物在基板上产生抗蚀剂图像的方法，即在集成电路等的制造中。

24. 发明申请

US20110111339A1 BILAYER SYSTEMS INCLUDING A POLYDIMETHYLGLUTARIMIDE-BASED BOTTOM LAYER AND COMPOSITIONS THEREOF 有权
标题翻译：双层系统，其中包括基于聚二甲基硅氧烷的底层及其组合物
公开(公告)号：US20110111339A1
公开(公告)日：2011-05-12
申请号：US12613800
申请日：2009-11-06
申请人： Joy Cheng , Ho-Cheol Kim , Hiroshi Ito , Atsuko Ito , Hoa D. Truong
发明人： Joy Cheng , Ho-Cheol Kim , Hiroshi Ito , Atsuko Ito , Hoa D. Truong
IPC分类号： G03F7/004 , G03F7/20
CPC分类号： G03F7/091 , G03F7/0392 , G03F7/095
摘要： Bilayer systems include a bottom layer formed of polydimethylglutarimide, an acid labile dissolution inhibitor and a photoacid generator. The bilayer system can be exposed and developed in a single exposure and development process.
摘要翻译：双层体系包括由聚二甲基戊二酰亚胺形成的底层，酸不稳定溶解抑制剂和光酸产生剂。双层系统可以在单一的曝光和开发过程中暴露和发展。

25. 发明授权

US07828986B2 Forming surface features using self-assembling masks 有权
标题翻译：使用自组装掩模形成表面特征
公开(公告)号：US07828986B2
公开(公告)日：2010-11-09
申请号：US11926722
申请日：2007-10-29
申请人： Joy Cheng , Mark W. Hart , Hiroshi Ito , Ho-Cheol Kim , Robert Miller
发明人： Joy Cheng , Mark W. Hart , Hiroshi Ito , Ho-Cheol Kim , Robert Miller
IPC分类号： B44C1/22 , H01L21/302
CPC分类号： H01L21/0337 , B81C1/00031 , B81C2201/0149 , B81C2201/0198 , H01L21/0271 , H01L21/0332
摘要： A method. A combination is provided of a block copolymer and additional material. The copolymer includes a first block of a first polymer covalently bonded to a second block of a second polymer. The additional material is miscible with the first polymer. The first polymer includes polystyrene and the second polymer includes poly(ethylene oxide). A first layer including polydimethylglutarimide is adhered onto a surface of a substrate including a dielectric coated silicon wafer. A film is formed of the combination directly onto a surface of the first layer. Nanostructures of the additional material self-assemble within the first polymer block. The film and the first layer are simultaneously etched. The nanostructures have an etch rate lower than an etch rate of the block copolymer and lower than an etch rate of the first layer. Portions of the film are removed. Features remain on the surface of the first layer.
摘要翻译：一个方法。提供了一种嵌段共聚物和另外的材料的组合。共聚物包括共价键合到第二聚合物的第二嵌段的第一聚合物的第一嵌段。附加材料与第一聚合物混溶。第一聚合物包括聚苯乙烯，第二聚合物包括聚（环氧乙烷）。包括聚二甲基戊二酰亚胺的第一层粘附到包括电介质涂覆的硅晶片的基材的表面上。该组合物直接由第一层的表面形成。附加材料的纳米结构在第一聚合物嵌段内自组装。同时蚀刻膜和第一层。纳米结构的蚀刻速率低于嵌段共聚物的蚀刻速率，并且低于第一层的蚀刻速率。部分电影被删除。特征保留在第一层的表面上。

