专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

21. 发明授权

US08751267B2 Medical image processing server and managing method for medical image processing server 有权
标题翻译：医学图像处理服务器和医学图像处理服务器的管理方法
公开(公告)号：US08751267B2
公开(公告)日：2014-06-10
申请号：US13166015
申请日：2011-06-22
申请人： Hiroshi Kurosawa
发明人： Hiroshi Kurosawa
IPC分类号： G06Q50/00 , G06Q50/24
CPC分类号： G06Q50/24 , G06F19/00 , G06F19/321
摘要： A medical image processing server, connected with terminals, has an access time obtaining unit, an update time obtaining unit, a determining unit and a data outputting unit. The access time obtaining unit obtains an access start time at which each of the terminals accesses medical image data selected by each of the terminals. The update time obtaining, if each of the terminals issues an update request for edited medical image data, obtains a last update time of the edited medical image data. The determining unit determines whether to generate updated data or copied data of medical image data edited by one of the terminals based on the access start time obtained by the terminal and the last update time obtained by another of the terminals. The data outputting unit outputs the updated data and the copied data based on identification information complying with a predetermined medical protocol.
摘要翻译：与终端连接的医疗图像处理服务器具有访问时间获取单元，更新时间获取单元，确定单元和数据输出单元。访问时间获取单元获取每个终端访问由每个终端选择的医学图像数据的访问开始时间。如果每个终端发出针对编辑的医学图像数据的更新请求，则获取更新时间获得编辑的医学图像数据的最后更新时间。确定单元基于由终端获得的访问开始时间和由另一个终端获得的最后更新时间来确定是否生成由终端之一编辑的医学图像数据的更新数据或复制数据。数据输出单元根据符合预定医疗协议的识别信息输出更新数据和复制数据。

22. 发明授权

US07411678B2 Alignment apparatus, control method thereof, exposure apparatus and method of manufacturing semiconductor device by exposure apparatus controlled by the same control method 失效
标题翻译：对准装置，控制方法，曝光装置以及通过相同控制方法控制的曝光装置制造半导体装置的方法
公开(公告)号：US07411678B2
公开(公告)日：2008-08-12
申请号：US10374141
申请日：2003-02-27
申请人： Hiroshi Kurosawa
发明人： Hiroshi Kurosawa
IPC分类号： G01B11/00 , G01B11/02
CPC分类号： H01L21/682 , G03F7/70725 , G03F7/70775 , H01L21/681
摘要： An alignment apparatus which drives to a target position a stage capable of moving at least in a two-dimensional direction. A first measurement device and a second measurement device have a function of measuring positions of the stage in one direction from different positions, a switching device performs a switching operation for switching the first measurement device to the second measurement device, and a controller sets an initial value for the second position measurement device, which is used after the switching operation, based on the position of the stage finally measured by the first position measurement device before the switching operation.
摘要翻译：一种对准装置，其将至少在二维方向上移动的台架驱动到目标位置。第一测量装置和第二测量装置具有从不同位置测量载物台在一个方向上的位置的功能，开关装置执行用于将第一测量装置切换到第二测量装置的切换操作，并且控制器设置初始基于在切换操作之前由第一位置测量装置最终测量的平台的位置，在切换操作之后使用的第二位置测量装置的值。

23. 发明授权

US07315350B2 Exposure apparatus, reticle shape measurement apparatus and method 失效
标题翻译：曝光装置，掩模版形状测量装置和方法
公开(公告)号：US07315350B2
公开(公告)日：2008-01-01
申请号：US10843462
申请日：2004-05-12
申请人： Hiroshi Kurosawa
发明人： Hiroshi Kurosawa
IPC分类号： G03B27/52 , G03B27/42
CPC分类号： G03F7/70333 , G03F7/70783
摘要： An exposure apparatus exposes a substrate to light via a reticle while the substrate and the reticle are scanned based on information regarding a shape of the reticle. A projection optical system projects a reticle pattern onto the substrate and a reticle stage holds the reticle and moves in the scanning direction. A measurement system measures a position of the reticle surface in the optical axis direction. Information is generated on a position of each measurement point of the surface in the scanning direction with respect to which the measurement system measures a surface position based on pattern information. The measurement performed with respect to each measurement point is used to obtain reticle shape information. The position of the reticle stage and operation of the measurement system is controlled based on the generated information and the reticle stage position information.
摘要翻译：曝光装置根据关于掩模版的形状的信息，通过掩模版将基板曝光，同时基板和掩模版被扫描。投影光学系统将掩模版图案投影到基板上，并且标线台保持标线并沿扫描方向移动。测量系统测量光罩表面在光轴方向上的位置。在扫描方向的表面的每个测量点的位置上生成信息，测量系统基于图案信息测量表面位置。使用关于每个测量点执行的测量来获得掩模版形状信息。基于生成的信息和标线片台位置信息来控制标线片的位置和测量系统的操作。