26. 发明授权

US07821447B2 Bias adjustment of radio frequency unit in radar apparatus 有权
标题翻译：雷达设备射频单元的偏置调整
公开(公告)号：US07821447B2
公开(公告)日：2010-10-26
申请号：US12232067
申请日：2008-09-10
申请人： Kenji Oka , Hiroshi Ito , Jun Ito
发明人： Kenji Oka , Hiroshi Ito , Jun Ito
IPC分类号： G01S13/00
CPC分类号： G01S7/4004 , G01S7/032
摘要： Disclosed is a method of bias adjustment for a millimeter wave radar apparatus that can efficiently and highly accurately adjust the bias of an MMIC used in a radio frequency circuit in the millimeter wave radar apparatus. The method comprises: providing a DA converter in a bias circuit in the millimeter wave radar apparatus comprising an antenna, a radio frequency unit, and a processing unit for performing transmission and reception processing of the radio frequency unit; connecting a signal generator in place of the antenna; and connecting a test processing unit and a control apparatus to the radio frequency unit, wherein the control apparatus applies an initial bias value in the form of a digital value to the MMIC, calculates the target value for the digital bias value based on the result of the measurement of the received signal, and takes the target value as the digital bias value for the production processing unit when the radio frequency characteristic of the received signal obtained by applying the target value to the MMIC lies within specified limits.
摘要翻译：公开了一种毫米波雷达装置的偏置调整方法，其能够高效且高精度地调整毫米波雷达装置中用于射频电路的MMIC的偏置。该方法包括：在毫米波雷达装置的偏置电路中设置DA转换器，该雷达装置包括天线，射频单元和用于执行射频单元的发送和接收处理的处理单元; 连接信号发生器代替天线; 以及将测试处理单元和控制装置连接到所述射频单元，其中，所述控制装置将数字值形式的初始偏置值应用于所述MMIC，基于所述MMIC的结果来计算所述数字偏置值的目标值当通过将目标值应用于MMIC而获得的接收信号的射频特性位于规定的限度内时，接收信号的测量，并将目标值作为生产处理单元的数字偏置值。

27. 发明授权

US07811039B2 Screw loosening prevention structure and gas pressure device including same 有权
标题翻译：螺杆松动防止结构及包括其的气压装置
公开(公告)号：US07811039B2
公开(公告)日：2010-10-12
申请号：US11651941
申请日：2007-01-09
申请人： Kaoru Nomichi , Makoto Ninomiya , Yutaka Suzuki , Hiroshi Ito
发明人： Kaoru Nomichi , Makoto Ninomiya , Yutaka Suzuki , Hiroshi Ito
IPC分类号： F16B43/02
CPC分类号： F17C13/04 , F17C2201/0109 , F17C2203/0617 , F17C2203/0643 , F17C2203/0646 , F17C2205/0323 , F17C2205/0326 , F17C2205/0329 , F17C2205/0338 , F17C2205/0394 , F17C2209/228 , F17C2209/234 , F17C2221/011 , F17C2221/012 , F17C2221/033 , F17C2223/0123 , F17C2223/0153 , F17C2223/0161 , F17C2223/035 , F17C2223/036 , F17C2260/036 , F17C2260/053 , F17C2270/0168 , F17C2270/0184 , F17C2270/079 , Y02E60/321
摘要： A screw loosening prevention structure and a gas-pressure device are provided. The structure includes a first member that is formed with a container space filled with gas, and includes a first threaded portion, a second member that includes a second threaded portion, wherein the second member is threadedly coupled with the first member by threadedly engaging the second threaded portion with the first threaded portion, and receives a pressure from the gas in the container space of the first member, and a spring member provided between the first and second members in a deformed state in which the displacement of the spring member is greater than a relative displacement of the first and second members due to a loosening factor including the gas pressure that is received by this second member.
摘要翻译：提供螺钉松动防止结构和气压装置。该结构包括形成有填充有气体的容器空间的第一构件，并且包括第一螺纹部分，包括第二螺纹部分的第二构件，其中第二构件通过与第二构件螺纹接合而与第一构件螺纹连接螺纹部分与第一螺纹部分接合，并且接收来自第一构件的容器空间中的气体的压力，以及设置在第一和第二构件之间的弹簧构件，其中弹性构件的位移大于由于包括由该第二构件接收的气体压力的松动因素，第一和第二构件的相对位移。

28. 发明授权

US07808551B2 Imaging module and method of manufacturing imaging module 有权
标题翻译：成像模块及成像模块制造方法
公开(公告)号：US07808551B2
公开(公告)日：2010-10-05
申请号：US11934420
申请日：2007-11-02
申请人： Hiroshi Ito , You Kondoh , Mikio Nakamura
发明人： Hiroshi Ito , You Kondoh , Mikio Nakamura
IPC分类号： H04N5/225
CPC分类号： H04N5/2253 , H01L27/14618 , H01L2924/0002 , H04N2005/2255 , H05K1/0274 , H05K1/189 , H05K3/007 , H05K3/4644 , H05K2201/09072 , H05K2201/10121 , H05K2203/016 , H01L2924/00
摘要： An imaging module includes a flexible printed circuit board which has a first area on which a first functional element is mounted, a second area on which a second functional element is mounted, and a third area which is formed between the first area and the second area, an electronic component which is mounted on the first area, and an imaging device which is mounted on the second area. The flexible printed circuit board is formed by an insulating layer which is integrated, spreading over the first area, the second area, and the third area. The flexible printed circuit board is formed such that the flexible printed circuit board can be bent at least in the third area.
摘要翻译：成像模块包括柔性印刷电路板，其具有安装有第一功能元件的第一区域，安装有第二功能元件的第二区域和形成在第一区域和第二区域之间的第三区域安装在第一区域上的电子部件和安装在第二区域上的摄像装置。柔性印刷电路板由整合在第一区域，第二区域和第三区域上的绝缘层形成。柔性印刷电路板形成为使得柔性印刷电路板可以至少在第三区域中弯曲。

29. 发明授权

US07796460B2 Nonvolatile semiconductor memory device 有权
标题翻译：非易失性半导体存储器件
公开(公告)号：US07796460B2
公开(公告)日：2010-09-14
申请号：US12140071
申请日：2008-06-16
申请人： Kensuke Matsufuji , Toshimasa Namekawa , Hiroshi Ito
发明人： Kensuke Matsufuji , Toshimasa Namekawa , Hiroshi Ito
IPC分类号： G11C8/00
CPC分类号： G11C17/18 , G11C17/16 , H01L27/112 , H01L27/11206
摘要： A nonvolatile semiconductor memory device comprises an array of memory cells each including an antifuse to store information based on a variation in resistance in accordance with destruction of the insulator in the antifuse. The antifuse includes a semiconductor substrate, a first conduction layer formed in the surface of the semiconductor substrate, a first electrode provided on the first conduction layer to be given a first voltage, a second conduction layer provided on the semiconductor substrate with the insulator interposed therebetween, and a second electrode provided on the second conduction layer to be given a second voltage different from the first voltage. The first electrode or the second electrode is formed of a metal silicide.
摘要翻译：非易失性半导体存储器件包括存储单元阵列，每个存储单元包括反熔丝，以根据抗反熔丝中的绝缘体的破坏来存储基于电阻变化的信息。反熔丝包括半导体衬底，形成在半导体衬底的表面中的第一导电层，设置在第一导电层上以被赋予第一电压的第一电极，设置在半导体衬底上的绝缘体之间的第二导电层以及设置在所述第二导电层上的第二电极，以被赋予不同于所述第一电压的第二电压。第一电极或第二电极由金属硅化物形成。

30. 发明申请

US20100226696A1 IMAGE FORMING APPARATUS 失效
标题翻译：图像形成装置
公开(公告)号：US20100226696A1
公开(公告)日：2010-09-09
申请号：US12708732
申请日：2010-02-19
申请人： Makoto Shihoh , Hiroshi Ito , Yoshihiro Shigemura
发明人： Makoto Shihoh , Hiroshi Ito , Yoshihiro Shigemura
IPC分类号： G03G15/01
CPC分类号： G03G15/5008 , G03G15/0131 , G03G15/0194 , G03G2215/0158
摘要： The image forming apparatus includes a plurality of photosensitive members, a plurality of exposure portions to perform exposure on the plurality of photosensitive members, a development portion to form a toner image at the plurality of photosensitive members, a transfer medium to which the respective toner images formed on the plurality of photosensitive members are sequentially transferred so as to form an image, and a position correction portion to perform position correction by moving at least one photosensitive member among the plurality of photosensitive members, and the position correction of the photosensitive member is performed by swinging the photosensitive member by the position correction portion having a line on a circumference surface of the photosensitive member corresponding to an exposure position of the exposure portion as the center axis.
摘要翻译：图像形成装置包括多个感光构件，多个曝光部分，以在多个感光构件上进行曝光;显影部分，用于在多个感光构件上形成调色剂图像;转印介质，各调色剂图像形成在多个感光构件上的多个感光构件被顺序地转印以形成图像，以及位置校正部分，通过移动多个感光构件中的至少一个感光构件来执行位置校正，并且执行感光构件的位置校正通过位置校正部分使感光部件摆动，该位置校正部分具有与感光部件的曝光位置相对应的感光部件的圆周表面上的直线作为中心轴线。

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