24. 发明授权

US07016049B2 Alignment apparatus, control method therefor, exposure apparatus, device manufacturing method, semiconductor manufacturing factory, and exposure apparatus maintenance method 失效
标题翻译：对准装置，其控制方法，曝光装置，装置制造方法，半导体制造工厂和曝光装置的维护方法
公开(公告)号：US07016049B2
公开(公告)日：2006-03-21
申请号：US10460178
申请日：2003-06-13
申请人： Hiroshi Kurosawa
发明人： Hiroshi Kurosawa
IPC分类号： G01B9/02 , G01B11/00
CPC分类号： G03F7/70725 , G03F7/70775
摘要： An alignment apparatus including a first position measuring device and a second position measuring device which measure position information of an object to be controlled, a switching device which switches a position measuring system from the first position measuring device to the second position measuring device, depending on a moving area of the object to be controlled, a correction computing device which performs a correction calculation for a measurement result from the first position measuring device using a first correction parameter set to obtain a current position of the object to be controlled, a predicted coordinate computing unit which predicts coordinates of the object to be controlled on the basis of progress of a correction calculation result from the correction computing device, and a reverse correction computing device which performs a calculation for the coordinates predicted by the predicted coordinate computing unit using a second correction parameter set to obtain a command value for the second position measuring device.
摘要翻译：一种对准装置，包括测量被控制物体的位置信息的第一位置测量装置和第二位置测量装置，根据第一位置测量装置将位置测量系统从第一位置测量装置切换到第二位置测量装置的切换装置，被控制物体的移动区域，对第1位置测定装置的测定结果进行校正计算的校正计算装置，使用第1校正参数，求出被控制物的当前位置，预测坐标计算单元，其基于来自校正计算装置的校正计算结果的进度来预测要控制的对象的坐标;以及反向校正计算装置，其对由所述预测坐标计算单元使用第二预测坐标计算单元预测的坐标进行计算校正参数设置得到a 第二位置测量装置的指令值。

25. 发明授权

US09128371B2 Imprint method, imprint apparatus, and article manufacturing method 有权
标题翻译：压印方法，压印装置和制品制造方法
公开(公告)号：US09128371B2
公开(公告)日：2015-09-08
申请号：US13478287
申请日：2012-05-23
申请人： Hiroshi Kurosawa
发明人： Hiroshi Kurosawa
IPC分类号： B29C59/02 , B05C11/00 , B05C9/06 , B05D1/36 , B05D3/12 , G03F7/00 , B82Y10/00 , B82Y40/00
CPC分类号： B29C43/58 , B05C9/10 , B05C11/1021 , B29C43/021 , B29C43/203 , B29C59/022 , B29C59/026 , B29C2043/5891 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： An imprint method includes an inspection step of inspecting a substrate to obtain information of a foreign substance on the substrate; and a film forming step of forming a film covering the foreign substance, using the information of a foreign substance on the substrate, wherein the film forming step is performed before the contact step.
摘要翻译：压印方法包括检查基板以获得基板上的异物的信息的检查步骤; 以及成膜步骤，使用所述基材上的异物信息，形成覆盖所述异物的膜，其中所述成膜步骤在所述接触步骤之前进行。

26. 发明授权

US07812927B2 Scanning exposure technique 有权
标题翻译：扫描曝光技术
公开(公告)号：US07812927B2
公开(公告)日：2010-10-12
申请号：US11770115
申请日：2007-06-28
申请人： Hiroshi Kurosawa
发明人： Hiroshi Kurosawa
IPC分类号： G03B27/42 , G03B27/52
CPC分类号： G03F9/7026 , G03F7/70725 , G03F9/7003
摘要： A scanning exposure apparatus for performing exposure of a substrate to light includes a projection optical system to project light from the original onto the substrate, a stage to hold the substrate and to move in a scanning direction, and a focus detector to detect a position of a surface region of the substrate in a direction of the optical axis. The apparatus (i) detects the position of the surface region with respect to each of a plurality of measurement points and with respect to each of a plurality of shot regions of the substrate, (ii) averages the detected positions, (iii) obtains a function which approximates the averaged positions, (iv) calculates a difference between each of the averaged positions and a value of the obtained function, (v) offsets a detected position with a corresponding one of the calculated differences, (vi) controls a position of the stage based on the offset positions, and (vii) logs the obtained function.
摘要翻译：用于对基板进行曝光的扫描曝光装置包括：投影光学系统，用于将来自原稿的光投射到基板上;保持基板并沿扫描方向移动的台;以及焦点检测器，基板的光轴方向的表面区域。该装置（i）检测表面区域相对于多个测量点中的每一个以及相对于基板的多个照射区域中的每一个的位置，（ii）对检测到的位置进行平均，（iii）获得函数近似于平均位置，（iv）计算每个平均位置之间的差值和所获得的函数的值，（v）用所计算的差分中的相应一个偏移检测位置，（vi）控制位置基于偏移位置的阶段，（vii）记录所获得的函数。

27. 发明授权

US5385830A Apparatus for measuring free and total sulfurous acid and method of measurement 失效
标题翻译：用于测量游离和总亚硫酸的设备和测量方法
公开(公告)号：US5385830A
公开(公告)日：1995-01-31
申请号：US771632
申请日：1991-10-04
申请人： Yoshifumi Amano , Kazuo Nakamura , Hiroshi Kurosawa , Takeshi Sato , Hirofumi Akano , Yoshiya Kawamura
发明人： Yoshifumi Amano , Kazuo Nakamura , Hiroshi Kurosawa , Takeshi Sato , Hirofumi Akano , Yoshiya Kawamura
IPC分类号： C12Q1/00 , C12Q1/02 , C12Q1/26 , C12Q1/32 , C12S3/00 , C12M1/00 , C12P1/04 , C12P11/00
CPC分类号： C12Q1/02 , C12Q1/001 , C12Q1/26 , C12Q1/32 , Y10T436/15 , Y10T436/18 , Y10T436/184 , Y10T436/186 , Y10T436/188
摘要： The present invention provides a method for measuring the amount of free sulfurous acid and bound sulfurous acid in a sample using a bacterium belonging to Thiobacillus thiooxidans or Thiobacillus ferrooxidans of in which the sample is treated with acid and/or alkali to give free sulfurous acid alone in the sample. Then, the total amount of free sulfurous acid in the sample is measured by an oxidation reaction of free sulfurous acid to sulfuric acid using a bacterium belonging to Thiobacillus thiooxidans or Thiobacillus ferrooxidans.
摘要翻译：本发明提供了使用属于硫氧化硫杆菌（Thiobacillus thiooxidans）或硫氧化硫杆菌（Thiobacillus ferrooxidans）的细菌测量样品中游离亚硫酸和结合亚硫酸的量的方法，其中样品用酸和/或碱处理以产生单独的亚硫酸在样品中。然后，使用属于硫氧化硫杆菌（Thiobacillus thiooxidans）或硫氧化硫杆菌（Thiobacillus ferrooxidans）的细菌，通过游离亚硫酸与硫酸的氧化反应测定样品中游离亚硫酸的总量。

28. 发明授权

US4860021A Parabolic antenna 失效
标题翻译：抛物面天线
公开(公告)号：US4860021A
公开(公告)日：1989-08-22
申请号：US877206
申请日：1986-06-23
申请人： Hiroshi Kurosawa , Izumi Ochiai
发明人： Hiroshi Kurosawa , Izumi Ochiai
IPC分类号： H01Q1/12
CPC分类号： H01Q1/125
摘要： A parabolic antenna comprises a parabolic reflector having a flange at outer periphery of reflector contiguously and an antenna fitting integrally formed with upper and lower fitting arms to be secured to upper and lower portions of the flange, respectively. The back of the parabolic reflector is fixedly mounted to the antenna fitting through the upper and lower fitting arms and fixed on an antenna support post.
摘要翻译：抛物面天线包括抛物面反射器，其反射器在反射器的外周缘处具有凸缘，并且天线接头与上和下配合臂一体地形成，以分别固定在凸缘的上部和下部。抛物面反射器的背面通过上下配件臂固定安装在天线配件上，固定在天线支撑柱上。

29. 发明授权

US08278097B2 Method for forming embryoid bodies 有权
标题翻译：形成胚状体的方法
公开(公告)号：US08278097B2
公开(公告)日：2012-10-02
申请号：US12480156
申请日：2009-06-08
申请人： Hiroshi Kurosawa , Shujiro Sakaki
发明人： Hiroshi Kurosawa , Shujiro Sakaki
IPC分类号： C12N5/00
CPC分类号： C12N5/0603 , C12M21/06 , C12M23/20 , C12N2533/20 , C12N2533/30
摘要： The invention relates to a vessel for embryoid formation used for forming embryoid bodies from ES cells easily without complicated technique, and to a method for forming embryoid bodies easily and efficiently using the vessel. The method includes the steps of (A) providing a vessel for embryoid formation having a coating layer formed from a compound having a particular PC-like group on a vessel surface defining a region for floating culture of ES cells, and (B) floating culturing ES cells in the vessel to form embryoid bodies.
摘要翻译：本发明涉及一种用于胚胎形成的容器，用于容易地从ES细胞形成胚状体而不需要复杂的技术，并且涉及一种容易且有效地使用血管形成胚状体的方法。该方法包括以下步骤：（A）提供用于胚状体形成的容器，其具有在容器表面上形成的具有特定PC样基团的化合物形成的涂层，其限定ES细胞的漂浮培养区域，和（B）漂浮培养 ES细胞在血管中形成胚状体。

30. 发明申请

US20060130408A1 Polishing slurry for ionic materials, method for selecting a dispersant to be contained in the polishing slurring, method for determining a mixing concentration of the selected dispersant and polishing method using said polishing slurry 审中-公开
标题翻译：用于离子材料的抛光浆料，用于选择抛光浆液中包含的分散剂的方法，用于确定所选分散剂的混合浓度的方法和使用所述抛光浆料的抛光方法
公开(公告)号：US20060130408A1
公开(公告)日：2006-06-22
申请号：US11302288
申请日：2005-12-14
申请人： Hiroshi Kurosawa
发明人： Hiroshi Kurosawa
IPC分类号： B24D18/00 , B24D3/00
CPC分类号： C09G1/02
摘要： A polishing slurry is disclosed, which is to be used for polishing an ionic material, the polishing slurry including a dispersant which is to form a nonionic adsorbing layer on a surface of the ionic material. The dispersant may be selected by separately preparing first and second solutions containing first and second different dispersants, immersing test pieces each made of said ionic material into the first and second solutions, respectively, comparing a step between an etched portion and a non-etched portion of the test piece immersed in the first solution with a step between an etched portion and a non-etched portion of the test piece immersed in the second solution, and selecting the dispersant used in the solution in which the test piece having the smaller step is immersed.
摘要翻译：公开了抛光浆料，其用于抛光离子材料，抛光浆料包括在离子材料的表面上形成非离子吸附层的分散剂。可以通过分别制备含有第一和第二不同分散剂的第一溶液和第二溶液，分别将分别由所述离子材料制成的试验片浸入第一和第二溶液中来选择分散剂，比较蚀刻部分和非蚀刻部分之间的台阶的浸渍在第二溶液中的试验片的蚀刻部和未蚀刻部之间的台阶浸渍在第一溶液中，并且选择在具有较小台阶的试片的溶液中使用的分散剂沉浸在

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式